JPS6489595A - Manufacture of wiring board - Google Patents

Manufacture of wiring board

Info

Publication number
JPS6489595A
JPS6489595A JP24712887A JP24712887A JPS6489595A JP S6489595 A JPS6489595 A JP S6489595A JP 24712887 A JP24712887 A JP 24712887A JP 24712887 A JP24712887 A JP 24712887A JP S6489595 A JPS6489595 A JP S6489595A
Authority
JP
Japan
Prior art keywords
resist
peeled
side wall
polyimide
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24712887A
Other languages
Japanese (ja)
Other versions
JPH081988B2 (en
Inventor
Akinari Kida
Naoki Fukutomi
Yoshiaki Tsubomatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP24712887A priority Critical patent/JPH081988B2/en
Publication of JPS6489595A publication Critical patent/JPS6489595A/en
Publication of JPH081988B2 publication Critical patent/JPH081988B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To enable a support substrate to be peeled off easily, making the outer periphery and/or side wall of the support substrate vitreous at least in the surface rough, and the other part smooth, by providing the support substrate with a copper layer, and by forming thereon a multilayer wiring consisting of wiring conductor and insulating resin such as polyimide. CONSTITUTION:The side wall and the substrate end of a glass substrate 1 having a smooth surface 2 are made rough 3 with a rotary whetstone. Next, a copper layer 4 is formed on the surface of the glass substrate and on the side wall. A resist layer is formed on the surface of the copper layer 4 and turned into a resist pattern by exposure and development, and a part free of resist is plated with copper; then, the resist is peeled off to form an interlayer connection metal column 5. After a polyimide layer 6 is provided, the polyimide is flattened to allow the interlayer connection metal column 5 to be exposed, resulting in formation of wiring conductor 7. Such steps are repeated required times to allow a multilayer structure. Then, a part finally forming the product is peeled off from the glass substrate, thus obtaining a multilayer wiring board 8.
JP24712887A 1987-09-30 1987-09-30 Manufacturing method of wiring board Expired - Lifetime JPH081988B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24712887A JPH081988B2 (en) 1987-09-30 1987-09-30 Manufacturing method of wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24712887A JPH081988B2 (en) 1987-09-30 1987-09-30 Manufacturing method of wiring board

Publications (2)

Publication Number Publication Date
JPS6489595A true JPS6489595A (en) 1989-04-04
JPH081988B2 JPH081988B2 (en) 1996-01-10

Family

ID=17158848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24712887A Expired - Lifetime JPH081988B2 (en) 1987-09-30 1987-09-30 Manufacturing method of wiring board

Country Status (1)

Country Link
JP (1) JPH081988B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06334343A (en) * 1992-09-04 1994-12-02 Hitachi Ltd Manufacture of multilayered wiring board and high density multilayered wiring board
US7187072B2 (en) 1994-03-18 2007-03-06 Hitachi Chemical Company, Ltd. Fabrication process of semiconductor package and semiconductor package
EP2287897A3 (en) * 1996-05-27 2011-11-02 Dai Nippon Printing Co., Ltd. Circuit member for semiconductor device, semiconductor device using the same, and process for producing said circuit member and said semiconductor device
WO2020105236A1 (en) * 2018-11-20 2020-05-28 三井金属鉱業株式会社 Multilayer body

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100209259B1 (en) * 1996-04-25 1999-07-15 이해규 Ic card and method for manufacture of the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06334343A (en) * 1992-09-04 1994-12-02 Hitachi Ltd Manufacture of multilayered wiring board and high density multilayered wiring board
US7187072B2 (en) 1994-03-18 2007-03-06 Hitachi Chemical Company, Ltd. Fabrication process of semiconductor package and semiconductor package
EP2287897A3 (en) * 1996-05-27 2011-11-02 Dai Nippon Printing Co., Ltd. Circuit member for semiconductor device, semiconductor device using the same, and process for producing said circuit member and said semiconductor device
WO2020105236A1 (en) * 2018-11-20 2020-05-28 三井金属鉱業株式会社 Multilayer body
TWI717107B (en) * 2018-11-20 2021-01-21 日商三井金屬鑛業股份有限公司 Layered body
JPWO2020105236A1 (en) * 2018-11-20 2021-09-30 三井金属鉱業株式会社 Laminate
US12193153B2 (en) 2018-11-20 2025-01-07 Mitsui Mining & Smelting Co., Ltd. Multilayer body

Also Published As

Publication number Publication date
JPH081988B2 (en) 1996-01-10

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