JPWO2024257504A5 - - Google Patents

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Publication number
JPWO2024257504A5
JPWO2024257504A5 JP2024551616A JP2024551616A JPWO2024257504A5 JP WO2024257504 A5 JPWO2024257504 A5 JP WO2024257504A5 JP 2024551616 A JP2024551616 A JP 2024551616A JP 2024551616 A JP2024551616 A JP 2024551616A JP WO2024257504 A5 JPWO2024257504 A5 JP WO2024257504A5
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JP
Japan
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less
continuous reactor
gas
chemical solution
volume
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JP2024551616A
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English (en)
Japanese (ja)
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JP7634139B1 (ja
JPWO2024257504A1 (ar
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Priority claimed from PCT/JP2024/016925 external-priority patent/WO2024257504A1/ja
Publication of JPWO2024257504A1 publication Critical patent/JPWO2024257504A1/ja
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Publication of JP7634139B1 publication Critical patent/JP7634139B1/ja
Publication of JPWO2024257504A5 publication Critical patent/JPWO2024257504A5/ja
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JP2024551616A 2023-06-13 2024-05-07 半導体洗浄用薬液および半導体洗浄用薬液の製造方法 Active JP7634139B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023096884 2023-06-13
JP2023096884 2023-06-13
PCT/JP2024/016925 WO2024257504A1 (ja) 2023-06-13 2024-05-07 半導体薬液および半導体薬液の製造方法

Publications (3)

Publication Number Publication Date
JPWO2024257504A1 JPWO2024257504A1 (ar) 2024-12-19
JP7634139B1 JP7634139B1 (ja) 2025-02-20
JPWO2024257504A5 true JPWO2024257504A5 (ar) 2025-05-27

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ID=93851967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024551616A Active JP7634139B1 (ja) 2023-06-13 2024-05-07 半導体洗浄用薬液および半導体洗浄用薬液の製造方法

Country Status (5)

Country Link
JP (1) JP7634139B1 (ar)
KR (1) KR20260021637A (ar)
CN (1) CN121039789A (ar)
TW (1) TW202500541A (ar)
WO (1) WO2024257504A1 (ar)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4754058B2 (ja) * 2000-10-16 2011-08-24 三井化学株式会社 イソプロピルアルコールの製造方法
KR102313108B1 (ko) * 2016-06-17 2021-10-15 가부시키가이샤 도쿠야마 이소프로필 알코올의 제조 방법 및 불순물이 저감된 이소프로필 알코올
JP6980952B1 (ja) * 2020-04-02 2021-12-15 株式会社トクヤマ 半導体処理液及びその製造方法
US20250171718A1 (en) * 2022-03-16 2025-05-29 Tokuyama Corporation Semiconductor cleaning liquid and method for producing semiconductor cleaning liquid

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