KR20200031105A - 스펙트럼 변환기를 사용하여 3d 성형품을 제조하는 방법 및 장치 - Google Patents
스펙트럼 변환기를 사용하여 3d 성형품을 제조하는 방법 및 장치 Download PDFInfo
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Abstract
Description
도 2는 전면에 하나의 필터 요소(도 2a), 여러 개의 필터 요소(도 2b), 냉각 요소(도 2c) 또는 확산기(diffuser)(도 2d)가 있는 소결 램프의 예시적인 실시형태를 도시한다.
도 3은 본 발명에 따른 공정의 순서를 도시한다.
도 4는 a) 폴리아미드 12와 같은 분말의 개략적인 에너지 입력 및 출력 곡선을; b) 프린트되지 않은 영역 유형의 액상 및 고상 온도를 나타내는 온도 곡선을; c) 프린트된 영역 유형의 액상 및 고상 온도를 나타내는 온도 곡선을 도시한다.
도 5는 두 가지 다른 방사기 설계를 갖는 소결 램프의 실시형태를 도시한다.
도 6는 빔 경로에 단파 적외선 방사기와 스펙트럼 변환기를 결합하여 구현된 오버헤드 방사기(overhead radiator)를 도시한다.
도 7은 방사선 스펙트럼으로서, 필터 없이 구현된(도 7a) 및 필터와 함께 구현된(도 7b) 소결 유닛에서 분말(II) 및 흡수제(I)의 흡수 범위에 대한 장파 및 단파 방사선의 중첩을 도시하며, 음영 영역은 흡수제에 의해 흡수된 방사선 에너지를 나타낸다.
101: 코터
102: 제작 플랫폼
103: arts 부품
107: 층
108: 오버헤드 방사기
109: 소결 방사기 유닛
110: 제작 컨테이너
105: 제작 컨테이너의 단열재
104: 저항 히터 또는 가열 코일
106: 제작 플랫폼의 하향 단열재
111: 저항 히터 또는 코터
112: 고온계
201: 단파 IR 방사기
202: 필터
202a: 단파 적외선 방사기 바로 옆의 필터
202b: 제작 표면 바로 옆의 필터
202c: 확산기
203: 장파 성분을 갖는 적외선
204: 장파 성분이 없는 적외선
204b: 지향되지 않은, 장파 성분이 없는 적외선
205: 두 개의 방사선 필터 사이의 공동
206: 냉각 슬롯
207: 유체-냉각 방사기
208: 팬
501: 방사선 필터가 없는 소결 방사기
502: 방사선 필터로 구현된 소결 방사기
601: 단파 적외선 방사기
602: 광대역 적외선
603: 흡수제
604: 흡수제에 의해 방출된 장파 적외선
701: 2차 피크를 갖는 종래의 방사기의 전형적인 방사선 스펙트럼
702: 저전력에서 종래의 방사기의 스펙트럼
703: 붕규산 유리 디스크의 흡수 스펙트럼
704: 고전력에서 종래의 방사기의 방출된 스펙트럼
705: 투과된 스펙트럼
706: 차단된 파장 범위
Claims (10)
- 정해진 층 내에서 제작장 상에 미립자 제작 재료가 코터에 의해 도포되고, 하나 이상의 액체 또는 하나 이상의 흡수제의 미립자 재료가 선택적으로 도포되고, 에너지 투입이 방사기에 의해 달성되고, 선택적으로 도포된 흡수제가 있는 영역이 선택적으로 응고되고, 제작장이 하나의 층 두께만큼 하강하거나 코터가 하나의 층 두께만큼 상승하며, 원하는 3D 성형품이 생성될 때까지 이들 단계가 반복되는, 3D 성형품을 제조하는 방법에 있어서, 방법은 적어도 하나의 스펙트럼 변환기를 사용하는 것을 특징으로 하는 3D 성형품을 제조하는 방법.
- 제 1 항에 있어서,
스펙트럼 변환기는 단파 또는 장파 방사선을 필터링하는 적어도 하나의 필터인 것을 특징으로 하는 3D 성형품을 제조하는 방법.
- 제 1 항 또는 제 2 항에 있어서,
필터링된 방사선 범위는 사용된 미립자 재료의 스펙트럼과 호환되는 방식으로 선택되고, 미립자 재료 상에 방사되는 스펙트럼은 바람직하게 8 내지 3.5 μm의 파장을 갖고, 바람직하게,
폴리아미드 분말, 폴리아미드계 열가소성 엘라스토머 또는 우레탄계 열가소성 엘라스토머가 분말 재료서 사용되는 것을 특징으로 하는 3D 성형품을 제조하는 방법.
- 제 1 항, 제 2 항 또는 제 3 항에 있어서,
도포된 분말 층이 제 1 가열 단계에서 분말 재료의 소결 창 내에 있는 분말의 기본 온도로 흡수제 없이 가열되고, 제 2 소결 단계는 분말의 용융 온도보다 높은 소결 온도에서 흡수제로 프린트된 영역의 열 투입에 의한 선택적 응고를 유도하고, 선택적으로 도포된 흡수제가 있는 영역은 흡수제가 없는 영역보다 제 1 단계에서 더 가열되고, 따라서 흡수제가 있는 영역과 흡수제가 없는 영역 사이에 온도차가 설정되는 것을 특징으로 하는 3D 성형품을 제조하는 방법.
- 분말-기반 프린팅 공정에 필요한 모든 구성요소를 포함하는, 3D 성형품을 제조하는 장치로서, 장치는 바람직하게 냉각 슬롯, 냉각 리세스, 냉각 그루브 및/또는 냉각 보어를 갖는 적어도 하나의 스펙트럼 변환기를 포함하는 것을 특징으로 하는 3D 성형품을 제조하는 장치.
- 제 5 항에 있어서,
스펙트럼 변환기는, 선택된 파장 범위를 정의하고 해당 파장 범위를 필터링하는 적어도 하나의 필터이고, 바람직하게,
필터는 붕규산 디스크인 것을 특징으로 하는 3D 성형품을 제조하는 장치.
- 제 5 항 또는 제 6 항에 있어서,
선택된 파장 범위는 장파 또는 단파 적외선에서 선택되고, 바람직하게는 8 μm 내지 3.5 μm 또는 3.5 μm 내지 0.5 μm의 파장 범위이고, 바람직하게,
적어도 두 개의 스펙트럼 변환기는 본질적으로 하나 위에 다른 하나가 있는 방식으로 배치되고, 바람직하게 적어도 두 개의 스펙트럼 변환기 사이에 공동이 존재하는 것을 특징으로 하는 3D 성형품을 제조하는 장치.
- 제 5 항 내지 제 7 항 중 어느 한 항에 있어서,
구성요소는 제작 플랫폼, 측벽, 작업 상자, 리코터, 프린트 헤드, 세라믹 시트, 에너지 투입 수단, 바람직하게 하나 이상의 방사기, 바람직하게 오버헤드 방사기 또는/및 소결 방사기 유닛에서 선택되는 것을 특징으로 하는 3D 성형품을 제조하는 장치.
- 제 5 항 내지 제 8 항 중 어느 한 항에 있어서,
오버헤드 방사기는 8 내지 3.5 μm의 파장 범위를 방사하고 및/또는 바람직하게 필터(들)를 포함하는 소결 방사기 유닛은 입자 재료 및/또는 제작 표면 상에 방사되는 3.5 내지 0.5 μm의 파장 범위를 방사하는 것을 특징으로 하는 3D 성형품을 제조하는 장치.
- 제 5 항 내지 제 9 항 중 어느 한 항에 있어서,
유체-냉각 방사기, 팬, 제작 컨테이너의 단열재, 제작 플랫폼의 단열재, 저항 히터, 가열 코일, 코터의 저항 히터, 고온계, 확산기 및 적외선 방사기로 이루어진 군에서 선택되는 하나 이상의 구성요소를 더 포함하는 것을 특징으로 하는 3D 성형품을 제조하는 장치.
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| PCT/DE2018/000205 WO2019015707A1 (de) | 2017-07-21 | 2018-07-09 | Verfahren und vorrichtung zum herstellen von 3d-formteilen mit spektrumswandler |
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2017
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2018
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- 2018-07-09 WO PCT/DE2018/000205 patent/WO2019015707A1/de not_active Ceased
- 2018-07-09 EP EP18756365.5A patent/EP3655234A1/de active Pending
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| US11731361B2 (en) | 2023-08-22 |
| US20240025118A1 (en) | 2024-01-25 |
| US11279087B2 (en) | 2022-03-22 |
| WO2019015707A1 (de) | 2019-01-24 |
| JP2020527491A (ja) | 2020-09-10 |
| CN110944824A (zh) | 2020-03-31 |
| CN110944824B (zh) | 2022-11-18 |
| KR102615544B1 (ko) | 2023-12-19 |
| US20220168956A1 (en) | 2022-06-02 |
| DE102017006860A1 (de) | 2019-01-24 |
| EP3655234A1 (de) | 2020-05-27 |
| US20200130263A1 (en) | 2020-04-30 |
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