NO20034441L - Halvlederanordning og fremgangsmåte for fremstilling av samme - Google Patents
Halvlederanordning og fremgangsmåte for fremstilling av sammeInfo
- Publication number
- NO20034441L NO20034441L NO20034441A NO20034441A NO20034441L NO 20034441 L NO20034441 L NO 20034441L NO 20034441 A NO20034441 A NO 20034441A NO 20034441 A NO20034441 A NO 20034441A NO 20034441 L NO20034441 L NO 20034441L
- Authority
- NO
- Norway
- Prior art keywords
- semiconductor chips
- manufacturing
- same
- semiconductor device
- adhesive layer
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
- H10W70/08—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs
- H10W70/09—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs extending onto an encapsulation that laterally surrounds the chip or wafer, e.g. fan-out wafer level package [FOWLP] RDLs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/611—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
- H10W70/614—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together the multiple chips being integrally enclosed
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/019—Manufacture or treatment using temporary auxiliary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
- H10W74/129—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed forming a chip-scale package [CSP]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7424—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self-supporting substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
- H10W70/093—Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/099—Connecting interconnections to insulating or insulated package substrates, interposers or redistribution layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
- H10W70/65—Shapes or dispositions of interconnections
- H10W70/654—Top-view layouts
- H10W70/655—Fan-out layouts
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
- H10W72/242—Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/29—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/922—Bond pads being integral with underlying chip-level interconnections
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/9415—Dispositions of bond pads relative to the surface, e.g. recessed, protruding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/981—Auxiliary members, e.g. spacers
- H10W72/983—Reinforcing structures, e.g. collars
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/142—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations exposing the passive side of the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/722—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Dicing (AREA)
Abstract
Et antall halvlederbrikker (23) festes til et klebesjikt (22) som er dannet på en bunnplate (21). Deretter dannes første til tredje isolasjonsfilmer (31, 35, 39), første og andre underliggende metallsjikt (33, 37), første og andre omkablinger (34, 38) og en loddekule (41) i fellesskap for antallet av halvlederbrikker (23). I dette tilfelle dannes de første og andre underliggende metallsjikt (33,37) ved hjelp av en vakuumpådampingsmetode, og de første og andre omkablinger (34, 38) dannes ved hjelp av en elektropletteringsmetode. Deretter oppskjæres en laminatstruktur bestående av de tre isolasjonsfilmer (39, 35, 31), klebesjiktet (22) og bunnplaten (21) i et område som er beliggende mellom de tilstøtende halvlederbrikker (23).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002026808 | 2002-02-04 | ||
| JP2002117307A JP4135390B2 (ja) | 2002-04-19 | 2002-04-19 | 半導体装置およびその製造方法 |
| PCT/JP2003/001061 WO2003067648A2 (en) | 2002-02-04 | 2003-02-03 | Semiconductor device and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO20034441D0 NO20034441D0 (no) | 2003-10-03 |
| NO20034441L true NO20034441L (no) | 2003-12-03 |
Family
ID=27736426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO20034441A NO20034441L (no) | 2002-02-04 | 2003-10-03 | Halvlederanordning og fremgangsmåte for fremstilling av samme |
Country Status (10)
| Country | Link |
|---|---|
| US (3) | US7190064B2 (no) |
| EP (1) | EP1472724A2 (no) |
| KR (1) | KR100548668B1 (no) |
| CN (1) | CN100358118C (no) |
| AU (1) | AU2003244348A1 (no) |
| CA (1) | CA2443149C (no) |
| MX (1) | MXPA03009043A (no) |
| NO (1) | NO20034441L (no) |
| TW (1) | TW577160B (no) |
| WO (1) | WO2003067648A2 (no) |
Families Citing this family (100)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004015771A2 (en) * | 2002-08-09 | 2004-02-19 | Casio Computer Co., Ltd. | Semiconductor device and method of manufacturing the same |
| JP2004349361A (ja) * | 2003-05-21 | 2004-12-09 | Casio Comput Co Ltd | 半導体装置およびその製造方法 |
| JP4012496B2 (ja) * | 2003-09-19 | 2007-11-21 | カシオ計算機株式会社 | 半導体装置 |
| US7489032B2 (en) * | 2003-12-25 | 2009-02-10 | Casio Computer Co., Ltd. | Semiconductor device including a hard sheet to reduce warping of a base plate and method of fabricating the same |
| JP4271590B2 (ja) * | 2004-01-20 | 2009-06-03 | 新光電気工業株式会社 | 半導体装置及びその製造方法 |
| JP4093186B2 (ja) * | 2004-01-27 | 2008-06-04 | カシオ計算機株式会社 | 半導体装置の製造方法 |
| JP4441282B2 (ja) * | 2004-02-02 | 2010-03-31 | 富士フイルム株式会社 | 蒸着マスク及び有機el表示デバイスの製造方法 |
| JP3819395B2 (ja) * | 2004-02-20 | 2006-09-06 | 沖電気工業株式会社 | 半導体装置の製造方法 |
| JP4381191B2 (ja) * | 2004-03-19 | 2009-12-09 | Okiセミコンダクタ株式会社 | 半導体パッケージ及び半導体装置の製造方法 |
| US7342312B2 (en) * | 2004-09-29 | 2008-03-11 | Rohm Co., Ltd. | Semiconductor device |
| JP2006100666A (ja) * | 2004-09-30 | 2006-04-13 | Toshiba Corp | 半導体装置及びその製造方法 |
| US20090166856A1 (en) * | 2004-12-03 | 2009-07-02 | Yuki Iwata | Semiconductor Device |
| US7468545B2 (en) * | 2005-05-06 | 2008-12-23 | Megica Corporation | Post passivation structure for a semiconductor device and packaging process for same |
| US7582556B2 (en) | 2005-06-24 | 2009-09-01 | Megica Corporation | Circuitry component and method for forming the same |
| JP4458010B2 (ja) * | 2005-09-26 | 2010-04-28 | カシオ計算機株式会社 | 半導体装置 |
| JP4395775B2 (ja) * | 2005-10-05 | 2010-01-13 | ソニー株式会社 | 半導体装置及びその製造方法 |
| CN100481426C (zh) * | 2006-07-07 | 2009-04-22 | 晶宏半导体股份有限公司 | 同排凸块交错探测的半导体装置 |
| DE102006032251A1 (de) * | 2006-07-12 | 2008-01-17 | Infineon Technologies Ag | Verfahren zum Herstellen von Chip-Packages sowie derartig hergestelltes Chip-Package |
| TWI336913B (en) * | 2006-07-18 | 2011-02-01 | Via Tech Inc | A chip and manufacturing method and application thereof |
| US7569422B2 (en) * | 2006-08-11 | 2009-08-04 | Megica Corporation | Chip package and method for fabricating the same |
| JP4922891B2 (ja) | 2006-11-08 | 2012-04-25 | 株式会社テラミクロス | 半導体装置およびその製造方法 |
| US20080145484A1 (en) * | 2006-12-14 | 2008-06-19 | Leslie Michelle Haywood | Food marking tag |
| JP2008159820A (ja) * | 2006-12-22 | 2008-07-10 | Tdk Corp | 電子部品の一括実装方法、及び電子部品内蔵基板の製造方法 |
| JP2008159819A (ja) * | 2006-12-22 | 2008-07-10 | Tdk Corp | 電子部品の実装方法、電子部品内蔵基板の製造方法、及び電子部品内蔵基板 |
| TWI320588B (en) * | 2006-12-27 | 2010-02-11 | Siliconware Precision Industries Co Ltd | Semiconductor device having conductive bumps and fabrication methodthereof |
| TWI343084B (en) * | 2006-12-28 | 2011-06-01 | Siliconware Precision Industries Co Ltd | Semiconductor device having conductive bumps and fabrication methodthereof |
| JP2008211125A (ja) | 2007-02-28 | 2008-09-11 | Spansion Llc | 半導体装置およびその製造方法 |
| US20090039514A1 (en) * | 2007-08-08 | 2009-02-12 | Casio Computer Co., Ltd. | Semiconductor device and method for manufacturing the same |
| JP2009043857A (ja) * | 2007-08-08 | 2009-02-26 | Casio Comput Co Ltd | 半導体装置およびその製造方法 |
| JP4752825B2 (ja) | 2007-08-24 | 2011-08-17 | カシオ計算機株式会社 | 半導体装置の製造方法 |
| US8018043B2 (en) * | 2008-03-10 | 2011-09-13 | Hynix Semiconductor Inc. | Semiconductor package having side walls and method for manufacturing the same |
| KR100959604B1 (ko) * | 2008-03-10 | 2010-05-27 | 주식회사 하이닉스반도체 | 웨이퍼 레벨 반도체 패키지 및 이의 제조 방법 |
| US7749814B2 (en) * | 2008-03-13 | 2010-07-06 | Stats Chippac, Ltd. | Semiconductor device with integrated passive circuit and method of making the same using sacrificial substrate |
| JP5289830B2 (ja) * | 2008-06-06 | 2013-09-11 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| KR20100000328A (ko) * | 2008-06-24 | 2010-01-06 | 삼성전자주식회사 | 조인트 신뢰성이 향상된 반도체 패키지 및 그 제조방법 |
| JP5436837B2 (ja) * | 2008-10-30 | 2014-03-05 | 新光電気工業株式会社 | 半導体装置内蔵基板の製造方法 |
| JP5436836B2 (ja) * | 2008-10-30 | 2014-03-05 | 新光電気工業株式会社 | 半導体装置内蔵基板の製造方法 |
| JP4420965B1 (ja) * | 2008-10-30 | 2010-02-24 | 新光電気工業株式会社 | 半導体装置内蔵基板の製造方法 |
| US8704350B2 (en) * | 2008-11-13 | 2014-04-22 | Samsung Electro-Mechanics Co., Ltd. | Stacked wafer level package and method of manufacturing the same |
| US9735136B2 (en) * | 2009-03-09 | 2017-08-15 | Micron Technology, Inc. | Method for embedding silicon die into a stacked package |
| FR2946795B1 (fr) * | 2009-06-12 | 2011-07-22 | 3D Plus | Procede de positionnement des puces lors de la fabrication d'une plaque reconstituee |
| KR101169531B1 (ko) | 2009-07-03 | 2012-07-27 | 가부시키가이샤 테라미크로스 | 반도체구성체 및 그 제조방법과 반도체장치 및 그 제조방법 |
| TWI528514B (zh) * | 2009-08-20 | 2016-04-01 | 精材科技股份有限公司 | 晶片封裝體及其製造方法 |
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-
2003
- 2003-01-30 TW TW092102111A patent/TW577160B/zh not_active IP Right Cessation
- 2003-02-03 CN CNB038001284A patent/CN100358118C/zh not_active Expired - Lifetime
- 2003-02-03 KR KR1020037012972A patent/KR100548668B1/ko not_active Expired - Fee Related
- 2003-02-03 MX MXPA03009043A patent/MXPA03009043A/es unknown
- 2003-02-03 EP EP03737462A patent/EP1472724A2/en not_active Withdrawn
- 2003-02-03 WO PCT/JP2003/001061 patent/WO2003067648A2/en not_active Ceased
- 2003-02-03 AU AU2003244348A patent/AU2003244348A1/en not_active Abandoned
- 2003-02-03 CA CA002443149A patent/CA2443149C/en not_active Expired - Fee Related
- 2003-02-03 US US10/472,803 patent/US7190064B2/en not_active Expired - Lifetime
- 2003-10-03 NO NO20034441A patent/NO20034441L/no unknown
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2006
- 2006-05-05 US US11/429,368 patent/US20060202353A1/en not_active Abandoned
- 2006-10-27 US US11/588,647 patent/US7514335B2/en not_active Expired - Fee Related
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|---|---|
| CA2443149A1 (en) | 2003-08-14 |
| TW200303609A (en) | 2003-09-01 |
| TW577160B (en) | 2004-02-21 |
| EP1472724A2 (en) | 2004-11-03 |
| US7190064B2 (en) | 2007-03-13 |
| CN1633705A (zh) | 2005-06-29 |
| KR100548668B1 (ko) | 2006-02-03 |
| WO2003067648A2 (en) | 2003-08-14 |
| US20070042594A1 (en) | 2007-02-22 |
| US20060202353A1 (en) | 2006-09-14 |
| CA2443149C (en) | 2008-01-08 |
| MXPA03009043A (es) | 2004-02-18 |
| US20050098891A1 (en) | 2005-05-12 |
| US7514335B2 (en) | 2009-04-07 |
| NO20034441D0 (no) | 2003-10-03 |
| WO2003067648A3 (en) | 2003-10-30 |
| CN100358118C (zh) | 2007-12-26 |
| KR20040030560A (ko) | 2004-04-09 |
| AU2003244348A1 (en) | 2003-09-02 |
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