NO309920B1 - Lineær bueutladning ved plasmaprosessering - Google Patents

Lineær bueutladning ved plasmaprosessering Download PDF

Info

Publication number: NO309920B1
Authority: NO; Norway
Prior art keywords: electrode; electrode plates; electrode plate; linear; arc discharge
Prior art date: 1994-11-18

Application number

NO972280A

Other languages

English (en)

Norwegian (no)

Other versions

NO972280D0 (no

NO972280L (no

Inventor

Ladislav Bardos

Hana Barankova

Original Assignee

Surfcoat Oy

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1994-11-18

Filing date

1997-05-20

Publication date

2001-04-17

1997-05-20 Application filed by Surfcoat Oy filed Critical Surfcoat Oy

1997-05-20 Publication of NO972280D0 publication Critical patent/NO972280D0/no

1997-07-10 Publication of NO972280L publication Critical patent/NO972280L/no

2001-04-17 Publication of NO309920B1 publication Critical patent/NO309920B1/no

Links

238000010891 electric arc Methods 0.000 title claims abstract description 41
238000012545 processing Methods 0.000 title claims abstract description 28
239000000758 substrate Substances 0.000 claims abstract description 15
239000007787 solid Substances 0.000 claims abstract description 6
238000010438 heat treatment Methods 0.000 claims description 18
239000000463 material Substances 0.000 claims description 11
238000009826 distribution Methods 0.000 claims description 7
210000002381 plasma Anatomy 0.000 description 35
239000007789 gas Substances 0.000 description 31
150000002500 ions Chemical class 0.000 description 6
238000000151 deposition Methods 0.000 description 4
230000006698 induction Effects 0.000 description 4
239000002184 metal Substances 0.000 description 4
238000001816 cooling Methods 0.000 description 3
230000008021 deposition Effects 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
238000003491 array Methods 0.000 description 2
239000010406 cathode material Substances 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
238000001704 evaporation Methods 0.000 description 2
230000008020 evaporation Effects 0.000 description 2
230000008018 melting Effects 0.000 description 2
238000002844 melting Methods 0.000 description 2
229910021645 metal ion Inorganic materials 0.000 description 2
239000002245 particle Substances 0.000 description 2
239000000126 substance Substances 0.000 description 2
241000276498 Pollachius virens Species 0.000 description 1
230000002159 abnormal effect Effects 0.000 description 1
238000010420 art technique Methods 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
238000010276 construction Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000010586 diagram Methods 0.000 description 1
230000003628 erosive effect Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
230000004941 influx Effects 0.000 description 1
238000011835 investigation Methods 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
238000012423 maintenance Methods 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
238000005457 optimization Methods 0.000 description 1
238000004157 plasmatron Methods 0.000 description 1
230000010287 polarization Effects 0.000 description 1
238000012552 review Methods 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
General Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Spectroscopy & Molecular Physics (AREA)
Plasma Technology (AREA)
Physical Vapour Deposition (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Carbon And Carbon Compounds (AREA)
Treatments Of Macromolecular Shaped Articles (AREA)

NO972280A 1994-11-18 1997-05-20 Lineær bueutladning ved plasmaprosessering NO309920B1 (no)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
SE9403988A SE9403988L (sv)	1994-11-18	1994-11-18	Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
PCT/SE1995/001248 WO1996016531A1 (fr)	1994-11-18	1995-10-20	Appareil pour produire une decharge en arc lineaire, pour un traitement par plasma

Publications (3)

Publication Number	Publication Date
NO972280D0 NO972280D0 (no)	1997-05-20
NO972280L NO972280L (no)	1997-07-10
NO309920B1 true NO309920B1 (no)	2001-04-17

Family

ID=20396028

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO972280A NO309920B1 (no)	1994-11-18	1997-05-20	Lineær bueutladning ved plasmaprosessering

Country Status (13)

Country	Link
US (1)	US5908602A (fr)
EP (1)	EP0792572B1 (fr)
JP (1)	JP3652702B2 (fr)
KR (1)	KR100333800B1 (fr)
AT (1)	ATE182738T1 (fr)
AU (1)	AU688996B2 (fr)
CA (1)	CA2205576C (fr)
DE (1)	DE69511103T2 (fr)
DK (1)	DK0792572T3 (fr)
ES (1)	ES2138755T3 (fr)
NO (1)	NO309920B1 (fr)
SE (1)	SE9403988L (fr)
WO (1)	WO1996016531A1 (fr)

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SE511139C2 (sv) *	1997-11-20	1999-08-09	Hana Barankova	Plasmabearbetningsapparat med vridbara magneter
SE516336C2 (sv) *	1999-04-28	2001-12-17	Hana Barankova	Apparat för plasmabehandling av ytor
US7091605B2 (en) *	2001-09-21	2006-08-15	Eastman Kodak Company	Highly moisture-sensitive electronic device element and method for fabrication
US6444945B1 (en)	2001-03-28	2002-09-03	Cp Films, Inc.	Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
US6764658B2 (en) *	2002-01-08	2004-07-20	Wisconsin Alumni Research Foundation	Plasma generator
US20030168009A1 (en) *	2002-03-08	2003-09-11	Denes Ferencz S.	Plasma processing within low-dimension cavities
CA2465879C (fr) *	2002-08-30	2008-10-07	Sekisui Chemical Co., Ltd.	Appareil pour le traitement au plasma
US7411352B2 (en) *	2002-09-19	2008-08-12	Applied Process Technologies, Inc.	Dual plasma beam sources and method
US7327089B2 (en) *	2002-09-19	2008-02-05	Applied Process Technologies, Inc.	Beam plasma source
JP3933035B2 (ja) *	2002-11-06	2007-06-20	富士ゼロックス株式会社	カーボンナノチューブの製造装置および製造方法
US7038389B2 (en) *	2003-05-02	2006-05-02	Applied Process Technologies, Inc.	Magnetron plasma source
US7867366B1 (en)	2004-04-28	2011-01-11	Alameda Applied Sciences Corp.	Coaxial plasma arc vapor deposition apparatus and method
US8038858B1 (en)	2004-04-28	2011-10-18	Alameda Applied Sciences Corp	Coaxial plasma arc vapor deposition apparatus and method
DE102004043967B4 (de) *	2004-09-11	2010-01-07	Roth & Rau Ag	Anordnung und Verfahren zur Plasmabehandlung eines Substrates
FR2912864B1 (fr) *	2007-02-15	2009-07-31	H E F Soc Par Actions Simplifi	Dispositif pour generer un plasma froid dans une enceinte sous vide et utilisation du dispositif pour des traitements thermochimiques
KR101468077B1 (ko) *	2007-07-19	2014-12-05	엘아이지에이디피 주식회사	상압 플라즈마 처리장치
US8263951B2 (en)	2008-06-13	2012-09-11	Fablab Inc.	System and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
WO2010017185A1 (fr)	2008-08-04	2010-02-11	Agc Flat Glass North America, Inc.	Source de plasma et procédés pour déposer des revêtements de film mince en utilisant un dépôt chimique en phase vapeur renforcé par plasma
RU2370002C1 (ru) *	2008-10-20	2009-10-10	Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом"	Способ получения плазменного источника излучения и устройство для его осуществления
WO2011156876A1 (fr) *	2010-06-18	2011-12-22	Mahle Metal Leve S/A	Dispositif de traitement au plasma
WO2011156877A1 (fr) *	2010-06-18	2011-12-22	Mahle Metal Leve S/A	Dispositif de traitement au plasma
US8697198B2 (en) *	2011-03-31	2014-04-15	Veeco Ald Inc.	Magnetic field assisted deposition
US9508532B2 (en)	2013-03-13	2016-11-29	Bb Plasma Design Ab	Magnetron plasma apparatus
KR102272311B1 (ko)	2014-12-05	2021-07-06	에이쥐씨 글래스 유럽	중공형 음극 플라즈마 소스
MY191327A (en)	2014-12-05	2022-06-16	Agc Flat Glass Na Inc	Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US9721765B2 (en)	2015-11-16	2017-08-01	Agc Flat Glass North America, Inc.	Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en)	2015-11-16	2017-08-01	Agc Flat Glass North America, Inc.	Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10573499B2 (en)	2015-12-18	2020-02-25	Agc Flat Glass North America, Inc.	Method of extracting and accelerating ions
US10242846B2 (en)	2015-12-18	2019-03-26	Agc Flat Glass North America, Inc.	Hollow cathode ion source
RU168090U1 (ru) *	2016-06-06	2017-01-18	Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП"	Плазменный источник светового излучения
RU168022U1 (ru) *	2016-06-15	2017-01-17	Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП"	Плазменный источник светового излучения
JP6388146B1 (ja) *	2017-08-07	2018-09-12	春日電機株式会社	表面改質装置
KR102216854B1 (ko) *	2019-09-30	2021-02-17	포항공과대학교 산학협력단	마이크로파 플라즈마를 이용한 아크 방전장치 및 아크 방전방법
FR3115180B1 (fr) *	2020-10-14	2022-11-04	Peter Choi	Appareil de génération de plasma
CN115928029B (zh) *	2022-11-25	2025-06-24	苏州臻锂新材科技有限公司	一种溅射沉积组件、沉积室、真空沉积设备

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US3562141A (en) *	1968-02-23	1971-02-09	John R Morley	Vacuum vapor deposition utilizing low voltage electron beam
US4521286A (en) *	1983-03-09	1985-06-04	Unisearch Limited	Hollow cathode sputter etcher
FR2581244B1 (fr) *	1985-04-29	1987-07-10	Centre Nat Rech Scient	Source d'ions du type triode a une seule chambre d'ionisation a excitation haute frequence et a confinement magnetique du type multipolaire
CS246982B1 (en) *	1985-06-17	1986-11-13	Ladislav Bardos	Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers
DE3606959A1 (de) *	1986-03-04	1987-09-10	Leybold Heraeus Gmbh & Co Kg	Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung
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DE69032691T2 (de) *	1989-12-07	1999-06-10	Japan Science And Technology Corp., Kawaguchi, Saitama	Verfahren und Gerät zur Plasmabehandlung unter atmosphärischem Druck
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SE501888C2 (sv) *	1993-10-18	1995-06-12	Ladislav Bardos	En metod och en apparat för generering av en urladdning i egna ångor från en radiofrekvenselektrod för kontinuerlig självförstoftning av elektroden

1994
- 1994-11-18 SE SE9403988A patent/SE9403988L/ not_active IP Right Cessation
1995
- 1995-10-20 DE DE69511103T patent/DE69511103T2/de not_active Expired - Lifetime
- 1995-10-20 AU AU39420/95A patent/AU688996B2/en not_active Ceased
- 1995-10-20 JP JP51676196A patent/JP3652702B2/ja not_active Expired - Fee Related
- 1995-10-20 WO PCT/SE1995/001248 patent/WO1996016531A1/fr not_active Ceased
- 1995-10-20 KR KR1019970703347A patent/KR100333800B1/ko not_active Expired - Fee Related
- 1995-10-20 AT AT95937260T patent/ATE182738T1/de not_active IP Right Cessation
- 1995-10-20 CA CA002205576A patent/CA2205576C/fr not_active Expired - Fee Related
- 1995-10-20 DK DK95937260T patent/DK0792572T3/da active
- 1995-10-20 US US08/836,708 patent/US5908602A/en not_active Expired - Lifetime
- 1995-10-20 ES ES95937260T patent/ES2138755T3/es not_active Expired - Lifetime
- 1995-10-20 EP EP95937260A patent/EP0792572B1/fr not_active Expired - Lifetime
1997
- 1997-05-20 NO NO972280A patent/NO309920B1/no not_active IP Right Cessation

Also Published As

Publication number	Publication date
SE503141C2 (sv)	1996-04-01
DE69511103T2 (de)	2000-04-13
AU3942095A (en)	1996-06-17
CA2205576A1 (fr)	1996-05-30
EP0792572A1 (fr)	1997-09-03
KR100333800B1 (ko)	2002-11-27
NO972280D0 (no)	1997-05-20
AU688996B2 (en)	1998-03-19
EP0792572B1 (fr)	1999-07-28
DE69511103D1 (de)	1999-09-02
SE9403988L (sv)	1996-04-01
US5908602A (en)	1999-06-01
JP3652702B2 (ja)	2005-05-25
ATE182738T1 (de)	1999-08-15
WO1996016531A1 (fr)	1996-05-30
DK0792572T3 (da)	2000-03-13
CA2205576C (fr)	2005-09-20
ES2138755T3 (es)	2000-01-16
JPH10509833A (ja)	1998-09-22
SE9403988D0 (sv)	1994-11-18
NO972280L (no)	1997-07-10

Legal Events

Date	Code	Title	Description
2010-05-31	MM1K	Lapsed by not paying the annual fees

Publication	Publication Date	Title
NO309920B1 (no)	2001-04-17	Lineær bueutladning ved plasmaprosessering
Boxman et al.	2006	Vacuum arc deposition devices
US5656141A (en)	1997-08-12	Apparatus for coating substrates
EP3711078B1 (fr)	2023-06-07	Source d'ions plasma à fréquence radio à énergie linéarisée
RU2472869C2 (ru)	2013-01-20	Установка вакуумной обработки и способ вакуумной обработки
US6570172B2 (en)	2003-05-27	Magnetron negative ion sputter source
US4992153A (en)	1991-02-12	Sputter-CVD process for at least partially coating a workpiece
JP3846970B2 (ja)	2006-11-15	イオン化スパッタリング装置
US8262869B2 (en)	2012-09-11	Work piece processing by pulsed electric discharges in solid-gas plasma
US9812299B2 (en)	2017-11-07	Apparatus and method for pretreating and coating bodies
Grigoriev et al.	2004	Plasma-and beam-assisted deposition methods
KR101267459B1 (ko)	2013-05-31	플라즈마 이온주입 장치 및 방법
JP2010065240A (ja)	2010-03-25	スパッタ装置
Vetter et al.	1993	Advances in cathodic arc technology using electrons extracted from the vacuum arc
US5662741A (en)	1997-09-02	Process for the ionization of thermally generated material vapors and a device for conducting the process
JPH04235276A (ja)	1992-08-24	基板をコーティングするための装置
Beilis et al.	2000	The hot refractory anode vacuum arc: a new plasma source for metallic film deposition
US6302056B1 (en)	2001-10-16	Device for coating substrates with a material vapor in negative pressure or vacuum
Kusano et al.	1999	Ion energy distribution in ionized dc sputtering measured by an energy-resolved mass spectrometer
US6342132B1 (en)	2002-01-29	Method of controlling gas density in an ionized physical vapor deposition apparatus
Chayahara et al.	2004	Metal plasma source for PBII using arc-like discharge with hot cathode
CN102833936A (zh)	2012-12-19	一种大气压直流弧放电等离子体发生装置
JPS63282257A (ja)	1988-11-18	イオンプレ−ティング装置
GB2108533A (en)	1983-05-18	Ion plating
HK40036021A (en)	2021-05-21	Linearized energetic radio-frequency plasma ion source