PL1749240T3 - Prekursor fotopolimerowej płyty drukarskiej - Google Patents
Prekursor fotopolimerowej płyty drukarskiejInfo
- Publication number
- PL1749240T3 PL1749240T3 PL05743030T PL05743030T PL1749240T3 PL 1749240 T3 PL1749240 T3 PL 1749240T3 PL 05743030 T PL05743030 T PL 05743030T PL 05743030 T PL05743030 T PL 05743030T PL 1749240 T3 PL1749240 T3 PL 1749240T3
- Authority
- PL
- Poland
- Prior art keywords
- printing plate
- poly
- photopolymer printing
- plate precursor
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04101955 | 2004-05-06 | ||
| US57767404P | 2004-06-07 | 2004-06-07 | |
| EP05743030A EP1749240B1 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
| PCT/EP2005/051885 WO2005109103A1 (en) | 2004-05-06 | 2005-04-27 | Photopolymer printing plate precursor. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL1749240T3 true PL1749240T3 (pl) | 2012-09-28 |
Family
ID=34929065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL05743030T PL1749240T3 (pl) | 2004-05-06 | 2005-04-27 | Prekursor fotopolimerowej płyty drukarskiej |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20070224543A1 (pl) |
| EP (1) | EP1749240B1 (pl) |
| CN (1) | CN1981239B (pl) |
| AT (1) | ATE553417T1 (pl) |
| ES (1) | ES2381013T3 (pl) |
| PL (1) | PL1749240T3 (pl) |
| WO (1) | WO2005109103A1 (pl) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1788442B1 (en) | 2005-11-18 | 2010-07-28 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| WO2008145528A1 (en) | 2007-05-25 | 2008-12-04 | Agfa Graphics Nv | A lithographic printing plate precursor |
| WO2009011176A1 (ja) * | 2007-07-18 | 2009-01-22 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料及びその現像処理方法 |
| ES2344668T3 (es) | 2007-11-30 | 2010-09-02 | Agfa Graphics N.V. | Metodo para tratar una plancha de impresion litografica. |
| ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
| ES2365885T3 (es) | 2008-03-31 | 2011-10-13 | Agfa Graphics N.V. | Un método para tratar una plancha de impresión litográfica. |
| JP5324290B2 (ja) * | 2008-04-03 | 2013-10-23 | 東京応化工業株式会社 | 反射防止膜形成材料、およびこれを用いたレジストパターン形成方法 |
| ES2382371T3 (es) | 2008-10-23 | 2012-06-07 | Agfa Graphics N.V. | Plancha de impresión litográfica |
| US8318405B2 (en) * | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| JP5244987B2 (ja) * | 2011-02-28 | 2013-07-24 | 富士フイルム株式会社 | 平版印刷版原版及びその製版方法 |
| JP5211187B2 (ja) * | 2011-02-28 | 2013-06-12 | 富士フイルム株式会社 | 平版印刷版原版及び製版方法 |
| EP2855152B1 (en) | 2012-06-05 | 2016-03-16 | AGFA Graphics NV | A lithographic printing plate precursor |
| BR112015030811A2 (pt) | 2013-06-14 | 2017-07-25 | Agfa Graphics Nv | precursor de placa de impressão litográfica |
| CN103275679B (zh) * | 2013-06-17 | 2015-09-09 | 孙安顺 | 用于聚合物驱油的粘度稳定剂 |
| EP2883699B1 (en) | 2013-12-11 | 2017-05-03 | Agfa Graphics Nv | A lithographic printing plate precursor and monomer |
| EP2916171B1 (en) | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
| ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
| TWI572675B (zh) * | 2015-07-15 | 2017-03-01 | 臻鼎科技股份有限公司 | 聚醯亞胺組合物、聚醯亞胺膜及電路板 |
| EP3430474A1 (en) | 2016-03-16 | 2019-01-23 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| US10599035B2 (en) * | 2017-04-12 | 2020-03-24 | Macdermid Graphics Solutions, Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| US10457082B2 (en) * | 2017-05-09 | 2019-10-29 | Macdermid Graphics Solutions, Llc | Flexographic printing plate with improved storage stability |
| EP3431290B1 (en) | 2017-07-20 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
| EP3474073B1 (en) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | A method for making a printing plate |
| EP3495891B1 (en) | 2017-12-08 | 2021-06-16 | Agfa Nv | A method for making a lithographic printing plate |
| CN111867839A (zh) | 2018-03-22 | 2020-10-30 | 爱克发有限公司 | 平版印刷版前体 |
| WO2019219574A1 (en) | 2018-05-14 | 2019-11-21 | Agfa Nv | A lithographic printing plate precursor |
| EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
| US20200096865A1 (en) * | 2018-09-21 | 2020-03-26 | Eastman Kodak Company | Lithographic printing plate precursor and color-forming composition |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3650938A1 (en) | 2018-11-09 | 2020-05-13 | Agfa Nv | A lithographic printing plate precursor |
| CN113168096B (zh) | 2018-12-10 | 2024-05-24 | 易客发有限公司 | Uv或紫色敏化的平版印刷版的在机加工 |
| EP3686011A1 (en) | 2019-01-23 | 2020-07-29 | Agfa Nv | A lithographic printing plate precursor |
| EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
| EP3875271B1 (en) | 2020-03-04 | 2025-10-15 | Eco3 Bv | A lithographic printing plate precursor |
| EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
| WO2021259650A1 (en) | 2020-06-24 | 2021-12-30 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3928983B1 (en) | 2020-06-24 | 2023-09-27 | Eco3 Bv | A lithographic printing plate precursor |
| ES3013752T3 (en) | 2020-06-24 | 2025-04-15 | Eco3 Bv | A lithographic printing plate precursor |
| ES3037727T3 (en) | 2020-08-31 | 2025-10-06 | Eco3 Bv | A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate |
| EP4225582B1 (en) | 2020-10-09 | 2024-08-28 | Eco3 Bv | A lithographic printing plate precursor |
| EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4129682B1 (en) | 2021-08-05 | 2025-10-01 | Eco3 Bv | A lithographic printing plate precursor |
| EP4223534A1 (en) | 2022-02-07 | 2023-08-09 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4239411A1 (en) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Method and apparatus for processing a lithographic printing plate precursor |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
| EP4461539A1 (en) | 2023-05-10 | 2024-11-13 | Eco3 Bv | A negative-working lithographic printing plate precursor |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
| CN87103740A (zh) * | 1987-05-30 | 1988-12-21 | 天津市印刷技术研究所 | 丝网印刷制版感光胶 |
| DE4338079A1 (de) * | 1992-11-06 | 1994-05-11 | Fuji Photo Film Co Ltd | Bilderzeugungsverfahren unter Verwendung einer Abziehschicht und einer lichtempfindlichen polymerisierbaren silberhalogenidhaltigen Schicht |
| JP3115745B2 (ja) * | 1993-07-12 | 2000-12-11 | 富士写真フイルム株式会社 | 感光材料 |
| JP3717000B2 (ja) * | 1995-04-19 | 2005-11-16 | コダックポリクロームグラフィックス株式会社 | 光重合性感光材料 |
| US6180319B1 (en) * | 1998-03-11 | 2001-01-30 | E. I. Du Pont De Nemours And Company | Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues |
| DE19915717A1 (de) | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
| DE19933139A1 (de) | 1999-07-19 | 2001-01-25 | Agfa Gevaert Ag | Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial |
| CN1151192C (zh) * | 1999-12-01 | 2004-05-26 | 大东树脂化学股份有限公司 | 含有不饱和双键的聚羧酸树脂的制备方法 |
| DE06121351T1 (de) * | 2000-04-19 | 2009-01-29 | Agfa Graphics N.V. | Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte |
| JP4199942B2 (ja) * | 2001-07-09 | 2008-12-24 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US6756183B2 (en) * | 2001-08-24 | 2004-06-29 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
| CN1208363C (zh) * | 2003-06-12 | 2005-06-29 | 中国科学院长春应用化学研究所 | 功能化聚烯烃树脂的制备方法 |
| EP1668418A1 (en) * | 2003-09-22 | 2006-06-14 | Agfa-Gevaert | Photopolymer printing plate precursor |
| EP1668417B1 (en) * | 2003-09-22 | 2009-05-13 | Agfa Graphics N.V. | Photopolymerizable composition. |
-
2005
- 2005-04-27 PL PL05743030T patent/PL1749240T3/pl unknown
- 2005-04-27 WO PCT/EP2005/051885 patent/WO2005109103A1/en not_active Ceased
- 2005-04-27 AT AT05743030T patent/ATE553417T1/de active
- 2005-04-27 EP EP05743030A patent/EP1749240B1/en not_active Expired - Lifetime
- 2005-04-27 ES ES05743030T patent/ES2381013T3/es not_active Expired - Lifetime
- 2005-04-27 CN CN2005800226882A patent/CN1981239B/zh not_active Expired - Lifetime
- 2005-04-27 US US11/568,742 patent/US20070224543A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN1981239A (zh) | 2007-06-13 |
| ATE553417T1 (de) | 2012-04-15 |
| EP1749240A1 (en) | 2007-02-07 |
| US20070224543A1 (en) | 2007-09-27 |
| EP1749240B1 (en) | 2012-04-11 |
| WO2005109103A1 (en) | 2005-11-17 |
| CN1981239B (zh) | 2011-01-26 |
| ES2381013T3 (es) | 2012-05-22 |
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