SE450377B - Sett att framstella kisel samt produkt belagd med sadant kisel - Google Patents
Sett att framstella kisel samt produkt belagd med sadant kiselInfo
- Publication number
- SE450377B SE450377B SE8103957A SE8103957A SE450377B SE 450377 B SE450377 B SE 450377B SE 8103957 A SE8103957 A SE 8103957A SE 8103957 A SE8103957 A SE 8103957A SE 450377 B SE450377 B SE 450377B
- Authority
- SE
- Sweden
- Prior art keywords
- polychlorosilane
- pyrolysis
- silicon
- molecular weight
- product
- Prior art date
Links
- 229920001296 polysiloxane Polymers 0.000 title 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 238000000197 pyrolysis Methods 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 12
- 239000012298 atmosphere Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 229910007245 Si2Cl6 Inorganic materials 0.000 description 8
- 239000007858 starting material Substances 0.000 description 8
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 235000019198 oils Nutrition 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- -1 ammonium halide Chemical class 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- IBWGNZVCJVLSHB-UHFFFAOYSA-M tetrabutylphosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CCCC IBWGNZVCJVLSHB-UHFFFAOYSA-M 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 235000019502 Orange oil Nutrition 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000010502 orange oil Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004460 silage Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photovoltaic Devices (AREA)
- Chemically Coating (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/166,201 US4374182A (en) | 1980-07-07 | 1980-07-07 | Preparation of silicon metal through polymer degradation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE8103957L SE8103957L (sv) | 1982-01-08 |
| SE450377B true SE450377B (sv) | 1987-06-22 |
Family
ID=22602230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE8103957A SE450377B (sv) | 1980-07-07 | 1981-06-24 | Sett att framstella kisel samt produkt belagd med sadant kisel |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4374182A (fr) |
| JP (1) | JPS5756313A (fr) |
| KR (1) | KR840000958B1 (fr) |
| AU (1) | AU544798B2 (fr) |
| BE (1) | BE889523A (fr) |
| CA (1) | CA1162385A (fr) |
| CH (1) | CH649069A5 (fr) |
| DE (1) | DE3126240C2 (fr) |
| FR (1) | FR2486057B1 (fr) |
| GB (1) | GB2079736B (fr) |
| IT (1) | IT1211065B (fr) |
| SE (1) | SE450377B (fr) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4611035A (en) * | 1984-02-10 | 1986-09-09 | Minnesota Mining And Manufacturing Company | Polyhydridosilanes and their conversion to pyropolymers |
| US4704444A (en) * | 1984-02-10 | 1987-11-03 | Minnesota Mining And Manufacturing Company | Polyhydridosilanes and their conversion to pyropolymers |
| US4537942A (en) * | 1984-02-10 | 1985-08-27 | Minnesota Mining And Manufacturing Company | Polyhydridosilanes and their conversion to pyropolymers |
| US4683144A (en) * | 1984-04-16 | 1987-07-28 | Canon Kabushiki Kaisha | Method for forming a deposited film |
| US4683147A (en) * | 1984-04-16 | 1987-07-28 | Canon Kabushiki Kaisha | Method of forming deposition film |
| US4696834A (en) * | 1986-02-28 | 1987-09-29 | Dow Corning Corporation | Silicon-containing coatings and a method for their preparation |
| EP0264722A3 (fr) * | 1986-10-09 | 1989-07-12 | Mitsubishi Materials Corporation | Procédé de préparation de silicium amorphe |
| US4762808A (en) * | 1987-06-22 | 1988-08-09 | Dow Corning Corporation | Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes |
| RU2156220C1 (ru) * | 1999-05-26 | 2000-09-20 | Карелин Александр Иванович | Способ получения раствора металлического кремния, способ получения металлического кремния из раствора и металлический кремний, полученный на основе этих способов, способ получения керамических материалов и керамический материал, полученный на основе этого способа |
| DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
| DE102006043929B4 (de) * | 2006-09-14 | 2016-10-06 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von festen Polysilanmischungen |
| KR100839797B1 (ko) * | 2007-03-13 | 2008-06-19 | (주) 태양기전 | 컬러 박막 및 이의 제조 방법 |
| DE102007000841A1 (de) | 2007-10-09 | 2009-04-16 | Wacker Chemie Ag | Verfahren zur Herstellung von hochreinem Hexachlordisilan |
| DE102008025260B4 (de) | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und thermisches Verfahren zu dessen Herstellung |
| DE102008025261B4 (de) * | 2008-05-27 | 2010-03-18 | Rev Renewable Energy Ventures, Inc. | Halogeniertes Polysilan und plasmachemisches Verfahren zu dessen Herstellung |
| US20110305619A1 (en) * | 2008-05-27 | 2011-12-15 | Spawnt Private S.A.R.L | Silicon Containing Halogenide, Method for Producing the Same, and Use of the Same |
| DE102008025264A1 (de) * | 2008-05-27 | 2009-12-03 | Rev Renewable Energy Ventures, Inc. | Granulares Silicium |
| DE102008036143A1 (de) | 2008-08-01 | 2010-02-04 | Berlinsolar Gmbh | Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium |
| US20110129784A1 (en) * | 2009-11-30 | 2011-06-02 | James Crawford Bange | Low thermal expansion doped fused silica crucibles |
| DE102009056437B4 (de) | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Verfahren und Vorrichtung zur Herstellung von kurzkettigen halogenierten Polysilanen |
| DE102009056436B4 (de) * | 2009-12-02 | 2013-06-27 | Spawnt Private S.À.R.L. | Chloridhaltiges Silicium |
| DE102010025948A1 (de) | 2010-07-02 | 2012-01-05 | Spawnt Private S.À.R.L. | Polysilane mittlerer Kettenlänge und Verfahren zu deren Herstellung |
| DE102013207441A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hexachlordisilan durch Spaltung von höheren Polychlorsilanen wie Octachlortrisilan |
| DE102013016986A1 (de) | 2013-10-15 | 2015-04-16 | Psc Polysilane Chemicals Gmbh | Elektronenstrahlverfahren zur Modifizierung von Halogensilangemischen |
| DE102013021306A1 (de) * | 2013-12-19 | 2015-06-25 | Johann Wolfgang Goethe-Universität | Verfahren zum Herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten Oligo- und Polysilyl-Anionen |
| DE102014007767B4 (de) | 2014-05-21 | 2025-08-28 | Christian Bauch | Verfahren zur Herstellung halogenierter Oligosilane aus Silicium und Tetrachlorsilan |
| DE102014007766B4 (de) | 2014-05-21 | 2025-10-16 | Christian Bauch | Verfahren zur plasmachemischen Herstellung halogenierter Oligosilane aus Tetrachlorsilan |
| EP3345866B1 (fr) | 2014-12-15 | 2021-10-06 | Evonik Operations GmbH | Procédé de fabrication d'un composé de silane cyclique |
| DE102014118658B4 (de) | 2014-12-15 | 2020-12-31 | Evonik Operations Gmbh | Verfahren zum Herstellen von perhalogeniertem Hexasilan-Anion |
| CN105777792B (zh) * | 2016-04-21 | 2018-08-21 | 东南大学 | 一种季铵盐化荧光硅点及其制备方法与应用 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH175201A (fr) * | 1932-01-07 | 1935-02-15 | Soc D Expl Des Brevets Lucien | Installation pour amortir les chocs pour véhicules à moteur. |
| GB702349A (en) * | 1950-07-08 | 1954-01-13 | British Thomson Houston Co Ltd | Improvements in and relating to the preparation of chloropolysilanes |
| US2820698A (en) * | 1954-06-25 | 1958-01-21 | Du Pont | Process for purifying silicon halide |
| US2844441A (en) * | 1954-11-26 | 1958-07-22 | Du Pont | Process of purifying liquid silicon halide |
| DE1169904B (de) * | 1955-05-17 | 1964-05-14 | Siemens Ag | Verfahren zum Herstellen von Silicium |
| US2840489A (en) * | 1956-01-17 | 1958-06-24 | Owens Illinois Glass Co | Process for the controlled deposition of silicon dihalide vapors onto selected surfaces |
| US2944874A (en) * | 1956-12-14 | 1960-07-12 | Raytheon Co | Preparation of silicon |
| US2916359A (en) * | 1956-12-14 | 1959-12-08 | Raytheon Co | Preparation of substantially pure silicon |
| DE1161868B (de) * | 1958-07-15 | 1964-01-30 | Wacker Chemie Gmbh | Verfahren zur Herstellung von hochreinen Siliciumhalogeniden |
| US4070444A (en) * | 1976-07-21 | 1978-01-24 | Motorola Inc. | Low cost, high volume silicon purification process |
| US4138509A (en) * | 1977-12-23 | 1979-02-06 | Motorola, Inc. | Silicon purification process |
| GB2028289B (en) * | 1978-08-18 | 1982-09-02 | Schumacher Co J C | Producing silicon |
| US4230773A (en) * | 1978-12-04 | 1980-10-28 | International Business Machines Corporation | Decreasing the porosity and surface roughness of ceramic substrates |
-
1980
- 1980-07-07 US US06/166,201 patent/US4374182A/en not_active Expired - Lifetime
-
1981
- 1981-06-10 CA CA000379461A patent/CA1162385A/fr not_active Expired
- 1981-06-17 IT IT8122366A patent/IT1211065B/it active
- 1981-06-17 GB GB8118669A patent/GB2079736B/en not_active Expired
- 1981-06-24 SE SE8103957A patent/SE450377B/sv not_active IP Right Cessation
- 1981-07-03 DE DE3126240A patent/DE3126240C2/de not_active Expired
- 1981-07-03 CH CH4407/81A patent/CH649069A5/de not_active IP Right Cessation
- 1981-07-06 JP JP56105431A patent/JPS5756313A/ja active Granted
- 1981-07-06 FR FR8113226A patent/FR2486057B1/fr not_active Expired
- 1981-07-06 BE BE0/205326A patent/BE889523A/fr not_active IP Right Cessation
- 1981-07-06 AU AU72609/81A patent/AU544798B2/en not_active Ceased
- 1981-07-06 KR KR1019810002444A patent/KR840000958B1/ko not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2486057B1 (fr) | 1987-06-12 |
| GB2079736B (en) | 1984-02-15 |
| US4374182A (en) | 1983-02-15 |
| IT1211065B (it) | 1989-09-29 |
| CA1162385A (fr) | 1984-02-21 |
| AU7260981A (en) | 1982-01-14 |
| AU544798B2 (en) | 1985-06-13 |
| BE889523A (fr) | 1982-01-06 |
| IT8122366A0 (it) | 1981-06-17 |
| JPS6116729B2 (fr) | 1986-05-01 |
| FR2486057A1 (fr) | 1982-01-08 |
| KR840000958B1 (ko) | 1984-07-02 |
| GB2079736A (en) | 1982-01-27 |
| SE8103957L (sv) | 1982-01-08 |
| CH649069A5 (de) | 1985-04-30 |
| DE3126240A1 (de) | 1982-05-19 |
| JPS5756313A (en) | 1982-04-03 |
| DE3126240C2 (de) | 1983-09-08 |
| KR830006116A (ko) | 1983-09-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |
Ref document number: 8103957-0 Effective date: 19930109 Format of ref document f/p: F |