SE511189C2 - Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets - Google Patents

Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets

Info

Publication number
SE511189C2
SE511189C2 SE9703700A SE9703700A SE511189C2 SE 511189 C2 SE511189 C2 SE 511189C2 SE 9703700 A SE9703700 A SE 9703700A SE 9703700 A SE9703700 A SE 9703700A SE 511189 C2 SE511189 C2 SE 511189C2
Authority
SE
Sweden
Prior art keywords
delay
clock
signal
phase
time
Prior art date
Application number
SE9703700A
Other languages
English (en)
Swedish (sv)
Other versions
SE9703700D0 (sv
SE9703700L (sv
Inventor
Torbjoern Sandstroem
Leif Odselius
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE9703700A priority Critical patent/SE511189C2/sv
Publication of SE9703700D0 publication Critical patent/SE9703700D0/xx
Priority to DE69823375T priority patent/DE69823375T2/de
Priority to EP98950562A priority patent/EP1023638B1/de
Priority to PCT/SE1998/001835 priority patent/WO1999019772A1/en
Priority to AU96570/98A priority patent/AU9657098A/en
Priority to JP2000516261A priority patent/JP2001520407A/ja
Priority to AT98950562T priority patent/ATE265058T1/de
Publication of SE9703700L publication Critical patent/SE9703700L/xx
Publication of SE511189C2 publication Critical patent/SE511189C2/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/047—Detection, control or error compensation of scanning velocity or position
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
    • H04N2201/04—Scanning arrangements
    • H04N2201/047—Detection, control or error compensation of scanning velocity or position
    • H04N2201/04753—Control or error compensation of scanning position or velocity
    • H04N2201/04758—Control or error compensation of scanning position or velocity by controlling the position of the scanned image area
    • H04N2201/04767—Control or error compensation of scanning position or velocity by controlling the position of the scanned image area by controlling the timing of the signals, e.g. by controlling the frequency o phase of the pixel clock
    • H04N2201/04781—Controlling the phase of the signals
    • H04N2201/04784—Controlling the phase of the signals using one or more clock signals selected from a number of clock signals of different phases

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Pulse Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
SE9703700A 1997-10-13 1997-10-13 Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets SE511189C2 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE9703700A SE511189C2 (sv) 1997-10-13 1997-10-13 Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets
DE69823375T DE69823375T2 (de) 1997-10-13 1998-10-13 Verfahren und Vorrichtung zum Schreiben von komplexen lithographischen Mustern unter Verwendung eines Verzögerungsschaltkreises
EP98950562A EP1023638B1 (de) 1997-10-13 1998-10-13 Apparat in einem laser-belichtungsgerät für komplexe mikrolithographiemuster mit einem verzögerungsschaltkreis
PCT/SE1998/001835 WO1999019772A1 (en) 1997-10-13 1998-10-13 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit
AU96570/98A AU9657098A (en) 1997-10-13 1998-10-13 Apparatus for a laser writer for complex microlithographic patterns with a delaycircuit
JP2000516261A JP2001520407A (ja) 1997-10-13 1998-10-13 遅延回路を用いた複雑なマイクロリソグラフィ・パターンのレーザ書込み装置
AT98950562T ATE265058T1 (de) 1997-10-13 1998-10-13 Apparat in einem laser-belichtungsgerät für komplexe mikrolithographiemuster mit einem verzögerungsschaltkreis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9703700A SE511189C2 (sv) 1997-10-13 1997-10-13 Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets

Publications (3)

Publication Number Publication Date
SE9703700D0 SE9703700D0 (sv) 1997-10-13
SE9703700L SE9703700L (sv) 1999-04-14
SE511189C2 true SE511189C2 (sv) 1999-08-23

Family

ID=20408569

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9703700A SE511189C2 (sv) 1997-10-13 1997-10-13 Metod och anordning för en laserskrivare för komplexa mikrolitografiska mönster med en fördröjingskrets

Country Status (7)

Country Link
EP (1) EP1023638B1 (de)
JP (1) JP2001520407A (de)
AT (1) ATE265058T1 (de)
AU (1) AU9657098A (de)
DE (1) DE69823375T2 (de)
SE (1) SE511189C2 (de)
WO (1) WO1999019772A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8941085B2 (en) 2013-03-14 2015-01-27 Taiwan Semiconductor Manufacturing Company, Ltd. Electron beam lithography systems and methods including time division multiplex loading

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4549222A (en) * 1982-03-04 1985-10-22 Ing. C. Olivetti & C., S.P.A. Dot matrix printing method and printer therefor
US5635976A (en) * 1991-07-17 1997-06-03 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate

Also Published As

Publication number Publication date
JP2001520407A (ja) 2001-10-30
DE69823375D1 (de) 2004-05-27
EP1023638A1 (de) 2000-08-02
SE9703700D0 (sv) 1997-10-13
EP1023638B1 (de) 2004-04-21
WO1999019772A1 (en) 1999-04-22
SE9703700L (sv) 1999-04-14
AU9657098A (en) 1999-05-03
DE69823375T2 (de) 2005-05-04
ATE265058T1 (de) 2004-05-15

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Legal Events

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