SG80023A1 - Aqueous developing solutions for reduced developer residue - Google Patents

Aqueous developing solutions for reduced developer residue

Info

Publication number
SG80023A1
SG80023A1 SG9901662A SG1999001662A SG80023A1 SG 80023 A1 SG80023 A1 SG 80023A1 SG 9901662 A SG9901662 A SG 9901662A SG 1999001662 A SG1999001662 A SG 1999001662A SG 80023 A1 SG80023 A1 SG 80023A1
Authority
SG
Singapore
Prior art keywords
developing solutions
aqueous developing
developer residue
reduced developer
reduced
Prior art date
Application number
SG9901662A
Other languages
English (en)
Inventor
Robert Barr
Daniel E Lundy
Original Assignee
Nichigo Morton Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichigo Morton Co Ltd filed Critical Nichigo Morton Co Ltd
Publication of SG80023A1 publication Critical patent/SG80023A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Removal Of Specific Substances (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SG9901662A 1998-04-29 1999-04-13 Aqueous developing solutions for reduced developer residue SG80023A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/069,517 US6063550A (en) 1998-04-29 1998-04-29 Aqueous developing solutions for reduced developer residue

Publications (1)

Publication Number Publication Date
SG80023A1 true SG80023A1 (en) 2001-04-17

Family

ID=22089521

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9901662A SG80023A1 (en) 1998-04-29 1999-04-13 Aqueous developing solutions for reduced developer residue

Country Status (11)

Country Link
US (1) US6063550A (fr)
EP (1) EP0953879B1 (fr)
KR (1) KR100376611B1 (fr)
CN (1) CN1141621C (fr)
AT (1) ATE232993T1 (fr)
BR (1) BR9901323A (fr)
CA (1) CA2266609A1 (fr)
DE (1) DE69905416T2 (fr)
IL (1) IL129581A0 (fr)
SG (1) SG80023A1 (fr)
TW (1) TW581942B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
US6503694B1 (en) * 2001-06-12 2003-01-07 Chi Mei Corporation Developer solution and edge bead remover composition
US20030196685A1 (en) * 2001-12-18 2003-10-23 Shipley Company, L.L.C. Cleaning composition and method
EP1335016A1 (fr) * 2002-02-06 2003-08-13 Shipley Company LLC Composition de nettoyage
US6900003B2 (en) * 2002-04-12 2005-05-31 Shipley Company, L.L.C. Photoresist processing aid and method
US6887654B2 (en) * 2002-05-07 2005-05-03 Shipley Company, L.L.C. Residue and scum reducing composition and method
TW200307856A (en) * 2002-05-07 2003-12-16 Shipley Co Llc Residue reducing stable concentrate
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US7094523B1 (en) 2005-11-30 2006-08-22 Kesheng Feng Developer solution and process for use
KR102158579B1 (ko) * 2019-01-25 2020-09-22 (주)화백엔지니어링 Pcb 현상공정에서 스컴 방지를 위한 반응성 계면활성제가 함유된 현상 조성물 및 이의 제어시스템
KR102158580B1 (ko) * 2019-02-01 2020-09-22 (주)화백엔지니어링 정밀 회로구현이 가능한 현상 조성물

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193335A (en) * 1986-07-18 1988-02-03 Tokyo Ohka Kogyo Co Ltd A developer solution for positive-working photoresist compositions
US5532116A (en) * 1992-01-13 1996-07-02 Fuji Photo Film Co., Ltd. Aqueous alkaline developing solution
US5731132A (en) * 1994-06-01 1998-03-24 Clariant Gmbh Metal-ion free, aqueous developer for photoresist layers

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4824769A (en) * 1984-10-15 1989-04-25 Allied Corporation High contrast photoresist developer
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution
JPH063549B2 (ja) * 1984-12-25 1994-01-12 株式会社東芝 ポジ型フォトレジスト現像液組成物
JP2527172B2 (ja) * 1987-01-09 1996-08-21 東京応化工業株式会社 ポジ型ホトレジスト用現像液
EP0279630B1 (fr) * 1987-02-16 1993-10-13 Konica Corporation Développateur pour plaque d'imprimerie lithographique sensible à la lumière capable de développer en commun une plaque de type négatif ou de type positif et composition développatrice pour matériau sensible à la lumière
US5364736A (en) * 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
JP2543742B2 (ja) * 1988-04-07 1996-10-16 富士写真フイルム株式会社 ポジ型フオトレジスト用現像液
US5175078A (en) * 1988-10-20 1992-12-29 Mitsubishi Gas Chemical Company, Inc. Positive type photoresist developer
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JPH03167554A (ja) * 1989-11-27 1991-07-19 Toray Ind Inc 水なし平版印刷版用現像液
JPH04163556A (ja) * 1990-10-29 1992-06-09 Konica Corp 感光性平版印刷版の処理方法及び処理装置
JP2866951B2 (ja) * 1990-11-28 1999-03-08 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
JP2748057B2 (ja) * 1991-07-22 1998-05-06 富士写真フイルム株式会社 画像形成方法及びアルカリ性現像液
JPH0572686A (ja) * 1991-09-11 1993-03-26 Konica Corp ハロゲン化銀写真感光材料
DE4300576A1 (en) * 1992-01-13 1993-07-15 Fuji Photo Film Co Ltd Imaging process using specified surfactant in alkaline developer soln. - used to reduce development time of light-sensitive resin and minimise pigment fog
JP3094716B2 (ja) * 1992-01-16 2000-10-03 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
US5457011A (en) * 1993-12-27 1995-10-10 Eastman Kodak Company Photographic developing composition containing a sludge inhibiting agent and use thereof in the high contrast development of nucleated photographic elements
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
JP2937801B2 (ja) * 1994-03-31 1999-08-23 東京応化工業株式会社 レジスト用現像原液
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US5576145A (en) * 1995-02-10 1996-11-19 Morton International, Inc. Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance
US5998102A (en) * 1997-10-06 1999-12-07 Agfa Corporation Etch inhibitors in developer for lithographic printing plates

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193335A (en) * 1986-07-18 1988-02-03 Tokyo Ohka Kogyo Co Ltd A developer solution for positive-working photoresist compositions
US5532116A (en) * 1992-01-13 1996-07-02 Fuji Photo Film Co., Ltd. Aqueous alkaline developing solution
US5731132A (en) * 1994-06-01 1998-03-24 Clariant Gmbh Metal-ion free, aqueous developer for photoresist layers

Also Published As

Publication number Publication date
KR19990083500A (ko) 1999-11-25
US6063550A (en) 2000-05-16
IL129581A0 (en) 2000-02-29
CN1233782A (zh) 1999-11-03
DE69905416D1 (de) 2003-03-27
DE69905416T2 (de) 2003-07-17
CA2266609A1 (fr) 1999-10-29
ATE232993T1 (de) 2003-03-15
KR100376611B1 (ko) 2003-03-19
TW581942B (en) 2004-04-01
EP0953879B1 (fr) 2003-02-19
EP0953879A3 (fr) 1999-11-17
EP0953879A2 (fr) 1999-11-03
BR9901323A (pt) 2000-03-14
CN1141621C (zh) 2004-03-10

Similar Documents

Publication Publication Date Title
DE59306127D1 (de) Pumpfähige alkalische reinigerkonzentrate
IL129581A0 (en) Aqueous developing solutions for reduced developer residue
CA2034666A1 (fr) Composition detergente
EP1464487A3 (fr) Composition photosensible positive, plaque d'impression photosensible de type positif et procédé pour la fabrication de plaques lithographiques positives
DK0585352T3 (da) Vanddispergerbar foliedækket alkalisk sammensætning
EP1129145A4 (fr) Composition de nettoyage et de decapage non corrosive
ES2189466T3 (es) Formulacion de glifosato.
ATE157152T1 (de) Wiederherstellung des betriebszustandes eines bereichsgetriebes nach einer getriebestrangunterbrechung
ATE174380T1 (de) Waschmittelblock enthaltend nitrilotriessigsäure
GR3018145T3 (en) Self-thickened cleaning compositions.
TW330211B (en) Method for cleaning semiconductor wafers
MY103673A (en) Detergent composition
ES2175989T3 (es) Derivado de testosterona.
NZ332912A (en) rinseable hard surface cleaner containing a silicate, a hydrophobic acrylic polymer and a surfactant
CA2281785A1 (fr) Detergent liquide transparent contenant un tensioactif anionique a l'alkylbenzenesulfonate et du silicate de sodium
GR3031529T3 (en) Stable aqueous emulsions of nonionic surfactants with a viscosity controlling agent.
DE69025371D1 (de) Verwendung von Lysophospholipiden als OBERFLÄCHENAKTIVE MITTEL
AR243848A1 (es) Procedimiento para la estabilizacion de soluciones de peroxido de hidrogeno acuosas levemente alcalinas diluidas.
GB0024747D0 (en) Aromatic sulfonation reactions
DK0643690T3 (da) Desferrioxamin-B-salte samt deres anvendelse som oralt aktive jernchelatdannere
BR9607561A (pt) Agentes tensoativos não-iÈnicos com taxas de dissolução aquosa aumentadas
EP0974347A4 (fr) Agents antiviraux
AU740079C (en) Antirheumatic agents
FI962435A7 (fi) N.N'-bis(2-hydroksibentsyyli)eteenidiamiini-N,N'-dietikkahapon johdannaiset kelatoivina aineina
MXPA01003858A (es) Lubricante de cadena para sistemas transportadores y de transporte.