TW385495B - Method of implanting low doses of ions into a substrate - Google Patents

Method of implanting low doses of ions into a substrate Download PDF

Info

Publication number
TW385495B
TW385495B TW087110065A TW87110065A TW385495B TW 385495 B TW385495 B TW 385495B TW 087110065 A TW087110065 A TW 087110065A TW 87110065 A TW87110065 A TW 87110065A TW 385495 B TW385495 B TW 385495B
Authority
TW
Taiwan
Prior art keywords
gas
dopant
ions
substrate
ion source
Prior art date
Application number
TW087110065A
Other languages
English (en)
Chinese (zh)
Inventor
Matthew Charles Gwinn
Original Assignee
Eaton Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Corp filed Critical Eaton Corp
Application granted granted Critical
Publication of TW385495B publication Critical patent/TW385495B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00—Ion implantation into wafers, substrates or parts of devices
    • H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
TW087110065A 1997-07-10 1998-06-23 Method of implanting low doses of ions into a substrate TW385495B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/891,415 US5962858A (en) 1997-07-10 1997-07-10 Method of implanting low doses of ions into a substrate

Publications (1)

Publication Number Publication Date
TW385495B true TW385495B (en) 2000-03-21

Family

ID=25398141

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087110065A TW385495B (en) 1997-07-10 1998-06-23 Method of implanting low doses of ions into a substrate

Country Status (7)

Country Link
US (1) US5962858A (de)
EP (1) EP0890657B1 (de)
JP (1) JPH1187261A (de)
KR (1) KR100428619B1 (de)
CN (1) CN1208954A (de)
DE (1) DE69804546T2 (de)
TW (1) TW385495B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891173B2 (en) 2001-10-26 2005-05-10 Varian Semiconductor Equipment Associates, Inc. Ion implantation systems and methods utilizing a downstream gas source

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6335534B1 (en) * 1998-04-17 2002-01-01 Kabushiki Kaisha Toshiba Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
US6756600B2 (en) * 1999-02-19 2004-06-29 Advanced Micro Devices, Inc. Ion implantation with improved ion source life expectancy
KR101177867B1 (ko) * 2005-05-12 2012-08-28 파나소닉 주식회사 플라즈마 도핑 방법 및 플라즈마 도핑 장치
US7586109B2 (en) * 2007-01-25 2009-09-08 Varian Semiconductor Equipment Associates, Inc. Technique for improving the performance and extending the lifetime of an ion source with gas dilution
CN102074448B (zh) * 2009-11-20 2014-09-24 同方威视技术股份有限公司 离子迁移谱仪以及提高其检测灵敏度的方法
US8779383B2 (en) 2010-02-26 2014-07-15 Advanced Technology Materials, Inc. Enriched silicon precursor compositions and apparatus and processes for utilizing same
TWI466179B (zh) 2010-02-26 2014-12-21 尖端科技材料股份有限公司 用以增進離子植入系統中之離子源的壽命及性能之方法與設備
CN105637616A (zh) 2013-08-16 2016-06-01 恩特格里斯公司 基板中的硅注入及提供其硅前体组合物
JP6238689B2 (ja) 2013-11-13 2017-11-29 住友重機械イオンテクノロジー株式会社 イオン生成装置およびイオン生成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916034A (en) * 1971-05-21 1975-10-28 Hitachi Ltd Method of transporting substances in a plasma stream to and depositing it on a target
US3924134A (en) * 1974-11-29 1975-12-02 Ibm Double chamber ion source
US4881010A (en) * 1985-10-31 1989-11-14 Harris Semiconductor Patents, Inc. Ion implantation method and apparatus
US4775818A (en) * 1986-04-14 1988-10-04 Hughes Aircraft Company Liquid metal ion source and alloy
US4988640A (en) * 1988-07-25 1991-01-29 Air Products And Chemicals, Inc. Method of doping and implanting using arsine, antimony, and phosphine substitutes
US5558718A (en) * 1994-04-08 1996-09-24 The Regents, University Of California Pulsed source ion implantation apparatus and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891173B2 (en) 2001-10-26 2005-05-10 Varian Semiconductor Equipment Associates, Inc. Ion implantation systems and methods utilizing a downstream gas source

Also Published As

Publication number Publication date
DE69804546D1 (de) 2002-05-08
JPH1187261A (ja) 1999-03-30
US5962858A (en) 1999-10-05
KR100428619B1 (ko) 2004-08-04
EP0890657A1 (de) 1999-01-13
CN1208954A (zh) 1999-02-24
KR19990013752A (ko) 1999-02-25
DE69804546T2 (de) 2002-11-14
EP0890657B1 (de) 2002-04-03

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