TW398038B - Thin film formation process - Google Patents

Thin film formation process Download PDF

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Publication number
TW398038B
TW398038B TW087104097A TW87104097A TW398038B TW 398038 B TW398038 B TW 398038B TW 087104097 A TW087104097 A TW 087104097A TW 87104097 A TW87104097 A TW 87104097A TW 398038 B TW398038 B TW 398038B
Authority
TW
Taiwan
Prior art keywords
layer
porous
substrate
thin film
porous layer
Prior art date
Application number
TW087104097A
Other languages
English (en)
Chinese (zh)
Inventor
Masaaki Iwane
Takao Yonehara
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of TW398038B publication Critical patent/TW398038B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/1914—Preparing SOI wafers using bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/1924—Preparing SOI wafers with separation/delamination along a porous layer

Landscapes

  • Photovoltaic Devices (AREA)
  • Recrystallisation Techniques (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
  • Glass Compositions (AREA)
TW087104097A 1997-03-26 1998-03-19 Thin film formation process TW398038B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7369197 1997-03-26

Publications (1)

Publication Number Publication Date
TW398038B true TW398038B (en) 2000-07-11

Family

ID=13525505

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087104097A TW398038B (en) 1997-03-26 1998-03-19 Thin film formation process

Country Status (10)

Country Link
US (2) US6133112A (de)
EP (1) EP0867920B1 (de)
KR (1) KR100345354B1 (de)
CN (1) CN1112721C (de)
AT (1) ATE275288T1 (de)
AU (1) AU731697B2 (de)
CA (1) CA2233028C (de)
DE (1) DE69825928T2 (de)
SG (1) SG71094A1 (de)
TW (1) TW398038B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI614869B (zh) * 2015-09-11 2018-02-11 Taiwan Semiconductor Manufacturing Co., Ltd. 互連結構與其製造方法和應用其之半導體元件

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7148119B1 (en) * 1994-03-10 2006-12-12 Canon Kabushiki Kaisha Process for production of semiconductor substrate
SG70141A1 (en) 1997-12-26 2000-01-25 Canon Kk Sample separating apparatus and method and substrate manufacturing method
JP3500063B2 (ja) * 1998-04-23 2004-02-23 信越半導体株式会社 剥離ウエーハを再利用する方法および再利用に供されるシリコンウエーハ
TW484184B (en) * 1998-11-06 2002-04-21 Canon Kk Sample separating apparatus and method, and substrate manufacturing method
JP4313874B2 (ja) * 1999-02-02 2009-08-12 キヤノン株式会社 基板の製造方法
US6602767B2 (en) 2000-01-27 2003-08-05 Canon Kabushiki Kaisha Method for transferring porous layer, method for making semiconductor devices, and method for making solar battery
JP3982218B2 (ja) * 2001-02-07 2007-09-26 ソニー株式会社 半導体装置およびその製造方法
DE102004060363B4 (de) * 2004-12-15 2010-12-16 Austriamicrosystems Ag Halbleitersubstrat mit pn-Übergang und Verfahren zur Herstellung
US7429521B2 (en) * 2006-03-30 2008-09-30 Intel Corporation Capillary underfill of stacked wafers
DE102007021991B4 (de) * 2007-05-10 2015-03-26 Infineon Technologies Austria Ag Verfahren zum Herstellen eines Halbleiterbauelements durch Ausbilden einer porösen Zwischenschicht
US9409383B2 (en) * 2008-12-22 2016-08-09 Apple Inc. Layer-specific energy distribution delamination
US8242591B2 (en) 2009-08-13 2012-08-14 International Business Machines Corporation Electrostatic chucking of an insulator handle substrate
DE102009053262A1 (de) * 2009-11-13 2011-05-19 Institut Für Solarenergieforschung Gmbh Verfahren zum Bilden von dünnen Halbleiterschichtsubstraten sowie Verfahren zum Herstellen eines Halbleiterbauelements, insbesondere einer Solarzelle, mit einem solchen Halbleiterschichtsubstrat
US8945344B2 (en) * 2012-07-20 2015-02-03 Taiwan Semiconductor Manufacturing Company, Ltd. Systems and methods of separating bonded wafers
WO2017223296A1 (en) * 2016-06-24 2017-12-28 Crystal Solar Inc. Semiconductor layer separation from single crystal silicon substrate by infrared irradiation of porous silicon separation layer
DE102019114328B4 (de) * 2018-05-31 2022-03-03 Rohm Co. Ltd Halbleitersubstratstruktur und leistungshalbleitervorrichtung

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DE143981C (de) *
US4237150A (en) * 1979-04-18 1980-12-02 The United States Of America As Represented By The United States Department Of Energy Method of producing hydrogenated amorphous silicon film
US4392011A (en) * 1980-04-30 1983-07-05 Rca Corporation Solar cell structure incorporating a novel single crystal silicon material
DE69006353T2 (de) * 1990-05-25 1994-06-23 Ibm Verfahren und Vorrichtung zum Spalten von Halbleiterplatten und Bekleiden der gespalteten Facetten.
SG59963A1 (en) * 1990-08-03 1999-02-22 Canon Kk Semiconductor member and process for preparing semiconductor member
FR2681472B1 (fr) * 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
US5371564A (en) * 1992-03-09 1994-12-06 Nikon Corporation Shutter device in a camera
TW330313B (en) * 1993-12-28 1998-04-21 Canon Kk A semiconductor substrate and process for producing same
FR2715501B1 (fr) * 1994-01-26 1996-04-05 Commissariat Energie Atomique Procédé de dépôt de lames semiconductrices sur un support.
JP3257580B2 (ja) * 1994-03-10 2002-02-18 キヤノン株式会社 半導体基板の作製方法
FR2725074B1 (fr) 1994-09-22 1996-12-20 Commissariat Energie Atomique Procede de fabrication d'une structure comportant une couche mince semi-conductrice sur un substrat
JP2689935B2 (ja) * 1995-02-01 1997-12-10 日本電気株式会社 半導体薄膜形成方法
JP3381443B2 (ja) * 1995-02-02 2003-02-24 ソニー株式会社 基体から半導体層を分離する方法、半導体素子の製造方法およびｓｏｉ基板の製造方法
US6103598A (en) * 1995-07-13 2000-08-15 Canon Kabushiki Kaisha Process for producing semiconductor substrate
JPH0929472A (ja) * 1995-07-14 1997-02-04 Hitachi Ltd 割断方法、割断装置及びチップ材料
CN1132223C (zh) 1995-10-06 2003-12-24 佳能株式会社 半导体衬底及其制造方法
JPH09115833A (ja) * 1995-10-07 1997-05-02 Hyundai Electron Ind Co Ltd 半導体素子のポリシリコン膜製造方法
WO1997029509A1 (en) * 1996-02-09 1997-08-14 Philips Electronics N.V. Laser separation of semiconductor elements formed in a wafer of semiconductor material
FR2748851B1 (fr) * 1996-05-15 1998-08-07 Commissariat Energie Atomique Procede de realisation d'une couche mince de materiau semiconducteur
US6054363A (en) 1996-11-15 2000-04-25 Canon Kabushiki Kaisha Method of manufacturing semiconductor article
CA2220600C (en) * 1996-11-15 2002-02-12 Canon Kabushiki Kaisha Method of manufacturing semiconductor article
SG65697A1 (en) * 1996-11-15 1999-06-22 Canon Kk Process for producing semiconductor article
SG55413A1 (en) 1996-11-15 1998-12-21 Method Of Manufacturing Semico Method of manufacturing semiconductor article
EP0849788B1 (de) 1996-12-18 2004-03-10 Canon Kabushiki Kaisha Vefahren zum Herstellen eines Halbleiterartikels unter Verwendung eines Substrates mit einer porösen Halbleiterschicht
US6033974A (en) 1997-05-12 2000-03-07 Silicon Genesis Corporation Method for controlled cleaving process
US6159824A (en) 1997-05-12 2000-12-12 Silicon Genesis Corporation Silicon-on-silicon wafer bonding process using a thin film blister-separation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI614869B (zh) * 2015-09-11 2018-02-11 Taiwan Semiconductor Manufacturing Co., Ltd. 互連結構與其製造方法和應用其之半導體元件

Also Published As

Publication number Publication date
DE69825928D1 (de) 2004-10-07
CA2233028A1 (en) 1998-09-26
KR19980080550A (ko) 1998-11-25
CA2233028C (en) 2002-08-20
KR100345354B1 (ko) 2002-09-18
EP0867920B1 (de) 2004-09-01
AU5951998A (en) 1998-10-01
ATE275288T1 (de) 2004-09-15
CN1195880A (zh) 1998-10-14
US6534383B1 (en) 2003-03-18
AU731697B2 (en) 2001-04-05
US6133112A (en) 2000-10-17
DE69825928T2 (de) 2005-09-08
EP0867920A2 (de) 1998-09-30
EP0867920A3 (de) 1999-06-16
SG71094A1 (en) 2000-03-21
CN1112721C (zh) 2003-06-25

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