TW402646B - Metallic material or film having fluorinated surface layer, and fluorination process - Google Patents

Metallic material or film having fluorinated surface layer, and fluorination process Download PDF

Info

Publication number: TW402646B
Authority: TW; Taiwan
Prior art keywords: film; metal; fluorinated; patent application; layer
Prior art date: 1997-09-12

Application number

TW087115090A

Other languages

English (en)

Chinese (zh)

Inventor

Kunio Kasiwada

Takanori Kodama

Hiroyasu Taguchi

Tomo Hirano

Original Assignee

Showadenko K K

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-09-12

Filing date

1998-09-10

Publication date

2000-08-21

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17175125&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW402646(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1998-09-10 Application filed by Showadenko K K filed Critical Showadenko K K

2000-08-21 Application granted granted Critical

2000-08-21 Publication of TW402646B publication Critical patent/TW402646B/zh

Links

238000000034 method Methods 0.000 title claims description 53
239000007769 metal material Substances 0.000 title claims description 45
238000003682 fluorination reaction Methods 0.000 title claims description 29
239000002344 surface layer Substances 0.000 title claims description 15
229910052751 metal Inorganic materials 0.000 claims abstract description 56
239000002184 metal Substances 0.000 claims abstract description 56
238000007254 oxidation reaction Methods 0.000 claims abstract description 34
230000003647 oxidation Effects 0.000 claims abstract description 32
239000010408 film Substances 0.000 claims description 114
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 69
239000010410 layer Substances 0.000 claims description 57
239000007789 gas Substances 0.000 claims description 56
229910052731 fluorine Inorganic materials 0.000 claims description 41
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 38
239000011737 fluorine Substances 0.000 claims description 38
229910052760 oxygen Inorganic materials 0.000 claims description 33
239000001301 oxygen Substances 0.000 claims description 30
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 29
229910052759 nickel Inorganic materials 0.000 claims description 28
239000000463 material Substances 0.000 claims description 25
239000010409 thin film Substances 0.000 claims description 20
230000002079 cooperative effect Effects 0.000 claims description 19
229910000838 Al alloy Inorganic materials 0.000 claims description 9
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 9
229910052782 aluminium Inorganic materials 0.000 claims description 9
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
229910000881 Cu alloy Inorganic materials 0.000 claims description 8
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
229910052802 copper Inorganic materials 0.000 claims description 7
239000010949 copper Substances 0.000 claims description 7
238000011049 filling Methods 0.000 claims description 7
230000001590 oxidative effect Effects 0.000 claims description 7
239000011261 inert gas Substances 0.000 claims description 5
239000000758 substrate Substances 0.000 claims description 5
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 4
229910017604 nitric acid Inorganic materials 0.000 claims description 4
239000007864 aqueous solution Substances 0.000 claims description 3
239000011248 coating agent Substances 0.000 claims description 3
238000000576 coating method Methods 0.000 claims description 3
239000007788 liquid Substances 0.000 claims description 3
150000002739 metals Chemical class 0.000 claims description 3
ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 claims description 2
CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
OMBRFUXPXNIUCZ-UHFFFAOYSA-N dioxidonitrogen(1+) Chemical compound O=[N+]=O OMBRFUXPXNIUCZ-UHFFFAOYSA-N 0.000 claims description 2
GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims description 2
239000001272 nitrous oxide Substances 0.000 claims description 2
229910000990 Ni alloy Inorganic materials 0.000 claims 2
NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims 2
238000007743 anodising Methods 0.000 claims 1
238000004898 kneading Methods 0.000 claims 1
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 47
238000004519 manufacturing process Methods 0.000 description 40
229910052757 nitrogen Inorganic materials 0.000 description 27
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 23
238000005260 corrosion Methods 0.000 description 23
230000007797 corrosion Effects 0.000 description 23
238000004458 analytical method Methods 0.000 description 22
238000006243 chemical reaction Methods 0.000 description 19
238000007747 plating Methods 0.000 description 18
229910052786 argon Inorganic materials 0.000 description 17
230000002269 spontaneous effect Effects 0.000 description 17
239000012071 phase Substances 0.000 description 16
238000004544 sputter deposition Methods 0.000 description 14
239000002253 acid Substances 0.000 description 13
239000000203 mixture Substances 0.000 description 13
238000002161 passivation Methods 0.000 description 13
239000000956 alloy Substances 0.000 description 12
-1 argon ion Chemical class 0.000 description 12
229910045601 alloy Inorganic materials 0.000 description 11
229910001220 stainless steel Inorganic materials 0.000 description 11
239000010935 stainless steel Substances 0.000 description 10
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
238000005299 abrasion Methods 0.000 description 8
239000003153 chemical reaction reagent Substances 0.000 description 8
QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 8
229910052681 coesite Inorganic materials 0.000 description 7
229910052906 cristobalite Inorganic materials 0.000 description 7
238000009792 diffusion process Methods 0.000 description 7
238000005530 etching Methods 0.000 description 7
238000005259 measurement Methods 0.000 description 7
229910052682 stishovite Inorganic materials 0.000 description 7
238000012360 testing method Methods 0.000 description 7
229910052905 tridymite Inorganic materials 0.000 description 7
230000004580 weight loss Effects 0.000 description 7
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
238000012937 correction Methods 0.000 description 6
238000001514 detection method Methods 0.000 description 6
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 6
239000004065 semiconductor Substances 0.000 description 6
230000000052 comparative effect Effects 0.000 description 5
239000000243 solution Substances 0.000 description 5
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
238000010586 diagram Methods 0.000 description 4
238000005516 engineering process Methods 0.000 description 4
239000003344 environmental pollutant Substances 0.000 description 4
239000007791 liquid phase Substances 0.000 description 4
231100000719 pollutant Toxicity 0.000 description 4
238000002360 preparation method Methods 0.000 description 4
238000006467 substitution reaction Methods 0.000 description 4
238000002441 X-ray diffraction Methods 0.000 description 3
WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 3
229910052797 bismuth Inorganic materials 0.000 description 3
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
229910052799 carbon Inorganic materials 0.000 description 3
239000003638 chemical reducing agent Substances 0.000 description 3
239000003795 chemical substances by application Substances 0.000 description 3
SHXXPRJOPFJRHA-UHFFFAOYSA-K iron(iii) fluoride Chemical compound F[Fe](F)F SHXXPRJOPFJRHA-UHFFFAOYSA-K 0.000 description 3
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 3
238000005498 polishing Methods 0.000 description 3
238000000746 purification Methods 0.000 description 3
239000000126 substance Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
229910018104 Ni-P Inorganic materials 0.000 description 2
229910018536 Ni—P Inorganic materials 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 2
239000012298 atmosphere Substances 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
239000011651 chromium Substances 0.000 description 2
229910052804 chromium Inorganic materials 0.000 description 2
229910021563 chromium fluoride Inorganic materials 0.000 description 2
239000008139 complexing agent Substances 0.000 description 2
238000007796 conventional method Methods 0.000 description 2
238000005336 cracking Methods 0.000 description 2
230000007423 decrease Effects 0.000 description 2
238000010790 dilution Methods 0.000 description 2
239000012895 dilution Substances 0.000 description 2
ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000007772 electroless plating Methods 0.000 description 2
239000012025 fluorinating agent Substances 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
239000001257 hydrogen Substances 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
150000002431 hydrogen Chemical class 0.000 description 2
238000007654 immersion Methods 0.000 description 2
238000005470 impregnation Methods 0.000 description 2
150000002500 ions Chemical class 0.000 description 2
229910052742 iron Inorganic materials 0.000 description 2
229910001512 metal fluoride Inorganic materials 0.000 description 2
BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 2
230000007935 neutral effect Effects 0.000 description 2
239000007800 oxidant agent Substances 0.000 description 2
238000005240 physical vapour deposition Methods 0.000 description 2
150000003254 radicals Chemical class 0.000 description 2
230000035484 reaction time Effects 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
235000012239 silicon dioxide Nutrition 0.000 description 2
229910052709 silver Inorganic materials 0.000 description 2
239000004332 silver Substances 0.000 description 2
229910052708 sodium Inorganic materials 0.000 description 2
239000011734 sodium Substances 0.000 description 2
230000003068 static effect Effects 0.000 description 2
FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 2
239000012808 vapor phase Substances 0.000 description 2
OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
229910001339 C alloy Inorganic materials 0.000 description 1
KSSJBGNOJJETTC-UHFFFAOYSA-N COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC Chemical compound COC1=C(C=CC=C1)N(C1=CC=2C3(C4=CC(=CC=C4C=2C=C1)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC(=CC=C1C=1C=CC(=CC=13)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)N(C1=CC=C(C=C1)OC)C1=C(C=CC=C1)OC)C1=CC=C(C=C1)OC KSSJBGNOJJETTC-UHFFFAOYSA-N 0.000 description 1
229910000570 Cupronickel Inorganic materials 0.000 description 1
KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
229910018054 Ni-Cu Inorganic materials 0.000 description 1
229910018481 Ni—Cu Inorganic materials 0.000 description 1
229910004298 SiO 2 Inorganic materials 0.000 description 1
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
229910001080 W alloy Inorganic materials 0.000 description 1
238000000026 X-ray photoelectron spectrum Methods 0.000 description 1
240000008866 Ziziphus nummularia Species 0.000 description 1
230000001133 acceleration Effects 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
239000003513 alkali Substances 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
229910021529 ammonia Inorganic materials 0.000 description 1
YADDYKXZVNQFBH-UHFFFAOYSA-N argon;hydrobromide Chemical compound [Ar].Br YADDYKXZVNQFBH-UHFFFAOYSA-N 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
239000002585 base Substances 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
230000033228 biological regulation Effects 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
229910052794 bromium Inorganic materials 0.000 description 1
239000003518 caustics Substances 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
230000003749 cleanliness Effects 0.000 description 1
239000013065 commercial product Substances 0.000 description 1
230000003750 conditioning effect Effects 0.000 description 1
239000000470 constituent Substances 0.000 description 1
230000001276 controlling effect Effects 0.000 description 1
YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
238000005238 degreasing Methods 0.000 description 1
210000004268 dentin Anatomy 0.000 description 1
229910001873 dinitrogen Inorganic materials 0.000 description 1
239000003814 drug Substances 0.000 description 1
238000005108 dry cleaning Methods 0.000 description 1
239000008151 electrolyte solution Substances 0.000 description 1
229920006351 engineering plastic Polymers 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
150000002222 fluorine compounds Chemical class 0.000 description 1
125000001153 fluoro group Chemical group F* 0.000 description 1
235000019253 formic acid Nutrition 0.000 description 1
238000002309 gasification Methods 0.000 description 1
229910052735 hafnium Inorganic materials 0.000 description 1
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
238000011090 industrial biotechnology method and process Methods 0.000 description 1
229910052743 krypton Inorganic materials 0.000 description 1
DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
239000011159 matrix material Substances 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
229910052754 neon Inorganic materials 0.000 description 1
GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
229910000480 nickel oxide Inorganic materials 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
230000010355 oscillation Effects 0.000 description 1
GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
229910052702 rhenium Inorganic materials 0.000 description 1
WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
230000001568 sexual effect Effects 0.000 description 1
235000015170 shellfish Nutrition 0.000 description 1
238000005480 shot peening Methods 0.000 description 1
239000000344 soap Substances 0.000 description 1
229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
241000894007 species Species 0.000 description 1
239000003381 stabilizer Substances 0.000 description 1
239000010959 steel Substances 0.000 description 1
238000005979 thermal decomposition reaction Methods 0.000 description 1
229910052722 tritium Inorganic materials 0.000 description 1
210000000689 upper leg Anatomy 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/34—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in more than one step
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Chemically Coating (AREA)
Preventing Corrosion Or Incrustation Of Metals (AREA)
Chemical Treatment Of Metals (AREA)

TW087115090A 1997-09-12 1998-09-10 Metallic material or film having fluorinated surface layer, and fluorination process TW402646B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP09248231A JP3094000B2 (ja)	1997-09-12	1997-09-12	フッ化表面層を有する金属材料もしくは金属皮膜ならびにフッ化方法

Publications (1)

Publication Number	Publication Date
TW402646B true TW402646B (en)	2000-08-21

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Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW087115090A TW402646B (en)	1997-09-12	1998-09-10	Metallic material or film having fluorinated surface layer, and fluorination process

Country Status (5)

Country	Link
EP (1)	EP0902101B1 (fr)
JP (1)	JP3094000B2 (fr)
KR (1)	KR100308688B1 (fr)
DE (2)	DE69811446D1 (fr)
TW (1)	TW402646B (fr)

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CN116583691A (zh) *	2020-12-21	2023-08-11	爱思开新材料有限公司	耐刮擦性得到提升的高纯度氟化氢储藏容器用金属材料及其制造方法

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1997
- 1997-09-12 JP JP09248231A patent/JP3094000B2/ja not_active Expired - Fee Related
1998
- 1998-09-10 TW TW087115090A patent/TW402646B/zh active
- 1998-09-10 KR KR1019980037294A patent/KR100308688B1/ko not_active Expired - Fee Related
- 1998-09-11 DE DE69811446A patent/DE69811446D1/de not_active Expired - Fee Related
- 1998-09-11 DE DE69811446T patent/DE69811446T4/de not_active Expired - Lifetime
- 1998-09-11 EP EP98117280A patent/EP0902101B1/fr not_active Expired - Lifetime

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CN110508299A (zh) *	2019-09-03	2019-11-29	北京邮电大学	一种迅速升温制备二维局域氧化的过渡族金属氟化物催化剂方法
CN110508299B (zh) *	2019-09-03	2022-04-19	北京邮电大学	一种迅速升温制备二维局域氧化的过渡族金属氟化物催化剂方法
CN116583691A (zh) *	2020-12-21	2023-08-11	爱思开新材料有限公司	耐刮擦性得到提升的高纯度氟化氢储藏容器用金属材料及其制造方法

Also Published As

Publication number	Publication date
DE69811446D1 (de)	2003-03-27
JP3094000B2 (ja)	2000-10-03
DE69811446T2 (de)	2003-10-23
EP0902101A1 (fr)	1999-03-17
KR19990029675A (ko)	1999-04-26
EP0902101B1 (fr)	2003-02-19
DE69811446T4 (de)	2004-07-08
JPH1192912A (ja)	1999-04-06
KR100308688B1 (ko)	2001-11-30

Legal Events

Date	Code	Title	Description
2001-01-16	GD4A	Issue of patent certificate for granted invention patent

Publication	Publication Date	Title
TW402646B (en)	2000-08-21	Metallic material or film having fluorinated surface layer, and fluorination process
US6280597B1 (en)	2001-08-28	Fluorinated metal having a fluorinated layer and process for its production
Krishnan et al.	2006	An overall aspect of electroless Ni-P depositions—A review article
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Mainier et al.	2013	Quality of electroless Ni-P (nickel-phosphorus) coatings applied in oil production equipment with salinity
WO1996034122A1 (fr)	1996-10-31	Procede de creation de revetements de protection au nitrure, carbure et a l'oxyde
Newman et al.	1989	Evidence for dealloying of austenitic stainless steels in simulated stress corrosion crack environments
EP0446079A1 (fr)	1991-09-11	Matériel industriel avec film contenant de la fluorine et procédé pour fabriquer celui-ci
JPH02263972A (ja)	1990-10-26	フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
CN111519231B (zh)	2021-06-29	一种钛合金油管短节表面处理方法
Knowles	1969	High-strength, low-temperature bonding of beryllium and other metals.
JP3030351B2 (ja)	2000-04-10	フッ化不働態膜が形成されたステンレス鋼、その製造方法並びにそのステンレスを用いた装置
JP5000236B2 (ja)	2012-08-15	最表面層がフッ化ニッケル膜である金属材料およびその製造方法
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KR102940228B1 (ko)	2026-03-18	적층체 및 그 제조 방법
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CN116583691A (zh)	2023-08-11	耐刮擦性得到提升的高纯度氟化氢储藏容器用金属材料及其制造方法
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