TWI430966B - 熔融石英玻璃及其製造方法 - Google Patents
熔融石英玻璃及其製造方法 Download PDFInfo
- Publication number
- TWI430966B TWI430966B TW096133898A TW96133898A TWI430966B TW I430966 B TWI430966 B TW I430966B TW 096133898 A TW096133898 A TW 096133898A TW 96133898 A TW96133898 A TW 96133898A TW I430966 B TWI430966 B TW I430966B
- Authority
- TW
- Taiwan
- Prior art keywords
- fused silica
- silica glass
- ppm
- glass
- viscosity
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/10—Compositions for glass with special properties for infrared transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/54—Doped silica-based glasses containing metals containing beryllium, magnesium or alkaline earth metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006245137 | 2006-09-11 | ||
| JP2007017901 | 2007-01-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200831421A TW200831421A (en) | 2008-08-01 |
| TWI430966B true TWI430966B (zh) | 2014-03-21 |
Family
ID=39183755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096133898A TWI430966B (zh) | 2006-09-11 | 2007-09-11 | 熔融石英玻璃及其製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8211817B2 (de) |
| EP (1) | EP2070883B2 (de) |
| JP (2) | JP5529369B2 (de) |
| KR (1) | KR101378748B1 (de) |
| CN (1) | CN101511744B (de) |
| TW (1) | TWI430966B (de) |
| WO (1) | WO2008032698A1 (de) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5663870B2 (ja) * | 2009-12-24 | 2015-02-04 | 東ソー株式会社 | 金属不純物拡散阻止能を有する石英ガラス |
| CN101767983B (zh) * | 2009-12-25 | 2014-08-06 | 河北理工大学 | 含氧化镱的熔融石英陶瓷材料及其制备方法 |
| GB201011582D0 (en) | 2010-07-09 | 2010-08-25 | Heraeus Quartz Uk Ltd | High purity synthetic silica and items such as semiconductor jigs manufactured therefrom |
| JP2012066947A (ja) * | 2010-09-21 | 2012-04-05 | Tosoh Corp | 金属不純物拡散阻止能を有する石英ガラス |
| GB2498100A (en) * | 2011-07-08 | 2013-07-03 | Heraeus Quartz Uk Ltd | High purity synthetic silica and items such as semiconductor jigs manufactured therefrom |
| US20140092376A1 (en) * | 2012-10-01 | 2014-04-03 | Momentive Performance Materials, Inc. | Container and method for in-line analysis of protein compositions |
| IN2013DE00079A (de) * | 2013-01-10 | 2015-06-19 | Indian Inst Technology Kanpur | |
| DE102013107435B4 (de) * | 2013-07-12 | 2015-01-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglas-Großrohres |
| KR101642323B1 (ko) | 2014-09-23 | 2016-07-26 | (주) 디에스테크노 | 고 순도 석영 유리의 제조 방법 |
| KR101642327B1 (ko) | 2014-09-23 | 2016-07-26 | (주) 디에스테크노 | 고 순도 석영 유리의 제조 장치 |
| EP3210942B1 (de) * | 2014-10-22 | 2019-02-27 | AGC Inc. | Verfahren zur herstellung von körnchen aus glasrohmaterial, verfahren zur herstellung von glasschmelze und verfahren zur herstellung eines glasartikels |
| KR101659340B1 (ko) | 2015-03-30 | 2016-09-26 | (주) 디에스테크노 | 고 순도 실린더형 석영 유리의 제조 장치 |
| KR20170034974A (ko) | 2015-09-21 | 2017-03-30 | (주) 디에스테크노 | 고 순도 실린더형 석영 유리의 제조 방법 |
| JP6981710B2 (ja) * | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| TWI793065B (zh) * | 2015-12-18 | 2023-02-21 | 德商何瑞斯廓格拉斯公司 | 用於熔融烘箱的氣體沖洗及製備石英玻璃之方法 |
| WO2017103170A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| EP3390303B1 (de) * | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| EP3390300A1 (de) * | 2015-12-18 | 2018-10-24 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines quarzglaskörpers in einem stehendem sintertiegel |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| CN108698889A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在悬挂式金属片坩埚中制备石英玻璃体 |
| EP3390298A1 (de) * | 2015-12-18 | 2018-10-24 | Heraeus Quarzglas GmbH & Co. KG | Herstellen und nachbehandeln eines quarzglaskörpers |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| KR20180095618A (ko) * | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| EP3390304B1 (de) * | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| TW201733930A (zh) * | 2015-12-18 | 2017-10-01 | 何瑞斯廓格拉斯公司 | 石英玻璃製備中之二氧化矽粉末的氨處理 |
| JP2017216389A (ja) * | 2016-06-01 | 2017-12-07 | 信越石英株式会社 | 紫外線smd型led素子の気密封止用シリカガラス部材 |
| KR102337364B1 (ko) * | 2016-06-01 | 2021-12-09 | 신에쯔 세끼에이 가부시키가이샤 | 자외선smd형 led소자의 기밀봉지용 석영유리 부재 및 자외선led용 석영유리 부재의 제조방법 |
| JP6623968B2 (ja) * | 2016-08-03 | 2019-12-25 | 信越化学工業株式会社 | 光学素子パッケージ用窓材、光学素子パッケージ、それらの製造方法、及び光学素子用パッケージ |
| DE102016012003A1 (de) | 2016-10-06 | 2018-04-12 | Karlsruher Institut für Technologie | Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung |
| KR20180072917A (ko) * | 2016-12-21 | 2018-07-02 | 삼성전자주식회사 | 유전체 윈도우, 그를 포함하는 플라즈마 장치, 및 그의 제조 방법 |
| WO2018131668A1 (ja) * | 2017-01-16 | 2018-07-19 | 旭硝子株式会社 | 石英ガラスおよびそれを用いた紫外線発光素子用部材 |
| CN110612274B (zh) * | 2017-04-26 | 2022-04-01 | 东曹石英素材股份有限公司 | 抗紫外线石英玻璃及其制造方法 |
| JP7060386B2 (ja) * | 2017-04-26 | 2022-04-26 | 東ソ-・エスジ-エム株式会社 | 耐紫外線性石英ガラス及びその製造方法 |
| CN108987612A (zh) | 2017-06-01 | 2018-12-11 | 京东方科技集团股份有限公司 | 掩膜版及其制造方法,柔性衬底剥离系统及柔性衬底剥离方法 |
| KR20190020238A (ko) | 2017-08-18 | 2019-02-28 | (주) 디에스테크노 | 상부 가열식 석영유리 진공 용융 장치 및 방법 |
| JP2019182691A (ja) * | 2018-04-04 | 2019-10-24 | 東ソ−・エスジ−エム株式会社 | 石英ガラスインゴット及び石英ガラス製品の製造方法 |
| US20210403374A1 (en) * | 2018-12-14 | 2021-12-30 | Tosoh Quartz Corporation | Method of manufacturing opaque quartz glass |
| JP7713171B2 (ja) * | 2021-10-29 | 2025-07-25 | ウシオ電機株式会社 | エキシマランプ及び紫外光照射装置 |
| JP2025517934A (ja) * | 2022-05-18 | 2025-06-12 | ユーヴィーシー サイエンス インコーポレイテッド | Hvacデバイス用hvac uvc led投影ユニット |
| US20240399002A1 (en) * | 2023-02-05 | 2024-12-05 | Uvc Science, Inc. | Mobile uvc light projection unit |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| DE3581455D1 (de) * | 1984-08-30 | 1991-02-28 | Nippon Oxygen Co Ltd | Verfahren zur herstellung von glas. |
| WO1987006836A1 (en) | 1986-05-15 | 1987-11-19 | Emory University | Fibrinolytic composition |
| JPH0624993B2 (ja) * | 1987-12-28 | 1994-04-06 | 信越石英株式会社 | 石英ガラスの製造方法 |
| JPH07115880B2 (ja) | 1989-08-29 | 1995-12-13 | 信越石英株式会社 | 耐熱性の優れた合成石英ガラス部材 |
| JPH03109223A (ja) | 1989-09-22 | 1991-05-09 | Asahi Glass Co Ltd | 石英ガラスおよびその製造方法 |
| JPH054827A (ja) * | 1990-09-07 | 1993-01-14 | Mitsubishi Kasei Corp | シリカガラス粉末及びその製法並びにこれを用いたシリカガラス成形体 |
| DE69109026T2 (de) | 1990-09-07 | 1995-12-07 | Mitsubishi Chem Corp | Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand. |
| JP2839725B2 (ja) | 1990-12-28 | 1998-12-16 | 新日鐵化学株式会社 | 高純度結晶質シリカの製造方法 |
| GB9108891D0 (en) | 1991-04-25 | 1991-06-12 | Tetronics Research & Dev Co Li | Silica production |
| CN1035608C (zh) * | 1992-01-21 | 1997-08-13 | 亓飞 | 无羟基透明石英玻璃的连续电熔法 |
| CA2123019A1 (en) | 1993-06-01 | 1994-12-02 | Stanley M. Antczak | Viscosity tailoring of fused silica |
| US6235669B1 (en) | 1993-06-01 | 2001-05-22 | General Electric Company | Viscosity tailoring of fused silica |
| US6136736A (en) | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| US5631522A (en) | 1995-05-09 | 1997-05-20 | General Electric Company | Low sodium permeability glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| JP3128451B2 (ja) * | 1994-12-08 | 2001-01-29 | 信越化学工業株式会社 | 合成石英ガラスの製造方法 |
| JPH08290927A (ja) * | 1995-04-17 | 1996-11-05 | Tosoh Corp | 石英ガラス基板の製造方法 |
| JPH0912322A (ja) * | 1995-06-29 | 1997-01-14 | Tosoh Corp | 高純度透明石英ガラス及びその製造方法 |
| JPH0940434A (ja) * | 1995-07-28 | 1997-02-10 | Tosoh Corp | 高純度石英ガラス及びその製造方法 |
| JPH0948623A (ja) * | 1995-08-02 | 1997-02-18 | Nitto Chem Ind Co Ltd | 石英ガラスの製造方法 |
| JP3757476B2 (ja) * | 1996-08-05 | 2006-03-22 | 株式会社ニコン | 石英ガラス光学部材、その製造方法、及び投影露光装置 |
| JP3893816B2 (ja) | 1998-10-28 | 2007-03-14 | 旭硝子株式会社 | 合成石英ガラスおよびその製造方法 |
| WO2000024685A1 (fr) | 1998-10-28 | 2000-05-04 | Asahi Glass Company Ltd. | Verre en quartz synthetique et procede de fabrication |
| EP1067097A4 (de) | 1998-12-25 | 2004-03-31 | Asahi Glass Co Ltd | Synthetisches quartz glass und verfahren zur herstellung |
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| JP2003201125A (ja) * | 2001-12-28 | 2003-07-15 | Asahi Glass Co Ltd | 合成石英ガラスおよびその製造方法 |
| JP4085633B2 (ja) * | 2001-12-28 | 2008-05-14 | 旭硝子株式会社 | 光学部材用合成石英ガラス |
| JP3970692B2 (ja) * | 2002-05-31 | 2007-09-05 | 信越化学工業株式会社 | プリフォーム製造方法 |
| JP4470054B2 (ja) * | 2003-08-26 | 2010-06-02 | 東ソー株式会社 | 合成石英ガラス及びその製造方法 |
| JP4473653B2 (ja) | 2004-05-25 | 2010-06-02 | 東ソ−・エスジ−エム株式会社 | 高純度石英ガラスの製造方法 |
-
2007
- 2007-09-11 JP JP2007235031A patent/JP5529369B2/ja not_active Expired - Fee Related
- 2007-09-11 CN CN200780033716XA patent/CN101511744B/zh not_active Expired - Fee Related
- 2007-09-11 US US12/440,683 patent/US8211817B2/en active Active
- 2007-09-11 TW TW096133898A patent/TWI430966B/zh not_active IP Right Cessation
- 2007-09-11 EP EP07807048.9A patent/EP2070883B2/de not_active Not-in-force
- 2007-09-11 WO PCT/JP2007/067639 patent/WO2008032698A1/ja not_active Ceased
- 2007-09-11 KR KR1020097004337A patent/KR101378748B1/ko not_active Expired - Fee Related
-
2013
- 2013-10-15 JP JP2013215033A patent/JP5825722B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101511744B (zh) | 2012-11-14 |
| JP5529369B2 (ja) | 2014-06-25 |
| WO2008032698A1 (en) | 2008-03-20 |
| TW200831421A (en) | 2008-08-01 |
| KR101378748B1 (ko) | 2014-03-27 |
| US20100041538A1 (en) | 2010-02-18 |
| EP2070883B1 (de) | 2013-11-13 |
| JP2014005204A (ja) | 2014-01-16 |
| EP2070883A4 (de) | 2012-09-12 |
| EP2070883B2 (de) | 2017-04-19 |
| US8211817B2 (en) | 2012-07-03 |
| CN101511744A (zh) | 2009-08-19 |
| EP2070883A1 (de) | 2009-06-17 |
| JP5825722B2 (ja) | 2015-12-02 |
| JP2008208017A (ja) | 2008-09-11 |
| KR20090057237A (ko) | 2009-06-04 |
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