US5217848A - Method and apparatus for processing presensitized lithographic printing plate - Google Patents
Method and apparatus for processing presensitized lithographic printing plate Download PDFInfo
- Publication number
- US5217848A US5217848A US07/783,117 US78311791A US5217848A US 5217848 A US5217848 A US 5217848A US 78311791 A US78311791 A US 78311791A US 5217848 A US5217848 A US 5217848A
- Authority
- US
- United States
- Prior art keywords
- printing plate
- developing
- lithographic printing
- presensitized lithographic
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012545 processing Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 31
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 17
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000011161 development Methods 0.000 claims abstract description 12
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 8
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 8
- 230000015556 catabolic process Effects 0.000 claims abstract description 8
- 238000006731 degradation reaction Methods 0.000 claims abstract description 8
- 239000000243 solution Substances 0.000 claims description 138
- 239000004094 surface-active agent Substances 0.000 claims description 25
- 229920005989 resin Polymers 0.000 claims description 19
- 239000011347 resin Substances 0.000 claims description 19
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 8
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 5
- 239000004411 aluminium Substances 0.000 claims 2
- 239000012670 alkaline solution Substances 0.000 claims 1
- -1 aromatic diazonium salt Chemical class 0.000 description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 14
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 13
- 150000003839 salts Chemical class 0.000 description 13
- 238000005406 washing Methods 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 238000001514 detection method Methods 0.000 description 7
- 235000014113 dietary fatty acids Nutrition 0.000 description 7
- 239000000194 fatty acid Substances 0.000 description 7
- 229930195729 fatty acid Natural products 0.000 description 7
- 159000000000 sodium salts Chemical class 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 125000002091 cationic group Chemical group 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 6
- 239000010452 phosphate Substances 0.000 description 6
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 6
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 150000004665 fatty acids Chemical class 0.000 description 5
- 239000012487 rinsing solution Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000004115 Sodium Silicate Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 235000019256 formaldehyde Nutrition 0.000 description 4
- 229960004279 formaldehyde Drugs 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 3
- KDVYCTOWXSLNNI-UHFFFAOYSA-N 4-t-Butylbenzoic acid Chemical compound CC(C)(C)C1=CC=C(C(O)=O)C=C1 KDVYCTOWXSLNNI-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 3
- 229910052913 potassium silicate Inorganic materials 0.000 description 3
- 235000019353 potassium silicate Nutrition 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 229940079877 pyrogallol Drugs 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 235000019795 sodium metasilicate Nutrition 0.000 description 3
- 150000003871 sulfonates Chemical class 0.000 description 3
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 2
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 2
- WXTMDXOMEHJXQO-UHFFFAOYSA-N 2,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1O WXTMDXOMEHJXQO-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 2
- UYEMGAFJOZZIFP-UHFFFAOYSA-N 3,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC(O)=C1 UYEMGAFJOZZIFP-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229940118056 cresol / formaldehyde Drugs 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- XBMOWLAOINHDLR-UHFFFAOYSA-N dipotassium;hydrogen phosphite Chemical compound [K+].[K+].OP([O-])[O-] XBMOWLAOINHDLR-UHFFFAOYSA-N 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 150000002642 lithium compounds Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011591 potassium Chemical group 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 159000000001 potassium salts Chemical class 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000010129 solution processing Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- BFXKJHOJSIMHSJ-UHFFFAOYSA-N 1-(hexadecoxymethyl)pyridin-1-ium Chemical class CCCCCCCCCCCCCCCCOC[N+]1=CC=CC=C1 BFXKJHOJSIMHSJ-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- SJJCQDRGABAVBB-UHFFFAOYSA-N 1-hydroxy-2-naphthoic acid Chemical compound C1=CC=CC2=C(O)C(C(=O)O)=CC=C21 SJJCQDRGABAVBB-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- XDESGXRLUIHEJT-UHFFFAOYSA-N 2,3,4-tribenzylphenol Chemical compound C=1C=CC=CC=1CC1=C(CC=2C=CC=CC=2)C(O)=CC=C1CC1=CC=CC=C1 XDESGXRLUIHEJT-UHFFFAOYSA-N 0.000 description 1
- IDROIXKNGNJRED-UHFFFAOYSA-N 2,3-diazido-N-phenylaniline Chemical compound N(=[N+]=[N-])C=1C(=C(C=CC1)NC1=CC=CC=C1)N=[N+]=[N-] IDROIXKNGNJRED-UHFFFAOYSA-N 0.000 description 1
- 229940082044 2,3-dihydroxybenzoic acid Drugs 0.000 description 1
- IWSZDQRGNFLMJS-UHFFFAOYSA-N 2-(dibutylamino)ethanol Chemical compound CCCCN(CCO)CCCC IWSZDQRGNFLMJS-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
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- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
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- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- WVFDILODTFJAPA-UHFFFAOYSA-M sodium;1,4-dihexoxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CCCCCCOC(=O)CC(S([O-])(=O)=O)C(=O)OCCCCCC WVFDILODTFJAPA-UHFFFAOYSA-M 0.000 description 1
- FGXAXWOAJVOILP-UHFFFAOYSA-M sodium;2-[methyl(pentadecyl)amino]acetate Chemical compound [Na+].CCCCCCCCCCCCCCCN(C)CC([O-])=O FGXAXWOAJVOILP-UHFFFAOYSA-M 0.000 description 1
- KIMPPGSMONZDMN-UHFFFAOYSA-N sodium;dihydrogen phosphite Chemical compound [Na+].OP(O)[O-] KIMPPGSMONZDMN-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
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- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3078—Processing different kinds of plates, e.g. negative and positive plates, in the same machine
Definitions
- the present invention relates to a method of, and an apparatus for, processing a presensitized lithographic printing plate. More particularly, it relates to a method and an apparatus that are suited for processing a positive-working presensitized lithographic printing plate and a negative-working presensitized lithographic printing plate in common.
- positive-working presensitized lithographic printing plates and negative-working presensitized lithographic printing plates may cause exhaustion of the developing solution in a degree different from each other, and hence there has been the problem that it is difficult to control the replenishing and is difficult to carry out stable processing in practical use.
- the fresh-solution processing method has the disadvantage that it consumes the developing solution in a larger quantity than the circulation method.
- An object of the present invention is to provide a method of, and an apparatus for, processing a presensitized lithographic printing plate, that can stably process both a positive-working presensitized lithographic printing plate and a negative-working presensitized lithographic printing plate in common in a set of automatic processor, using at least one developing solution which is repeatedly used.
- Another object of the present invention is to provide a technique capable of achieving a processing cost reduction, in a method of, and an apparatus for, processing a presensitized lithographic printing plate, that can stably process a positive-working presensitized lithographic printing plate and a negative-working presensitized lithographic printing plate in common in a set of automatic processor, using at least one developing solution which is repeatedly used.
- a method for processing both an imagewise exposed, positive-working presensitized lithographic printing plate and an imagewise exposed, negative-working presensitized lithographic printing plate comprising developing the printing plates with a developing solution repeatedly used, the printing plates comprising an aluminum support and a light-sensitive layer formed thereon, a replenishing solution being added to the developing solution to compensate for the degradation of the developing solution brought about by development and/or by carbon dioxide in the air, comprising the steps of;
- An apparatus for processing both an imagewise exposed, positive-working presensitized lithographic printing plate and an imagewise exposed, negative-working presensitized lithographic printing plate comprising developing the printing plates with a developing solution repeatedly used, the printing plates comprising an aluminum support and a light-sensitive layer formed thereon, comprising;
- FIGS. 1 and 2 diagrammatically illustrate embodiments of processing apparatus according to the present invention.
- FIG. 1 diagrammatically illustrates an embodiment of the processing apparatus according to the present invention.
- the letter symbol A denotes a developing zone in which developing is carried out using a repeatedly usable developing solution capable of developing a negative-working presensitized lithographic printing plate and a positive-working presensitized lithographic printing plate in common (hereinafter "negative/positive common developing solution")
- B a washing zone in which presensitized lithographic printing plates are washed with water
- C a rinsing/gum zone in which presensitized lithographic printing plates are processed with a rinsing solution or a gum solution
- PS a path through which the presensitized lithographic printing plates are transported.
- reference numeral 1 denotes a pair of transport rollers for transporting presensitized lithographic printing plates; 5, a pair of squeegee rollers; 8, a pair of skewer-shaped rollers; 9, a guide roller; 10, a brush roller that brushes plate surfaces to accelerate development; II, a shower pipe; 14, a developing solution tank that holds a developing solution; 15, a washing water tank that holds washing water; 16, a rinsing/gum solution tank that hold a rinsing solution or a desensitizing solution (a gum solution); 17, 18 and 19, pumps that feed processing solutions from the developing solution tank 14, the washing water tank 15 and the rinsing/gum solution tank 16 to each corresponding shower pipe 11; 20, a developer replenishing solution tank that holds a replenishing solution to compensate for the degradation of a developing solution brought about by development and/or by carbon dioxide in the air; and 21, a replenishing device, comprising a liquid-feed metering pump and having a mechanism of operating a
- the liquid-feed metering pump is so designed as to be operated through a control system comprised of a feed control circuit 37 described later, and also be manually operated.
- Reference numeral 22 denotes a pipe that guides an overflow from the developing solution tank 14, the washing water tank 15 or the rinsing/gum solution tank 16 to each corresponding overflow tank (not shown).
- Reference numeral 30 denotes a planimetric reflection sensor, measuring the width of a presensitized printing plated and the time taken for transport, comprising a plurality of optical sensors arranged at regular intervals in a horizontal direction falling at right angles with the transport path, where a light-emitting device irradiates the surface of a presensitized lithographic printing plate transported there and a receptor receives the light reflected from the surface of the presensitized lithographic printing plate.
- Reference numeral 31 denotes a plate width detecting circuit, which is so designed that the plate width can be detected on the basis of plate detection signals sent from the planimetric reflection sensor 30.
- Reference numeral 32 denotes a plate area integrating circuit, which is so designed that a plate area to be processed can be detected by integration of the signals from the planimetric reflection sensor 30.
- Reference numeral 33 denotes a discriminating sensor, which is so constituted that a reflection density or a reflectance of the light-sensitive layer of the exposed presensitized lithographic printing plate is measured before development so as to discriminate the type of the printing plate.
- the type of the exposed presensitized lithographic printing plates means a negative-working presensitized lithographic printing plate or a positive-working presensitized lithographic printing plate.
- the light used in discriminating the difference in type is preferably light having a wavelength of from 350 nm to 450 nm or from 550 nm to 650 nm, and more preferably light having a wavelength of from 360 nm to 430 nm or from 550 nm to 620 nm.
- Reference numeral 34 denotes a negative/positive discriminating circuit, which is so constructed that the reflection density with respect to light of a specific wavelength is measured with the discriminating reflection sensor 33 and the measurements obtained are compared with a predetermined standard value to discriminate the positive and negative types.
- any devices can be used so long as they are light sources that emit light having a wavelength within the above wavelength region.
- a tungsten lamp or a sodium (D 2 ) lamp can be preferably used.
- the light from a light source may also be passed through a spectroscopic system such as a grating spectroscope, or an interference filter, to take out a monochromatic light to shed the light upon the plate surfaces.
- a photodiode, a phototransistor or the like is used as the receptor.
- Reference numeral 35 denotes an operation/pause-time integrating circuit, which controls replenishment in accordance with an exhaustion of a developing solution (processing exhaustion) resulting from the processing of presensitized lithographic printing plates, as well as degradation of a developing solution (exhaustion with time) caused by carbon dioxide in the air. It detects operation or pause of the processing apparatus according to the on-off of a power source switch 36 of the processing apparatus, and integrates respectively the operation time and the pause time to calculate the amount of replenishment that corresponds to the exhaustion with time in each state of operation or pause.
- the apparatus is so constructed that the above plate areas, positive/negative discriminating signals and signals corresponding to the amount of exhaustion with time are inputted to a flow-rate control circuit 37, and the replenishing device 21 is controlled via a pump driving circuit 38 so that the developing solution can be replenished in the amount based on the predetermined function relationship.
- a known technique can be applied in respect of the controlling of developing conditions corresponding with the plate areas, the positive/negative discriminated types and the exhaustion with time at the time of operation or pause.
- presensitized lithographic printing plates are inserted from the left end, viewed in the drawing, of the transport path PS. Then the plate area is calculated by means of the plate width detecting circuit 31 and the plate area integrating circuit 32 on the basis of the signals detected by the planimetric reflection sensor 30, and separately the positive type or negative type is identified by the negative/positive discriminating circuit 34 on the basis of the signals detected by the discriminating reflection sensor 33. These signals are inputted to the flow-rate control circuit 37. In parallel with these, the signals from the operation/pause-time integrating circuit 35 are inputted to the flow-rate control circuit 37.
- the flow-rate control circuit 37 controls the replenishing device 21 in such a way that the developing solution is replenished in the amount based on the predetermined function relationship having been set up using the plate areas, the positive/negative discriminated types and the signals from the operation/pause-time integrating circuit 35 as variables, so that the developer replenishing solution held in the replenishing solution tank 20 is supplied to the developing tank 14.
- the timing of this replenishment may be appropriately selected. For example, at the time a presensitized lithographic printing plate is inserted, the replenishment is carried out wherein the amount of replenishment is changed according to the plate area and the type of the printing plate and before the presensitized lithographic printing plate is inserted the replenishment is carried out which corresponds with the exhaustion with time.
- the negative/positive common developing solution held in the developing solution tank 14 for which the above replenishment is carried out is fed by means of the pump 17 to the plate surface, the plate surface is brushed with the brush roller 10, and then any developing solution adhered to the both sides of the plate and any matters dissolved out on the photosensitive layer of the presensitized lithographic printing plate are removed by a pair of squeegee rollers 5. Developing is thus completed.
- the presensitized lithographic printing plate is transported to the washing zone B.
- the washing zone B the washing water held in the washing water tank 15 is fed from the shower pipe 11 to the plate surface of the presensitized lithographic printing plate by means of the pump 18.
- the presensitized lithographic printing plate having been washed is passed through the squeegee rollers 5, where the solution remaining on the both surfaces thereof are removed.
- the presensitized lithographic printing plate is transported to the rinsing/gum zone C.
- a rinsing solution or gum solution held in the rinsing/gum solution tank 16 is fed from the shower pipe 11 to the plate surface by means of the pump 19, and then removed by the squeegee rollers 5, leaving the solution in the necessary amount.
- the processing is completed.
- FIG. 2 diagrammatically illustrates another embodiment of the processing apparatus according to the present invention.
- the letter symbol A denotes a developing zone in which developing is carried out using a repeatedly usable negative/positive common developing solution, B, a washing zone; C, a rinsing/gum zone in which presensitized lithographic printing plates are processed with a rinsing solution or a gum solution; and PS, a path through which the presensitized lithographic printing plates are transported.
- reference numeral 1 denotes a pair of transport rollers for transporting presensitized lithographic printing plates; 5, a pair of squeegee rollers; 8a, a skewer-shaped roller; 8b, a pair of skewer-shaped rollers; 9, a guide roller; 10a, a brush roller; 12, a shower pipe; 14a, a developing solution tank; 15, a washing water tank; 16, a rinsing/gum solution tank that hold a rinsing solution or a desensitizing solution (a gum solution); 17a, a pump that causes the developing solution in the developing solution tank 14a to flow; 18 and 19, pumps that pressure-feed processing solutions to each corresponding shower pipe 12; 20, a developer replenishing solution tank that holds a developer replenishing solution; 21, a replenishing device; 23, 25 and 26, each a pipe that guides an overflow to an overflow tank (not shown); and 27, a heater with a thermostat, for heating the developing solution in the developing solution tank 14a to
- Reference numeral 30 denotes a planimetric reflection sensor; 31, a plate width detecting circuit; 32, a plate area integrating circuit; 33, a discriminating reflection sensor; 34, a negative/positive discriminating circuit: 35, an operation/pause-time integrating circuit: 36, a power source switch; 37, a flow-rate control circuit; and 38, a pump driving circuit.
- Reference numeral 40 denotes a transport speed control circuit, which is so designed that the speed at which presensitized lithographic printing plates are transported can be changed according to the input from the negative/positive discriminating circuit 34.
- Reference numeral 41 denotes a drive circuit for rotationally driving each roller provided along the transport path PS and 42, a motor that rotationally drives each roller.
- the plate area is calculated by means of the plate width detecting circuit 31 and the plate area integrating circuit 32 on the basis of the signals detected by the planimetric reflection sensor 30, and separately the type of the printing plate is identified by the negative/positive discriminating circuit 34 on the basis of the signals detected by the discriminating reflection sensor 33.
- These signals are inputted to the flow-rate control circuit 37.
- the signals from the operation/pause-time integrating circuit 35 are inputted to the flow-rate control circuit 37.
- the flow-rate control circuit 37 controls the replenishing device 21 in such a way that the developing solution is replenished in the amount based on the predetermined function relationship having been set up using the plate areas, the positive/negative discriminated types and the signals from the operation/pause-time integrating circuit 35 as variables, so that the developer replenishing solution held in the replenishing solution tank 20 is supplied to the developing solution tank 14a.
- the signals from the negative/positive discriminating circuit 34 are processed in the transport speed control circuit 40 to generate signals that indicate a transport speed for each of the positive-working presensitized lithographic printing plate and the negative-working presensitized lithographic printing plate.
- the roller drive circuit is controlled according to this signals so that the transport speed can be changed according to the discriminated difference in type between the positive plate and negative plate.
- the presensitized lithographic printing plate is immersed in the negative/positive common developing solution held in the developing solution tank 14a for which the above replenishment is carried out, the plate surface is brushed with the brush roller 10a, and then any developing solution adhered to the both sides of the plate and any matters dissolved out on the photosensitive layer of the presensitized lithographic printing plate are removed by the pair of squeegee rollers 5. Developing is thus completed.
- the presensitized lithographic printing plate is transported to the washing zone B and then to the rinsing/gum zone C, where the washing and its post processing are carried out in the same manner as in the apparatus shown in FIG. 1.
- Developing conditions that are automatically changed according to the automatically discriminated difference in type between the positive-working presensitized lithographic printing plate and the negative-working presensitized lithographic printing plate may be arbitrarily selected, and a known technique can be applied. Such conditions may also be determined by an experimental means.
- the amount of the replenishment is determined as described below.
- a fresh developing solution is used and positive-working presensitized lithographic printing plates are continuously processed in a large number to experimentally determine a total plate area (Ap) of the plates processed until the developing solution has been exhausted to a tolerance limit of sensitivity variations and an amount of replenishment (proper amount of replenishment) (Rp) necessary for the sensitivity at that time to be restored to the sensitivity of the fresh solution.
- negative-working presensitized lithographic printing plates are processed to similarly determine a total plate area (An) of the plates processed until the developing solution has been exhausted to a tolerance limit of sensitivity variations and a proper amount of replenishment (Rn) for the exhausted solution.
- the amount of replenishment per plate area of the plates processed is expressed by Rp/Ap in the case of the positive-working presensitized lithographic printing plate, and Rn/An in the case of the negative-working presensitized lithographic printing plate.
- the transport speed i.e., developing time
- an experiment similar to the above may be carried out on a plurality of standard transport speeds, and the conditions under which best results have been obtained maybe employed.
- the presensitized lithographic printing plate to which the present invention can be applied may include those comprising a support having a hydrophilic surface, provided on this surface with a layer of a photosensitive composition as shown below.
- the diazo compound contained in this photosensitive composition may include diazo resins as typified by, for example, a condensate of an aromatic diazonium salt with formaldehyde or acetaldehyde. It may include, for example, a diazo resin which is a salt of a condensate of p-diazodiphenylamine with formaldehyde or acetaldehyde, e.g., a hexafluoroborophosphate, tetrafluoroborophosphate, perchlorate or periodate of the above condensate; and a diazo resin organic salt which is a reaction product of the above condensate and a sulfonate, as disclosed in U.S. Pat. No.
- compositions in which a diazo resin is used in combination with a binder may also include compositions in which a diazo resin is used in combination with a binder.
- Various polymeric compounds can be used as the binder, including a copolymer of a monomer having an aromatic hydroxyl group as disclosed in Japanese Patent Publication Open to Public Inspection (hereinafter referred to as Japanese Patent O.P.I. Publication) No.
- the negative-working presensitized lithographic printing plate comprises a support and, provided thereon, a light-sensitive layer comprising a diazo resin.
- a photosensitive composition containing an o-quinonediazide compound may include compositions in which an o-quinonediazide compound and an alkali-soluble resin are used in combination.
- the positive-working presensitized lithographic printing plate comprises a support and, provided thereon, a light-sensitive layer comprising o-naphthoquinonediazide.
- the o-quinonediazide compound may include an ester compound of, e.g., o-naphthoquinonediazidosulfonic acid with a polycondensation resin of a phenol with an aldehyde or a ketone.
- the above phenol may include, for example, monohydric phenols such as phenol, o-cresol, m-cresol, p-cresol, 3,5-xylenol, carvacrol and thymol; dihydric phenols such as catechol, resorcinol and hydroquinone; and trihydric phenols such as pyrogallol and phloroglucinol.
- the above aldehyde may include formaldehyde, benzaldehyde, acetaldehyde, crotonaldehyde and furfural.
- the above ketone may include acetone and methyl ethyl ketone.
- the above polycondensation resin may specifically include phenol/formaldehyde resin, m-cresol/formaldehyde resin, m-, p-mixed cresol/formaldehyde resin, resorcinol/benzaldehyde resin, and pyrogallol/acetone resin.
- the above o-naphthoquinonediazide compound may include those in which the rate of condensation of o-naphthoquinonediazidosulfonic acid with respect to the OH group of a phenol (a conversion per one OH group) is 15% to 80%.
- the o-quinonediazide compound that can be used may also include those disclosed in Japanese Patent O.P.I. Publication No. 43451/1983.
- the support may include paper, plastic-laminated paper as exemplified by polyethylene-, polypropylene- or polystyrene-laminated paper, sheets of metals such as aluminum (including aluminum alloys), zinc and copper, films of plastics such as cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate and polyvinyl acetal, and paper to or on which any of the metals described above is laminated or deposited, or steel sheets coated with chromium.
- plastic-laminated paper as exemplified by polyethylene-, polypropylene- or polystyrene-laminated paper
- sheets of metals such as aluminum (including aluminum alloys), zinc and copper
- films of plastics such as cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate and polyvinyl acetal, and paper to or on which
- the support may also include those comprising an aluminum material having been subjected to surface roughening for the purpose of improving water retension and also improving adhesion to a photosensitive layer.
- the surface roughening may be carried out by a conventionally known method such as brushing, ball etching, electrolytic etching, chemical etching, liquid honing or sand blasting, and a combination of any of these.
- At least one repeatedly usable developing solution used in the present invention is preferably an alkaline developing solution comprised of water as a main solvent (stated specifically, comprised of 50% by weight or more of water) which is a negative/positive common developing solution.
- This developing solution and a replenishing solution therefor may each preferably be an alkaline water-based developing solution with pH 10 or more, and preferably pH 12 or more, containing an alkali silicate and also containing at least one of an organic solvent and a surface active agent.
- the alkali silicate may include, for example, potassium silicate, sodium silicate, sodium metasilicate, potassium metasilicate and ammonium silicate.
- the alkali silicate may preferably be contained in the developing solution in an amount ranging from 0.3 to 10% by weight.
- the alkali silicate may be in an amount ranging from 0.1 to 7.0% by weight in terms of SiO 2 concentration.
- an alkali agent other than the alkali silicate can be used in combination.
- an inorganic alkali agent such as potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium tertiary phosphate, sodium secondary phosphate, potassium tertiary phosphate, potassium secondary phosphate, ammonium tertiary phosphate, ammonium secondary phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate or ammonium carbonate, and an organic alkali agent such as mono-, di- or triethanolamine or a tetraalkyl hydroxide can be used in combination.
- An organic solvent or a surface active agent is preferably added to the developing solution and the replenishing solution used in the present invention.
- the organic solvent may preferably be those having a solubility to water at 20° C., of not less than 10% by weight, including, for example, carboxylic acid esters such as ethyl acetate, propyl acetate, butyl acetate.
- These organic solvents may each be used alone or in combination of two or more kinds.
- the surface active agent that can be used may be at least one selected from a nonionic surface active agent, an anionic surface active agent, a cationic surface active agent and an amphoteric surface active agent. It may preferably be a nonionic surface active agent.
- the nonionic surface active agent can be roughly grouped into polyethylene glycol types and polyhydric alcohol types, both of which can be used. From the viewpoint of development performance, nonionic surface active agents of a polyethylene glycol type are preferred, among which more preferred is a nonionic surface active agent having three or more ethylene oxy groups and also having an ULB value (HLV is the abbreviation for hydrophile-lipophile balance) of not less than 5, and more preferably from 8 to 20.
- HBV is the abbreviation for hydrophile-lipophile balance
- nonionic surface active agents those having both an ethylene oxy group and a propylene oxy group are particularly preferred, among which those having an HLB value of not less than 8 are more preferred.
- nonionic surface active agent include the compounds represented by the following
- R represents a hydrogen atom or a monovalent organic group.
- Such an organic group may include, for example, a straight-chain or branched alkyl group having 1 to 30 carbon atoms which may have a substituent as exemplified by an aryl group such as phenyl, an alkylcarbonyl group in which the alkyl moiety is the same as the above alkyl group, and a phenyl group which may have a substituent as exemplified by a hydroxyl group and the same alkyl group as the above.
- the letter symbols a, b, c, m, n, x and y each represent an integer of 1 to 40.
- the nonionic surface active agent may preferably have a weight average molecular weight ranging from 300 to 10,000, and particularly preferably from 500 to 5,000.
- the anionic surface active agent may include higher alcohol (C 8 to C 22 ) sulfuric acid ester salts as exemplified by a sodium salt of lauryl alcohol sulfate, a sodium salt of octyl alcohol sulfate, an ammonium salt of lauryl alcohol sulfate, Teepol-81 (trade name; available from Shell Kagaku K.K.) and a disodium alkylsulfate, aliphatic alcohol phosphoric acid ester salts as exemplified by a sodium salt of cetyl alcohol phosphoric acid ester, alkylaryl sulfonic acid salts as exemplified by a sodium salt of dodecylbenzenesulfonic acid, a sodium salt of isopropylnaphthalenesulfonic acid, a sodium salt of dinaphthalenedisulfonic acid and a sodium salt of metanitrobenzenesulfonic acid, sulfonates of alkylamides as
- the cationic surface active agent can be roughly grouped into amine types and quaternary ammonium salt types, both of which can be used.
- Examples of the amine types are a polyoxyethylene alkylamine, a N-alkylpopyleneamine, a N-alkylpolyethylene polyamine, a N-alkylpolyethylene polyamine dimethyl sulfate, an alkylbiguanide, a long-chain amine oxide, an alkylimidazoline, a 1-hydroxyethyl-2-alkylimidazoline, a 1-acetylaminoethyl-2-alkylimidazoline and a 2-alkyl-4-methyl-4-hydroxymethyloxazoline.
- Examples of the quaternary ammonium salt types are a long-chain primary amine salt, an alkyltrimethylammonium salt, a dialkyldimethylethylammonium salt, an alkyldimethylammonium salt, an alkyldimethylbenzylammonium salt, an alkylpyridinium salt, an alkylquinolinium salt, an alkyl isoquinolinium salt, an alkylpyridinium sulfate, a stearamidomethylpyridinium salt, an acylaminoethyl diethylamine salt, an acylaminoethyl methyldiethylammonium salt, an alkylamidopropyl dimethylbenzylammonium salt, a fatty acid polyethylene polyamide, an acylaminoethylpyridinium salt, an acylcolaminoformylmethylpyridinium salt, a stearoxymethylpyridinium salt, a fatty acid
- alkyl represents a straight-chain or partially substituted alkyl having 6 to 20 carbon atoms, where, stated specifically, straight-chain alkyls such as hexyl, octyl, cetyl and stearyl are preferably used.
- cationic surface active agents of a water-soluble quaternary ammonium type are effective, among which preferred are an alkyltrimethylammonium salt, an alkyldimethylbenzylammonium salt, an ethylene oxide addition ammonium salt and so forth.
- Polymers having a cationic component as a repeating unit can also be grouped into a cationic surface active agent in a broad sense, and are included in the cationic surface active agent of this invention.
- a polymer containing a quaternary ammonium salt, obtained by copolymerization with a lipophilic monomer can preferably be used.
- Such a polymer may have a weight average molecular weight ranging from 300 to 50,000, and particularly preferably from 500 to 5,000.
- amphoteric surface active agent it is possible to use a compound as exemplified by sodium N-methyl-N-pentadecylaminoacetate.
- These surface active agents may each preferably be contained in the developing solution in an amount ranging from 0.5 to 10% by weight.
- an inorganic reducing agent, an organic reducing agent or an organic carboxylic acid may be added to the negative/positive common developing solution and the replenishing solution used in the present invention.
- the inorganic reducing agent may include, for example, sulfites such as sodium sulfite, potassium sulfite, ammonium sulfite, sodium hydrogensulfite and potassium hydrogensulfite; phosphites such as sodium phosphite, potassium phosphite, sodium hydrogenphosphite, potassium hydrogenphosphite, sodium dihydrogenphosphite and dipotassium hydrogenphosphite; hydrazine, sodium thiosulfate and sodium dithiosulfite. Reducing agents that can bring about a particularly superior effect are sulfites. These sulfites may be contained in an amount ranging from 0.1% by weight to 10% by weight, and preferably from 0.5% by weight to 5% by weight.
- the developing solution and the replenishing solution therefor may also contain other known additives as exemplified by a water-soluble or alkali-soluble organic reducing agent, an organic carboxylic acid and salts thereof.
- the organic reducing agent may include, for example, phenolic compounds such as hydroquinone, methol and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine.
- the organic carboxylic acid may include aliphatic carboxylic acids having 6 to 20 carbon atoms, and aromatic carboxylic acids comprising a benzene ring or naphthalene ring on which a carboxylic group is substituted.
- the aliphatic carboxylic acids may preferably be alkanoic acids having 6 to 20 carbon atoms, specifically including caproic acid, enanthylic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid and stearic acid. Alkanoic acids having 6 to 12 carbon atoms are particularly preferred. Fatty acids having a double bond in the carbon chain or those having a branched carbon chain are also available.
- the above aliphatic carboxylic acids may be used in the form of sodium or potassium salts or ammonium salts.
- Specific compounds of the aromatic carboxylic acids may include benzoic acid, o-chlorobenzoic acid, p-chlorobenzoic acid, o-hydroxybenzoic acid, p-hydroxybenzoic acid, p-t-butylbenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-1-naphthoic acid, 1-naphthoic acid and 2-naphthoic acid.
- aromatic carboxylic acids may be used in the form of sodium or potassium salts or ammonium salts.
- the aliphatic carboxylic acid or aromatic carboxylic acid may be contained in an amount of 0.1% by weight to 10% by weight.
- the following additives may be added to the above components so that development performance can be improved.
- They include, for example, neutral salts such as NaCl, KCl and KBr, as disclosed in Japanese Patent O.P.I. Publication No. 75152/1983; chelating agents such as EDTA and NTA, as disclosed in Japanese Patent O.P.I. Publication No. 190952/1984; complexes such as [Co(NH 3 )] 6 Cl 3 , as disclosed in Japanese Patent O.P.I. Publication No. 121336/1984; polymeric ampholytes such as a copolymer of vinylbenzyl trimethylammonium chloride with sodium acrylate, as disclosed in Japanese Patent O.P.I.
- the negative/positive common developing solution used in the method of the present invention may also include the developing solutions as disclosed in Japanese Patent O.P.I. publications No. 24263/1987, No. 24264/1987, No. 25761/1987, No. 35351/1987, No. 75535/1987, No. 89060/1987, No. 125357/1987, No. 133460/1987, No. 159148/1987, No. 168160/1987, No. 175758/1987, No. 200154/1988 and No. 205658/1988.
- the replenishing solution added to the repeatedly usable developing solution may preferably be supplied for both the processing exhaustion and the exhaustion with time.
- the reflection density of the surface of a photosensitive layer which is measured for the purpose of discriminating the difference in type, may be measured at any part of a presensitized lithographic printing plate. It may preferably be measured at a position within 5 cm from the edge of a presensitized lithographic printing plate, and more preferably at a position within 4 cm from the front edge or rear edge in the transport direction of a presensitized lithographic printing plate.
- the above part corresponds to the exposed portion in the case of the negative-working presensitized lithographic printing plate and to the unexposed portion in the case of the negative-working presensitized lithographic printing plate and hence is preferable for the measurement of reflection density on the surface of the photosensitive layer at its exposed portion in the case of the positive-working presensitized lithographic printing plate and at its unexposed portion in the case of the negative-working presensitized lithographic printing plate.
- the following developing solution (24 liters) was put in the developing solution tank 14 of the automatic processor as shown in FIG. 1, and the following developer replenishing solution, in the developer replenishing solution tank 20.
- a JIS-1050 aluminum plate of 0.24 mm in thickness was immersed in an aqueous 2% sodium hydroxide solution to carry out degreasing. Thereafter, the plate was roughened by an electrochemical means in a diluted nitric acid solution, and then thoroughly cleaned, which was thereafter subjected to anodizing in a diluted sulfuric acid solution. An oxide coating of 2.5 g/m 2 was thus formed on the surface of the above aluminum plate.
- the aluminum plate thus treated was washed with water, and dried. Thereafter, a photosensitive solution having the following composition was coated thereon so as to give a dry weight of 2.5 g/m 2 , and dried to give a positive-working presensitized lithographic printing plate plate.
- the positive-working presensitized lithographic printing plate thus obtained was made ready for use in a large number, brought into close contact with a transparent positive film and a sensitivity-measuring step tablet (No. 2, available from Eastman Kodak Co.; a gray scale with 21 stages having each density difference of 0.15), and then exposed to light for 60 seconds with a distance of 70 cm under conditions of 8.0 mW/cm 2 , using a 2 kW metal halide lamp (trade name: Idolfin 2000; manufactured by Iwasaki Electric Co., Ltd.) as a light source.
- a JIS-1050 aluminum plate of 0.24 mm in thickness was immersed in an aqueous 20% sodium phosphate solution to carry out degreasing. Thereafter, the plate was roughened by an electrochemical means in a diluted hydrochloric acid solution, and then thoroughly cleaned, which was thereafter subjected to anodizing in a diluted sulfuric acid solution. An oxide coating of 1.5 g/m 2 was thus formed on the surface of the above aluminum plate.
- the aluminum plate thus treated was further immersed in an aqueous sodium metasilicate solution to carry out sealing of the anodic oxide coating, then washed with water, and dried. Thereafter, a photosensitive solution having the following composition was coated thereon so as to give a dry weight of 2.0 g/m 2 , and dried to give a negative-working presensitized lithographic printing plate.
- the negative-working presensitized lithographic printing plate thus obtained was made ready for use in a large number, brought into close contact with a transparent positive film and a sensitivity-measuring step tablet (No. 2, available from Eastman Kodak Co.; a gray scale with 21 stages having each density difference of 0.15), and then exposed to light for 30 seconds with a distance of 70 cm under conditions of 8.0 mW/cm 2 , using a 2 kW metal halide lamp (trade name: Idolfin 2000; manufactured by Iwasaki Electric Co., Ltd.) as a light source.
- the detection conducted by means of the discriminating reflection sensor 33 was so set as to be carried out 2 seconds after the detection by means of the planimetric reflection sensor 30 was conducted.
- the reflection density of the positive-working presensitized lithographic printing plate was measured at its exposed portion, and that of the negative-working presensitized lithographic printing plate at its unexposed portion.
- the reflection density was less than 0.7, a plate was identified as the positive-working presensitized lithographic printing plate, and when it was 0.7 or more, identified as the negative-working presensitized lithographic printing plate.
- the developing solution (24 liters) was put in the developing solution tank 14a. Temperature of the developing solution was maintained at 30° C., and developing time was set to 12 seconds for the positive-working presensitized lithographic printing plate and 20 seconds for the negative-working presensitized lithographic printing plate.
- the detection conducted by means of the discriminating reflection sensor 33 was so set as to be carried out 1 second after the detection by means of the planimetric reflection sensor 30 was conducted.
- the reflection density of the positive-working presensitized lithographic printing plate was measured at its exposed portion, and that of the negative-working presensitized lithographic printing plate at its unexposed portion.
- the reflection density was less than 0.65, a plate was identified as the positive-working presensitized lithographic printing plate, and when it was 0.65 or more, identified as the negative-working presensitized lithographic printing plate.
- Example 2 An experiment was carried out in the same manner as in Example 1 except that the discriminating reflection sensor 33 was removed and the replenishment for processing exhaustion was carried out in an amount of 51 ml/m 2 each for both a negative-working presensitized lithographic printing plate and a positive-working presensitized lithographic printing plate. As a result, faulty development occurred in the 200th positive-working presensitized lithographic printing plate, which caused a stain in print.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2-291134 | 1990-10-29 | ||
| JP2291134A JPH04163556A (ja) | 1990-10-29 | 1990-10-29 | 感光性平版印刷版の処理方法及び処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US5217848A true US5217848A (en) | 1993-06-08 |
Family
ID=17764892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/783,117 Expired - Fee Related US5217848A (en) | 1990-10-29 | 1991-10-25 | Method and apparatus for processing presensitized lithographic printing plate |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5217848A (de) |
| EP (1) | EP0484087B1 (de) |
| JP (1) | JPH04163556A (de) |
| DE (1) | DE69123943T2 (de) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5701542A (en) * | 1995-09-29 | 1997-12-23 | Fuji Photo Film Co., Ltd. | Automatic developing apparatus for photosensitive lithographic printing plates |
| US5716743A (en) * | 1992-02-17 | 1998-02-10 | Agfa-Gevaert Ag | Process and apparatus for developing radiation-sensitive, exposed printing forms |
| US5853963A (en) * | 1997-08-11 | 1998-12-29 | Applied Chemical Technologies, Inc. | Life extension of photoresist developer solutions |
| US5922522A (en) * | 1998-04-29 | 1999-07-13 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US6063550A (en) * | 1998-04-29 | 2000-05-16 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US6107009A (en) * | 1998-04-15 | 2000-08-22 | Tan; Zoilo Cheng Ho | Photoresist developer and method |
| US6138566A (en) * | 1997-09-30 | 2000-10-31 | Dainippon Screen Meg Co., Ltd | Method and apparatus for developing printing plates in press |
| US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
| US6241401B1 (en) * | 1998-03-03 | 2001-06-05 | Fuji Photo Film Co., Ltd. | Image forming apparatus |
| US6432211B1 (en) * | 1997-06-24 | 2002-08-13 | Heidelberger Druckmaschinen A.G. | Method of cleaning a printing form and cleaning fluid therefor |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| US6562555B2 (en) * | 2001-08-01 | 2003-05-13 | Kodak Polychrome Graphics Llc | Method for developing lithographic printing plate precursors using a coating attack-suppressing agent |
| US20050089804A1 (en) * | 2001-07-04 | 2005-04-28 | Fuji Photo Film Co., Ltd. | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate |
| US20050162505A1 (en) * | 2004-01-28 | 2005-07-28 | Shimazu Ken-Ichi | Method for developing multilayer imageable elements |
| US20090197206A1 (en) * | 2008-01-25 | 2009-08-06 | Ray Kevin B | Method of making images using fresh processing solution |
| US20220291588A1 (en) * | 2019-11-26 | 2022-09-15 | Fujifilm Corporation | Treatment device and treatment method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2306697A (en) * | 1995-11-02 | 1997-05-07 | Horsell Graphic Ind Ltd | Plate processing |
| EP1099981B1 (de) * | 1999-11-09 | 2012-10-03 | FUJIFILM Corporation | Entwicklungsvorrichtung für lichtempfindliches Material |
| US8534937B2 (en) | 2009-10-19 | 2013-09-17 | Eastman Kodak Company | Plate developer with a configurable transport path |
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| EP0084097A2 (de) * | 1981-11-30 | 1983-07-27 | Fuji Photo Film Co., Ltd. | Verfahren zum Auffüllen des Entwicklers während dem Entwickeln photoempfindlicher Platten in einem automatischen Entwicklungsgerät |
| JPS6223044A (ja) * | 1985-07-22 | 1987-01-31 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版の処理方法 |
| JPS6278558A (ja) * | 1985-10-01 | 1987-04-10 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版の処理方法 |
| EP0247835A2 (de) * | 1986-05-27 | 1987-12-02 | Konica Corporation | Verfahren zur Behandlung von vorsensibilisierten Flachdruckplatten und Vorrichtung dazu |
| JPH0391750A (ja) * | 1989-09-04 | 1991-04-17 | Konica Corp | 感光性平版印刷版の処理方法 |
| EP0423782A2 (de) * | 1989-10-20 | 1991-04-24 | Konica Corporation | Behandlungsgerät für vorsensibilisierte Flachdruckplatten |
| US5106724A (en) * | 1987-02-16 | 1992-04-21 | Konica Corporation | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive-type and developer composition for light-sensitive material |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02256053A (ja) * | 1989-03-29 | 1990-10-16 | Konica Corp | 感光性平版印刷版の現像処理方法 |
-
1990
- 1990-10-29 JP JP2291134A patent/JPH04163556A/ja active Pending
-
1991
- 1991-10-25 US US07/783,117 patent/US5217848A/en not_active Expired - Fee Related
- 1991-10-29 DE DE69123943T patent/DE69123943T2/de not_active Expired - Fee Related
- 1991-10-29 EP EP91309953A patent/EP0484087B1/de not_active Expired - Lifetime
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| JPH0391750A (ja) * | 1989-09-04 | 1991-04-17 | Konica Corp | 感光性平版印刷版の処理方法 |
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Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5716743A (en) * | 1992-02-17 | 1998-02-10 | Agfa-Gevaert Ag | Process and apparatus for developing radiation-sensitive, exposed printing forms |
| US5930547A (en) * | 1992-02-17 | 1999-07-27 | Agfa-Gevaert Ag | Process and apparatus for developing radiation-sensitive, exposed printing forms |
| US5701542A (en) * | 1995-09-29 | 1997-12-23 | Fuji Photo Film Co., Ltd. | Automatic developing apparatus for photosensitive lithographic printing plates |
| US6432211B1 (en) * | 1997-06-24 | 2002-08-13 | Heidelberger Druckmaschinen A.G. | Method of cleaning a printing form and cleaning fluid therefor |
| US5853963A (en) * | 1997-08-11 | 1998-12-29 | Applied Chemical Technologies, Inc. | Life extension of photoresist developer solutions |
| US6138566A (en) * | 1997-09-30 | 2000-10-31 | Dainippon Screen Meg Co., Ltd | Method and apparatus for developing printing plates in press |
| US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
| US6241401B1 (en) * | 1998-03-03 | 2001-06-05 | Fuji Photo Film Co., Ltd. | Image forming apparatus |
| US6107009A (en) * | 1998-04-15 | 2000-08-22 | Tan; Zoilo Cheng Ho | Photoresist developer and method |
| US6200736B1 (en) * | 1998-04-15 | 2001-03-13 | Etec Systems, Inc. | Photoresist developer and method |
| US6063550A (en) * | 1998-04-29 | 2000-05-16 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US5922522A (en) * | 1998-04-29 | 1999-07-13 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
| US20050089804A1 (en) * | 2001-07-04 | 2005-04-28 | Fuji Photo Film Co., Ltd. | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate |
| US6562555B2 (en) * | 2001-08-01 | 2003-05-13 | Kodak Polychrome Graphics Llc | Method for developing lithographic printing plate precursors using a coating attack-suppressing agent |
| US20050162505A1 (en) * | 2004-01-28 | 2005-07-28 | Shimazu Ken-Ichi | Method for developing multilayer imageable elements |
| US6992688B2 (en) | 2004-01-28 | 2006-01-31 | Eastman Kodak Company | Method for developing multilayer imageable elements |
| US20090197206A1 (en) * | 2008-01-25 | 2009-08-06 | Ray Kevin B | Method of making images using fresh processing solution |
| US20220291588A1 (en) * | 2019-11-26 | 2022-09-15 | Fujifilm Corporation | Treatment device and treatment method |
| US11940733B2 (en) * | 2019-11-26 | 2024-03-26 | Fujifilm Corporation | Treatment device and treatment method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04163556A (ja) | 1992-06-09 |
| EP0484087A3 (en) | 1992-11-25 |
| EP0484087A2 (de) | 1992-05-06 |
| DE69123943D1 (de) | 1997-02-13 |
| EP0484087B1 (de) | 1997-01-02 |
| DE69123943T2 (de) | 1997-05-22 |
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