WO1996010218A1 - Photosensitive composition and photosensitive rubber plate - Google Patents
Photosensitive composition and photosensitive rubber plate Download PDFInfo
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- WO1996010218A1 WO1996010218A1 PCT/JP1995/001923 JP9501923W WO9610218A1 WO 1996010218 A1 WO1996010218 A1 WO 1996010218A1 JP 9501923 W JP9501923 W JP 9501923W WO 9610218 A1 WO9610218 A1 WO 9610218A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Definitions
- the present invention relates to a photosensitive rubber plate and a photostimulable composition. More specifically, the present invention relates to a photosensitive rubber which is excellent in transparency and temperature balance and has a high water washing rate after exposure, and a photosensitive composition for obtaining the same.
- Flexographic printing RS is manufactured by adhering a negative film to the surface of a photosensitive plate, irradiating it with actinic light, K-lighting a part of the light latent, and then washing and removing the unlighted part to form a relief. Is done. Further, as a cleaning solvent used for cleaning an unexposed portion, a conventional organic solvent is being converted to an aqueous solvent which is less likely to cause environmental pollution.
- a flexographic printing plate as the luminous lumber slope ffl optical layer lumber has excellent transparency to allow light to reach the depths of the photosensitive layer, and has excellent adhesion to the SI object and the plate itself. It is excellent in balance with the temperature (hereinafter sometimes referred to as the temperature balance). To facilitate the formation of the relief after the B light, a high water washing speed is required.
- the photosensitive layer is made mainly of a thermoplastic elastomer such as a styrene-butadiene block copolymer or a styrene-soprene block copolymer or a hydrophilic copolymer, and a photopolymerizable ethylenically unsaturated unit.
- a thermoplastic elastomer such as a styrene-butadiene block copolymer or a styrene-soprene block copolymer or a hydrophilic copolymer
- a photopolymerizable ethylenically unsaturated unit There is known an efficacious elastomer composition containing a composition and a photopolymerization initiator.
- the ffi-light rubber plate using this photosensitive elastomer composition is inferior in transparency, poor in intensity balance, and slow in water washing after exposure.
- Another object of the present invention is to provide a photosensitive rubber plate which is excellent in transparency and temperature balance and has a high water washing rate after exposure, and a photosensitive composition for obtaining the same.
- the present inventors have conducted extensive research in order to apprehend the above-mentioned purpose, and have found that styrene-butadiene having a high content of a hydrophilic copolymer and a conjugated gen monomer unit having a large number of bullet bonds. It has been found that ⁇ -light rubber, which is a light-sensitive composition containing styrene-co-polymer, is excellent in W permeability and temperature balance, and has a high water-washing speed after light. Based on the above, the present invention has been completed.
- At least one polymer block composed of a polymer having 95% by weight or more of an aromatic vinyl monomer as a constitutional unit and at least 2 OS amount% or more of a synergistic agent
- At least one polymer block B composed of a conjugated gen-based polymer having a monomer as a constitutional unit and having a bulge bond content of 157-170% in the conjugated gen monomer unit portion is used.
- Block copolymer having 20 to 65 parts by weight
- an optical rubber slope having a laminated structure comprising a support and a layer of a photoluminescent composition formed on a main surface thereof.
- the photosensitive composition of the present invention contains a block copolymer, a hydrophilic copolymer, a photopolymerizable ethylenically unsaturated monomer, and a photopolymerization initiator.
- the block copolymer which is the first component of the photosensitive composition of the present invention, comprises a polymer block A composed of a polymer having an aromatic vinyl monomer as a main constituent unit, and a conjugated diene monomer.
- a polymer conjugate B comprising a conjugated gen-based polymer having a vinyl conjugate content of 15 to 70% as a constituent unit and the conjugated gen monomer unit portion.
- the polymer processor A constituting the block copolymer is a polymer having a unitary aromatic vinyl unit as a main constituent unit.
- aromatic vinyl single polymer examples include styrene, ⁇ -methylstyrene, 0-methylstyrene, m-methylstyrene, p-methylstyrene, p-tert-butylstyrene, 1,3-dimethylstyrene, vinyltoluene, chlorostyrene, vinylnaphthalene, Buranthracene and the like.
- a single aromatic S-body Styrene is preferred.
- the amount of the aromatic butyl monomer constituting the polymer block A is 95% by weight or more, preferably 9.9% by weight or more, based on all the single units constituting the polymer block A. .
- the monomers other than the aromatic vinyl monomer constituting the polymer block A are not particularly limited.
- the weight average molecule S of the polymer block A is usually from 3,000 to 200,000, preferably from 8,000 to 100,000.
- the glass transition temperature of the polymer block A is usually 25 or more, preferably 50 or more.
- the polymer block B constituting the block copolymer comprises a polymer having a conjugated diene monomer as an essential constituent unit. That is, the polymer block B is made of a homopolymer of a conjugated diene single S-form or a copolymer of a conjugated diene single-form and an ethylenically unsaturated unitary monomer copolymerizable therewith.
- S of the conjugated genomic unit constituting the polymer block B is 20% by weight or more, preferably 40% by weight or more, based on all the monomer units constituting the polymer block B. More preferably, it is 70% by weight or more. If the content is less than 20% by weight, the sensitivity balance of the photosensitive rubber plate obtained using the photosensitive composition will be poor.
- conjugated diene monomer examples include 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 1,3-hexadiene, and chloroprene. Of these conjugated diene monomers, butadiene and isoprene are preferred.
- ethylenically unsaturated monomers copolymerizable with conjugated gen monomers include styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, p-tert-butylstyrene, 1,3-dimethylstyrene, vinyl toluene, chlorostyrene, and virnaf Aromatic vinyl monomers such as taren and buruanthracene; methyl acrylate, ethyl acrylate, propyl acrylate, n-amyl acrylate, isoamyl acrylate, hexyl acrylate, Ethylhexyl acrylate, octyl acrylate, hydroxyshethyl acrylate, hydroxypropyl acrylate, glycidyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate
- Polymer block B is a polymer conjugated monomer unit
- the weight of the metal bond is 15 to 70%, preferably 25 to 55%. If the content of the bullet stake is less than 15%, the transparency of S-light rubber sales will decrease, the strength balance will decrease, and the water washing speed will decrease. If it exceeds 70%, the viscosity of the light rubber decreases.
- the vinyl bond content is defined as one of the conjugated diene monomers incorporated in the polymer block ⁇ in a 1,2-bonded, 3,4-bonded or 4-bonded bonding mode. These are conjugates of conjugated diene monomers incorporated in the 1, 2, and 3 and 4 bond modes.
- the value of the Bull bond content is a value measured using a nuclear magnetic resonance apparatus.
- the weight average molecular weight of the polymer block is usually from 5,000 to 500,000, preferably from 10,000 to 300,000.
- the glass transition temperature S of the polymer block is 10 or less, preferably 0 or less.
- the glass transition temperature is a value measured by TDC or the like for a polymer obtained by polymerizing a monomer composition constituting the polymer pro-V or ⁇ alone.
- Block copolymers generally have an overall weight average molecular weight of 8,000-2,000. Million, preferably 18,000-1,000,000.
- the weight-average molecular weight is measured using gel permeation chromatography (hereinafter, abbreviated as GPC) and converted to the molecular weight of standard polystyrene.
- GPC gel permeation chromatography
- the average molecular weight of polymer block A or B is determined by measuring the weight average molecular weight after each formation of polymer block A or B that constitutes the block copolymer, and the overlapping average molecular weight between each stage It was determined from the increase.
- the block copolymer which is the first component of the photosensitive composition of the present invention, is not limited by the combination structure of the polymer block A and the polymer block B.
- A is a polymer block A and B is a polymer block 8
- X is a residue of a coupling agent or a polyfunctional ion polymerization initiator
- n is 1 or more, preferably an integer of 1 to 5
- m is 2 or more, preferably 2 to 5
- the coupling agent include tin tetrachloride, silicon tetrachloride, epoxidized esters
- the block copolymer used in the present invention can be usually obtained by polymerizing the single unit using a polymerization initiator such as an organolithium compound. Specifically, a monomer mixture mainly composed of a single unit of an aromatic bullet is superimposed to form a polymer process A, and a single unit containing a drawn conjugated diene monomer as an essential component The polymer mixture is added and polymerized to form a polymer block B which is in contact with the molecular terminal of the polymer block A, and then a single aromatic fibrous substance is added and the polymer block is laid on the base to form the polymer block. Forming another polymer block A that contacts school B, or forming polymer block A and polymer block B that comes into contact with it as described above, and then adding a coupling agent, etc. It can be obtained by the method.
- a polymerization initiator such as an organolithium compound.
- Bulle bond content of the polymer pro v click B » ⁇ is not limited by the means. Usually, a wax or seed of a polar compound used when polymerizing polymer Prop B is obtained. And by controlling the polymerization temperature and the like.
- the bulk of the block copolymer in the photosensitive composition of the present invention is 20 to 65 parts by weight, preferably 25 to 25 parts by weight, based on 100 parts by weight of the total amount of the block copolymer and the later hydrophilic copolymer S. It is about 55 parts by weight, more preferably 30 to 45 parts by weight. If the amount exceeds 65 parts by weight, the washing speed of the photosensitive rubber obtained using the photosensitive composition with water decreases. Conversely, if less than 20 parts by weight, the processability of the luminous composition and the water-based ink resistance of the photosensitive rubber JS are reduced.
- the second component is a hydrophilic copolymer of the photosensitive composition of the present invention, as a pen Dan to its own molecular chain, primary OH groups, one COOH group, one CN group, one NHs group, one S0 3 H group
- a hydrophilic group such as an SOsH group, a PO (OH) 2 group and a PO (OH)-group, and preferably an acid ester group such as a PO (OH) 2 group or a PO (OH)-group are those that combine.
- the hydrophilic copolymer is usually obtained by radical copolymerization of an ethylenically unsaturated unit having a proteophilic group and a monomer copolymerizable therewith.
- Ethylenically unsaturated monocarboxylic acids having a hydrophilic group include ethylenically unsaturated monocarboxylic acids such as acrylic acid and methacrylic acid; and ethylenically unsaturated monocarboxylic acids such as maleic acid, fumaric acid, citraconic acid and itaconic acid.
- Polycarboxylic acids Partially esterified ethylenically unsaturated polycarboxylic acids, such as monoethyl maleate and pentamethyl methyl itaconate; Hydroxicetyl acrylate, Hydroxybutyl acrylate, Pill of methacrylic acid Droxityl, hydroxypropyl methacrylate; methyl cyanuric acid monomers such as methacrylotriyl and acrylonitrile; ethylene acrylate, trimethylene phthalate, acid prothrate Pyrene acrylate, tetramethylene diacrylate, »acid (bis) ethylene acrylate, « acid (bi ) Trimethylene acrylate, phosphoric acid (bis) tetramethylene acrylate, »Diethylene glycol acrylate, » Acid triethylene glycol acrylate, »Polyethylene glycol acrylate,» Acid Processes containing acid ester groups such as (bis) diethylene glycol acrylate, acid (bis) triethylene glycol
- Ethylene having these hydrophilic groups Among the unsaturated unsaturated monomers, ethylenic unsaturated monoisomers containing an acid ester group, in particular, acid ethylene acrylate, acid propylene acrylate, puric acid (bis) ethylene phthalate, acid (bis) propylene Attalylate and the corresponding methacrylate are preferred.
- S of the ethylenically unsaturated unit having a hydrophilic group is usually 5 to 30% by weight, preferably 5 to 20% by weight of all monomers used for obtaining the hydrophilic copolymer. %. If the content is less than 5% by weight, the water washing rate of the photosensitive rubber JK obtained using the photosensitive composition tends to decrease. If the content exceeds 30% by weight, the processability of the photosensitive composition and the water-based ink resistance of the photosensitive rubber tend to decrease.
- Monomers that can be co-polymerized with the ethylenically unsaturated unit having a hydrophilic group include styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, p-tert-butylstyrene, 1,3-dimethylstyrene, Aromatic mononuclear waxes such as toluene, black styrene, vinylnaphthalene, vinylanthracene, bieberbenzene, and triphenylbenzene; methyl acrylate, methyl acrylate, ethyl acrylate, acrylate, and acrylyl Acid n-amyl, isoamyl acrylate, hexyl acrylate, ethyl hexyl acrylate, octyl acrylate, acrylic glycidyl, methyl methacrylate, methyl methacrylate Me
- S-forms which can be co-mounted with a monomer having a hydrophilic group, in order to improve the criticality balance of the photosensitive rubber plate, a single conjugated gen, particularly 1,3-butadiene or isoprene Is preferably used.
- Conjugation; S of the monomer is usually 40 to 90% by weight, preferably 50 to 80% by weight, based on the total unit used to obtain the hydrophilic copolymer. . If the amount is less than 40% by weight, the strength of the photosensitive rubber plate is reduced. 90 fold If it exceeds ⁇ %, the water washing speed of photosensitive rubber sales decreases.
- a polyfunctional ethylenically unsaturated unit is preferably used.
- the polyfunctional ethylenically unsaturated monomers include atrial acid esters of polyhydric alcohols such as ethylene glycol diatalate, trimethylol brondiate reatelate, and propylene glycol diacrylate, and corresponding methacrylic acid esters.
- Multifunctional aromatic butyl monomers such as dibutylbenzene and tributylbenzene.
- polyfunctional ethylenically unsaturated monomers ethylene glycol dimethacrylate or divinylbenzene is preferred.
- the amount of the polyfunctional ethylenically unsaturated monomer is usually not more than 10% by weight of the total monomer used for obtaining the hydrophilic copolymer.
- the hydrophilic copolymer used in the photosensitive composition of the present invention has a number average molecular weight of usually 10 or 0,0 from the viewpoint of improving the processability of the photosensitive composition and the strength of the photosensitive rubber. 0 to 500, 000, preferably 20, 000-200, 000. In addition, the number average molecular arrangement is measured by using GPC and converted to the molecular weight of standard polystyrene.
- Examples of the photopolymerizable ethylenically unsaturated unit represented by the third component of the photosensitive composition of the present invention include styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, p-tert-butylstyrene, and 1,3.
- Monocyclic aromatic vinyls such as dimethylstyrene, butyltoluene, chlorostyrene, burnaphthalene, buruanthracene, divinylpentene, and tributylbenzene; and ethylene such as atalylutril and methacrylonitrile Insoluble trimethyl monomers; methyl acrylate, ethyl acrylate, acrylate acrylate, n-amyl acrylate, isoamyl acrylate, acrylic acid Hexyl, ethyl acrylate hexyl, octyl acrylate, glycidyl acrylate, methyl methacrylate, ethyl methacrylate, Provirtyl acrylate, n-amyl methacrylate, isoamyl methacrylate, hexyl methacrylate, ethyl hexyl methacrylate, octyl methacrylate,
- Ethylenic unsaturated carboxylic acid ester monomer Ethylenic unsaturated glycidyl ether such as aryl glycidyl ether; 1,3-butadiene, isoprene, chloroprene, conjugated genomer such as 1,3-pentene Monomer; ethylenic amines such as acrylic acid and metathalilic acid Carboxylic acid; ethylenically unsaturated polyvalent carboxylic acid such as maleic acid, fumaric acid, citraconic acid, and itaconic acid; ethylenically unsaturated polyvalent such as monoethyl maleate and monomethyl itaconate Carboxylic acid partial ester; ethylene phosphate acrylate, »trimethylene acrylate, propylene acrylate, j» tetramethylene acrylate, «acid (bis) ethylene acrylate, acid (Bis) trimethylene acrylate, phosphoric acid (bis) tetram
- S of the photopolymerizable ethylenically unsaturated monomer is 5 to 300 parts by weight, preferably 10 to 100 parts by weight, based on 100 parts by weight of the total amount of the block copolymer and the hydrophilic copolymer. It is a 200 0 overlapping part. If 5 parts by weight is not used, the curing of the photosensitive composition by the active light becomes insufficient, so that the strength of the IS light rubber JK decreases. Conversely, if the amount exceeds 300 parts by weight, the strength and solvent resistance of the photosensitive rubber plate decrease.
- the photopolymerization initiator which is the fourth component of the photosensitive composition of the present invention, includes cr diketones such as diacetyl and benzyl; acetylenes such as benzoin and Vivatine; Acylone ethers such as methyl ether, benzoinethyl ether and benzoin isopropyl ether; polynuclear quinones such as anthraquinone and 1,4-naphthoquinone; and the like.
- cr diketones such as diacetyl and benzyl
- acetylenes such as benzoin and Vivatine
- Acylone ethers such as methyl ether, benzoinethyl ether and benzoin isopropyl ether
- polynuclear quinones such as anthraquinone and 1,4-naphthoquinone; and the like.
- the amount of the photopolymerization initiator is from 0.1 to 10 parts by weight, preferably from 0.5 to 5 parts by weight, based on 100 parts by weight of the total amount of the block copolymer and the hydrophilic copolymer. Department. If the amount is less than 0.1 part by weight, the curing of the light-sensitive composition by the active light becomes insufficient, so that the viscosity of the photosensitive rubber JK decreases. Conversely, if it exceeds 10 overlapping portions, the photopolymerization rate decreases.
- the translucent composition of the present invention may further comprise, if necessary, a plasticizer; a storage stabilizer; an ozone-resistant agent; a styrene-butadiene random copolymer; Random copolymers such as tri-butadiene random copolymer, styrene-isoprene random copolymer, and methyl methacrylate-butadiene random copolymer; and homopolymers such as polybutadiene and polyisobrene; Can be mounted.
- a plasticizer is provided to improve the plasticity of the photosensitive composition and uniformly mix and mold the first to fourth components.
- plasticizer examples include hydrocarbon oils such as naphthenic oil and paraffin oil; polystyrene having a molecular weight of 300 or less; polyatalylate; liquid 1,2-bolybutadiene; liquid 1,4-polybutadiene; Liquid alcohol-tolyl-butadiene copolymers, liquid styrene-butadiene copolymers, and lipoxylated compounds thereof.
- hydrocarbon oils such as naphthenic oil and paraffin oil
- polyatalylate liquid 1,2-bolybutadiene
- liquid 1,4-polybutadiene Liquid alcohol-tolyl-butadiene copolymers
- liquid styrene-butadiene copolymers examples include lipoxylated compounds thereof.
- a storage stabilizer is blended to improve the storage stability of the photosensitive composition.
- Preservative stabilizers include phenols such as hydroquinone, pyrogallol, ⁇ -methoxyphenol, t-butylcatechol, 2,6-di-tert-butyl-p-cresol, and benzoquinone; benzoquinone, P-toluquinone And quinones such as p-xyloquinone; and amines such as phenyl ⁇ -naphthylamine.
- the luminous composition of the present invention is usually kneaded using a kneader such as a kneader-roll mill to produce S3.
- a kneader such as a kneader-roll mill to produce S3.
- the order of kneading is not particularly limited, but, in order to obtain a uniform composition, after kneading the hydrophilic copolymer and the block copolymer, the photopolymerizable ethylenically unsaturated unit and the photopolymerization are mixed. It is preferred to add and knead with an initiator.
- S is a photosensitive resin composition formed on the support and its main surface. It has a laminated structure composed of layers of objects.
- the support is usually made of a portable film or sheet, and optionally has an undercoat layer made of »type JB or an adhesive or primer.
- the support may be a flexible film such as a polyethylene terephthalate film, a polypropylene film, or a polyimide film; an elastic composition such as a natural rubber, a base rubber, or a soft vinyl chloride spore.
- Examples of such sheets include polyethylene terephthalate, polyethylene propylene, and flexible sheets such as Polyimide.
- a conventionally known method may be employed. For example, after the photosensitive composition is molded into a sheet using a molding machine such as an extruder, a breathing machine, or a calender, or simultaneously with the molding, the photosensitive composition is adhered to a support, or the photosensitive composition is used as a photosensitive composition.
- a molding machine such as an extruder, a breathing machine, or a calender
- the photosensitive composition is adhered to a support, or the photosensitive composition is used as a photosensitive composition.
- Carbon tetrachloride, trichloroethane, methylethylketone, getylketone, benzene, toluene, tetrahydrofuran, etc. in which the above-mentioned first to fourth components are dissolved in a sheet-shaped frame mold.
- the sheet is formed by injecting and then evaporating the solvent to form the sheet, or at the same time as forming, by adhering to the support.
- a thin layer of a non-adhesive, water-soluble polymer be cast on the shoes of the photostimulable composition as a coating.
- the above question S is solved by providing a thin layer of non-tacky water-soluble polymer.
- a cover film can be further cast on the photosensitive rubber plate of the present invention.
- the force bar film is made of a film of a flexible resin.
- the cover film forms a protector film layer on the light-sensitive composition layer (on a thin layer of a water-soluble polymer when the thin layer is cast). On the surface of the cover film which comes into contact with the photosensitive composition JB, the separation SS may be lowered.
- Cover films include polyethylene terephthalate film, polyethylene film, polypropylene film, and polyethylene film. Polystyrene film and the like can be mentioned.
- the thickness of the film is usually from 75 to 200 wm, preferably from 100 to 150 um. At less than 75 // m, the film strength is insufficient, and the molded light rubber slope is easily deformed. Conversely, if it exceeds 200 zm, the film strength is too high, so that it is difficult to separate the film from B of the photosensitive composition.
- a foam may be stacked on the surface of the support opposite to the surface on which the photosensitive composition layer is formed. By laminating the foam, the printing pressure during flexographic printing can be adjusted.
- Aqueous developers usually consist of water, alcohol, aqueous or alcoholic solutions.
- the aqueous solution include an alkaline aqueous solution such as an alkali metal salt and an alkaline earth metal salt, and an aqueous solution in which a surfactant or the like is dissolved.
- an aqueous solution in which a surfactant is dissolved is preferable.
- the opaque rubber plate is cut into small pieces of 3 OmmX 3 Omm, and the small pieces are heated at a concentration of 2% using a washing machine for photosensitive flexographic plates (J0W-As-SS type manufactured by JEOL Ltd.).
- the time required for the small pieces to reach a thickness of 2 mm when washed with an aqueous solution of polyoxyethylene phenyl ether at a temperature of 50 degrees was calculated and indicated according to the lower princess standard.
- a rating of A indicates the best water washability, and B to C to D indicate poor water washability. [transparency]
- the photosensitive rubber was cut into a size of 3 Omm x 3 Omm to obtain a small piece, and the permeability of the small piece was measured using a Macbeth irrigation meter (through type). A smaller value indicates better transparency.
- One side of the ffi-light rubber was exposed to light using a UV light device (JE-As-SS type manufactured by JEOL Ltd.) so that the thickness of the cured eyebrows was about 1.5 mm.
- the polyester film on the non-exposed surface was peeled off, and a negative film for evaluating reproducibility was adhered to the surface, and the surface was exposed to light for 15 minutes using the ultraviolet exposure apparatus.
- the negative film was peeled off, and the unexposed portions were dissolved and removed with a 2% aqueous solution of polyoxyethylene nonylphenyl ether at a temperature of 50%. Thereafter, the surface was dried at 70 for 20 minutes, and the surface from which the unexposed portions had been removed was re-lighted for 10 minutes using the above-mentioned ultraviolet exposure machine, thereby creating a relief image for evaluation of reproducibility.
- the width of the convex fine line which is the same width as the negative film convex line and is reproduced without distortion and fatness, was measured. A smaller value indicates better convex fine line reproducibility.
- the depth of the groove of the 0.7 mm wide concave fine line was measured. The larger the number, the better the concave fine line reproducibility.
- the flat part of the rubber plate used for the evaluation of the relief image reproducibility was tested at the time of breaking under the conditions of a tensile speed of 500 mm / min and a line length of 20 mm in accordance with JISK-6301 “Tensile test method”.
- the product of the degree and the elongation (tensile product) was determined. Larger tensile products indicate better strength balance.
- Pro-V copolymer 3 was obtained in the same manner as in Reference Example 1, except that the amount of tetramethylethylenediamine used in Reference Example 1 was changed to 0.92 parts.
- Pro-V copolymer was obtained in the same manner as in Reference Example 1 except that the amount of tetramethylethylenediamine used in Reference Example 1 was changed to 0.22 parts.
- a block copolymer 5 was obtained in the same manner as in Reference Example 1, except that tetramethylethylenediamine used in Reference Example 1 was not used.
- Table 1 shows the styrene content, butadiene content, S content in the butyl bond in buta-geneploc, and the weight average molecular weight of these block copolymers (1) to (4).
- the measurement was performed using a 500 MHz H 1 —N MR.
- This photosensitive composition is placed in a frame mold having a spacer thickness of 3. Omm and upper and lower sides with a B8 opening, and a 0.1 mm thick polyester film is coated above and below the opening of the frame mold.
- Table 2 shows the evaluation results of this opaque rubber JK.
- Comparative Example 2 has remarkably low water washability and transparency.
- a photosensitive composition and a photosensitive rubber plate were obtained in the same manner as in Example 1 except that the hydrophilic copolymer or the block copolymer used in Example 1 was changed to the formulation shown in Table 2.
- Table 2 shows the evaluation results of these photosensitive rubber plates.
- the composition containing the styrene-butadiene-styrene block copolymer having a vinyl bond-containing weight of 10.3% (Comparative Example 1) was inferior in water washability, and had poor strength balance and image reproducibility. It turns out that it is low. Also, styrene-butadiene It can be seen that in the case of the composition (Comparative Example 2) in which the amount of at-copolymerization of styrene and s-block was 7% by weight, the water washability was significantly reduced.
- the light-sensitive composition of the present invention containing a styrene-butadiene-styrene type block copolymer having a Bull bond content of 15 to 70 has high transparency, high balance, image reproducibility, and water washability. It turns out that it is excellent.
- the photosensitive composition of the present invention containing the S— ⁇ —S block copolymer having a Bull bond content of 20 to 55%, transparency, strength balance, image reproducibility, and water washability are all improved. It turns out that it is excellent.
- the photosensitive composition of the present invention is excellent in transparency and temperature balance and has a high water washing speed after light exposure, the negative film is brought into close contact with the light and irradiated with light for 18 light, and the unlighted portion is washed. It can be suitably used for flexographic printing who removes to form a relief.
- the photosensitive composition of the present invention can wash and remove unexposed portions by aqueous dissolution, so that it is easy to treat the washing waste liquid after washing, and there is little environmental pollution.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
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- Materials For Photolithography (AREA)
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Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/809,369 US6025098A (en) | 1994-09-29 | 1995-09-25 | Photosensitive composition and photosensitive rubber plate |
| EP95932218A EP0784232B1 (en) | 1994-09-29 | 1995-09-25 | Photosensitive composition and photosensitive rubber plate |
| DE69528069T DE69528069D1 (de) | 1994-09-29 | 1995-09-25 | Fotoempfindliche zusammensetzung und fotoempfindliche gummiplatte |
| JP51159496A JP3451571B2 (ja) | 1994-09-29 | 1995-09-25 | 感光性組成物及び感光性ゴム版 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6259158A JPH1031303A (ja) | 1994-09-29 | 1994-09-29 | 感光性組成物及び感光性ゴム版 |
| JP6/259158 | 1994-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1996010218A1 true WO1996010218A1 (en) | 1996-04-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1995/001923 Ceased WO1996010218A1 (en) | 1994-09-29 | 1995-09-25 | Photosensitive composition and photosensitive rubber plate |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6025098A (ja) |
| EP (1) | EP0784232B1 (ja) |
| JP (1) | JPH1031303A (ja) |
| DE (1) | DE69528069D1 (ja) |
| WO (1) | WO1996010218A1 (ja) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0786700A4 (en) * | 1994-10-14 | 1998-11-25 | Nippon Zeon Co | PHOTOSENSITIVE ELASTOMER COMPOSITION AND PHOTOSENSITIVE RUBBER PLATE |
| US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
| US5889116A (en) * | 1995-12-06 | 1999-03-30 | Nippon Zeon Co., Ltd. | Photosensitive composition from copolymers of ethylenic phosphorous monomer(s) and elastomer |
| US6811951B2 (en) * | 2000-03-16 | 2004-11-02 | Asahi Kasei Kabushiki Kaisha | Photosensitive constituent for flexographic printing plate |
| JP2006104359A (ja) * | 2004-10-06 | 2006-04-20 | Kraton Jsr Elastomers Kk | 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998004407A1 (en) | 1996-07-30 | 1998-02-05 | Hitachi Chemical Co., Ltd. | Manufacture of laminated film and printed wiring board |
| US5902714A (en) * | 1997-07-30 | 1999-05-11 | Polyfibron Technologies, Inc. | Latex-based, aqueous developable photopolymers and use thereof in printing plates |
| DE19811330A1 (de) | 1998-03-16 | 1999-09-23 | Du Pont Deutschland | Entwickler und Verfahren zur Herstellung von flexographischen Druckformen |
| EP1154325B1 (en) | 1998-12-25 | 2005-12-21 | Asahi Kasei Chemicals Corporation | Flexographic printing plate and original plate therefor |
| US6506542B1 (en) | 1999-03-16 | 2003-01-14 | E.I. Du Pont De Nemours And Company | Developer and process for preparing flexographic printing forms |
| TW562997B (en) * | 2000-09-27 | 2003-11-21 | Hitachi Chemical Co Ltd | Photoresist mask pattern, and preparing method and use thereof |
| JP4839525B2 (ja) | 2000-09-29 | 2011-12-21 | 大日本印刷株式会社 | 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ |
| DE10227189A1 (de) * | 2002-06-18 | 2004-01-08 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung von Flexdruckformen mittels Laser-Direktgravur |
| JP4069389B2 (ja) * | 2003-03-07 | 2008-04-02 | ジェイエスアール クレイトン エラストマー株式会社 | アスファルト改質用ブロック共重合体組成物、その製造方法、およびアスファルト組成物 |
| DE602004018362D1 (de) | 2003-09-25 | 2009-01-22 | Zeon Corp | Block-copolymerzusammensetzung für eine lichtempfindliche flexographische platte |
| CN1965266B (zh) * | 2004-06-11 | 2010-12-15 | 旭化成电子材料株式会社 | 柔版印刷板用感光树脂及其制造方法 |
| US20080318161A1 (en) * | 2004-11-11 | 2008-12-25 | Asahi Kasei Chemicals Corporation | Photosensitive Resin Composition for Flexographic Printing |
| US20060154180A1 (en) | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
| EP1881370B1 (en) * | 2005-05-11 | 2012-09-19 | Asahi Kasei Chemicals Corporation | Photosensitive resin composition |
| WO2007058163A1 (ja) * | 2005-11-21 | 2007-05-24 | Asahi Kasei Chemicals Corporation | フレキソ印刷版 |
| US7704676B2 (en) * | 2007-09-04 | 2010-04-27 | Kraton Polymers U.S. Llc | Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers |
| US8470518B2 (en) | 2007-09-14 | 2013-06-25 | E I Du Pont De Nemours And Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| DE102007046641A1 (de) * | 2007-09-27 | 2009-04-09 | Carl Freudenberg Kg | Strahlungs-härtbare Elastomermischung |
| JP2010185128A (ja) * | 2008-04-23 | 2010-08-26 | Fujifilm Corp | めっき用感光性樹脂組成物、積層体、それを用いた表面金属膜材料の作製方法、表面金属膜材料、金属パターン材料の作製方法、金属パターン材料、及び配線基板 |
| JP6397194B2 (ja) * | 2014-02-21 | 2018-09-26 | 旭化成株式会社 | 印刷版用感光性樹脂組成物、印刷版用感光性樹脂構成体、及び印刷版 |
| JP2021042282A (ja) * | 2019-09-09 | 2021-03-18 | ジェイエスアール クレイトン エラストマー株式会社 | 柔軟性と耐摩耗性を両立した感光性印刷版材用ブロック共重合体及びその製造方法 |
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| JPS59100433A (ja) * | 1982-11-30 | 1984-06-09 | Hitachi Chem Co Ltd | 難燃型感光性樹脂組成物 |
| JPH027055A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 感光性平版印刷版の処理方法 |
| JPH04271351A (ja) * | 1990-07-19 | 1992-09-28 | E I Du Pont De Nemours & Co | フレキソ印刷用光重合性印刷プレート |
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| CA1101586A (en) * | 1971-05-17 | 1981-05-19 | Arnel D. Potter | Photosensitive compositions |
| US5135837A (en) * | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
| US5348844A (en) * | 1990-12-03 | 1994-09-20 | Napp Systems, Inc. | Photosensitive polymeric printing medium and water developable printing plates |
| AU644949B2 (en) * | 1991-02-15 | 1993-12-23 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive elastomer composition |
| JP2793068B2 (ja) * | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
| US5679485A (en) * | 1993-03-31 | 1997-10-21 | Nippon Zeon Co., Ltd. | Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same |
| EP0675412B1 (en) * | 1994-03-30 | 2001-01-17 | Japan Synthetic Rubber Co., Ltd. | Photosensitive resin composition |
| US5422225A (en) * | 1994-06-23 | 1995-06-06 | Shell Oil Company | Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend |
| US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
-
1994
- 1994-09-29 JP JP6259158A patent/JPH1031303A/ja active Pending
-
1995
- 1995-09-25 DE DE69528069T patent/DE69528069D1/de not_active Expired - Lifetime
- 1995-09-25 US US08/809,369 patent/US6025098A/en not_active Expired - Lifetime
- 1995-09-25 WO PCT/JP1995/001923 patent/WO1996010218A1/ja not_active Ceased
- 1995-09-25 EP EP95932218A patent/EP0784232B1/en not_active Expired - Lifetime
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| JPS59100433A (ja) * | 1982-11-30 | 1984-06-09 | Hitachi Chem Co Ltd | 難燃型感光性樹脂組成物 |
| JPH027055A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 感光性平版印刷版の処理方法 |
| JPH04271351A (ja) * | 1990-07-19 | 1992-09-28 | E I Du Pont De Nemours & Co | フレキソ印刷用光重合性印刷プレート |
| JPH05165216A (ja) * | 1991-12-13 | 1993-07-02 | Mitsubishi Petrochem Co Ltd | 感光性樹脂組成物 |
| JPH05232698A (ja) * | 1991-12-26 | 1993-09-10 | Nippon Zeon Co Ltd | リン含有親水性共重合体の製造方法及び該共重合体を用いた水現像用感光性組成物 |
| JPH06202331A (ja) * | 1992-12-28 | 1994-07-22 | Nippon Zeon Co Ltd | 感光性エラストマー組成物及びそれを用いた感光性フレキソ版 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0786700A4 (en) * | 1994-10-14 | 1998-11-25 | Nippon Zeon Co | PHOTOSENSITIVE ELASTOMER COMPOSITION AND PHOTOSENSITIVE RUBBER PLATE |
| US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
| US5889116A (en) * | 1995-12-06 | 1999-03-30 | Nippon Zeon Co., Ltd. | Photosensitive composition from copolymers of ethylenic phosphorous monomer(s) and elastomer |
| US6811951B2 (en) * | 2000-03-16 | 2004-11-02 | Asahi Kasei Kabushiki Kaisha | Photosensitive constituent for flexographic printing plate |
| JP2006104359A (ja) * | 2004-10-06 | 2006-04-20 | Kraton Jsr Elastomers Kk | 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0784232A4 (en) | 1998-10-21 |
| EP0784232B1 (en) | 2002-09-04 |
| EP0784232A1 (en) | 1997-07-16 |
| DE69528069D1 (de) | 2002-10-10 |
| JPH1031303A (ja) | 1998-02-03 |
| US6025098A (en) | 2000-02-15 |
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