WO2010075615A1 - Procédé de préparation de films minces ou ultra-minces et nanocomposites de nanoparticules d'oxydes métalliques et/ou de métaux imprégnés dans des substrats de verre, de polymère, de bois ou de métal et/ou déposés sur ceux-ci - Google Patents

Procédé de préparation de films minces ou ultra-minces et nanocomposites de nanoparticules d'oxydes métalliques et/ou de métaux imprégnés dans des substrats de verre, de polymère, de bois ou de métal et/ou déposés sur ceux-ci Download PDF

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Publication number
WO2010075615A1
WO2010075615A1 PCT/BR2009/000419 BR2009000419W WO2010075615A1 WO 2010075615 A1 WO2010075615 A1 WO 2010075615A1 BR 2009000419 W BR2009000419 W BR 2009000419W WO 2010075615 A1 WO2010075615 A1 WO 2010075615A1
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WO
WIPO (PCT)
Prior art keywords
metal
wood
glass
substrates
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/BR2009/000419
Other languages
English (en)
Portuguese (pt)
Inventor
Sergio Mazurek Tebcherani
Sergio Da Silva Cava
Silvana Souza Netto Mandalozzo
Danielle Berger
Jarem Raul Garcia
Karen Wohnrath
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Itajara Minerios Ltda
Original Assignee
Itajara Minerios Ltda
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Itajara Minerios Ltda filed Critical Itajara Minerios Ltda
Publication of WO2010075615A1 publication Critical patent/WO2010075615A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides

Definitions

  • the present invention comprises a method for manufacturing thin or ultra-thin films and nanocomposites of metal oxide and / or metal nanoparticles in interaction with glass substrates or
  • polymers or woods, metals or any other substrate which may or may cause porosity on its surface by a process of impregnation and / or deposition of metal oxides and / or metals previously formed at a temperature below the glass transition or softening point or flash point or below any temperature that will result in a change in the physical state of the material when associated with the influence of the time at which the test is performed.
  • Thin films can be produced by saline deposition through the effect of temperature.
  • Ag + ion deposition films have already been prepared on the glass surface from Ag 2 S0 4 , CuS0 4 , Na 2 S0 4 solution in the presence of organic compounds dispersed in oil.
  • the treatment temperature was 300 ° C, 320 ° C and 350 ° C, with time ranging from 1 to 48 h.
  • Another way to obtain films is from the deposited by electrostatic spray, by method of sputtering method and followed by heat treatment.
  • the filtered cathode arc plasma and oxygen flow technique was also applied to deposit thin films of zinc oxide on glass surface and temperature of 200 ° C.
  • the methods described above may constitute the oxides to be obtained in the form of films only if they are mixed during the synthesis process of these materials.
  • the oxides are formed from precursor substances deposited on the substrates which, by treatment (usually thermal), form the oxide films to be obtained.
  • glassy materials when subjected to high temperatures reach a "softening" state which, by definition, is known as glass transition (Tg). This glass transition is often a limiting factor for film-making and particulate material impregnation methods on the glass surface, and if it is a polymeric substrate softening can be achieved and if it is a flash point wood and metal oxidation. , etc.
  • the present invention comprises a method for the manufacture of thin or ultra-thin films and metal oxide nanoparticle nanocomposites in interaction with glass or polymeric substrates or woods, metals or any other substrate which may or may generate porosity on its surface. by a process of impregnation and / or deposition of metal oxide powders previously formed at a temperature below the glass transition or
  • fig. 1 is a sequence of 3,000 X magnification scanning electron microscopy ranging from pure glass substrate until the deposition of the treated nanoparticulate Sn02 film at 485 ° C.
  • fig. 2 represents an example of cobalt oxide deposition by EV.
  • fig. 3 depicts an example of iron oxide III deposition by SEM.
  • fig. 4 depicts an example of SEM deposition of titanium oxide.
  • fig. 5 depicts an example of deposition of aluminum oxide by SEM.
  • fig. 6 depicts an example of copper oxide deposition by SEM.
  • the present invention comprises a process for fabricating metal oxide thin films from films at temperatures below the glass transition temperature, or the softening temperature, or the flash point, or the change in oxidation state depending on the substrate. pressure as a function of the test time.
  • the process consists of: (a) deposition of metal powders on the substrate surface, (b) application of high pressure cooled gas, (c) infiltration and / or deposition of powders on the substrate surface and (d) below heating temperature glass transition temperature (for glass), softening (for polymers), flash point (for wood) and oxidation (for metals) as a function of time.
  • FIG. 1 shows an example of thin film of metal oxides impregnated and / or deposited by high limit pressure (Pi.) On substrate.
  • Pi. high limit pressure
  • stage 3 can be reached if: the limit pressure is kept constant and the temperature of T 2 is raised to T3 or, if the time is increased from t 2 to t. 3 or raise both to T3 and respectively.
  • the same result is also achieved if the temperature at T 2 and the time at t 2 remain constant, but if the applied pressure is greater than the pressure exerted at stage (2).

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Chemical And Physical Treatments For Wood And The Like (AREA)
  • Laminated Bodies (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Le titre de l'abrégé doit manifestement être harmonisé avec le titre de l'invention, conformément à la règle 4.3 du PCT, ainsi qu'avec les modifications apportées à l'abrégé, conformément à la règle 38.3. Le titre de l'abrégé sera ainsi identique au titre de l'invention et présentera alors la formulation suivante : Procédé de préparation de films minces ou ultra-minces et nanocomposites de nanoparticules d'oxydes métalliques et/ou de métaux imprégnés dans des substrats de verre, de polymère, de bois ou de métal et/ou déposés sur ceux-ci.
PCT/BR2009/000419 2008-12-29 2009-12-23 Procédé de préparation de films minces ou ultra-minces et nanocomposites de nanoparticules d'oxydes métalliques et/ou de métaux imprégnés dans des substrats de verre, de polymère, de bois ou de métal et/ou déposés sur ceux-ci Ceased WO2010075615A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BRPI0806015 BRPI0806015A2 (pt) 2008-12-29 2008-12-29 processo de preparação de filmes finos ou ultra-finos e nanocompósitos de nanopartìculas de óxidos metálicos e/ou metais impregnados e/ou depositados em substratos vìtreos, poliméricos, madeiras, metais e outros
BRPI0806015-0 2008-12-29

Publications (1)

Publication Number Publication Date
WO2010075615A1 true WO2010075615A1 (fr) 2010-07-08

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/BR2009/000419 Ceased WO2010075615A1 (fr) 2008-12-29 2009-12-23 Procédé de préparation de films minces ou ultra-minces et nanocomposites de nanoparticules d'oxydes métalliques et/ou de métaux imprégnés dans des substrats de verre, de polymère, de bois ou de métal et/ou déposés sur ceux-ci

Country Status (2)

Country Link
BR (1) BRPI0806015A2 (fr)
WO (1) WO2010075615A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018056900A1 (fr) 2016-09-20 2018-03-29 Agency For Science, Technology And Research Composites de métal/oxyde métallique à activité d'oxydo-réduction pour applications antimicrobiennes

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399388A (en) * 1994-02-28 1995-03-21 The United States Of America As Represented By The Secretary Of The Navy Method of forming thin films on substrates at low temperatures
US6635554B1 (en) * 1999-09-03 2003-10-21 The Trustees Of Columbia University In The City Of New York Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures
DE10312658A1 (de) * 2003-03-21 2004-09-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung flexibler Substrate mit Aluminium
EP1731219A1 (fr) * 2005-06-11 2006-12-13 TuTech Innovation GmbH Procédé pour l'encapsulage de substances organiques dans forme particulière, effectué en atomisant un gaz inert et surcritique avec un matériau destiné à revêtir ladit substance dans un lit fluidisé à haut pression situé dans un autoclave
WO2008060358A2 (fr) * 2006-09-29 2008-05-22 Massachusetts Institute Of Technology Système et procédé pour fournir la possibilité d'enlever par pelage des films polymères minces d'un substrat

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399388A (en) * 1994-02-28 1995-03-21 The United States Of America As Represented By The Secretary Of The Navy Method of forming thin films on substrates at low temperatures
US6635554B1 (en) * 1999-09-03 2003-10-21 The Trustees Of Columbia University In The City Of New York Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures
DE10312658A1 (de) * 2003-03-21 2004-09-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Beschichtung flexibler Substrate mit Aluminium
EP1731219A1 (fr) * 2005-06-11 2006-12-13 TuTech Innovation GmbH Procédé pour l'encapsulage de substances organiques dans forme particulière, effectué en atomisant un gaz inert et surcritique avec un matériau destiné à revêtir ladit substance dans un lit fluidisé à haut pression situé dans un autoclave
WO2008060358A2 (fr) * 2006-09-29 2008-05-22 Massachusetts Institute Of Technology Système et procédé pour fournir la possibilité d'enlever par pelage des films polymères minces d'un substrat

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018056900A1 (fr) 2016-09-20 2018-03-29 Agency For Science, Technology And Research Composites de métal/oxyde métallique à activité d'oxydo-réduction pour applications antimicrobiennes
EP3516091A4 (fr) * 2016-09-20 2020-04-01 Agency for Science, Technology and Research Composites de métal/oxyde métallique à activité d'oxydo-réduction pour applications antimicrobiennes

Also Published As

Publication number Publication date
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