WO2010143379A1 - Method of producing electronic component mounting structure, and electronic component mounting structure - Google Patents
Method of producing electronic component mounting structure, and electronic component mounting structure Download PDFInfo
- Publication number
- WO2010143379A1 WO2010143379A1 PCT/JP2010/003707 JP2010003707W WO2010143379A1 WO 2010143379 A1 WO2010143379 A1 WO 2010143379A1 JP 2010003707 W JP2010003707 W JP 2010003707W WO 2010143379 A1 WO2010143379 A1 WO 2010143379A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electronic component
- circuit board
- mounting structure
- curable resin
- foaming agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
- H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0116—Porous, e.g. foam
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
Definitions
- the present invention relates to an electronic component mounting structure manufacturing method and an electronic component mounting structure. Specifically, the present invention relates to a method for manufacturing an electronic component mounting structure capable of controlling the thickness of a cured resin that protects an electronic component mounted on a circuit board surface.
- a resin is formed in the gap formed between the circuit board surface and the electronic component.
- An underfill method for filling a cured product is also known.
- Patent Document 1 discloses a sealing resin composition containing a curable resin and a foaming agent.
- the encapsulating resin composition disclosed in Patent Document 1 is an underfill resin composition that allows an electronic component mounted on a circuit board surface to be easily removed and repaired (repaired).
- the sealing resin composition is underfilled and cured at the solder joint between the circuit board and the electronic component flip-chip connected to the surface thereof.
- a foaming agent is foamed by heating to the temperature at which the foaming agent in resin cured material foams. The strength of the cured resin is reduced by foaming of the foaming agent, and the mounted electronic component can be easily removed by melting the solder.
- an electronic component mounted on a circuit board accommodated in a portable electronic device may be disconnected or damaged by an impact or the like.
- a protective coating made of a cured resin is formed for the purpose of reinforcement on parts that are relatively susceptible to damage such as joints between the circuit board surface and electronic components. The method of doing is also known.
- an electronic component mounting structure 50 obtained by mounting an electronic component 52 including an IC (Integrated Circuit) package 60 and lead terminals 61 on a circuit board 13 as shown in FIG. 3 will be described.
- the electronic component 52 is inserted into the through hole H1 formed in the circuit board 13 from the front surface of the circuit board 13 and then soldered to the circuit (not shown) formed on the back surface of the circuit board 13 using the solder 55. It is implemented by attaching. And the resin cured material 53 which is a protective film is formed in the surface of the solder
- a cured resin 53 having a uniform thickness and an appropriately thick thickness can be formed due to the influence of the interfacial tension or the like.
- the film thickness of the cured resin 53 in such a region tends to be thin.
- the insulation characteristics and the like due to the cured resin 53 are reduced in the thin portion of the cured resin 53.
- current may leak from the thin portion. Such current leakage is particularly likely to occur in a high temperature and high humidity environment.
- the present invention relates to an electronic component mounting structure capable of easily controlling the thickness of a protective coating when an electronic component mounted on a circuit board surface is coated with a curable resin composition containing a foaming agent. It aims at providing the manufacturing method of.
- One aspect of the present invention is to mount an electronic component on a circuit board by soldering a terminal connected to the electronic component to an electrode formed on the surface of the circuit board, and a circuit formed by soldering.
- An electronic component mounting structure manufacturing method comprising: a curing step of forming a resin cured product by curing at a temperature; and a foaming step of foaming a foaming agent by heating at least a part of the resin cured product.
- Another aspect of the present invention is an electronic component mounting structure including a circuit board and at least one electronic component mounted by soldering on an electrode formed on the surface of the circuit board.
- the portion is covered with a resin cured product, and the resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin, and at least a part of the foaming agent of the resin cured product is foamed.
- Another aspect of the present invention is an electronic component mounting structure including a circuit board and at least one electronic component mounted on the first surface of the circuit board.
- the electronic component includes an electronic component body and an electronic component.
- the resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin, and at least a part of the foaming agent of the resin cured product is foamed. It is.
- the present invention it is possible to easily control the film thickness of the cured resin that covers the joint portion of the electronic component mounted on the circuit board.
- the liquid curable resin composition is a curable resin composition that is liquid at room temperature and contains a curable resin and a foaming agent.
- the curable resin composition which is liquid at normal temperature is a composition containing a foaming agent as a main component of a solvent-free liquid resin or a resin varnish obtained by dissolving a solid resin at normal temperature in a solvent. It is.
- Specific examples of the curable resin include a thermosetting resin, a photocurable resin, and an electron beam curable resin.
- a curable resin As such a curable resin, a conventionally known curable resin is used, and specifically, formed from a resin component such as a silicone resin, polyurethane, acrylic resin, polyolefin, epoxy resin, or the like. .
- a thermosetting silicone resin, a thermosetting polyolefin, and the like are particularly preferable from the viewpoint that the foaming state can be easily controlled in the foaming process described later.
- thermosetting resin a resin that can be cured at a temperature lower than the gas generation temperature of the foaming agent, which will be described later, is preferable because it can suppress foaming during thermosetting.
- a resin that can be cured at a temperature that is 10 ° C. or more lower than the gas generation temperature of the foaming agent, and further 20 ° C. or more is preferable.
- it is preferably a low temperature curable thermosetting resin that is cured at a low temperature such as room temperature to 100 ° C., and further room temperature to 80 ° C. In such a case, the thermosetting resin can be cured while being suppressed from foaming by heating to a curing temperature lower than the gas generation temperature of the foaming agent.
- the thermosetting resin to be used has elasticity even after curing.
- the glass transition point (Tg) of the cured resin is lower than the foaming temperature.
- the cured resin preferably has a Tg of 100 ° C. or lower.
- an organic decomposable foaming agent capable of generating gas by heating to a predetermined temperature and foaming the resin cured product.
- a foaming agent include, for example, azodicarbonamide (gas generation temperature: about 208 ° C., the same applies hereinafter), N, N′-dinitrosopentamethylenetetramine (about 205 ° C.), 4,4′- Oxybis (benzenesulfonylhydrazide) (about 159 ° C.), sodium bicarbonate (about 150 ° C.), barium azodicarboxylate (about 245 ° C.), acetone-paratoluenesulfonyl hydrazone (about 135 ° C.), paratoluenesulfonyl semicarbazide (about 220 ° C.) ° C), and mixtures thereof.
- the gas generation temperature of the foaming agent can be measured using, for example, a differential scanning calorimeter (DSC). Specifically, a predetermined amount of foaming agent is weighed as a sample, and the thermal behavior of the foaming agent when the weighed foaming agent is heated at a predetermined temperature increase rate is measured by DSC. Usually, an endothermic peak is observed in the curve indicating the relationship between the endothermic amount and the temperature. Here, the temperature at which the endothermic amount is maximum is the gas generation temperature.
- DSC differential scanning calorimeter
- Such an organic decomposable foaming agent generates foaming gas, specifically, for example, nitrogen gas (N 2 ), carbon dioxide gas (CO 2 ), etc. by decomposing at a predetermined temperature.
- the gas generation temperature is not particularly limited, but is preferably a temperature that does not exceed the melting point of the solder used for mounting the electronic component, and specifically, for example, 110 to 210 ° C., more preferably 120 to 180 ° C. It is preferable that it is the range of these.
- the content of the foaming agent in the liquid curable resin composition is 0.05 to 45% by mass, more preferably 1 to 40% by mass, particularly 5%, based on the total amount of the liquid thermosetting resin and the foaming agent. It is preferably ⁇ 25 mass.
- the content ratio of the foaming agent in the liquid curable resin composition is too high, the content ratio of the curable resin is relatively decreased, and thus the properties such as adhesion of the obtained resin cured product tend to be decreased. There is.
- the content of the foaming agent in the liquid curable resin composition is too low, the resin cured product tends not to be sufficiently thick due to foaming.
- the liquid curable resin composition may contain an additive as necessary.
- additives include, for example, curing catalysts, foam stabilizers, emulsifiers, flame retardants (phosphorus compounds, halogen compounds, etc.), antioxidants, anti-aging agents, ultraviolet absorbers, plasticizers, fillers (talc) Clay, calcium carbonate, silica powder, alumina, carbon black, titanium oxide, iron oxide, etc.), dyes, pigments and the like. You may use an additive individually by 1 type or in combination of 2 or more types.
- the liquid curable resin composition can be prepared by uniformly mixing a liquid curable resin and a foaming agent and defoaming.
- the liquid curable resin composition may contain a diluent in order to adjust its viscosity.
- a diluent is used, the content of the diluent is preferably 40 to 90% by mass, more preferably 50 to 80% by mass, from the viewpoints of handleability, coating properties, leveling properties, and the like.
- the solution viscosity of the liquid curable resin composition is preferably 1000 to 100 mPa ⁇ sec, more preferably 400 to 200 mPa ⁇ sec.
- the overcoat material and the underfill material can be applied in a single process.
- the material can be applied simultaneously.
- the solution viscosity is a value measured by a method based on the drop time of the viscosity cup.
- the manufacturing method of the electronic component mounting structure according to the present embodiment includes a mounting step of mounting the electronic component on the circuit board by soldering a terminal connected to the electronic component to an electrode formed on the surface of the circuit board.
- the mounting process for mounting electronic components on the surface of the circuit board includes electronic components 2a, 1a, 1b, 1c at predetermined positions on the surface of the circuit board 3, which are mounting areas. This is a process of mounting by soldering and joining the terminals 2b and 2c.
- the electronic component 2a is an IC package, and the electrode 7 formed on the surface thereof is connected to the electrode 1a formed on the surface of the circuit board by wire bonding with a wire W.
- the electronic component 2b is an IC package, and an unillustrated electrode formed on the back surface is connected to the electrode 1b formed on the surface of the circuit board by flip-chip mounting with solder bumps s1.
- the electronic component 2c is a connector, and a plurality of lead terminals L for mounting through holes are inserted into through holes H2 formed on the circuit board, and each lead terminal L is soldered to the electrode 1c formed on the back surface thereof. They are connected by mounting through holes.
- circuit boards include various printed boards including rigid boards and flexible boards.
- a rigid substrate uses a known circuit forming method such as a photoresist method on the surface of a substrate obtained by laminating a plurality of prepregs impregnated with a curable resin such as an epoxy resin on a fiber base material and heating and pressing.
- a printed wiring board on which a circuit made of copper foil or the like is formed.
- the flexible substrate is formed by forming a circuit on the surface of a heat-resistant resin film such as a polyimide film.
- Specific examples of electronic components that can be used in the method for manufacturing an electronic component mounting structure according to this embodiment include various IC packages, various resistors, various light emitting diodes, various capacitors, various connectors, and the like.
- the number of electronic components mounted on the circuit board surface may be one or more. Usually, a plurality of packages are mounted depending on the application.
- the method for mounting electronic components on the circuit board surface is not particularly limited, and a known surface mounting method or through-hole mounting method can be used. Specific examples include the following. Examples thereof include wire bonding connection in which a plurality of electrodes 7 formed on the surface of the electronic component 2a and an electrode 1a formed on the surface of the circuit board 3 are connected by thin wires such as gold wires. Also, a plurality of protruding solder bumps s1 formed on electrodes (not shown) formed on the surface of the electronic component 2b are placed on the electrodes 1b formed on the surface of the circuit board 3 so as to correspond to the solder bumps s1, The flip chip mounting which joins by passing through a reflow furnace is mentioned.
- the lead terminals L of the electronic component 2c having a plurality of lead terminals L for mounting through holes are inserted into the through holes H2 formed on the circuit board, and each lead terminal L is soldered to the electrode 1c formed on the back surface thereof. Through-hole mounting to be attached.
- the coating process is performed to form a resin joint that protects the solder joint formed by soldering the circuit board 3 and the electronic components 2a, 2b, and 2c. It is the process of apply
- the liquid curable resin composition 4 is cured.
- a cured resin for protecting the electronic components 2a, 2b, 2c from the external environment can be formed at the same time.
- the flip-chip-mounted electronic component 2b is further filled with the liquid curable resin composition 4 in the gap v between the electronic component 2b and the circuit board 3 in this step, so that an underfill material for flip-chip connection is used. Is also supplied. Thereby, the overcoat material and the underfill material are simultaneously applied to the electronic component 2b in one process.
- the application method of the liquid curable resin composition is not particularly limited, and specific examples include an application method using a dispenser (discharge device).
- the liquid curable resin composition 4 is applied to the solder joint portion on the back surface of the circuit board 3 to thereby prevent the through hole.
- a film made of a cured resin can also be formed at the joint between the electronic component 2c and the electrode 1c by mounting.
- the coating amount of the liquid curable resin composition is not particularly limited. Specifically, for example, it is preferably 10 to 80 ⁇ m, more preferably 20 to 50 ⁇ m. When applied to such a thickness, in the foaming process after curing, the flat part is 20 to 160 ⁇ m, further 40 to 100 ⁇ m, the edge part of the electronic component or the tip part of the lead terminal is 10 to 40 ⁇ m, and A film of a cured resin film having a thickness as large as 20 to 30 ⁇ m can be obtained.
- each of the solder joints of the electronic components 2a, 2b, 2c mounted on the surface of the circuit board 3, the outer surfaces of the electronic components 2a, 2b, 2c, and the surface of the circuit board 3 is provided.
- the cured resin 5 is formed by curing the liquid curable resin composition 4 covering the periphery of the electronic component mounting region at a temperature at which the foaming agent does not foam.
- the curing is performed at a temperature not higher than the gas generation temperature at which the foaming agent does not foam. Moreover, when the liquid curable resin composition 4 contains a photocurable resin, a sufficient amount of light for photocuring is irradiated. Furthermore, when the liquid curable resin composition 4 contains an electron beam curable resin, an electron beam sufficient for electron beam curing is irradiated. By such a method, the applied liquid curable resin composition 4 is cured, and a cured resin product 5 is formed.
- the region of the resin cured product 5 formed in the curing step is heated by heating the region surrounded by the broken line B, which is the portion where the film thickness is desired to be increased.
- the foaming agent contained in the product 5 foams to form pores 6, and the cured resin product 5 forms a foamed structure.
- the electronic component mounting structure 10 is formed.
- the film thickness of the cured resin 5 is increased by the pressure of the gas when forming the pores 6. In this way, when only the portion of the resin cured product 5 to be thickened is selectively heated, a thick coating such as a portion to be reinforced, specifically, a corner portion of an electronic component or a tip portion of a lead terminal.
- a thick protective film can be easily formed even on a portion where it is difficult to form. This allows thicker film to be applied in a single step without applying thickening by coating in a separate process on the part that you want to reinforce, or where you want to form a thick-film protective coating such as the tip of a lead terminal.
- the part can be formed.
- the effect of the manufacturing method of this embodiment will be described more specifically. 2
- the electronic component mounting structure 20 obtained by mounting the electronic component 52 including the IC package 60 and the lead terminal 61 on the circuit board 13 as shown in FIG. 2 is taken as an example. This will be described in detail in comparison with the component mounting structure 50.
- the thickness of the cured resin 12 that is a protective coating is greater than the thickness of the cured resin 53 that is the protective coating of the conventional electronic component mounting structure 50 shown in FIG. 3. It is the same except that.
- the thickness of the cured resin 12 formed in the region of the tip portion of the lead terminal 61 and the edge portion of the electronic component 52 is increased by foaming the cured resin 12. .
- the thickness of the region that tends to preferentially become thin due to the influence of the interfacial tension of the liquid curable resin composition after application is increased.
- the film thickness of the resin cured product 12 can be controlled by heating the portion where the film thickness is desired to be increased after curing.
- a heater having a relatively small heating element is brought close to the upper portion of the predetermined portion to directly heat the predetermined portion, or air heated by the heater is sprayed onto the predetermined portion.
- the method of heating is used.
- the heating temperature in the foaming step is equal to or higher than the gas generation temperature of the foaming agent and does not exceed the melting point of the solder used for joining the electronic component and the circuit board. Specifically, for example, it is preferably in the range of 110 to 210 ° C., more preferably 120 to 180 ° C.
- the heating time is appropriately adjusted depending on the target foaming ratio, and is preferably in the range of, for example, 1 to 10 minutes, and more preferably 3 to 7 minutes. Note that the foaming state can be controlled by changing the heating temperature and the heating time. And the higher the expansion ratio, the thicker the resin cured product.
- the resin cured product after foaming is 20 to 100 ⁇ m at the flat part, and further 20 to 95 ⁇ m at the flat part, depending on the film thickness of the resin cured product before foaming. Is preferably 20 to 40 ⁇ m, more preferably 20 to 35 ⁇ m.
- the change in the apparent volume before and after the foaming process of the resin cured product of the foamed part is that the apparent volume after the foaming process is about 2 to 8 times, further about 3 to 5 times the apparent volume before the foaming process. preferable.
- the circuit board on which the cured resin is formed may be placed in a heating furnace or the like set at a predetermined temperature for a predetermined time. In such a case, the film thickness of the entire formed resin cured product is increased by the foaming process.
- thermosetting resin a solvent-free liquid silicone resin (trade name: SE-9187L manufactured by Toray Dow Corning Co., Ltd., hereinafter also referred to as Resin A), or a diluent (dedicated thinner 904 ( Solid polyolefin (trade name: Humiseal 1B51NS manufactured by Chase Inc., hereinafter also referred to as resin B) dissolved in (trade name)) was used.
- the blending ratio of the solid polyolefin and the diluent was 1: 1 (weight ratio).
- a solution of resin A or resin B and a foaming agent (4,4′-oxybis (benzenesulfonylhydrazide; gas generation temperature of about 170 ° C.)) are mixed at a ratio shown in Table 1 and subjected to defoaming treatment.
- a liquid curable resin composition was prepared, and the content ratio of the foaming agent in Table 1 is the weight ratio of the foaming agent to the total amount of the curable resin (in terms of solid content) and the foaming agent.
- An IC package having a length of 10 mm, a width of 10 mm, and a height of 5 mm provided with a metal lead terminal portion was mounted on an FR-4 type circuit board using a mounter, and mounted using a reflow furnace having a maximum temperature of 240 ° C. Note that solder of Sn-3Ag-0.5Cu (melting point: 217-219 ° C.) was used for bonding.
- a liquid curable resin composition was applied using a dispenser around the outer surface of the IC package, the joint, and the area where the IC package was mounted on the surface of the circuit board so as to embed the IC package mounted on the circuit board.
- resin A was used as the curable resin
- cured material was formed by heating the circuit board with which the liquid curable resin composition was apply
- the foaming agent in the cured resin was foamed by heating the circuit board on which the cured resin was formed in a heating furnace set at 170 ° C. for 5 minutes. In this manner, the electronic component mounting structures A to H in which the IC package was mounted on the main surface of the circuit board and the IC package was covered with the foamed cured product were obtained.
- the obtained electronic component mounting structures A to H were evaluated by the following methods. [Change in film thickness] In manufacturing the electronic component mounting structures A to H, the film thickness before and after the foaming process was measured. The film thickness of the cured product was measured at two locations, a flat portion of the circuit board and an edge portion of the IC package.
- a cross-cut tape peeling test was performed on the cured products formed on the electronic component mounting structures A to H. Specifically, a film made of a resin cured product on a flat portion of a circuit board was cut out on a grid having 100 grids of 1 mm ⁇ 1 mm square using a cutter knife and a cutter guide. Then, after the cellophane tape was strongly pressure-bonded to the area cut out in the grid of the coating, the number of peeling of the grid when the tape edge was rapidly peeled off at an angle of 45 ° was counted.
- the foaming agent is foamed to form a film before the foaming step.
- the film thickness after the foaming process increased more than the thickness.
- the film thickness of the cured product at the edge portion is 20 ⁇ m or more by foaming the foaming agent in the cured product. It was a thick one. Therefore, the insulating property of the edge portion was particularly excellent.
- the film thickness of the edge portion did not increase.
- Example 7 and Example 8 using the liquid resin composition whose foaming agent content rate is 50 mass% since the increase rate of the film thickness of an edge part is high, the insulation of the edge part was excellent. However, since the content of the foaming agent was too high, the adhesion was slightly lowered.
- the thickness can be easily controlled in the case of forming a protective film that protects the joint between the circuit board and the electronic component.
- a protective film having a high protective property can be formed by an easy process. Therefore, it is useful for protecting an electronic component mounting structure obtained by mounting electronic components such as an IC package, a resistor, a light emitting diode, a capacitor, and a connector on the circuit board.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
本発明は、電子部品実装構造体の製造方法および電子部品実装構造体に関する。詳しくは、回路基板表面に実装された電子部品を保護する樹脂硬化物の厚みを制御することが可能な電子部品実装構造体を製造するための方法に関する。 The present invention relates to an electronic component mounting structure manufacturing method and an electronic component mounting structure. Specifically, the present invention relates to a method for manufacturing an electronic component mounting structure capable of controlling the thickness of a cured resin that protects an electronic component mounted on a circuit board surface.
従来から、回路基板表面に実装された電子部品を水分、ガス、塵埃、衝撃等から保護するために、エポキシ樹脂、ポリウレタン、シリコーン樹脂、アクリル樹脂等の樹脂硬化物で電子部品を被覆するオーバーコーティング法が知られている。 Conventionally, to protect electronic components mounted on the circuit board surface from moisture, gas, dust, impact, etc., overcoating that covers the electronic components with a cured resin such as epoxy resin, polyurethane, silicone resin, acrylic resin, etc. The law is known.
また、回路基板表面に電子部品をフリップチップ接続により実装して形成された電子部品実装構造体のハンダ接合部を補強するために、回路基板表面と電子部品との間に形成される隙間に樹脂硬化物を充填するアンダーフィル法も知られている。 In addition, in order to reinforce the solder joint of the electronic component mounting structure formed by mounting the electronic component on the circuit board surface by flip chip connection, a resin is formed in the gap formed between the circuit board surface and the electronic component. An underfill method for filling a cured product is also known.
特許文献1は、硬化性樹脂と発泡剤とを含有する封止用樹脂組成物を開示している。特許文献1に開示された封止用樹脂組成物は、回路基板表面に実装された電子部品を容易に取り外してリペア(補修交換)を可能とするアンダーフィル用樹脂組成物である。具体的には、回路基板とその表面にフリップチップ接続された電子部品との間のハンダ接合部に封止用樹脂組成物をアンダーフィルして硬化させる。そして、回路基板に実装された電子部品を取り外す場合には、樹脂硬化物中の発泡剤が発泡する温度に加熱することにより発泡剤を発泡させる。そして、発泡剤の発泡により樹脂硬化物の強度を低下させるとともに、ハンダを溶融させることにより、実装された電子部品を容易に取り外すことを可能にするものである。 Patent Document 1 discloses a sealing resin composition containing a curable resin and a foaming agent. The encapsulating resin composition disclosed in Patent Document 1 is an underfill resin composition that allows an electronic component mounted on a circuit board surface to be easily removed and repaired (repaired). Specifically, the sealing resin composition is underfilled and cured at the solder joint between the circuit board and the electronic component flip-chip connected to the surface thereof. And when removing the electronic component mounted in the circuit board, a foaming agent is foamed by heating to the temperature at which the foaming agent in resin cured material foams. The strength of the cured resin is reduced by foaming of the foaming agent, and the mounted electronic component can be easily removed by melting the solder.
また、携帯電子機器に収容される回路基板に実装された電子部品は衝撃等により断線や損傷を受けるおそれがある。このような断線等による損傷を抑制するために、回路基板表面と電子部品との接合部のような比較的衝撃による損傷を生じやすい部分に、補強を目的として樹脂硬化物からなる保護被膜を形成する方法も知られている。一例として、図3に示すような、回路基板13に、IC(Integrated Circuit)パッケージ60とリード端子61とを含む電子部品52を実装して得られる電子部品実装構造体50について説明する。電子部品52は回路基板13の表面から、回路基板13に形成されたスルーホールH1にリード端子61を挿入した後、回路基板13の裏面に形成された図略の回路にハンダ55を用いてハンダ付けすることにより実装されている。そして、ハンダ55及びハンダ付けされたリード端子61の表面に保護被膜である樹脂硬化物53が形成されている。図3に示すように、電子部品52の平坦な領域(R1)には、膜厚が均一で適度に厚い樹脂硬化物53を形成することは容易である。一方、リード端子61の先端部分の領域(R2)や、電子部品52のエッジ部分(R3)には、界面張力の影響等により膜厚が均一で適度に厚い樹脂硬化物53を形成することが困難である。従って、このような領域の樹脂硬化物53の膜厚は、薄くなりやすい。その結果、樹脂硬化物53の膜厚が薄い部分は樹脂硬化物53による絶縁特性等が低下するおそれがある。例えば、リード端子61の先端部分に形成される樹脂硬化物53の膜厚が薄くなった場合、薄い部分から電流がリークするおそれがある。高温多湿の環境下においては、このような電流のリークが特に発生しやすくなる。
このような問題を解決するために、リード端子61の先端部分(R2)のような領域や電子部品52のエッジ部(R3)のような領域に、樹脂硬化物53の形成後に、さらに、別の樹脂硬化物を重ねることにより、膜厚を厚くする方法も考えられる。しかしながら、リード端子の先端部分やエッジ部のような微細な領域に、別工程でピンポイントに被膜を形成することは工程上難しく、また、工程が増えるために生産性が低下する。さらに、別の樹脂硬化物を重ねた場合には、その分だけ重量が増加するために軽量化の観点からも好ましくない。
In order to solve such a problem, after forming the resin cured
本発明は、発泡剤を含有する硬化性樹脂組成物を用いて回路基板表面に実装された電子部品を被覆する場合において、保護被膜の厚みを容易に制御することが可能な電子部品実装構造体の製造方法を提供することを目的とする。 The present invention relates to an electronic component mounting structure capable of easily controlling the thickness of a protective coating when an electronic component mounted on a circuit board surface is coated with a curable resin composition containing a foaming agent. It aims at providing the manufacturing method of.
本発明の一局面は、回路基板表面に形成された電極に、電子部品に接続された端子をハンダ付けすることにより、電子部品を回路基板に実装する実装工程と、ハンダ付けにより形成された回路基板表面上のハンダ接合部を被覆するように硬化性樹脂と発泡剤とを含有する液状硬化性樹脂組成物を塗布する塗布工程と、液状硬化性樹脂組成物を発泡剤が発泡する温度より低い温度で硬化させることにより樹脂硬化物を形成させる硬化工程と、樹脂硬化物の少なくとも一部分を加熱することにより、発泡剤を発泡させる発泡工程と、を備える電子部品実装構造体の製造方法である。
また、本発明の他の一局面は、回路基板と回路基板表面に形成された電極にハンダ付けにより実装された少なくとも一つの電子部品とを含む電子部品実装構造体であって、ハンダ付けされた部分が樹脂硬化物で被覆されており、樹脂硬化物は、発泡剤と硬化性樹脂とを含む硬化性樹脂組成物の硬化物であり、樹脂硬化物の少なくとも一部分の発泡剤が発泡している電子部品実装構造体である。
また、本発明の他の一局面は、回路基板と、回路基板の第1面に実装された少なくとも一つの電子部品とを含む電子部品実装構造体であって、電子部品は電子部品本体と電子部品本体に接続されたスルーホール実装用の複数のリード端子を有し、回路基板は第1面から第2面に貫通する複数のスルーホールと第2面の表面に各スルーホールの周囲に設けられた回路を有し、各リード端子は各スルーホールに挿入されて、回路にハンダ付けされており、第2面の表面のハンダ付けされた部分及びその周囲が樹脂硬化物で被覆されており、樹脂硬化物は、発泡剤と硬化性樹脂とを含む硬化性樹脂組成物の硬化物であり、樹脂硬化物の少なくとも一部分の発泡剤が発泡していることを特徴とする電子部品実装構造体である。
One aspect of the present invention is to mount an electronic component on a circuit board by soldering a terminal connected to the electronic component to an electrode formed on the surface of the circuit board, and a circuit formed by soldering. An application step of applying a liquid curable resin composition containing a curable resin and a foaming agent so as to cover a solder joint on the substrate surface, and a temperature lower than the temperature at which the foaming agent foams the liquid curable resin composition An electronic component mounting structure manufacturing method comprising: a curing step of forming a resin cured product by curing at a temperature; and a foaming step of foaming a foaming agent by heating at least a part of the resin cured product.
Another aspect of the present invention is an electronic component mounting structure including a circuit board and at least one electronic component mounted by soldering on an electrode formed on the surface of the circuit board. The portion is covered with a resin cured product, and the resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin, and at least a part of the foaming agent of the resin cured product is foamed. An electronic component mounting structure.
Another aspect of the present invention is an electronic component mounting structure including a circuit board and at least one electronic component mounted on the first surface of the circuit board. The electronic component includes an electronic component body and an electronic component. It has a plurality of lead terminals for mounting through holes connected to the component body, and the circuit board is provided around the through holes on the surface of the second surface and the plurality of through holes that penetrate from the first surface to the second surface. Each lead terminal is inserted into each through-hole and soldered to the circuit, and the soldered portion of the surface of the second surface and its periphery are covered with a cured resin. The resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin, and at least a part of the foaming agent of the resin cured product is foamed. It is.
本発明によれば、回路基板に実装された電子部品の接合部分を被覆する樹脂硬化物の膜厚を容易に制御することができる。 According to the present invention, it is possible to easily control the film thickness of the cured resin that covers the joint portion of the electronic component mounted on the circuit board.
本発明の目的、特徴、局面、および利点は、以下の詳細な説明及び添付する図面によって、より明白となる。 The objects, features, aspects, and advantages of the present invention will become more apparent from the following detailed description and the accompanying drawings.
はじめに、本実施形態の電子部品実装構造体の製造方法に用いられる液状硬化性樹脂組成物について詳しく説明する。
液状硬化性樹脂組成物は、硬化性樹脂および発泡剤を含有する常温で液状の硬化性樹脂組成物である。なお、常温で液状の硬化性樹脂組成物とは、無溶剤タイプの液状樹脂、または、常温で固体の樹脂を溶媒に溶解して得られる樹脂ワニスを主成分とし、発泡剤を含有する組成物である。
硬化性樹脂の具体例としては、熱硬化性樹脂、光硬化性樹脂、電子線硬化性樹脂等が挙げられる。このような硬化性樹脂としては、従来から知られた硬化性樹脂が用いられ、具体的には、例えば、シリコーン樹脂、ポリウレタン、アクリル樹脂、ポリオレフィン、エポキシ樹脂等のような樹脂成分から形成される。これらの中では、熱硬化性のシリコーン樹脂や熱硬化性のポリオレフィン等が、後述する発泡工程において発泡状態を制御しやすい点から特に好ましい。
First, the liquid curable resin composition used for the manufacturing method of the electronic component mounting structure according to the present embodiment will be described in detail.
The liquid curable resin composition is a curable resin composition that is liquid at room temperature and contains a curable resin and a foaming agent. The curable resin composition which is liquid at normal temperature is a composition containing a foaming agent as a main component of a solvent-free liquid resin or a resin varnish obtained by dissolving a solid resin at normal temperature in a solvent. It is.
Specific examples of the curable resin include a thermosetting resin, a photocurable resin, and an electron beam curable resin. As such a curable resin, a conventionally known curable resin is used, and specifically, formed from a resin component such as a silicone resin, polyurethane, acrylic resin, polyolefin, epoxy resin, or the like. . Among these, a thermosetting silicone resin, a thermosetting polyolefin, and the like are particularly preferable from the viewpoint that the foaming state can be easily controlled in the foaming process described later.
熱硬化性樹脂としては、後述する発泡剤のガス発生温度よりも低い温度で硬化可能な樹脂が、熱硬化の際の発泡を抑制することができる点から好ましい。具体的には、例えば、発泡剤のガス発生温度よりも10℃以上低い温度、さらには20℃以上低い温度で硬化可能な樹脂が好ましい。具体的には、例えば、室温~100℃、さらには室温~80℃のような低温で硬化する低温硬化型の熱硬化性樹脂であることが好ましい。このような場合には、発泡剤のガス発生温度よりも低い硬化温度に加熱することにより、発泡剤が発泡することを抑制しながら、熱硬化性樹脂の硬化を進行させることができる。
なお、樹脂硬化物中の発泡剤を発泡させるためには、使用する熱硬化性樹脂は硬化後も弾性を有することが好ましい。具体的には樹脂硬化物のガラス転移点(Tg)が発泡させる温度より低いことが好ましい。具体的には、例えば、樹脂硬化物は100℃以下のTgを有することが好ましい。
As the thermosetting resin, a resin that can be cured at a temperature lower than the gas generation temperature of the foaming agent, which will be described later, is preferable because it can suppress foaming during thermosetting. Specifically, for example, a resin that can be cured at a temperature that is 10 ° C. or more lower than the gas generation temperature of the foaming agent, and further 20 ° C. or more is preferable. Specifically, it is preferably a low temperature curable thermosetting resin that is cured at a low temperature such as room temperature to 100 ° C., and further room temperature to 80 ° C. In such a case, the thermosetting resin can be cured while being suppressed from foaming by heating to a curing temperature lower than the gas generation temperature of the foaming agent.
In order to foam the foaming agent in the resin cured product, it is preferable that the thermosetting resin to be used has elasticity even after curing. Specifically, it is preferable that the glass transition point (Tg) of the cured resin is lower than the foaming temperature. Specifically, for example, the cured resin preferably has a Tg of 100 ° C. or lower.
発泡剤としては、所定の温度に加熱することによりガスを発生して樹脂硬化物を発泡させうる有機分解性発泡剤が用いられる。このような発泡剤の具体例としては、例えば、アゾジカルボンアミド(ガス発生温度:約208℃、以下同様)、N,N’-ジニトロソペンタメチレンテトラミン(約205℃)、4,4’-オキシビス(ベンゼンスルホニルヒドラジド)(約159℃)、炭酸水素ナトリウム(約150℃)、アゾジカルボン酸バリウム(約245℃)、アセトン-パラトルエンスルホニルヒドラゾン(約135℃)、パラトルエンスルホニルセミカルバジド(約220℃)、およびその混合物等が挙げられる。 As the foaming agent, an organic decomposable foaming agent capable of generating gas by heating to a predetermined temperature and foaming the resin cured product is used. Specific examples of such a foaming agent include, for example, azodicarbonamide (gas generation temperature: about 208 ° C., the same applies hereinafter), N, N′-dinitrosopentamethylenetetramine (about 205 ° C.), 4,4′- Oxybis (benzenesulfonylhydrazide) (about 159 ° C.), sodium bicarbonate (about 150 ° C.), barium azodicarboxylate (about 245 ° C.), acetone-paratoluenesulfonyl hydrazone (about 135 ° C.), paratoluenesulfonyl semicarbazide (about 220 ° C.) ° C), and mixtures thereof.
発泡剤のガス発生温度は、例えば示差走査熱量計(DSC)を用いて測定することができる。具体的には、サンプルとして所定量の発泡剤を秤量し、秤量した発泡剤を所定の昇温速度で加熱したときの発泡剤の熱的挙動をDSCで測定する。通常、吸熱量と温度との関係を示す曲線には吸熱ピークが観測される。ここで、吸熱量が最大になる温度が、ガス発生温度である。 The gas generation temperature of the foaming agent can be measured using, for example, a differential scanning calorimeter (DSC). Specifically, a predetermined amount of foaming agent is weighed as a sample, and the thermal behavior of the foaming agent when the weighed foaming agent is heated at a predetermined temperature increase rate is measured by DSC. Usually, an endothermic peak is observed in the curve indicating the relationship between the endothermic amount and the temperature. Here, the temperature at which the endothermic amount is maximum is the gas generation temperature.
このような有機分解性発泡剤は、所定の温度で分解することにより発泡ガス、具体的には、例えば、窒素ガス(N2)、炭酸ガス(CO2)などを発生する。ガス発生温度は、特に限定されないが、電子部品の実装に用いられているハンダの融点を超えない温度であることが好ましく、具体的には、例えば、110~210℃、さらには120~180℃の範囲であることが好ましい。 Such an organic decomposable foaming agent generates foaming gas, specifically, for example, nitrogen gas (N 2 ), carbon dioxide gas (CO 2 ), etc. by decomposing at a predetermined temperature. The gas generation temperature is not particularly limited, but is preferably a temperature that does not exceed the melting point of the solder used for mounting the electronic component, and specifically, for example, 110 to 210 ° C., more preferably 120 to 180 ° C. It is preferable that it is the range of these.
液状硬化性樹脂組成物中の発泡剤の含有割合は、液状熱硬化性樹脂と発泡剤との合計量に対して、0.05~45質量%、さらには1~40質量%、とくには5~25質量であることが好ましい。液状硬化性樹脂組成物中の発泡剤の含有割合が高すぎる場合には、硬化性樹脂の含有割合が相対的に低下するために、得られる樹脂硬化物の密着性等の特性が低下する傾向がある。一方、液状硬化性樹脂組成物中の発泡剤の含有割合が低すぎる場合には発泡により樹脂硬化物が充分に厚膜化しない傾向がある。 The content of the foaming agent in the liquid curable resin composition is 0.05 to 45% by mass, more preferably 1 to 40% by mass, particularly 5%, based on the total amount of the liquid thermosetting resin and the foaming agent. It is preferably ˜25 mass. When the content ratio of the foaming agent in the liquid curable resin composition is too high, the content ratio of the curable resin is relatively decreased, and thus the properties such as adhesion of the obtained resin cured product tend to be decreased. There is. On the other hand, when the content of the foaming agent in the liquid curable resin composition is too low, the resin cured product tends not to be sufficiently thick due to foaming.
液状硬化性樹脂組成物は、必要に応じて、添加剤を含有していてもよい。添加剤の具体例としては、例えば、硬化用触媒、整泡剤、乳化剤、難燃剤(リン化合物、ハロゲン化合物など)、酸化防止剤、老化防止剤、紫外線吸収剤、可塑剤、充填材(タルク、クレー、炭酸カルシウム、シリカ粉、アルミナ、カーボンブラック、酸化チタン、酸化鉄など)、染料、顔料等が挙げられる。添加剤は1種を単独でまたは2種以上を組み合わせて用いてもよい。 The liquid curable resin composition may contain an additive as necessary. Specific examples of additives include, for example, curing catalysts, foam stabilizers, emulsifiers, flame retardants (phosphorus compounds, halogen compounds, etc.), antioxidants, anti-aging agents, ultraviolet absorbers, plasticizers, fillers (talc) Clay, calcium carbonate, silica powder, alumina, carbon black, titanium oxide, iron oxide, etc.), dyes, pigments and the like. You may use an additive individually by 1 type or in combination of 2 or more types.
液状硬化性樹脂組成物は、液状の硬化性樹脂と発泡剤とを均一に混合し、脱泡することにより調製できる。なお、液状硬化性樹脂組成物は、その粘度を調整するために希釈剤を含有してもよい。希釈剤を用いる場合、希釈材の含有割合は、取扱い性、塗工性、レベリング性等の観点から40~90質量%、さらには50~80質量%であることが好ましい。
液状硬化性樹脂組成物の溶液粘度としては、1000~100mPa・sec、さらには400~200mPa・secであることが好ましい。このような溶液粘度の場合には、電子部品の表面を覆うオーバーコート材としても、フリップチップ実装のアンダーフィル材としても塗工可能であるために、一度の工程で、オーバーコート材とアンダーフィル材とを同時に塗工することができる。なお、溶液粘度は粘度カップの落下時間による方法により測定された値である。
The liquid curable resin composition can be prepared by uniformly mixing a liquid curable resin and a foaming agent and defoaming. The liquid curable resin composition may contain a diluent in order to adjust its viscosity. When a diluent is used, the content of the diluent is preferably 40 to 90% by mass, more preferably 50 to 80% by mass, from the viewpoints of handleability, coating properties, leveling properties, and the like.
The solution viscosity of the liquid curable resin composition is preferably 1000 to 100 mPa · sec, more preferably 400 to 200 mPa · sec. In the case of such a solution viscosity, since it can be applied as an overcoat material for covering the surface of an electronic component or as an underfill material for flip chip mounting, the overcoat material and the underfill material can be applied in a single process. The material can be applied simultaneously. The solution viscosity is a value measured by a method based on the drop time of the viscosity cup.
次に、上述したような液状硬化性樹脂組成物を用いた電子部品実装構造体の製造方法について図1A~図1Dを参照しながら詳しく説明する。
本実施形態の電子部品実装構造体の製造方法は、回路基板表面に形成された電極に、電子部品に接続された端子をハンダ付けすることにより、電子部品を回路基板に実装する実装工程と、ハンダ付けにより形成された回路基板表面上のハンダ接合部を被覆するように硬化性樹脂と発泡剤とを含有する液状硬化性樹脂組成物を塗布する塗布工程と、液状硬化性樹脂組成物を発泡剤が発泡する温度より低い温度で硬化させることにより樹脂硬化物を形成させる硬化工程と、樹脂硬化物の少なくとも一部分を加熱することにより、発泡剤を発泡させる発泡工程と、を備える。
回路基板表面に電子部品を実装する実装工程は、例えば、図1Aに示すように、回路基板3の表面に形成された実装領域である電極1a,1b,1cの所定の位置に電子部品2a,2b,2cの端子をハンダ付けして接合することにより実装する工程である。
電子部品2aはICパッケージであり、その表面に形成された電極7は回路基板表面に形成された電極1aにワイヤーWによりワイヤーボンディングすることにより接続されている。電子部品2bはICパッケージであり、裏面に形成された図略の電極は回路基板表面に形成された電極1bにハンダバンプs1によりフリップチップ実装することにより接続されている。電子部品2cはコネクタであり、スルーホール実装用の複数のリード端子Lを回路基板に形成されたスルーホールH2に挿入し、その裏面に形成された電極1cに各リード端子Lをハンダ付けしてスルーホール実装することにより接続されている。
Next, a method for manufacturing an electronic component mounting structure using the liquid curable resin composition as described above will be described in detail with reference to FIGS. 1A to 1D.
The manufacturing method of the electronic component mounting structure according to the present embodiment includes a mounting step of mounting the electronic component on the circuit board by soldering a terminal connected to the electronic component to an electrode formed on the surface of the circuit board. Applying a liquid curable resin composition containing a curable resin and a foaming agent to cover the solder joints on the circuit board surface formed by soldering, and foaming the liquid curable resin composition A curing step of forming a resin cured product by curing at a temperature lower than the temperature at which the agent foams, and a foaming step of foaming the foaming agent by heating at least a part of the resin cured product.
For example, as shown in FIG. 1A, the mounting process for mounting electronic components on the surface of the circuit board includes
The
回路基板の具体例としては、リジッド基板、フレキシブル基板等を含む各種プリント基板が挙げられる。リジッド基板は、繊維基材にエポキシ樹脂等の硬化性樹脂を含浸させたプリプレグを複数枚積層して加熱加圧成形して得られる基板表面に、フォトレジスト法等の公知の回路形成方法を用いて銅箔等からなる回路が形成されたプリント配線基板である。また、フレキシブル基板はポリイミドフィルム等の耐熱性樹脂フィルムの表面に回路形成されたものである。 Specific examples of circuit boards include various printed boards including rigid boards and flexible boards. A rigid substrate uses a known circuit forming method such as a photoresist method on the surface of a substrate obtained by laminating a plurality of prepregs impregnated with a curable resin such as an epoxy resin on a fiber base material and heating and pressing. A printed wiring board on which a circuit made of copper foil or the like is formed. The flexible substrate is formed by forming a circuit on the surface of a heat-resistant resin film such as a polyimide film.
本実施形態の電子部品実装構造体の製造方法に用いられうる電子部品の具体例としては、例えば、各種ICパッケージ、各種抵抗体、各種発光ダイオード、各種コンデンサ、各種コネクタ等が挙げられる。回路基板表面に実装される電子部品の数は、一つでも複数であってもよい。通常は、用途に応じて、複数個実装される。 Specific examples of electronic components that can be used in the method for manufacturing an electronic component mounting structure according to this embodiment include various IC packages, various resistors, various light emitting diodes, various capacitors, various connectors, and the like. The number of electronic components mounted on the circuit board surface may be one or more. Usually, a plurality of packages are mounted depending on the application.
回路基板表面に電子部品を実装する方法は、特に限定されず、公知の表面実装法やスルーホール実装法が用いられうる。具体的には、例えば、次のようなものが挙げられる。電子部品2aの表面に形成された複数の電極7と回路基板3の表面に形成された電極1aとを、金線等の細線で接続するワイヤーボンディング接続が挙げられる。また、電子部品2bの表面に形成された図略の電極に形成された複数の突起状のハンダバンプs1を、各ハンダバンプs1に対応するように回路基板3の表面に形成された電極1bに載せ、リフロー炉に通過させることにより接合するフリップチップ実装が挙げられる。さらに、スルーホール実装用の複数のリード端子Lを有する電子部品2cのリード端子Lを回路基板に形成されたスルーホールH2に挿入し、その裏面に形成された電極1cに各リード端子Lをハンダ付けするスルーホール実装が挙げられる。
The method for mounting electronic components on the circuit board surface is not particularly limited, and a known surface mounting method or through-hole mounting method can be used. Specific examples include the following. Examples thereof include wire bonding connection in which a plurality of
次に、ハンダ付けにより形成された回路基板表面上のハンダ接合部を被覆するように発泡剤を含有する液状硬化性樹脂組成物を塗布する塗布工程について説明する。
例えば、図1Bに示すように、塗布工程は、回路基板3と電子部品2a,2b,2cとのハンダ付けにより形成されたハンダ接合部を保護する樹脂硬化物を形成するために、ハンダ接合部を被覆するように発泡剤を含有する液状硬化性樹脂組成物4を塗布する工程である。なお、このとき、回路基板3表面に実装された電子部品2a,2b,2cを包埋するように液状硬化性樹脂組成物4を塗布した後、液状硬化性樹脂組成物4を硬化させることにより電子部品2a,2b,2cを外部環境から保護するための樹脂硬化物も同時に形成することができる。なお、フリップチップ実装されている電子部品2bは、本工程において、電子部品2bと回路基板3との隙間vにさらに液状硬化性樹脂組成物4を充填することにより、フリップチップ接続のアンダーフィル材も供給される。これにより電子部品2bには、オーバーコート材とアンダーフィル材とが、一つの工程で同時に塗工される。液状硬化性樹脂組成物の塗布方法は特に制限されないが、具体的には、例えば、ディスペンサ(吐出装置)を用いる塗布方法が挙げられる。また、スルーホール実装された電子部品2cのハンダ付けされたリード端子Lを保護するために、回路基板3の裏面のハンダ接合部にも液状硬化性樹脂組成物4を塗布することにより、スルーホール実装による電子部品2cと電極1cとの接合部にも樹脂硬化物からなる被膜を形成することができる。
Next, an application process for applying a liquid curable resin composition containing a foaming agent so as to cover a solder joint on the surface of the circuit board formed by soldering will be described.
For example, as shown in FIG. 1B, the coating process is performed to form a resin joint that protects the solder joint formed by soldering the
液状硬化性樹脂組成物の塗布量は特に限定されない。具体的には、例えば、10~80μm、さらには20~50μmであることが好ましい。このような厚みに塗布した場合には、硬化後の発泡工程において、平坦部で20~160μm、さらには40~100μm、電子部品のエッジ部やリード端子の先端部等で10~40μm、さらには20~30μmになるような厚い膜厚の樹脂硬化物の被膜が得られる。 The coating amount of the liquid curable resin composition is not particularly limited. Specifically, for example, it is preferably 10 to 80 μm, more preferably 20 to 50 μm. When applied to such a thickness, in the foaming process after curing, the flat part is 20 to 160 μm, further 40 to 100 μm, the edge part of the electronic component or the tip part of the lead terminal is 10 to 40 μm, and A film of a cured resin film having a thickness as large as 20 to 30 μm can be obtained.
次に、上述のように塗布された液状硬化性樹脂組成物を発泡剤が発泡しない温度で硬化させることにより樹脂硬化物を形成させる硬化工程について説明する。
例えば図1Cに示すように、本工程では、回路基板3表面に実装された電子部品2a,2b,2cのハンダ接合部や、電子部品2a,2b,2cの外表面及び回路基板3表面の各電子部品の実装領域の周囲を被覆している液状硬化性樹脂組成物4を発泡剤が発泡しない温度で硬化させることにより、樹脂硬化物5を形成する。硬化方法は、液状硬化性樹脂組成物4が熱硬化性樹脂を含有する場合には、発泡剤が発泡しないガス発生温度以下の温度で硬化させる。また、液状硬化性樹脂組成物4が、光硬化性樹脂を含有する場合には、光硬化に充分な量の光を照射する。さらに、液状硬化性樹脂組成物4が、電子線硬化性樹脂を含有する場合には、電子線硬化に充分な量の電子線を照射する。このような方法により、塗布された液状硬化性樹脂組成物4が硬化され、樹脂硬化物5が形成される。
Next, a curing process for forming a resin cured product by curing the liquid curable resin composition applied as described above at a temperature at which the foaming agent does not foam will be described.
For example, as shown in FIG. 1C, in this step, each of the solder joints of the
次に、上述したように形成された、樹脂硬化物5の少なくとも一部分を加熱することにより、発泡剤を発泡させる発泡工程について説明する。
Next, a foaming process for foaming the foaming agent by heating at least a part of the cured
例えば図1Dに示すように、発泡工程では、硬化工程で形成された樹脂硬化物5の膜厚を厚くしたい部分である破線Bで囲んだ領域を加熱することにより、加熱された領域の樹脂硬化物5に含有される発泡剤が発泡して気孔6を形成し、樹脂硬化物5が発泡構造を形成する。これにより、電子部品実装構造体10が形成される。気孔6を形成する際のガスの圧力により、樹脂硬化物5の膜厚が増加する。このように樹脂硬化物5の厚膜化したい部分だけを選択的に加熱した場合には、とくに補強したい部分、具体的には、電子部品のコーナー部やリード端子の先端部のような厚い被膜を形成しにくい部分にも容易に厚い保護被膜を形成することができる。これにより、補強したい部分やリード端子の先端部等のような厚膜の保護被膜を形成したい部分に対して、別工程で塗工して厚膜化することなく、一度の塗工で厚膜部を形成することができる。
ここで、本実施形態の製造方法の効果をさらに具体的に説明する。図2に示すような、回路基板13にICパッケージ60とリード端子61とを含む電子部品52を実装して得られた電子部品実装構造体20を例にして、図3に示した従来の電子部品実装構造体50と比較して詳しく説明する。
電子部品実装構造体20は、保護被膜である樹脂硬化物12の膜厚が、図3に示した従来の電子部品実装構造体50の保護被膜である樹脂硬化物53の膜厚よりも厚くなっている以外は同様である。電子部品実装構造体20においては、リード端子61の先端部分の領域及び電子部品52のエッジ部分に形成される樹脂硬化物12の膜厚を、樹脂硬化物12を発泡させることにより厚くしている。それにより、塗布後の液状硬化性樹脂組成物の界面張力の影響により優先的に薄くなりやすい領域の厚みを厚くしている。このように、硬化後に膜厚を厚くしたい部分を加熱することにより、樹脂硬化物12の膜厚を制御することができる。このような方法によれば、別の保護被膜を重ねて厚い膜厚を確保する必要がない。なお、所定部分のみを加熱するためには、例えば、比較的小さな発熱体を備えたヒータを所定部分の上部に近接させ所定部分を直接加熱する、あるいはヒータで過熱した空気を所定部分に噴き付けて加熱する方法等が用いられる。
For example, as shown in FIG. 1D, in the foaming step, the region of the resin cured
Here, the effect of the manufacturing method of this embodiment will be described more specifically. 2, the electronic
In the electronic
発泡工程における加熱温度は、発泡剤のガス発生温度以上であって、電子部品と回路基板との接合に用いられているハンダの融点を超えない温度であることが好ましい。具体的には、例えば、110~210℃、さらには、120~180℃の範囲であることが好ましい。また、加熱時間は目的とする発泡倍率により適宜調整されるが、例えば、1~10分、さらには3~7分の範囲であることが好ましい。なお、加熱温度及び加熱時間を変化させることにより、発泡状態を制御することができる。そして、発泡倍率が高いほど、樹脂硬化物がより厚膜化する。発泡後の樹脂硬化物は、発泡前の樹脂硬化物の膜厚にもよるが、平坦部で20~100μm、さらには20~95μmであり、リード端子の先端部や電子部品のエッジ部等においては20~40μm、さらには20~35μmであることが好ましい。
発泡された部分の樹脂硬化物の発泡工程の前後における見かけ体積の変化は、発泡工程後の見かけ体積が発泡工程前の見かけ体積の2~8倍、さらには3~5倍程度であることが好ましい。
It is preferable that the heating temperature in the foaming step is equal to or higher than the gas generation temperature of the foaming agent and does not exceed the melting point of the solder used for joining the electronic component and the circuit board. Specifically, for example, it is preferably in the range of 110 to 210 ° C., more preferably 120 to 180 ° C. The heating time is appropriately adjusted depending on the target foaming ratio, and is preferably in the range of, for example, 1 to 10 minutes, and more preferably 3 to 7 minutes. Note that the foaming state can be controlled by changing the heating temperature and the heating time. And the higher the expansion ratio, the thicker the resin cured product. The resin cured product after foaming is 20 to 100 μm at the flat part, and further 20 to 95 μm at the flat part, depending on the film thickness of the resin cured product before foaming. Is preferably 20 to 40 μm, more preferably 20 to 35 μm.
The change in the apparent volume before and after the foaming process of the resin cured product of the foamed part is that the apparent volume after the foaming process is about 2 to 8 times, further about 3 to 5 times the apparent volume before the foaming process. preferable.
なお、本実施形態においては、樹脂硬化物の膜厚を厚くしたい部分のみを選択的に加熱する場合について詳しく説明したが、樹脂硬化物全体を加熱してもよい。樹脂硬化物全体を加熱する場合には、樹脂硬化物が形成された回路基板を、所定の温度に設定された加熱炉等に所定の時間載置すればよい。このような場合には、形成された樹脂硬化物全体の膜厚が、発泡工程により増加する。 In addition, in this embodiment, although the case where only the part which wants to thicken the film thickness of a resin cured material was selectively heated was demonstrated in detail, you may heat the whole resin cured material. When heating the entire cured resin, the circuit board on which the cured resin is formed may be placed in a heating furnace or the like set at a predetermined temperature for a predetermined time. In such a case, the film thickness of the entire formed resin cured product is increased by the foaming process.
次に、本発明を実施例に基づいて具体的に説明するが、本発明は以下の実施例に限定されるものではない。
[実施例1~8]
(液状硬化性樹脂組成物の調製)
本実施例では、液状熱硬化性樹脂として、無溶剤系液状シリコーン樹脂(東レダウコーニング(株)製の商品名:SE-9187L、以下、樹脂Aとも呼ぶ)、または希釈剤(専用シンナー904(商品名))で溶解した固形状ポリオレフィン(Chase Inc.製の商品名:Humiseal1B51NS、以下、樹脂Bとも呼ぶ)を用いた。なお、樹脂Bの溶液は、固形状ポリオレフィンと希釈剤との配合比率は、1:1(重量比)であった。
そして樹脂A、または樹脂Bの溶液と、発泡剤(4,4’-オキシビス(ベンゼンスルホニルヒドラジド;ガス発生温度約170℃)とを表1に示す割合で混合し、脱泡処理を施すことにより、液状硬化性樹脂組成物を調製した。なお、表1中の発泡剤の含有割合は、硬化性樹脂(固形分換算)と発泡剤との合計量に対する、発泡剤の重量割合である。
EXAMPLES Next, although this invention is demonstrated concretely based on an Example, this invention is not limited to a following example.
[Examples 1 to 8]
(Preparation of liquid curable resin composition)
In this example, as the liquid thermosetting resin, a solvent-free liquid silicone resin (trade name: SE-9187L manufactured by Toray Dow Corning Co., Ltd., hereinafter also referred to as Resin A), or a diluent (dedicated thinner 904 ( Solid polyolefin (trade name: Humiseal 1B51NS manufactured by Chase Inc., hereinafter also referred to as resin B) dissolved in (trade name)) was used. In the resin B solution, the blending ratio of the solid polyolefin and the diluent was 1: 1 (weight ratio).
Then, a solution of resin A or resin B and a foaming agent (4,4′-oxybis (benzenesulfonylhydrazide; gas generation temperature of about 170 ° C.)) are mixed at a ratio shown in Table 1 and subjected to defoaming treatment. A liquid curable resin composition was prepared, and the content ratio of the foaming agent in Table 1 is the weight ratio of the foaming agent to the total amount of the curable resin (in terms of solid content) and the foaming agent.
(電子部品の回路基板への実装)
FR-4タイプの回路基板に金属のリード端子部を備えた長さ10mm、幅10mm、高さ5mmのICパッケージをマウンターで載置し、最高温度240℃のリフロー炉を用いて実装した。なお、接合には、Sn-3Ag-0.5Cu(融点217-219℃)のハンダを用いた。
(Mounting electronic components on circuit boards)
An IC package having a length of 10 mm, a width of 10 mm, and a height of 5 mm provided with a metal lead terminal portion was mounted on an FR-4 type circuit board using a mounter, and mounted using a reflow furnace having a maximum temperature of 240 ° C. Note that solder of Sn-3Ag-0.5Cu (melting point: 217-219 ° C.) was used for bonding.
(塗布工程、硬化工程及び発泡工程)
回路基板に実装されたICパッケージを埋設するように、ICパッケージの外表面、接合部、及び回路基板表面のICパッケージを実装した領域の周囲に液状硬化性樹脂組成物をディスペンサを用いて塗布した。なお、表1に示すように、実施例1、2、5、及び7では、硬化性樹脂として樹脂Aを用い、実施例3、4、6、及び8では樹脂Bを用いた。
そして、液状硬化性樹脂組成物が塗布された回路基板を40℃に設定した加熱炉で60分間加熱することにより樹脂硬化物を形成した。次に、樹脂硬化物を形成させた回路基板を170℃に設定した加熱炉で5分間加熱することにより、樹脂硬化物中の発泡剤を発泡させた。このようにして、回路基板の主面にICパッケージが実装されており、ICパッケージが発泡構造の硬化物で覆われた電子部品実装構造体A~Hを得た。
(Coating process, curing process and foaming process)
A liquid curable resin composition was applied using a dispenser around the outer surface of the IC package, the joint, and the area where the IC package was mounted on the surface of the circuit board so as to embed the IC package mounted on the circuit board. . As shown in Table 1, in Examples 1, 2, 5, and 7, resin A was used as the curable resin, and in Examples 3, 4, 6, and 8, resin B was used.
And the resin hardened | cured material was formed by heating the circuit board with which the liquid curable resin composition was apply | coated for 60 minutes with the heating furnace set to 40 degreeC. Next, the foaming agent in the cured resin was foamed by heating the circuit board on which the cured resin was formed in a heating furnace set at 170 ° C. for 5 minutes. In this manner, the electronic component mounting structures A to H in which the IC package was mounted on the main surface of the circuit board and the IC package was covered with the foamed cured product were obtained.
(評価)
得られた電子部品実装構造体A~Hを下記の方法により評価した。
[膜厚の変化]
電子部品実装構造体A~Hの製造において、発泡工程の前後における膜厚を測定した。なお、硬化物の膜厚は、回路基板の平坦な部分、及び、ICパッケージのエッジ部分の2箇所で測定した。
(Evaluation)
The obtained electronic component mounting structures A to H were evaluated by the following methods.
[Change in film thickness]
In manufacturing the electronic component mounting structures A to H, the film thickness before and after the foaming process was measured. The film thickness of the cured product was measured at two locations, a flat portion of the circuit board and an edge portion of the IC package.
[エッジ部分絶縁性]
電子部品実装構造体A~Hについて、ICパッケージのエッジ部分に形成された硬化物に50Vの直流電流を流しながら水滴を滴下したときの発煙の発生を目視で確認した。
[Edge insulation]
Regarding the electronic component mounting structures A to H, generation of smoke when a water droplet was dropped while a direct current of 50 V was applied to the cured product formed at the edge portion of the IC package was visually confirmed.
[密着性]
電子部品実装構造体A~Hに形成された硬化物の碁盤目テープ剥離試験を行った。具体的には、回路基板の平坦な部分の樹脂硬化物からなる被膜にカッターナイフ及びカッターガイドを用いて、1mm×1mm四方の100個のグリッドを有する碁盤目に切り欠いた。そして、被膜の碁盤目に切り欠いた領域にセロハンテープを強く圧着させた後、テープの端を45°の角度で急速に引き剥がしたときのグリッドの剥離数を数えた。
[Adhesion]
A cross-cut tape peeling test was performed on the cured products formed on the electronic component mounting structures A to H. Specifically, a film made of a resin cured product on a flat portion of a circuit board was cut out on a grid having 100 grids of 1 mm × 1 mm square using a cutter knife and a cutter guide. Then, after the cellophane tape was strongly pressure-bonded to the area cut out in the grid of the coating, the number of peeling of the grid when the tape edge was rapidly peeled off at an angle of 45 ° was counted.
表1に示すように、実施例1~8の何れにおいても、発泡剤を含有する液状樹脂組成物からなる樹脂硬化物で封止した後、発泡剤を発泡させることにより、発泡工程前の膜厚よりも発泡工程後の膜厚の方が増加していた。
また、発泡剤含有割合が1~40質量%の液状樹脂組成物を用いた実施例1~4は、硬化物中の発泡剤を発泡させることにより、エッジ部分の硬化物の膜厚が20μm以上の厚いものであった。そのために、エッジ部の絶縁性がとくに優れていた。一方、発泡剤含有割合が0.01質量%の液状樹脂組成物を用いた実施例5及び実施例6では、エッジ部分の膜厚は増加しなかった。そのために、エッジ部の絶縁性が少し劣っていた。また、発泡剤含有割合が50質量%の液状樹脂組成物を用いた実施例7及び実施例8では、エッジ部分の膜厚の増加率は高いために、エッジ部の絶縁性は優れていた。しかしながら、発泡剤の含有割合が高すぎるために、密着性がやや低下した。
As shown in Table 1, in any of Examples 1 to 8, after sealing with a resin cured product composed of a liquid resin composition containing a foaming agent, the foaming agent is foamed to form a film before the foaming step. The film thickness after the foaming process increased more than the thickness.
In Examples 1 to 4 using the liquid resin composition having a foaming agent content of 1 to 40% by mass, the film thickness of the cured product at the edge portion is 20 μm or more by foaming the foaming agent in the cured product. It was a thick one. Therefore, the insulating property of the edge portion was particularly excellent. On the other hand, in Examples 5 and 6 using the liquid resin composition having a foaming agent content of 0.01% by mass, the film thickness of the edge portion did not increase. Therefore, the insulating property of the edge part was slightly inferior. Moreover, in Example 7 and Example 8 using the liquid resin composition whose foaming agent content rate is 50 mass%, since the increase rate of the film thickness of an edge part is high, the insulation of the edge part was excellent. However, since the content of the foaming agent was too high, the adhesion was slightly lowered.
本発明の電子部品実装構造体の製造方法によれば、回路基板と電子部品との接合部を保護する保護被膜を形成する場合において、厚みを容易に制御することができる。このような製造方法を用いることにより、容易な工程で、保護特性の高い保護被膜を形成することができる。従って、回路基板にICパッケージ、抵抗体、発光ダイオード、コンデンサ、コネクタ等の電子部品を実装して得られる電子部品実装構造体の保護に有用である。 According to the method for manufacturing an electronic component mounting structure of the present invention, the thickness can be easily controlled in the case of forming a protective film that protects the joint between the circuit board and the electronic component. By using such a manufacturing method, a protective film having a high protective property can be formed by an easy process. Therefore, it is useful for protecting an electronic component mounting structure obtained by mounting electronic components such as an IC package, a resistor, a light emitting diode, a capacitor, and a connector on the circuit board.
1a,1b,1c…回路基板表面に形成された電極
2a,2b,2c,52…電子部品
3,13…回路基板
4…液状硬化性樹脂組成物
5,12,53…樹脂硬化物
6…気孔
7…電子部品に形成された電極
10…回路基板
20,50…電子部品実装構造体
55…ハンダ
60…ICパッケージ
61…リード端子、
v…電子部品2bと回路基板3との隙間
H1,H2…スルーホール
DESCRIPTION OF
v: Gap between
Claims (12)
前記ハンダ付けにより形成された前記回路基板表面上のハンダ接合部を被覆するように硬化性樹脂と発泡剤とを含有する液状硬化性樹脂組成物を塗布する塗布工程と、
前記液状硬化性樹脂組成物を前記発泡剤が発泡する温度より低い温度で硬化させることにより樹脂硬化物を形成させる硬化工程と、
前記樹脂硬化物の少なくとも一部分を加熱することにより、前記発泡剤を発泡させる発泡工程と、を備えることを特徴とする電子部品実装構造体の製造方法。 A mounting step of mounting the electronic component on the circuit board by soldering a terminal connected to the electronic component to the electrode formed on the surface of the circuit board;
An application step of applying a liquid curable resin composition containing a curable resin and a foaming agent so as to cover a solder joint on the surface of the circuit board formed by the soldering;
A curing step of forming a resin cured product by curing the liquid curable resin composition at a temperature lower than a temperature at which the foaming agent foams;
And a foaming step of foaming the foaming agent by heating at least a part of the cured resin product.
前記塗布工程は、前記電子部品の外表面,及び前記前記ハンダ接合部の周囲を一体的に被覆するとともに、前記電子部品と前記回路基板との隙間を充填するように前記液状硬化性樹脂組成物を塗布する工程である請求項2に記載の電子部品実装構造体の製造方法。 The surface mounting is a step of flip-chip mounting the electronic component on an electrode formed on the surface of the circuit board;
In the coating step, the outer surface of the electronic component and the periphery of the solder joint are integrally covered, and the liquid curable resin composition is filled so as to fill a gap between the electronic component and the circuit board. The method for manufacturing an electronic component mounting structure according to claim 2, wherein the electronic component mounting structure is applied.
前記ハンダ付けされた部分が樹脂硬化物で被覆されており、
前記樹脂硬化物は、発泡剤と硬化性樹脂とを含む硬化性樹脂組成物の硬化物であり、
前記樹脂硬化物の少なくとも一部分の発泡剤が発泡していることを特徴とする電子部品実装構造体。 An electronic component mounting structure including a circuit board and at least one electronic component mounted on the circuit board by soldering,
The soldered part is coated with a cured resin,
The resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin,
An electronic component mounting structure, wherein a foaming agent of at least a part of the cured resin is foamed.
前記樹脂硬化物は、前記電子部品と前記回路基板との間に形成される隙間にさらに充填されている請求項8に記載の電子部品実装構造体。 The electronic component is mounted by flip chip mounting on an electrode formed on the surface of the circuit board,
The electronic component mounting structure according to claim 8, wherein the cured resin is further filled in a gap formed between the electronic component and the circuit board.
前記電子部品は電子部品本体と電子部品本体に接続されたスルーホール実装用の複数のリード端子を有し、前記回路基板は前記第1面から第2面に貫通する複数のスルーホールと前記第2面の表面に前記各スルーホールの周囲に設けられた回路を有し、
前記各リード端子は前記各スルーホールに挿入されて、前記回路にハンダ付けされており、
前記第2面の表面のハンダ付けされた部分及びその周囲が樹脂硬化物で被覆されており、
前記樹脂硬化物は、発泡剤と硬化性樹脂とを含む硬化性樹脂組成物の硬化物であり、
前記樹脂硬化物の少なくとも一部分の発泡剤が発泡していることを特徴とする電子部品実装構造体。 An electronic component mounting structure including a circuit board and at least one electronic component mounted on the first surface of the circuit board,
The electronic component has an electronic component main body and a plurality of lead terminals for mounting through holes connected to the electronic component main body, and the circuit board has a plurality of through holes penetrating from the first surface to the second surface, and the first A circuit provided around each through-hole on the surface of two surfaces;
Each lead terminal is inserted into each through-hole and soldered to the circuit,
The soldered portion of the surface of the second surface and its periphery are coated with a resin cured product,
The resin cured product is a cured product of a curable resin composition containing a foaming agent and a curable resin,
An electronic component mounting structure, wherein a foaming agent of at least a part of the cured resin is foamed.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011518276A JP5523454B2 (en) | 2009-06-08 | 2010-06-03 | Manufacturing method of electronic component mounting structure |
| CN201080025456.3A CN102460667B (en) | 2009-06-08 | 2010-06-03 | Method of producing electronic component mounting structure, and electronic component mounting structure |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-137230 | 2009-06-08 | ||
| JP2009137230 | 2009-06-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2010143379A1 true WO2010143379A1 (en) | 2010-12-16 |
Family
ID=43308642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2010/003707 Ceased WO2010143379A1 (en) | 2009-06-08 | 2010-06-03 | Method of producing electronic component mounting structure, and electronic component mounting structure |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5523454B2 (en) |
| CN (1) | CN102460667B (en) |
| WO (1) | WO2010143379A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013039653A (en) * | 2011-08-19 | 2013-02-28 | Hitachi Koki Co Ltd | Electric power tool and method for manufacturing the same |
| JP2014127647A (en) * | 2012-12-27 | 2014-07-07 | Mitsubishi Electric Corp | Power conversion device and refrigerator |
| KR101461041B1 (en) * | 2012-11-30 | 2014-11-13 | 유니콘 주식회사 | Power suppling apparatus of light emitted diode |
| KR20150057886A (en) * | 2013-11-20 | 2015-05-28 | 삼성에스디아이 주식회사 | Integrated silicone for protecting electronic devices, circuit module using the same, and the method thereof |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012018928A1 (en) * | 2012-09-25 | 2014-03-27 | Infineon Technologies Ag | Semiconductor housing for chip cards |
| CN103390693B (en) * | 2013-07-29 | 2016-04-27 | 宁晋阳光新能源有限公司 | The recycling method of solar cell section home roll |
| WO2019004132A1 (en) * | 2017-06-26 | 2019-01-03 | マクセルホールディングス株式会社 | Method for manufacturing circuit component and circuit component |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04192397A (en) * | 1990-11-26 | 1992-07-10 | Hitachi Ltd | Packaging structure and electronic device using same |
| JPH0487680U (en) * | 1990-11-30 | 1992-07-30 | ||
| JPH09315059A (en) * | 1996-05-31 | 1997-12-09 | Toppan Printing Co Ltd | IC card and method of manufacturing IC card |
| JP2001060756A (en) * | 1999-08-23 | 2001-03-06 | Toyota Motor Corp | Electronic component mounting method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63244747A (en) * | 1987-03-31 | 1988-10-12 | Toshiba Corp | Resin sealed integrated circuit device and manufacture thereof |
| CN100495677C (en) * | 2005-03-29 | 2009-06-03 | 松下电器产业株式会社 | Flip chip packaging method and bump forming method |
-
2010
- 2010-06-03 JP JP2011518276A patent/JP5523454B2/en not_active Expired - Fee Related
- 2010-06-03 CN CN201080025456.3A patent/CN102460667B/en not_active Expired - Fee Related
- 2010-06-03 WO PCT/JP2010/003707 patent/WO2010143379A1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04192397A (en) * | 1990-11-26 | 1992-07-10 | Hitachi Ltd | Packaging structure and electronic device using same |
| JPH0487680U (en) * | 1990-11-30 | 1992-07-30 | ||
| JPH09315059A (en) * | 1996-05-31 | 1997-12-09 | Toppan Printing Co Ltd | IC card and method of manufacturing IC card |
| JP2001060756A (en) * | 1999-08-23 | 2001-03-06 | Toyota Motor Corp | Electronic component mounting method |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013039653A (en) * | 2011-08-19 | 2013-02-28 | Hitachi Koki Co Ltd | Electric power tool and method for manufacturing the same |
| US9539649B2 (en) | 2011-08-19 | 2017-01-10 | Hitachi Koki Co., Ltd. | Power tool and method for producing the same |
| KR101461041B1 (en) * | 2012-11-30 | 2014-11-13 | 유니콘 주식회사 | Power suppling apparatus of light emitted diode |
| JP2014127647A (en) * | 2012-12-27 | 2014-07-07 | Mitsubishi Electric Corp | Power conversion device and refrigerator |
| KR20150057886A (en) * | 2013-11-20 | 2015-05-28 | 삼성에스디아이 주식회사 | Integrated silicone for protecting electronic devices, circuit module using the same, and the method thereof |
| JP2015103808A (en) * | 2013-11-20 | 2015-06-04 | 三星エスディアイ株式会社Samsung SDI Co.,Ltd. | Silicon-containing composition for electronic element protection, circuit module arranged by use thereof, and manufacturing method thereof |
| KR102177502B1 (en) * | 2013-11-20 | 2020-11-11 | 삼성에스디아이 주식회사 | Integrated silicone for protecting electronic devices, circuit module using the same, and the method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102460667B (en) | 2014-11-12 |
| JP5523454B2 (en) | 2014-06-18 |
| CN102460667A (en) | 2012-05-16 |
| JPWO2010143379A1 (en) | 2012-11-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5523454B2 (en) | Manufacturing method of electronic component mounting structure | |
| JP5442118B2 (en) | Mounting structure, manufacturing method thereof, and mounting structure repair method | |
| KR101175482B1 (en) | flip chip mounting method and bump forming method | |
| EP3202866B1 (en) | Conductive coating material and method for producing shield package using same | |
| US9957411B2 (en) | Underfill material and method for manufacturing semiconductor device using the same | |
| US20080191347A1 (en) | Conductive ball-or pin-mounted semiconductor packaging substrate, method for manufacturing the same and conductive bonding material | |
| TWI637021B (en) | Bottom filling material and manufacturing method of semiconductor device using the same | |
| CN103289621A (en) | Thermosetting resin composition | |
| KR20200098583A (en) | Manufacturing method of mounting structure | |
| WO2009147828A1 (en) | Manufacturing method for semiconductor device and semiconductor device | |
| JP2010171118A (en) | Surface mounting method for component to be mounted, structure with mounted component obtained by the method, and liquid epoxy resin composition for underfill used in the method | |
| WO2004059721A1 (en) | Electronic component unit | |
| EP3051580B1 (en) | Underfill material and method for manufacturing semiconductor device using said underfill material | |
| TWI649842B (en) | Bottom filling material and manufacturing method of semiconductor device using the same | |
| KR102522785B1 (en) | Manufacturing method of mounting structure and laminated sheet used therein | |
| CN101103449A (en) | Method of connecting semiconductor package to printed wiring board | |
| US8551819B2 (en) | Method for surface mounting using cleaning-free activated resinous composition | |
| JP2001329048A (en) | Liquid epoxy resin composition for sealing filler | |
| JP2009246026A (en) | Paste-like adhesive, and method of manufacturing substrate incorporating electronic components using the same | |
| KR101545962B1 (en) | Solder balls formed with an adhesive layer | |
| CN106170850A (en) | The method of preparation semiconductor packages and contactless upwards spraying system purposes in preparation semiconductor packages | |
| JP2015108155A (en) | Liquid epoxy resin composition for underfill, mounting component structure using the same, and surface mounting method for mounting component | |
| JP2006278589A (en) | Resin composition for mounting electronic components and method for mounting electronic components | |
| JP2007180062A (en) | Printed circuit board manufacturing method and dispenser device | |
| JP2007131820A (en) | Resin composition for sealing, bonded structure containing the same, and method for sealing electronic component |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 201080025456.3 Country of ref document: CN |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10785911 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2011518276 Country of ref document: JP |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 10785911 Country of ref document: EP Kind code of ref document: A1 |
