WO2012103885A4 - Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür - Google Patents

Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür Download PDF

Info

Publication number
WO2012103885A4
WO2012103885A4 PCT/DE2012/100020 DE2012100020W WO2012103885A4 WO 2012103885 A4 WO2012103885 A4 WO 2012103885A4 DE 2012100020 W DE2012100020 W DE 2012100020W WO 2012103885 A4 WO2012103885 A4 WO 2012103885A4
Authority
WO
WIPO (PCT)
Prior art keywords
crucible
titanium
separating device
protective layer
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2012/100020
Other languages
English (en)
French (fr)
Other versions
WO2012103885A1 (de
Inventor
Johan MATHIASSON
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Solibro GmbH
Original Assignee
Solibro GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solibro GmbH filed Critical Solibro GmbH
Priority to US13/982,985 priority Critical patent/US20140026815A1/en
Priority to CN2012800075670A priority patent/CN103459650A/zh
Priority to JP2013552106A priority patent/JP6050255B2/ja
Priority to KR1020137019831A priority patent/KR20130110211A/ko
Priority to EP12713863.4A priority patent/EP2670877A1/de
Publication of WO2012103885A1 publication Critical patent/WO2012103885A1/de
Publication of WO2012103885A4 publication Critical patent/WO2012103885A4/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • H10F71/1221—The active layers comprising only Group IV materials comprising polycrystalline silicon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/546—Polycrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating
    • Y10T29/49986—Subsequent to metal working

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

Die Erfindung bezieht sich auf eine Abscheidevorrichtung, aufweisend einen Tiegel (1) und Heizmittel (2), welche angeordnet sind, Verdampfungsmaterial (3) in dem Tiegel (1) aufzuwärmen, wobei der Tiegel (1) einen metallischen Körper (11) und einen Schutzschicht (13) aufweist, welche Titanoxid (TixOy) umfasst und zumindest einen Teil der Innenoberfläche (12) des metallischen Körpers (11) bedeckt. Ferner betrifft die Erfindung ein Verfahren zur Herstellung eines Tiegels (1) für eine derartige Abscheidevorrichtung.

Claims

GEÄNDERTE ANSPRÜCHE beim Internationalen Büro eingegangen am 30 Juli 2012 (30.07.2012)
1. Abscheidevorrichtung, aufweisend einen Tiegel (1 ) und Heizmittel (2), welche angeordnet sind, Verdampfungsmaterial (3) in dem Tiegel
(I ) aufzuwärmen, wobei der Tiegel (1 ) einen metallischen Körper
(I I ) und eine Schutzschicht (13) mit einer Dicke von mindestens 50nm aufweist, welche Titanoxid (TixOy) umfasst und zumindest einen Teil der Innenoberfläche (12) des metallischen Körpers (11 ) bedeckt, wobei der Körper (11 ) des Tiegels (1 ) aus Titan oder aus einer Titan-basierten Legierung gebildet ist.
2. Abscheidevorrichtung nach Anspruch 1 , dadurch gekennzeichnet, dass das Titanoxid (TixOy) der Schutzschicht (13) eine induzierte
Oxidschicht ist.
3. Abscheidevorrichtung nach Anspruch 1 oder 2, dadurch
gekennzeichnet, dass die Titan-basierte Legierung Palladium umfasst.
4. Abscheidevorrichtung nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass der Körper (11 ) des Tiegels (1 ) aus Metallblech gebildet ist.
5. Abscheidevorrichtung nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, dass die Schutzschicht (13) eine Dicke von mindestens 50nm, mindestens 100nm, mindestens 150nm,
mindestens 200nm, mindestens 300nm oder mindestens 500nm aufweist.
6. Abscheidevorrichtung nach einem der vorangehenden Ansprüche, gekennzeichnet durch Mittel zum Halten eines Solarzellensubstrates zum Abscheiden des in dem Tiegel (1 ) angeordneten
Verdampfungsmaterials (3) auf eine Oberfläche des
Solarzellensubstrates.
GEÄNDERTES BLATT (ARTIKEL 19)
7. Verfahren zur Herstellung eines Tiegels (1 ) für eine
Abscheidevorrichtung, umfassend ein Bereitstellen eines aus einem metallischen Material gebildeten Tiegelkörpers (11 ) und ein Bedecken zumindest eines Teils der Innenoberfläche (12) des metallischen Körpers (11 ) mittels einer Schutzschicht (13) mit einer Dicke von mindestens 50nm umfassend Titanoxid (TixOy), wobei der
Tiegelkörper (11 ) aus Titan oder aus einer Titan-basierten Legierung gebildet ist.
8. Verfahren nach Anspruch 7, dadurch gekennzeichnet, dass die
Titanoxid-Schutzschicht (13) mittels Oxidation des Teils der
Innenoberfläche (12) des Tiegelkörpers (11 ) hergestellt ist.
9. Verfahren nach Anspruch 7 oder 8, dadurch gekennzeichnet, dass das metallische Material des Körpers (11 ) des Tiegels (1 ) in einem
Walzverfahren erzeugt wird.
GEÄNDERTES BLATT (ARTIKEL 19)

IN ARTIKEL 19 (1 ) GENANNTE ERKLÄRUNG In Anspruch 1 wurden folgende Merkmale ergänzt:

1. Schutzschicht (13) weist eine Dicke von mindestens 50nm auf. Dieses Merkmal wurde in Anspruch 6 offenbart. Es wurde ergänzt, um sich noch weiter vom ermittelten Stand der Technik abzugrenzen.

2. Der Körper (11 ) des Tiegels (1 ) ist aus Titan oder aus einer Titan-basierten Legierung gebildet. Dieses Merkmal wurde in Anspruch 3 und in der

Beschreibung auf Seite 4 im dritten Absatz offenbart. Es wurde ergänzt, um klarzustellen, dass auch ein reines Titanmetall unter dem Begriff

Titanlegierung gemäß der Erfindung fällt.

Der Verfahrensanspruch (jetzt Anspruch 7) wurde an den Anspruch 1 angepasst.

PCT/DE2012/100020 2011-02-04 2012-01-31 Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür Ceased WO2012103885A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US13/982,985 US20140026815A1 (en) 2011-02-04 2012-01-31 Separating Device and Method for Producing A Crucible For Said Separating Device
CN2012800075670A CN103459650A (zh) 2011-02-04 2012-01-31 蒸镀装置和用于为其生产坩埚的方法
JP2013552106A JP6050255B2 (ja) 2011-02-04 2012-01-31 堆積装置および堆積装置用の坩堝を生産する方法
KR1020137019831A KR20130110211A (ko) 2011-02-04 2012-01-31 분리 장치 및 상기 분리 장치용 도가니의 제조 방법
EP12713863.4A EP2670877A1 (de) 2011-02-04 2012-01-31 Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011000502A DE102011000502A1 (de) 2011-02-04 2011-02-04 Abscheidevorrichtung und Verfahren zur Herstellung eines Tiegels hierfür
DE102011000502.1 2011-02-04

Publications (2)

Publication Number Publication Date
WO2012103885A1 WO2012103885A1 (de) 2012-08-09
WO2012103885A4 true WO2012103885A4 (de) 2012-10-18

Family

ID=45952809

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2012/100020 Ceased WO2012103885A1 (de) 2011-02-04 2012-01-31 Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür

Country Status (8)

Country Link
US (1) US20140026815A1 (de)
EP (1) EP2670877A1 (de)
JP (1) JP6050255B2 (de)
KR (1) KR20130110211A (de)
CN (1) CN103459650A (de)
DE (1) DE102011000502A1 (de)
TW (1) TWI576447B (de)
WO (1) WO2012103885A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470110B (zh) * 2012-09-07 2015-01-21 Manz Taiwan Ltd 用於化學沉積設備的夾固裝置
KR101582672B1 (ko) * 2013-12-17 2016-01-05 (주)알파플러스 증발용 도가니와 이를 포함하는 진공 증발원 및 진공 증착 장치
US11272579B2 (en) * 2016-06-17 2022-03-08 Tocalo Co., Ltd. Heat generating component
SG10201608496UA (en) * 2016-10-11 2018-05-30 Au Optronics Corp Crucible
CN109972096B (zh) * 2017-12-28 2021-04-13 核工业西南物理研究院 一种在料舟表面沉积金属涂层的方法
CN109161854A (zh) * 2018-10-11 2019-01-08 北京铂阳顶荣光伏科技有限公司 蒸镀装置及装置保护层的制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1022278A (en) * 1963-05-19 1966-03-09 Abraham Bar Or Improvements in or relating to crucibles
DE1544222A1 (de) * 1966-08-19 1970-02-26 Licentia Gmbh Vorrichtung zum Schmelzen und Verdampfen von Halbleiterstoffen,insbesondere von Selen
US3890140A (en) * 1973-05-10 1975-06-17 Us Energy Aluminum titanate crucible for molten uranium
US4342044A (en) * 1978-03-08 1982-07-27 Energy Conversion Devices, Inc. Method for optimizing photoresponsive amorphous alloys and devices
DE3328355A1 (de) * 1983-08-05 1985-02-14 Degussa Ag, 6000 Frankfurt Tiegel zur aufnahme von salzbaedern fuer das borieren von staehlen
JPH01139988A (ja) * 1987-11-26 1989-06-01 Toshiba Corp 金属溶解用るつぼ
US5135782A (en) * 1989-06-12 1992-08-04 Rostoker, Inc. Method of siliciding titanium and titanium alloys
JPH0537214A (ja) * 1991-07-26 1993-02-12 Tdk Corp 多層基板による共振器
US5934900A (en) * 1996-03-29 1999-08-10 Integrated Thermal Sciences, Inc. Refractory nitride, carbide, ternary oxide, nitride/oxide, oxide/carbide, oxycarbide, and oxynitride materials and articles
TW533440B (en) * 2000-12-19 2003-05-21 Toho Titanium Co Ltd Method for forming titanium oxide film and titanium electrolytic capacitor
JP4439894B2 (ja) * 2003-12-01 2010-03-24 株式会社半導体エネルギー研究所 蒸着用るつぼ及び蒸着装置
KR100592304B1 (ko) 2004-11-05 2006-06-21 삼성에스디아이 주식회사 가열 용기와 이를 구비한 증착 장치
US8323348B2 (en) * 2005-02-22 2012-12-04 Taiyen Biotech Co., Ltd. Bone implants
TW200632013A (en) * 2005-03-02 2006-09-16 Nano Tech Chemical & System Ltd The film-forming method of producing an inorganic protective film on the metal surface
JP4032068B2 (ja) * 2005-07-28 2008-01-16 株式会社神戸製鋼所 燃料電池用のセパレータに用いるチタン材
JP4738113B2 (ja) * 2005-09-15 2011-08-03 株式会社東芝 真空蒸着装置用るつぼおよびそれを用いた有機ｅｌディスプレイの製造方法
KR100805531B1 (ko) * 2006-06-13 2008-02-20 삼성에스디아이 주식회사 증발원
CN100582289C (zh) * 2006-06-28 2010-01-20 鸿富锦精密工业（深圳）有限公司 组合式坩埚
KR101263005B1 (ko) 2006-12-19 2013-05-08 비코 인스트루먼츠 인코포레이티드 증착 장치 및 방법
JP4941754B2 (ja) 2007-09-05 2012-05-30 ソニー株式会社 蒸着装置
US20090217876A1 (en) * 2008-02-28 2009-09-03 Ceramic Technologies, Inc. Coating System For A Ceramic Evaporator Boat
JP5469950B2 (ja) * 2008-08-08 2014-04-16 株式会社半導体エネルギー研究所 発光装置の作製方法
WO2010110871A2 (en) * 2009-03-25 2010-09-30 Veeco Instruments Inc. Deposition of high vapor pressure materials

Also Published As

Publication number Publication date
TWI576447B (zh) 2017-04-01
KR20130110211A (ko) 2013-10-08
US20140026815A1 (en) 2014-01-30
DE102011000502A1 (de) 2012-08-09
EP2670877A1 (de) 2013-12-11
WO2012103885A1 (de) 2012-08-09
JP2014508860A (ja) 2014-04-10
CN103459650A (zh) 2013-12-18
JP6050255B2 (ja) 2016-12-21
TW201233831A (en) 2012-08-16

Similar Documents

Publication Publication Date Title
WO2012103885A4 (de) Abscheidevorrichtung und verfahren zur herstellung eines tiegels hierfür
DE102010030465B4 (de) Verfahren zum Herstellen eines Blechformteils aus einem höherfesten Stahlblechmaterial mit einer elektrolytisch aufgebrachten Zink-Nickel-Beschichtung
DE102012224124A1 (de) Beschichtungsmaterial für eine Aluminiumdruckgussform und Verfahren zum Herstellen des Beschichtungsmaterials
EP3094763A1 (de) Gleitelement, insbesondere kolbenring
EP2824213A1 (de) Verfahren zur Verbesserung der Haftfähigkeit auf einem schutzbeschichteten Stahlblech
WO2012093150A1 (de) Verfahren zur oberflächenbehandlung eines schutzbeschichteten substrats
EP2944706A8 (de) Verfahren zur Herstellung eines durch Warmumformen geformten Stahlbauteils aus einem eine metallische Beschichtung aufweisendem Stahlblech, ein solches Stahlblech sowie ein daraus durch Warmumformen hergestelltes Stahlbauteil
EP4433234A1 (de) Verfahren zum herstellen eines schmelztauchbeschichteten stahlblechs und schmelztauchbeschichtetes stahlblech
EP3112497A8 (de) Graphenbeschichtung auf einem magnesiumlegierungssubstrat
AT514229B1 (de) Verfahren zur Oberflächenbehandlung eines metallischen Substrats
EP2196322A3 (de) Sicherheitselement
EP2243861A3 (de) Verfahren zur Herstellung einer Solarabsorberbeschichtung
WO2017054862A1 (de) Stahlwerkstück mit verbesserter oberflächenqualität
WO2017020965A1 (de) Verfahren zum erzeugen eines zink-magnesium-galvannealed-schmelztauchüberzugs und mit einem solchen überzug versehenes stahlflachprodukt
EP3261493B1 (de) Verfahren zur herstellung einer polsterfeder, polsterfeder, matratze und polstermöbel
EP3143182A1 (de) BAUTEIL, VERWENDUNG EINES BAUTEILS SOWIE VERFAHREN ZUR HERSTELLUNG EINES VERSCHLEIßBESTÄNDIGEN UND REIBUNGSREDUZIERENDEN BAUTEILS
WO2018078484A1 (de) Verfahren für die aufbringung einer schichtstruktur durch thermodiffusion auf eine metallische oder intermetallische oberfläche
EP3160737B1 (de) Verfahren zur herstellung eines stanzbauteils
EP3236197A3 (de) Dehnungssensor und verfahren zum herstellen eines dehnungssensors
EP3448207B1 (de) Polsterfeder, verfahren zur herstellung einer polsterfeder, matratze und polstermöbel
DE102018118695A1 (de) Synergie zur verbesserten thermischen Sprühhaftung
DE102017003698B3 (de) Herstellung einer dünnen Substratschicht
DE102013216393A1 (de) Intermetallische Verschleißschutzschicht für Titan-Werkstoffe
EP2871257A1 (de) Verfahren zum Beschichten mit anschließendem Umschmelzverfahren
DE102013006317A1 (de) Verfahren zur Erzeugung einer tiefschwarzen Optik

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12713863

Country of ref document: EP

Kind code of ref document: A1

WD Withdrawal of designations after international publication

Designated state(s): DE

ENP Entry into the national phase

Ref document number: 20137019831

Country of ref document: KR

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 2013552106

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2012713863

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 13982985

Country of ref document: US