ZA857435B - Photosensitive polymer compositions,electrophoretic deposition processes using same,and the use of same in forming films on substrates - Google Patents

Photosensitive polymer compositions,electrophoretic deposition processes using same,and the use of same in forming films on substrates

Info

Publication number
ZA857435B
ZA857435B ZA857435A ZA857435A ZA857435B ZA 857435 B ZA857435 B ZA 857435B ZA 857435 A ZA857435 A ZA 857435A ZA 857435 A ZA857435 A ZA 857435A ZA 857435 B ZA857435 B ZA 857435B
Authority
ZA
South Africa
Prior art keywords
same
substrates
polymer compositions
deposition processes
photosensitive polymer
Prior art date
Application number
ZA857435A
Other languages
English (en)
Inventor
William David Emmons
Mark Robert Winkle
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=67809744&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA857435(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of ZA857435B publication Critical patent/ZA857435B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/138—Corona discharge process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
ZA857435A 1984-09-26 1985-09-26 Photosensitive polymer compositions,electrophoretic deposition processes using same,and the use of same in forming films on substrates ZA857435B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/654,821 US4592816A (en) 1984-09-26 1984-09-26 Electrophoretic deposition process
CN86100150A CN86100150A (zh) 1984-09-26 1986-01-11 感光聚合物组合物及其电泳沉积工艺过程

Publications (1)

Publication Number Publication Date
ZA857435B true ZA857435B (en) 1987-11-25

Family

ID=67809744

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA857435A ZA857435B (en) 1984-09-26 1985-09-26 Photosensitive polymer compositions,electrophoretic deposition processes using same,and the use of same in forming films on substrates

Country Status (19)

Country Link
US (1) US4592816A (fr)
EP (1) EP0176356B1 (fr)
JP (1) JPH081519B2 (fr)
KR (1) KR920005775B1 (fr)
CN (2) CN86100150A (fr)
AU (1) AU586189B2 (fr)
BR (1) BR8504640A (fr)
CA (1) CA1257803A (fr)
DE (1) DE3566047D1 (fr)
DK (1) DK168802B1 (fr)
FI (1) FI80350C (fr)
HK (1) HK58289A (fr)
IE (1) IE58622B1 (fr)
IL (1) IL76491A (fr)
MX (1) MX165458B (fr)
NO (1) NO168857C (fr)
PH (1) PH22139A (fr)
SG (1) SG8489G (fr)
ZA (1) ZA857435B (fr)

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CA1182469A (fr) 1981-12-11 1985-02-12 William D. Emmons Esters d'homopolymeres d'acide acrylique obtenus par la reaction de condensation de michael
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Publication number Publication date
NO168857B (no) 1991-12-30
AU586189B2 (en) 1989-07-06
FI80350B (fi) 1990-01-31
BR8504640A (pt) 1986-07-15
FI853691L (fi) 1986-03-27
EP0176356A2 (fr) 1986-04-02
JPS6180240A (ja) 1986-04-23
PH22139A (en) 1988-06-01
IE58622B1 (en) 1993-10-20
SG8489G (en) 1989-07-14
HK58289A (en) 1989-07-28
NO853738L (no) 1986-04-01
EP0176356A3 (en) 1986-08-20
US4592816A (en) 1986-06-03
FI80350C (fi) 1990-05-10
KR860002735A (ko) 1986-04-28
DE3566047D1 (en) 1988-12-08
JPH081519B2 (ja) 1996-01-10
IE852343L (en) 1986-03-26
EP0176356B1 (fr) 1988-11-02
FI853691A0 (fi) 1985-09-25
AU4786285A (en) 1986-04-10
IL76491A (en) 1989-07-31
KR920005775B1 (ko) 1992-07-18
CA1257803A (fr) 1989-07-25
DK434885A (da) 1986-03-27
IL76491A0 (en) 1986-01-31
CN1058431A (zh) 1992-02-05
CN86100150A (zh) 1987-07-22
DK434885D0 (da) 1985-09-25
NO168857C (no) 1992-04-08
DK168802B1 (da) 1994-06-13
MX165458B (es) 1992-11-11

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