ZA859821B - Multilayer ohmic contact for p-type semiconductor and method of making same - Google Patents

Multilayer ohmic contact for p-type semiconductor and method of making same

Info

Publication number
ZA859821B
ZA859821B ZA859821A ZA859821A ZA859821B ZA 859821 B ZA859821 B ZA 859821B ZA 859821 A ZA859821 A ZA 859821A ZA 859821 A ZA859821 A ZA 859821A ZA 859821 B ZA859821 B ZA 859821B
Authority
ZA
South Africa
Prior art keywords
type semiconductor
ohmic contact
layer
making same
elements
Prior art date
Application number
ZA859821A
Other languages
English (en)
Inventor
Bulent Mehmet Basol
Original Assignee
Sohio Commercial Dev Co
Bp Photovoltaics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sohio Commercial Dev Co, Bp Photovoltaics Ltd filed Critical Sohio Commercial Dev Co
Publication of ZA859821B publication Critical patent/ZA859821B/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/62—Electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H10P14/47—Electrolytic deposition, i.e. electroplating; Electroless plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/543—Solar cells from Group II-VI materials

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Led Devices (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
ZA859821A 1984-12-28 1985-12-23 Multilayer ohmic contact for p-type semiconductor and method of making same ZA859821B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/687,092 US4680611A (en) 1984-12-28 1984-12-28 Multilayer ohmic contact for p-type semiconductor and method of making same

Publications (1)

Publication Number Publication Date
ZA859821B true ZA859821B (en) 1986-09-24

Family

ID=24759001

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA859821A ZA859821B (en) 1984-12-28 1985-12-23 Multilayer ohmic contact for p-type semiconductor and method of making same

Country Status (9)

Country Link
US (1) US4680611A (fr)
EP (1) EP0186350B1 (fr)
JP (1) JPS61222180A (fr)
AT (1) ATE56105T1 (fr)
AU (2) AU581946B2 (fr)
CA (1) CA1236224A (fr)
DE (1) DE3579429D1 (fr)
ES (1) ES8800785A1 (fr)
ZA (1) ZA859821B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735662A (en) * 1987-01-06 1988-04-05 The Standard Oil Company Stable ohmic contacts to thin films of p-type tellurium-containing II-VI semiconductors
JP2659714B2 (ja) * 1987-07-21 1997-09-30 株式会社日立製作所 半導体集積回路装置
JPH01111380A (ja) * 1987-10-23 1989-04-28 Sumitomo Metal Ind Ltd 光起電力素子及びその製造方法
US5393675A (en) * 1993-05-10 1995-02-28 The University Of Toledo Process for RF sputtering of cadmium telluride photovoltaic cell
US5557146A (en) * 1993-07-14 1996-09-17 University Of South Florida Ohmic contact using binder paste with semiconductor material dispersed therein
US5909632A (en) * 1997-09-25 1999-06-01 Midwest Research Institute Use of separate ZnTe interface layers to form OHMIC contacts to p-CdTe films
CN101779290B (zh) 2007-09-25 2013-02-27 第一太阳能有限公司 包括界面层的光伏器件
CN101960613A (zh) * 2008-03-07 2011-01-26 国立大学法人东北大学 光电转换元件结构和太阳能电池
US8524524B2 (en) * 2010-04-22 2013-09-03 General Electric Company Methods for forming back contact electrodes for cadmium telluride photovoltaic cells
US20110272010A1 (en) * 2010-05-10 2011-11-10 International Business Machines Corporation High work function metal interfacial films for improving fill factor in solar cells
WO2017091269A2 (fr) * 2015-08-31 2017-06-01 The Board Of Regents Of The University Of Oklahoma Dispositifs semiconducteurs comprenant des matériaux nanostructurés inclus dans une matrice

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3370207A (en) * 1964-02-24 1968-02-20 Gen Electric Multilayer contact system for semiconductor devices including gold and copper layers
US3268309A (en) * 1964-03-30 1966-08-23 Gen Electric Semiconductor contact means
US3465428A (en) * 1966-10-27 1969-09-09 Trw Inc Method of fabricating semiconductor devices and the like
US4065781A (en) * 1974-06-21 1977-12-27 Westinghouse Electric Corporation Insulated-gate thin film transistor with low leakage current
US4000508A (en) * 1975-07-17 1976-12-28 Honeywell Inc. Ohmic contacts to p-type mercury cadmium telluride
JPS5237785A (en) * 1975-09-20 1977-03-23 Agency Of Ind Science & Technol Process for production of photovoltaic elements
JPS5356988A (en) * 1976-11-04 1978-05-23 Agency Of Ind Science & Technol Photovoltaic element
JPS5454589A (en) * 1977-10-11 1979-04-28 Agency Of Ind Science & Technol Photoelectric transducer and production of the same
US4319069A (en) * 1980-07-25 1982-03-09 Eastman Kodak Company Semiconductor devices having improved low-resistance contacts to p-type CdTe, and method of preparation
JPS6033793B2 (ja) * 1981-01-19 1985-08-05 株式会社村田製作所 銅被膜を有するセラミツク体
JPS57126101A (en) * 1981-01-29 1982-08-05 Murata Manufacturing Co Method of forming electrode for barium titanate series semiconductor porcelain
US4388483A (en) * 1981-09-08 1983-06-14 Monosolar, Inc. Thin film heterojunction photovoltaic cells and methods of making the same
JPS5931041A (ja) * 1982-08-13 1984-02-18 Seiko Epson Corp 薄膜半導体装置
US4456630A (en) * 1983-08-18 1984-06-26 Monosolar, Inc. Method of forming ohmic contacts
JPH1151A (ja) * 1997-06-11 1999-01-06 Takashi Osawa ゲルマニウムミネラルを含んだ野菜を作る 土壌改良植成剤

Also Published As

Publication number Publication date
JPS61222180A (ja) 1986-10-02
EP0186350A2 (fr) 1986-07-02
CA1236224A (fr) 1988-05-03
AU5085185A (en) 1986-07-03
AU3404589A (en) 1989-08-31
US4680611A (en) 1987-07-14
AU608154B2 (en) 1991-03-21
AU581946B2 (en) 1989-03-09
DE3579429D1 (de) 1990-10-04
EP0186350A3 (en) 1988-01-20
EP0186350B1 (fr) 1990-08-29
ES550464A0 (es) 1987-11-16
ES8800785A1 (es) 1987-11-16
ATE56105T1 (de) 1990-09-15

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