ZA965647B - Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates - Google Patents

Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

Info

Publication number
ZA965647B
ZA965647B ZA965647A ZA965647A ZA965647B ZA 965647 B ZA965647 B ZA 965647B ZA 965647 A ZA965647 A ZA 965647A ZA 965647 A ZA965647 A ZA 965647A ZA 965647 B ZA965647 B ZA 965647B
Authority
ZA
South Africa
Prior art keywords
mole
chem
formula
amount
present
Prior art date
Application number
ZA965647A
Other languages
English (en)
Inventor
Harald Baumann
Udo Dwars
Celin M Savariar-Hauck
Hans-Joachim Timpe
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of ZA965647B publication Critical patent/ZA965647B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/28—Condensation with aldehydes or ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
ZA965647A 1995-07-07 1996-07-03 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates ZA965647B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19524851A DE19524851C2 (de) 1995-07-07 1995-07-07 Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten

Publications (1)

Publication Number Publication Date
ZA965647B true ZA965647B (en) 1997-06-06

Family

ID=7766308

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA965647A ZA965647B (en) 1995-07-07 1996-07-03 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

Country Status (7)

Country Link
US (2) US5700619A (fr)
EP (1) EP0752430B1 (fr)
AT (1) ATE196481T1 (fr)
CA (1) CA2180581A1 (fr)
DE (2) DE19524851C2 (fr)
ES (1) ES2151625T3 (fr)
ZA (1) ZA965647B (fr)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19525050C2 (de) * 1995-07-10 1999-11-11 Kodak Polychrome Graphics Llc Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19639897A1 (de) * 1996-09-27 1998-04-02 Sun Chemical Corp Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE69836840T2 (de) 1997-10-17 2007-10-11 Fujifilm Corp. Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser
DE19825244A1 (de) 1998-06-05 1999-12-16 Kodak Polychrome Graphics Gmbh Offsetdruckplatte mit hoher Auflagenstabilität
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
DE69930832T2 (de) * 1998-07-10 2006-11-30 Az Electronic Materials Usa Corp. Benutzung einer zusammensetzung für eine antireflexunterschicht
EP1208378B9 (fr) * 1999-07-08 2014-12-10 Lee H. Angros Dispositif et procede de demasquage et/ou de coloration d'antigenes
US6255033B1 (en) 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
US6238833B1 (en) * 1999-09-01 2001-05-29 Xerox Corporation Binder resin with reduced hydroxyl content
US6391524B2 (en) 1999-11-19 2002-05-21 Kodak Polychrome Graphics Llc Article having imagable coatings
DE10011096A1 (de) 2000-03-09 2001-10-11 Clariant Gmbh Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
US6555283B1 (en) 2000-06-07 2003-04-29 Kodak Polychrome Graphics Llc Imageable element and waterless printing plate
US6458511B1 (en) 2000-06-07 2002-10-01 Kodak Polychrome Graphics Llc Thermally imageable positive-working lithographic printing plate precursor and method for imaging
US6270938B1 (en) * 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6555291B1 (en) 2000-08-14 2003-04-29 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
JP4248137B2 (ja) 2000-11-22 2009-04-02 富士フイルム株式会社 ネガ型感光性平版印刷版
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
US6458503B1 (en) * 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
US6596456B2 (en) * 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
US6517988B1 (en) 2001-07-12 2003-02-11 Kodak Polychrome Graphics Llc Radiation-sensitive, positive working coating composition based on carboxylic copolymers
US6562527B2 (en) * 2001-08-17 2003-05-13 Kodak Polychrome Graphics Llc Imaged members and method of preparation thereof
US6783913B2 (en) * 2002-04-05 2004-08-31 Kodak Polychrome Graphics Llc Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing
DE10233631B4 (de) * 2002-07-24 2004-09-30 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
US7045269B2 (en) * 2003-03-10 2006-05-16 Eastman Kodak Company Method for forming images using negative working imageable elements
US6902861B2 (en) * 2003-03-10 2005-06-07 Kodak Polychrome Graphics, Llc Infrared absorbing compounds and their use in photoimageable elements
US7060409B2 (en) * 2003-03-10 2006-06-13 Eastman Kodak Company Imageable elements with improved dot stability
US6921626B2 (en) * 2003-03-27 2005-07-26 Kodak Polychrome Graphics Llc Nanopastes as patterning compositions for electronic parts
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US7094503B2 (en) * 2003-03-27 2006-08-22 Kodak Graphics Communications Canada Company Nanopastes for use as patterning compositions
US7081322B2 (en) * 2003-03-27 2006-07-25 Kodak Graphics Communications Canada Company Nanopastes as ink-jet compositions for printing plates
US6908726B2 (en) * 2003-04-07 2005-06-21 Kodak Polychrome Graphics Llc Thermally imageable elements imageable at several wavelengths
DE10345362A1 (de) * 2003-09-25 2005-04-28 Kodak Polychrome Graphics Gmbh Verfahren zur Verhinderung von Beschichtungsdefekten
DE102004026609A1 (de) * 2004-06-01 2006-01-12 Wacker Polymer Systems Gmbh & Co. Kg Aminofunktionelle Polyvinylacetale
US7473515B2 (en) * 2005-06-03 2009-01-06 American Dye Source, Inc. Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use
US7723013B2 (en) * 2007-01-11 2010-05-25 Southern Lithoplate, Inc. Negative-acting photolithographic printing plate with improved pre-burn performance
US7544462B2 (en) 2007-02-22 2009-06-09 Eastman Kodak Company Radiation-sensitive composition and elements with basic development enhancers
JP5451137B2 (ja) * 2008-03-27 2014-03-26 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作製方法
EP2194429A1 (fr) 2008-12-02 2010-06-09 Eastman Kodak Company Compositions de gommage avec nanoparticules pour l'amélioration de la sensibilité aux éraflures et des zones sans images des plaques d'impression lithographiques
ATE555904T1 (de) 2009-08-10 2012-05-15 Eastman Kodak Co Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern
EP2293144B1 (fr) 2009-09-04 2012-11-07 Eastman Kodak Company Procédé pour le séchage de plaques d'impression lithographique consécutif à un processus à étape unique
ES2395993T3 (es) 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
CN101813888B (zh) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 一种重氮感光胶热稳定性和光化学活性的调控方法
EP2796929B1 (fr) 2011-03-31 2015-12-30 Fujifilm Corporation Précurseur de plaque d'impression lithographique et son procédé de préparation
EP2796928B1 (fr) 2011-03-31 2015-12-30 Fujifilm Corporation Précurseur de plaque d'impression lithographique et son procédé de préparation
EP2937733A4 (fr) * 2012-12-19 2016-09-14 Ibf Indústria Brasileira De Filmes S A Composition sensible au rayonnement dans des régions du spectre électromagnétique à des fins d'impression, plaque pour impression comprenant ladite composition, utilisation de ladite composition et procédé de développement d'image
WO2014106554A1 (fr) 2013-01-01 2014-07-10 Agfa Graphics Nv Copolymères (éthylène, acétal vinylique) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2933278B1 (fr) 2014-04-17 2018-08-22 Agfa Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
EP2944657B1 (fr) 2014-05-15 2017-01-11 Agfa Graphics Nv Copolymères (éthylène, acétal de vinyle) et leur utilisation dans des précurseurs de plaque d'impression lithographique
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (fr) 2014-06-30 2017-04-05 Agfa Graphics NV Précurseur de plaque d'impression lithographique comprenant des copolymères (éthylène, acétal de vinyle)
CN108093630B (zh) * 2015-05-04 2020-01-14 富林特集团德国有限公司 可激光雕刻的移印板
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
CN106896644B (zh) * 2017-03-27 2020-05-08 青岛蓝帆新材料有限公司 一种感光性树脂组合物及其应用
CN106909024B (zh) * 2017-03-28 2020-03-13 辽宁靖帆新材料有限公司 一种感光性树脂组合物及其应用

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2513190A (en) * 1948-02-18 1950-06-27 Du Pont Polymeric color formers
US3627783A (en) * 1964-02-01 1971-12-14 Merck & Co Inc 1-aroylindole-3-acetonitriles
DE2053364A1 (de) * 1970-10-30 1972-05-04 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopiermasse
BE788679A (fr) * 1971-09-13 1973-03-12 Scott Paper Co Composition de photopolymere
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
FR2401941A1 (fr) * 1977-08-31 1979-03-30 Saint Gobain Procede de fabrication de polyvinyl butyral et polyvinyl butyral obtenu par ce procede
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
DE3036077A1 (de) * 1980-09-25 1982-05-06 Hoechst Ag, 6000 Frankfurt Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial
EP0092901B1 (fr) * 1982-04-23 1987-10-14 Autotype International Limited Photopolymères
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JPH0782236B2 (ja) * 1984-10-12 1995-09-06 三菱化学株式会社 感光性組成物
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
US4681245A (en) * 1985-03-25 1987-07-21 Harvey Robert D Method and apparatus for dispensing oil well proppant additive
DE3678050D1 (de) * 1985-06-07 1991-04-18 Fuji Photo Film Co Ltd Hoergeraet mit einer schwenkbaren klappe.
US4670507A (en) * 1985-08-02 1987-06-02 American Hoechst Corporation Resin
US4665124A (en) * 1985-08-02 1987-05-12 American Hoechst Corporation Resin
US4895788A (en) * 1985-08-02 1990-01-23 Hoechst Celanese Corporation Water developable lithographic composition
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
CA1308595C (fr) * 1985-11-22 1992-10-13 Toshiaki Aoai Composition photosensible
JPH0693116B2 (ja) * 1986-01-21 1994-11-16 富士写真フイルム株式会社 感光性組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644162A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
US5260161A (en) * 1989-05-06 1993-11-09 Konica Corporation Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US5238772A (en) * 1989-06-21 1993-08-24 Hoechst Aktiengesellschaft Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
DE3928825A1 (de) * 1989-08-31 1991-03-07 Hoechst Ag Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
JP2739390B2 (ja) * 1990-11-21 1998-04-15 富士写真フイルム株式会社 平版印刷版の製造方法
JP3321162B2 (ja) * 1991-07-30 2002-09-03 コダック ポリクロウム グラフィクス リミティド ライアビリティ カンパニー 酸置換された三元アセタールポリマー並びに感光性組成物および平板印刷版におけるそれの使用
US5219699A (en) * 1991-07-30 1993-06-15 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymers
US5169897A (en) * 1991-07-30 1992-12-08 Eastman Kodak Company Binary acetal polymers useful in photosensitive compositions and lithographic printing plates
US5262270A (en) * 1991-07-30 1993-11-16 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing binary acetal polymers
US5275907A (en) * 1992-07-23 1994-01-04 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5534381A (en) * 1995-07-06 1996-07-09 Minnesota Mining And Manufacturing Company Acetal polymers useful in photosensitive compositions

Also Published As

Publication number Publication date
US5985996A (en) 1999-11-16
EP0752430A2 (fr) 1997-01-08
DE19524851A1 (de) 1997-01-09
DE69610373T2 (de) 2001-05-23
ES2151625T3 (es) 2001-01-01
ATE196481T1 (de) 2000-10-15
EP0752430B1 (fr) 2000-09-20
US5700619A (en) 1997-12-23
DE69610373D1 (de) 2000-10-26
DE19524851C2 (de) 1998-05-07
EP0752430A3 (fr) 1998-04-15
CA2180581A1 (fr) 1997-01-08

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