ATE143703T1 - Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall - Google Patents

Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall

Info

Publication number
ATE143703T1
ATE143703T1 AT90401820T AT90401820T ATE143703T1 AT E143703 T1 ATE143703 T1 AT E143703T1 AT 90401820 T AT90401820 T AT 90401820T AT 90401820 T AT90401820 T AT 90401820T AT E143703 T1 ATE143703 T1 AT E143703T1
Authority
AT
Austria
Prior art keywords
refractory metal
mandrel
enclosure
material containing
molded body
Prior art date
Application number
AT90401820T
Other languages
English (en)
Inventor
Pierre Jalby
Juichi Arai
Frederic Rotman
Pierre Claverie
Masao Kimura
Jean-Marie Friedt
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of ATE143703T1 publication Critical patent/ATE143703T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14—Deposition of only one other metal element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
AT90401820T 1990-06-26 1990-06-26 Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall ATE143703T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP90401820A EP0463266B1 (de) 1990-06-26 1990-06-26 Verfahren zum Herstellen selbsttragender Formkörper aus feuerfestem Metall

Publications (1)

Publication Number Publication Date
ATE143703T1 true ATE143703T1 (de) 1996-10-15

Family

ID=8205732

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90401820T ATE143703T1 (de) 1990-06-26 1990-06-26 Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall

Country Status (5)

Country Link
US (1) US5230847A (de)
EP (1) EP0463266B1 (de)
JP (1) JP3119896B2 (de)
AT (1) ATE143703T1 (de)
DE (1) DE69028771T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0486927A1 (de) * 1990-11-20 1992-05-27 Air Products And Chemicals, Inc. Abscheidung von Wolframschichten aus Mischungen von Wolframhexafluorid, Organohydrosilanen und Wasserstoff
DE4334818A1 (de) * 1993-03-10 1994-09-15 Sintec Keramik Gmbh Verfahren zur Herstellung von hochreinen, spannungsfreien interfraktionären Metallbeschichtungen oder Formkörper
JPH07118851A (ja) * 1993-10-26 1995-05-09 Tokyo Tungsten Co Ltd 高融点金属箔およびその製造方法
US5773104A (en) * 1996-11-13 1998-06-30 Plasma Processes, Inc. High temperature and highly corrosive resistant sample containment cartridge
US5937323A (en) * 1997-06-03 1999-08-10 Applied Materials, Inc. Sequencing of the recipe steps for the optimal low-k HDP-CVD processing
JP2001098357A (ja) * 1999-09-28 2001-04-10 Citizen Watch Co Ltd タングステン膜とその製造方法ならびに薄膜ヒーターとその製造方法
US6827796B2 (en) * 2000-11-02 2004-12-07 Composite Tool Company, Inc. High strength alloys and methods for making same
DE10153541B4 (de) * 2001-10-30 2008-05-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Blutgefäßadapter
DE10153542B4 (de) * 2001-10-30 2006-11-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von Adaptern für Blutgefäße
JP2004296558A (ja) 2003-03-26 2004-10-21 Osaka Prefecture 絶縁層埋め込み型単結晶炭化シリコン基板の製造方法及びその製造装置
EP2502964A1 (de) 2011-03-24 2012-09-26 Molda AG Verfahren zur Herstellung von Kollagen
US20160258053A1 (en) * 2015-03-03 2016-09-08 Joseph Robert Pickens Machine and Process for building 3-Dimensional Metal and Composite Structures by Using Carbonyl and Other Gases
US20230279544A1 (en) 2020-09-03 2023-09-07 Tcm Research Ltd. Additive chemical vapor deposition methods and systems

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3072983A (en) * 1960-05-31 1963-01-15 Brenner Abner Vapor deposition of tungsten
US4202080A (en) * 1977-02-14 1980-05-13 U.T.I.-Spectrotherm Corporation Mass spectrometer filter
JPS60145376A (ja) * 1983-12-30 1985-07-31 Fujitsu Ltd タングステンシリサイド膜の成長方法
US4851295A (en) * 1984-03-16 1989-07-25 Genus, Inc. Low resistivity tungsten silicon composite film
US4756927A (en) * 1986-05-29 1988-07-12 Massachusetts Institute Of Technology Method and apparatus for refractory metal deposition
EP0252667B1 (de) * 1986-06-30 1996-03-27 Nihon Sinku Gijutsu Kabushiki Kaisha Verfahren zum Abscheiden aus der Gasphase
JPH0772351B2 (ja) * 1986-12-01 1995-08-02 株式会社日立製作所 金属薄膜選択成長方法
JPS63286574A (ja) * 1987-05-18 1988-11-24 Nisshin Steel Co Ltd Ｃｖｄ法によるタングステンの蒸着法
US5055246A (en) * 1991-01-22 1991-10-08 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of forming high purity metal silicides targets for sputtering

Also Published As

Publication number Publication date
JP3119896B2 (ja) 2000-12-25
DE69028771T2 (de) 1997-02-13
EP0463266A1 (de) 1992-01-02
US5230847A (en) 1993-07-27
JPH04231471A (ja) 1992-08-20
DE69028771D1 (de) 1996-11-07
EP0463266B1 (de) 1996-10-02

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee