ATE161901T1 - Elektroplattierte kupferfolie und verfahren zu deren herstellung - Google Patents
Elektroplattierte kupferfolie und verfahren zu deren herstellungInfo
- Publication number
- ATE161901T1 ATE161901T1 AT94307388T AT94307388T ATE161901T1 AT E161901 T1 ATE161901 T1 AT E161901T1 AT 94307388 T AT94307388 T AT 94307388T AT 94307388 T AT94307388 T AT 94307388T AT E161901 T1 ATE161901 T1 AT E161901T1
- Authority
- AT
- Austria
- Prior art keywords
- foil
- cathode
- copper foil
- copper
- anode
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 4
- 239000011889 copper foil Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000011888 foil Substances 0.000 abstract 3
- 239000008151 electrolyte solution Substances 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 229910001431 copper ion Inorganic materials 0.000 abstract 1
- 239000006259 organic additive Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Laminated Bodies (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Cell Electrode Carriers And Collectors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/141,483 US5431803A (en) | 1990-05-30 | 1993-10-22 | Electrodeposited copper foil and process for making same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE161901T1 true ATE161901T1 (de) | 1998-01-15 |
Family
ID=22495882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT94307388T ATE161901T1 (de) | 1993-10-22 | 1994-10-07 | Elektroplattierte kupferfolie und verfahren zu deren herstellung |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US5431803A (de) |
| EP (1) | EP0649917B1 (de) |
| JP (2) | JP3270637B2 (de) |
| KR (1) | KR100364685B1 (de) |
| CN (1) | CN1047411C (de) |
| AT (1) | ATE161901T1 (de) |
| DE (1) | DE69407726T2 (de) |
| MY (1) | MY111485A (de) |
| RU (1) | RU2122049C1 (de) |
| TW (1) | TW373037B (de) |
Families Citing this family (118)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6123788A (en) * | 1993-04-19 | 2000-09-26 | Electrocopper Products Limited | Copper wire and process for making copper wire |
| JP2754157B2 (ja) * | 1994-03-31 | 1998-05-20 | 三井金属鉱業株式会社 | プリント配線板用電解銅箔の製造方法 |
| TW289900B (de) * | 1994-04-22 | 1996-11-01 | Gould Electronics Inc | |
| US6132887A (en) | 1995-06-16 | 2000-10-17 | Gould Electronics Inc. | High fatigue ductility electrodeposited copper foil |
| JP3313277B2 (ja) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | ファインパターン用電解銅箔とその製造方法 |
| TW432124B (en) | 1996-05-13 | 2001-05-01 | Mitsui Mining & Amp Smelting C | Electrolytic copper foil with high post heat tensile strength and its manufacturing method |
| TW336325B (en) * | 1996-05-24 | 1998-07-11 | Electrocopper Products Ltd | Copper wire and process for making copper wire |
| JP3053440B2 (ja) * | 1996-08-23 | 2000-06-19 | グールド エレクトロニクス インコーポレイテッド | 高性能の可撓性積層体 |
| US5863666A (en) * | 1997-08-07 | 1999-01-26 | Gould Electronics Inc. | High performance flexible laminate |
| JPH10195689A (ja) * | 1996-12-27 | 1998-07-28 | Fukuda Metal Foil & Powder Co Ltd | 微細孔明き金属箔の製造方法 |
| JPH10330983A (ja) | 1997-05-30 | 1998-12-15 | Fukuda Metal Foil & Powder Co Ltd | 電解銅箔及びその製造方法 |
| US6179988B1 (en) | 1997-08-29 | 2001-01-30 | Electrocopper Products Limited | Process for making copper wire |
| EP1019954B1 (de) | 1998-02-04 | 2013-05-15 | Applied Materials, Inc. | Methode und Apparat für die Niedertemperaturbehandlung von elektroplattierten Kupfer-Mikrostrukturen für mikroelektronische Anordnungen |
| US7244677B2 (en) | 1998-02-04 | 2007-07-17 | Semitool. Inc. | Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
| US6632292B1 (en) | 1998-03-13 | 2003-10-14 | Semitool, Inc. | Selective treatment of microelectronic workpiece surfaces |
| US6565729B2 (en) | 1998-03-20 | 2003-05-20 | Semitool, Inc. | Method for electrochemically depositing metal on a semiconductor workpiece |
| JP2000017476A (ja) * | 1998-04-30 | 2000-01-18 | Mitsui Mining & Smelting Co Ltd | 分散強化型電解銅箔及びその製造方法 |
| US6497801B1 (en) | 1998-07-10 | 2002-12-24 | Semitool Inc | Electroplating apparatus with segmented anode array |
| US6297154B1 (en) * | 1998-08-28 | 2001-10-02 | Agere System Guardian Corp. | Process for semiconductor device fabrication having copper interconnects |
| US6132589A (en) * | 1998-09-10 | 2000-10-17 | Ga-Tek Inc. | Treated copper foil and process for making treated copper foil |
| ES2367838T3 (es) | 1998-09-10 | 2011-11-10 | JX Nippon Mining & Metals Corp. | Laminado que comprende una hoja de cobre tratada y procedimiento para su fabricación. |
| US6117536A (en) * | 1998-09-10 | 2000-09-12 | Ga-Tek Inc. | Adhesion promoting layer for use with epoxy prepregs |
| CN1184359C (zh) * | 1998-09-14 | 2005-01-12 | 三井金属鉱业株式会社 | 多孔铜箔及其用途和制造方法 |
| US6916412B2 (en) | 1999-04-13 | 2005-07-12 | Semitool, Inc. | Adaptable electrochemical processing chamber |
| US7351315B2 (en) | 2003-12-05 | 2008-04-01 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
| KR100695660B1 (ko) | 1999-04-13 | 2007-03-19 | 세미툴 인코포레이티드 | 개선된 처리 유체 유동을 갖는 처리 챔버를 구비하는가공편 프로세서 |
| US7020537B2 (en) | 1999-04-13 | 2006-03-28 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
| US7438788B2 (en) | 1999-04-13 | 2008-10-21 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| US7264698B2 (en) | 1999-04-13 | 2007-09-04 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| US7351314B2 (en) | 2003-12-05 | 2008-04-01 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
| US7189318B2 (en) | 1999-04-13 | 2007-03-13 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
| US7585398B2 (en) | 1999-04-13 | 2009-09-08 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
| JP2000340911A (ja) | 1999-05-25 | 2000-12-08 | Mitsui Mining & Smelting Co Ltd | プリント配線板用銅箔 |
| US8298395B2 (en) * | 1999-06-30 | 2012-10-30 | Chema Technology, Inc. | Electroplating apparatus |
| WO2001031723A1 (en) | 1999-10-22 | 2001-05-03 | Sanyo Electric Co., Ltd. | Electrode for lithium secondary cell and lithium secondary cell |
| JP3250994B2 (ja) * | 1999-12-28 | 2002-01-28 | 三井金属鉱業株式会社 | 電解銅箔 |
| JP3521074B2 (ja) * | 2000-01-06 | 2004-04-19 | 三井金属鉱業株式会社 | 電解銅箔の物性検査方法 |
| DE10005680B4 (de) * | 2000-02-07 | 2005-03-31 | Cis Solartechnik Gmbh | Trägermaterial für eine flexible, bandförmige CIS-Solarzelle |
| US6780374B2 (en) | 2000-12-08 | 2004-08-24 | Semitool, Inc. | Method and apparatus for processing a microelectronic workpiece at an elevated temperature |
| US6471913B1 (en) | 2000-02-09 | 2002-10-29 | Semitool, Inc. | Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature |
| LU90532B1 (en) * | 2000-02-24 | 2001-08-27 | Circuit Foil Luxembourg Trading Sarl | Comosite copper foil and manufacturing method thereof |
| US7102763B2 (en) | 2000-07-08 | 2006-09-05 | Semitool, Inc. | Methods and apparatus for processing microelectronic workpieces using metrology |
| JP2002105699A (ja) * | 2000-10-02 | 2002-04-10 | Nikko Materials Co Ltd | 銅張り積層板用電解銅箔及びその製造方法 |
| US20050098262A1 (en) * | 2001-07-03 | 2005-05-12 | Chia-Pin Lin | Method of laminating copper foil onto a printed circuit board |
| JP2003013156A (ja) * | 2001-07-04 | 2003-01-15 | Nippon Mining & Metals Co Ltd | 積層板用銅合金箔 |
| LU90804B1 (fr) * | 2001-07-18 | 2003-01-20 | Circuit Foil Luxembourg Trading Sarl | Process for manufacturing a composite foil suitable for manufacturing multi-layer printed circuit boards |
| WO2003012174A1 (en) * | 2001-07-27 | 2003-02-13 | Pirelli Pneumatici S.P.A. | Electrolytic process for depositing a layer of copper on a steel wire |
| JP2003041334A (ja) * | 2001-08-01 | 2003-02-13 | Nippon Mining & Metals Co Ltd | 積層板用銅合金箔 |
| JP2003041333A (ja) * | 2001-08-01 | 2003-02-13 | Nippon Mining & Metals Co Ltd | 積層板用銅合金箔 |
| JP2003041332A (ja) * | 2001-08-01 | 2003-02-13 | Nippon Mining & Metals Co Ltd | 積層板用銅合金箔 |
| JP2003051673A (ja) * | 2001-08-06 | 2003-02-21 | Mitsui Mining & Smelting Co Ltd | プリント配線板用銅箔及びそのプリント配線板用銅箔を用いた銅張積層板 |
| JP2003055723A (ja) * | 2001-08-10 | 2003-02-26 | Nippon Mining & Metals Co Ltd | 積層板用銅合金箔 |
| WO2003018874A2 (en) * | 2001-08-31 | 2003-03-06 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| CN100350079C (zh) * | 2001-11-16 | 2007-11-21 | 霍尼韦尔国际公司 | 用于电镀操作的阳极以及在半导体基体上形成材料的方法 |
| US6676823B1 (en) | 2002-03-18 | 2004-01-13 | Taskem, Inc. | High speed acid copper plating |
| US7736448B2 (en) * | 2002-11-01 | 2010-06-15 | Institute Of Metal Research Chinese Academy Of Sciences | Nano icrystals copper material with super high strength and conductivity and method of preparing thereof |
| KR100389061B1 (ko) * | 2002-11-14 | 2003-06-25 | 일진소재산업주식회사 | 전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법 |
| US20040108211A1 (en) * | 2002-12-06 | 2004-06-10 | Industrial Technology Research Institute | Surface treatment for a wrought copper foil for use on a flexible printed circuit board (FPCB) |
| CN1314838C (zh) * | 2002-12-11 | 2007-05-09 | 财团法人工业技术研究院 | 高高温伸长率电解铜箔的制造方法 |
| JP5116943B2 (ja) * | 2003-02-04 | 2013-01-09 | 古河電気工業株式会社 | 高周波回路用銅箔及びその製造方法 |
| TW200500199A (en) * | 2003-02-12 | 2005-01-01 | Furukawa Circuit Foil | Copper foil for fine patterned printed circuits and method of production of same |
| JP4273309B2 (ja) * | 2003-05-14 | 2009-06-03 | 福田金属箔粉工業株式会社 | 低粗面電解銅箔及びその製造方法 |
| JP3963907B2 (ja) * | 2004-05-26 | 2007-08-22 | 三井金属鉱業株式会社 | 純銅被覆銅箔及びその製造方法、並びにtabテープ及びその製造方法 |
| JP4583149B2 (ja) * | 2004-12-01 | 2010-11-17 | 三井金属鉱業株式会社 | 電解銅箔及びその製造方法 |
| WO2006080148A1 (ja) * | 2005-01-25 | 2006-08-03 | Nippon Mining & Metals Co., Ltd. | 特定骨格を有する化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
| JP2006222185A (ja) * | 2005-02-09 | 2006-08-24 | Furukawa Circuit Foil Kk | ポリイミド系フレキシブル銅張積層板用銅箔、ポリイミド系フレキシブル銅張積層板、及びポリイミド系フレキシブルプリント配線板 |
| KR100694382B1 (ko) * | 2005-05-02 | 2007-03-12 | 엘에스전선 주식회사 | 고강도를 갖는 저조도 전해동박의 제조방법, 이 방법에의해 제조된 전해동박, 및 이 전해동박을 사용하여 제작한전자 부품 |
| RU2322532C2 (ru) * | 2006-01-10 | 2008-04-20 | Тольяттинский государственный университет | Способ получения электроосажденной меди |
| US7655126B2 (en) * | 2006-03-27 | 2010-02-02 | Federal Mogul World Wide, Inc. | Fabrication of topical stopper on MLS gasket by active matrix electrochemical deposition |
| CN101426959B (zh) * | 2006-04-28 | 2010-11-17 | 三井金属矿业株式会社 | 电解铜箔、采用该电解铜箔的表面处理铜箔及采用该表面处理铜箔的覆铜层压板以及该电解铜箔的制造方法 |
| JP5255229B2 (ja) * | 2006-04-28 | 2013-08-07 | 三井金属鉱業株式会社 | 電解銅箔、その電解銅箔を用いた表面処理銅箔及びその表面処理銅箔を用いた銅張積層板並びにその電解銅箔の製造方法 |
| TWI378540B (en) | 2006-10-14 | 2012-12-01 | Advanpack Solutions Pte Ltd | Chip and manufacturing method thereof |
| JP4668232B2 (ja) * | 2007-04-16 | 2011-04-13 | 株式会社フジクラ | フレキシブルプリント基板 |
| JP2008285727A (ja) * | 2007-05-18 | 2008-11-27 | Furukawa Circuit Foil Kk | 高抗張力電解銅箔及びその製造方法 |
| RU2350694C1 (ru) * | 2007-07-09 | 2009-03-27 | Александр Иванович Вольхин | Электролит для производства медной фольги электролизом |
| US8303792B1 (en) | 2007-08-29 | 2012-11-06 | Magnecomp Corporation | High strength electrodeposited suspension conductors |
| JP5275273B2 (ja) * | 2010-02-23 | 2013-08-28 | パンパシフィック・カッパー株式会社 | 銅の電解精製装置及びそれを用いた銅の電解精製方法 |
| KR101642152B1 (ko) * | 2010-08-20 | 2016-07-22 | 엘지전자 주식회사 | 태양전지 모듈 |
| CN102400188B (zh) * | 2010-09-10 | 2014-10-22 | 中国科学院金属研究所 | 一种<111>织构纳米孪晶Cu块体材料及制备方法 |
| CN103221584B (zh) | 2010-11-22 | 2016-01-06 | 三井金属矿业株式会社 | 表面处理铜箔 |
| JP5650023B2 (ja) * | 2011-03-03 | 2015-01-07 | Jx日鉱日石金属株式会社 | プリント配線板用銅箔及びそれを用いた積層板 |
| JP5074611B2 (ja) * | 2011-03-30 | 2012-11-14 | Jx日鉱日石金属株式会社 | 二次電池負極集電体用電解銅箔及びその製造方法 |
| JP5666384B2 (ja) * | 2011-05-31 | 2015-02-12 | 日本電解株式会社 | 支持体付極薄銅箔とその製造方法 |
| JP5379928B2 (ja) * | 2011-06-30 | 2013-12-25 | 古河電気工業株式会社 | 電解銅箔、該電解銅箔の製造方法及び該電解銅箔を集電体とするリチウムイオン二次電池 |
| PH12014500086A1 (en) | 2011-07-13 | 2014-02-17 | Jx Nippon Mining & Metals Corp | High-strength, low-warping electrolytic copper foil and method for producing same |
| WO2013018773A1 (ja) | 2011-07-29 | 2013-02-07 | 古河電気工業株式会社 | 電解銅合金箔、その製造方法、それの製造に用いる電解液、それを用いた二次電池用負極集電体、二次電池及びその電極 |
| US9428840B2 (en) | 2011-10-31 | 2016-08-30 | Furukawa Electric Co., Ltd. | High strength, high heat resistance electrodeposited copper foil and manufacturing method for same |
| CN102383148A (zh) * | 2011-11-18 | 2012-03-21 | 山东金宝电子股份有限公司 | 电解铜箔用混合添加剂、其配制方法以及用于制备超低轮廓电解铜箔的方法 |
| JP5722813B2 (ja) * | 2012-03-02 | 2015-05-27 | Jx日鉱日石金属株式会社 | 電解銅箔及び二次電池用負極集電体 |
| JP5698196B2 (ja) * | 2012-08-17 | 2015-04-08 | Jx日鉱日石金属株式会社 | 電解銅箔、並びにこれを用いた二次電池集電体及び二次電池 |
| US9673162B2 (en) | 2012-09-13 | 2017-06-06 | Nxp Usa, Inc. | High power semiconductor package subsystems |
| JP6189966B2 (ja) * | 2012-11-08 | 2017-09-06 | モネ ロワイヤル カナディエンヌ/ロイヤル カナディアン ミントMonnaie Royale Canadienne/Royal Canadian Mint | 制御された条件下における錫と銅との相互拡散による金色の青銅のための改良された技法 |
| TWI539033B (zh) * | 2013-01-07 | 2016-06-21 | Chang Chun Petrochemical Co | Electrolytic copper foil and its preparation method |
| WO2014115681A1 (ja) | 2013-01-24 | 2014-07-31 | 古河電気工業株式会社 | 電解銅箔とその製造方法 |
| TWI533496B (zh) | 2013-07-23 | 2016-05-11 | Chang Chun Petrochemical Co | Electrolytic copper foil |
| CN105492660B (zh) * | 2013-08-01 | 2017-12-01 | 古河电气工业株式会社 | 配线基板用铜箔 |
| CN103510106B (zh) * | 2013-09-22 | 2015-10-21 | 中南大学 | 一种铜电解添加剂及其使用方法 |
| WO2016208863A1 (ko) * | 2015-06-24 | 2016-12-29 | 엘에스엠트론 주식회사 | 전해 동박, 그 전해 동박을 포함하는 집전체, 그 집전체를 포함하는 전극, 그 전극을 포함하는 이차전지 및 이의 제조방법 |
| JP6782561B2 (ja) | 2015-07-16 | 2020-11-11 | Jx金属株式会社 | キャリア付銅箔、積層体、積層体の製造方法、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6058182B1 (ja) * | 2015-07-27 | 2017-01-11 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6006445B1 (ja) | 2015-07-27 | 2016-10-12 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6200042B2 (ja) | 2015-08-06 | 2017-09-20 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6190500B2 (ja) | 2015-08-06 | 2017-08-30 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| JP6339636B2 (ja) | 2015-08-06 | 2018-06-06 | Jx金属株式会社 | キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
| KR101802949B1 (ko) | 2016-04-28 | 2017-11-29 | 일진머티리얼즈 주식회사 | 그래핀용 전해동박 및 그의 제조방법 |
| WO2018057490A1 (en) * | 2016-09-22 | 2018-03-29 | Macdermid Enthone Inc. | Copper plating method and composition for semiconductor substrates |
| KR102727322B1 (ko) * | 2016-10-07 | 2024-11-06 | 에스케이넥실리스 주식회사 | 전해동박, 이 전해동박을 포함하는 이차전지용 집전체 및 이차전지 |
| TWI619850B (zh) * | 2017-02-24 | 2018-04-01 | 南亞塑膠工業股份有限公司 | 電解液、電解銅箔及其製造方法 |
| US10205170B1 (en) * | 2017-12-04 | 2019-02-12 | Chang Chun Petrochemical Co., Ltd. | Copper foil for current collector of lithium secondary battery |
| TWI646227B (zh) * | 2017-12-08 | 2019-01-01 | 南亞塑膠工業股份有限公司 | 應用於信號傳輸的銅箔以及線路板組件的製造方法 |
| US20220010446A1 (en) * | 2018-10-31 | 2022-01-13 | Lam Research Corporation | Electrodeposition of nanotwinned copper structures |
| EP3877571A4 (de) | 2018-11-07 | 2022-08-17 | Coventya Inc. | Satin-kupfer-bad und verfahren zur abscheidung einer satin-kupfer-schicht |
| KR102733599B1 (ko) | 2018-12-10 | 2024-11-25 | 램 리써치 코포레이션 | 저온 구리-구리 직접 본딩 |
| CN110760903A (zh) * | 2019-10-10 | 2020-02-07 | 深圳先进电子材料国际创新研究院 | 一种铜薄膜材料及其电沉积制备方法 |
| PL245191B1 (pl) * | 2020-01-30 | 2024-05-27 | Mitsui Mining & Smelting Co Ltd | Elektrolityczna folia miedziana |
| CN112301382B (zh) * | 2020-09-07 | 2021-11-26 | 浙江花园新能源股份有限公司 | 一种高延展性低轮廓电解铜箔的制备方法 |
| CN112176366B (zh) * | 2020-09-07 | 2022-05-31 | 浙江花园新能源股份有限公司 | 一种高延展性电解铜箔的电解液与应用 |
| CN113881980B (zh) * | 2021-11-12 | 2023-06-06 | 山东金宝电子有限公司 | 一种剥离层处理液及可剥离的附载体超薄铜箔的制备方法 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2563360A (en) * | 1941-05-24 | 1951-08-07 | Gen Motors Corp | Electrodeposition of copper |
| US2475974A (en) * | 1945-08-28 | 1949-07-12 | Rca Corp | Electrodeposition of copper |
| US2482354A (en) * | 1946-07-06 | 1949-09-20 | Rca Corp | Copper plating solution |
| US2876178A (en) * | 1956-03-06 | 1959-03-03 | Ewald H Mccoy | Electrodepositing copper |
| US2859159A (en) * | 1956-10-09 | 1958-11-04 | Elechem Corp | Bright copper plating bath containing mixtures of metal compounds |
| GB1415913A (en) * | 1973-01-08 | 1975-12-03 | Electricity Council | Electrodeposition of metal foil |
| US3864227A (en) * | 1973-06-20 | 1975-02-04 | Amax Inc | Method for the electrolytic refining of copper |
| US3998601A (en) * | 1973-12-03 | 1976-12-21 | Yates Industries, Inc. | Thin foil |
| JPS5233074A (en) * | 1975-09-10 | 1977-03-12 | Nippon Mining Co | Surface treatment of printed circuit copper foil |
| JPS5853079B2 (ja) * | 1976-03-15 | 1983-11-26 | 三井アナコンダ銅箔株式会社 | 銅箔の防錆方法 |
| US4088544A (en) * | 1976-04-19 | 1978-05-09 | Hutkin Irving J | Composite and method for making thin copper foil |
| JPS5438053A (en) * | 1977-08-29 | 1979-03-22 | Mitsubishi Electric Corp | Safety device for elevator cage |
| US4169018A (en) * | 1978-01-16 | 1979-09-25 | Gould Inc. | Process for electroforming copper foil |
| US4386139A (en) * | 1980-10-31 | 1983-05-31 | Furukawa Circuit Foil Co., Ltd. | Copper foil for a printed circuit and a method for the production thereof |
| US4387006A (en) * | 1981-07-08 | 1983-06-07 | Fukuda Metal Foil & Powder Co., Ltd. | Method of treating the surface of the copper foil used in printed wire boards |
| US4686017A (en) * | 1981-11-05 | 1987-08-11 | Union Oil Co. Of California | Electrolytic bath and methods of use |
| JPS6152387A (ja) * | 1984-08-17 | 1986-03-15 | Fukuda Kinzoku Hakufun Kogyo Kk | 高温加熱時の伸び率が優れた電解銅箔の製造方法 |
| ATE82333T1 (de) * | 1985-07-05 | 1992-11-15 | Mitsui Mining & Smelting Co | Kupferfolie, durch elektrolytische abscheidung hergestellt. |
| JPH0639155B2 (ja) * | 1986-02-21 | 1994-05-25 | 名幸電子工業株式会社 | 銅張積層板の製造方法 |
| AU579517B2 (en) * | 1986-06-20 | 1988-11-24 | Gould Inc. | Double matte finish copper foil |
| DE3718584A1 (de) * | 1987-06-03 | 1988-12-15 | Norddeutsche Affinerie | Verfahren zur messung der wirksamen inhibitorkonzentration waehrend der metallabscheidung aus waessrigen elektrolyten |
| JPH0631461B2 (ja) * | 1987-06-15 | 1994-04-27 | 日本電解株式会社 | 電解銅箔の製造方法 |
| JPH0649958B2 (ja) * | 1987-06-15 | 1994-06-29 | 日本電解株式会社 | 電解銅箔の製造方法 |
| US4956053A (en) * | 1988-05-26 | 1990-09-11 | Olin Corporation | Apparatus and process for the production of micro-pore free high ductility metal foil |
| JP2993968B2 (ja) * | 1989-01-10 | 1999-12-27 | 古河サーキットフォイル株式会社 | 電解銅箔の製造方法 |
| US5181770A (en) * | 1989-04-19 | 1993-01-26 | Olin Corporation | Surface topography optimization through control of chloride concentration in electroformed copper foil |
| US5171417A (en) | 1989-09-13 | 1992-12-15 | Gould Inc. | Copper foils for printed circuit board applications and procedures and electrolyte bath solutions for electrodepositing the same |
| US4976826A (en) * | 1990-02-16 | 1990-12-11 | Furukawa Circuit Foil Co., Ltd. | Method of making electrodeposited copper foil |
| JPH0432155A (ja) * | 1990-05-25 | 1992-02-04 | Iwasaki Electric Co Ltd | 金属蒸気放電灯点灯装置 |
| WO1991019024A1 (en) * | 1990-05-30 | 1991-12-12 | Gould, Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having low chloride ion concentrations |
| US5215646A (en) | 1992-05-06 | 1993-06-01 | Circuit Foil Usa, Inc. | Low profile copper foil and process and apparatus for making bondable metal foils |
-
1993
- 1993-10-22 US US08/141,483 patent/US5431803A/en not_active Expired - Lifetime
-
1994
- 1994-09-30 MY MYPI94002609A patent/MY111485A/en unknown
- 1994-10-07 DE DE69407726T patent/DE69407726T2/de not_active Expired - Lifetime
- 1994-10-07 AT AT94307388T patent/ATE161901T1/de not_active IP Right Cessation
- 1994-10-07 EP EP94307388A patent/EP0649917B1/de not_active Expired - Lifetime
- 1994-10-20 CN CN94117570A patent/CN1047411C/zh not_active Expired - Lifetime
- 1994-10-20 RU RU94037962A patent/RU2122049C1/ru not_active IP Right Cessation
- 1994-10-21 KR KR1019940027016A patent/KR100364685B1/ko not_active Expired - Lifetime
- 1994-10-21 JP JP25721294A patent/JP3270637B2/ja not_active Expired - Lifetime
- 1994-11-17 TW TW083110761A patent/TW373037B/zh not_active IP Right Cessation
-
2001
- 2001-08-22 JP JP2001252156A patent/JP2002129373A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0649917A1 (de) | 1995-04-26 |
| RU94037962A (ru) | 1997-02-27 |
| US5431803A (en) | 1995-07-11 |
| KR100364685B1 (ko) | 2003-04-16 |
| JP2002129373A (ja) | 2002-05-09 |
| TW373037B (en) | 1999-11-01 |
| CN1105398A (zh) | 1995-07-19 |
| CN1047411C (zh) | 1999-12-15 |
| DE69407726D1 (de) | 1998-02-12 |
| RU2122049C1 (ru) | 1998-11-20 |
| EP0649917B1 (de) | 1998-01-07 |
| DE69407726T2 (de) | 1998-04-16 |
| JP3270637B2 (ja) | 2002-04-02 |
| KR950013331A (ko) | 1995-05-17 |
| MY111485A (en) | 2000-06-30 |
| JPH07188969A (ja) | 1995-07-25 |
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