ATE188313T1 - Mehrschichtiger verbundwerkstoff und verfahren zu dessen herstellung - Google Patents

Mehrschichtiger verbundwerkstoff und verfahren zu dessen herstellung

Info

Publication number
ATE188313T1
ATE188313T1 AT95937535T AT95937535T ATE188313T1 AT E188313 T1 ATE188313 T1 AT E188313T1 AT 95937535 T AT95937535 T AT 95937535T AT 95937535 T AT95937535 T AT 95937535T AT E188313 T1 ATE188313 T1 AT E188313T1
Authority
AT
Austria
Prior art keywords
thallium
composite material
layer composite
producing same
superconducting
Prior art date
Application number
AT95937535T
Other languages
English (en)
Inventor
Dean Willett Face
Kirsten Elizabeth Myers
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE188313T1 publication Critical patent/ATE188313T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices
    • H10N60/0941—Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/702—Josephson junction present
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Secondary Cells (AREA)
  • Metal Extraction Processes (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT95937535T 1994-10-17 1995-10-10 Mehrschichtiger verbundwerkstoff und verfahren zu dessen herstellung ATE188313T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32356094A 1994-10-17 1994-10-17
PCT/US1995/013462 WO1996012307A1 (en) 1994-10-17 1995-10-10 Multilayered composites and process of manufacture

Publications (1)

Publication Number Publication Date
ATE188313T1 true ATE188313T1 (de) 2000-01-15

Family

ID=23259739

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95937535T ATE188313T1 (de) 1994-10-17 1995-10-10 Mehrschichtiger verbundwerkstoff und verfahren zu dessen herstellung

Country Status (13)

Country Link
US (2) US5567673A (de)
EP (1) EP0787363B1 (de)
JP (1) JPH10507590A (de)
KR (1) KR100428910B1 (de)
AT (1) ATE188313T1 (de)
CA (1) CA2200185A1 (de)
DE (1) DE69514248T2 (de)
DK (1) DK0787363T3 (de)
ES (1) ES2141967T3 (de)
GR (1) GR3032460T3 (de)
PT (1) PT787363E (de)
TW (1) TW318287B (de)
WO (1) WO1996012307A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5773875A (en) * 1996-02-23 1998-06-30 Trw Inc. High performance, low thermal loss, bi-temperature superconductive device
JPH11186623A (ja) * 1997-12-25 1999-07-09 Sumitomo Electric Ind Ltd 磁気センサ
JP2001111123A (ja) * 1999-10-12 2001-04-20 Sumitomo Electric Ind Ltd Ｓｑｕｉｄ素子
US7162302B2 (en) 2002-03-04 2007-01-09 Nanoset Llc Magnetically shielded assembly
US7091412B2 (en) 2002-03-04 2006-08-15 Nanoset, Llc Magnetically shielded assembly
US20050260331A1 (en) * 2002-01-22 2005-11-24 Xingwu Wang Process for coating a substrate
US20040225213A1 (en) * 2002-01-22 2004-11-11 Xingwu Wang Magnetic resonance imaging coated assembly
BRPI0511203A (pt) * 2004-05-26 2007-11-27 Novus Energy Llc métodos de produção de álcool, álcool purificado e aparelho para produção de etanol
US20060118758A1 (en) * 2004-09-15 2006-06-08 Xingwu Wang Material to enable magnetic resonance imaging of implantable medical devices
US7517834B2 (en) * 2006-01-24 2009-04-14 The University Of Hong Kong High temperature superconducting (HTS) tape coil with enhanced protection and method for making same
US10256392B1 (en) * 2018-03-23 2019-04-09 International Business Machines Corporation Vertical transmon qubit device
CN111969102B (zh) * 2020-09-11 2023-10-27 中国科学院紫金山天文台 一种改善超导钛-铌薄膜接触电极的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4454522A (en) * 1981-11-05 1984-06-12 The Board Of Trustees Of The Leland Stanford Junior University Microbridge superconducting device having support with stepped parallel surfaces
JPS6431475A (en) * 1987-07-28 1989-02-01 Univ Tokyo Superconducting device and forming method thereof
US5034359A (en) * 1988-04-08 1991-07-23 Kabushiki Kaisha Toshiba Insulating composition
JPH0258879A (ja) * 1988-08-25 1990-02-28 Canon Inc トンネル型ジョセフソン接合素子およびその製造方法
JP2616986B2 (ja) * 1988-12-14 1997-06-04 工業技術院長 Ｔｌ系超電導体積層膜の製造法
JPH0368180A (ja) * 1989-08-07 1991-03-25 Nippon Telegr & Teleph Corp <Ntt> 超伝導接合素子
JP2790494B2 (ja) * 1989-10-13 1998-08-27 松下電器産業株式会社 超伝導素子
EP0443827B1 (de) * 1990-02-21 1996-07-17 Her Majesty The Queen In Right Of New Zealand Supraleiter auf Thalliumbasis substituiert durch seltene Erden
JPH03286601A (ja) * 1990-04-03 1991-12-17 Res Dev Corp Of Japan マイクロ波共振器
US5292718A (en) * 1990-05-30 1994-03-08 Sumitomo Electric Industries, Ltd. Process for preparing superconducting junction of oxide superconductor
EP0468868B1 (de) * 1990-07-19 1996-02-28 Sumitomo Electric Industries, Ltd. Supraleitende Einrichtung mit geschichteter Struktur, zusammengesetzt aus oxidischem Supraleiter und Isolatordünnschicht und deren Herstellungsmethode
JPH04171872A (ja) * 1990-11-05 1992-06-19 Matsushita Electric Ind Co Ltd ジョセフソン素子およびその製造方法
US5134117A (en) * 1991-01-22 1992-07-28 Biomagnetic Technologies, Inc. High tc microbridge superconductor device utilizing stepped edge-to-edge sns junction
US5252551A (en) * 1991-12-27 1993-10-12 The United States Of America As Represented By The Department Of Energy Superconducting composite with multilayer patterns and multiple buffer layers
EP0660968A1 (de) * 1992-09-14 1995-07-05 Conductus, Inc. Verbesserte sperrschichten fuer oxid-supraleiter-anordnungen und schaltungen

Also Published As

Publication number Publication date
ES2141967T3 (es) 2000-04-01
EP0787363B1 (de) 1999-12-29
EP0787363A1 (de) 1997-08-06
GR3032460T3 (en) 2000-05-31
JPH10507590A (ja) 1998-07-21
TW318287B (de) 1997-10-21
KR100428910B1 (ko) 2004-09-16
US5736488A (en) 1998-04-07
US5567673A (en) 1996-10-22
KR970707595A (ko) 1997-12-01
PT787363E (pt) 2000-04-28
CA2200185A1 (en) 1996-04-25
DE69514248D1 (de) 2000-02-03
DK0787363T3 (da) 2000-05-08
WO1996012307A1 (en) 1996-04-25
DE69514248T2 (de) 2000-07-06

Similar Documents

Publication Publication Date Title
ATE188313T1 (de) Mehrschichtiger verbundwerkstoff und verfahren zu dessen herstellung
ATE103366T1 (de) Gasdichte randdichtung und verfahren zu deren herstellung.
ATE303866T1 (de) Mehrschichtiger katalysator und dessen herstellungsverfahren
AU2003250246A8 (en) Method for production of a glazed piece provided with a multi-layer coating
TW200604368A (en) Controlled vapor deposition of multilayered coatings adhered by an oxide layer
CA2112229A1 (en) Multiple aluminide-silicide coating
IE822164L (en) Multiple chamber deposition and isolation apparatus.
DE69942392D1 (de) Verfahren zur herstellung aufgerauhter platinschichten, und verfahren zur kondensatoren-herstellung, die diese aufgerauhten platinschichten enthalten
AU2001253575A1 (en) Process for fabricating thin film transistors
KR880010479A (ko) 티타늄/질화티타늄 이중층을 제조하는 방법
ATE165730T1 (de) Methode zur herstellung von gefriergetrockneten dosierungen in einer blisterpackung aus multilaminat
WO2003080887A3 (en) Methods and apparatus for annealing in physical vapor deposition systems
TW372366B (en) Method of manufacturing semiconductor article
EP0815953A3 (de) Verfahren zur Abscheidung von substituierten Fluorkohlenstoffpolymerschichten
TW346676B (en) Method of manufacturing layered ferroelectric Bi containing film
ATE146355T1 (de) Transferverfahren zur herstellung transdermaler therapeutischer systeme
MY120896A (en) Preparation of structural materials by physical vapour deposition process
DE50312313D1 (de) Verfahren zum Herstellen von glatten Barriereschichten und Verbundmaterial mit glatter Barriereschicht
JPS6477934A (en) Manufacture of semiconductor device
WO2003062922A3 (en) Photomask and method for manufacturing the same
EP1107302A3 (de) Apparat und Methode, fixierte Ladungen in einem Halbleiter zu reduzieren
WO2000067311A3 (de) Verfarhen zur herstellung eines waferträgers in einem hochtemperatur-cvd-reaktor
EP0087151A3 (de) Verfahren zum Herstellen von Schichten aus hochschmelzenden Metallen bzw. Metallverbindungen durch Abscheidung aus der Dampfphase
JPS56113427A (en) Film-forming method
EP0393551A3 (de) Verfahren zur Herstellung von gleichmässigen dünnen Schichten

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee