ATE297053T1 - Elektronenquelle - Google Patents

Elektronenquelle

Info

Publication number
ATE297053T1
ATE297053T1 AT02796900T AT02796900T ATE297053T1 AT E297053 T1 ATE297053 T1 AT E297053T1 AT 02796900 T AT02796900 T AT 02796900T AT 02796900 T AT02796900 T AT 02796900T AT E297053 T1 ATE297053 T1 AT E297053T1
Authority
AT
Austria
Prior art keywords
value
plasma
enclosure
mass
electron source
Prior art date
Application number
AT02796900T
Other languages
English (en)
Inventor
Ana Lacoste
Jacques Pelletier
Yves Alban-Marie Arnal
Original Assignee
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient filed Critical Centre Nat Rech Scient
Application granted granted Critical
Publication of ATE297053T1 publication Critical patent/ATE297053T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/077Electron guns using discharge in gases or vapours as electron sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02Electron guns
    • H01J3/025Electron guns using a discharge in a gas or a vapour as electron source
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004Charge control of objects or beams
    • H01J2237/0041Neutralising arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Luminescent Compositions (AREA)
  • Saccharide Compounds (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Particle Accelerators (AREA)
AT02796900T 2001-12-07 2002-12-06 Elektronenquelle ATE297053T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0115897A FR2833452B1 (fr) 2001-12-07 2001-12-07 Source d'electrons
PCT/FR2002/004223 WO2003049139A1 (fr) 2001-12-07 2002-12-06 Source d'electrons

Publications (1)

Publication Number Publication Date
ATE297053T1 true ATE297053T1 (de) 2005-06-15

Family

ID=8870266

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02796900T ATE297053T1 (de) 2001-12-07 2002-12-06 Elektronenquelle

Country Status (8)

Country Link
US (1) US7911120B2 (de)
EP (1) EP1451846B1 (de)
JP (1) JP4059849B2 (de)
AT (1) ATE297053T1 (de)
CA (1) CA2468760A1 (de)
DE (1) DE60204481T2 (de)
FR (1) FR2833452B1 (de)
WO (1) WO2003049139A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1923483A1 (de) * 2006-11-02 2008-05-21 Dow Corning Corporation Abscheidung von amorphen Siliziumschichten durch Elektronzyclotron-Wellenresonanz
WO2010029270A1 (fr) * 2008-09-15 2010-03-18 Centre National De La Recherche Scientifique (C.N.R.S) Dispositif de génération d'un faisceau d'ions avec piège cryogénique
EP2168691B1 (de) * 2008-09-26 2011-08-17 Camvac Limited Strahlungsgehärtete Beschichtungen
GB2479154A (en) * 2010-03-30 2011-10-05 Camvac Ltd Electron flux coated substrate

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3831052A (en) 1973-05-25 1974-08-20 Hughes Aircraft Co Hollow cathode gas discharge device
US4684848A (en) * 1983-09-26 1987-08-04 Kaufman & Robinson, Inc. Broad-beam electron source
US4647818A (en) * 1984-04-16 1987-03-03 Sfe Technologies Nonthermionic hollow anode gas discharge electron beam source
FR2583250B1 (fr) 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
US4910435A (en) * 1988-07-20 1990-03-20 American International Technologies, Inc. Remote ion source plasma electron gun
JPH04351838A (ja) * 1991-05-28 1992-12-07 Hitachi Ltd イオンビーム装置の中性化器
FR2702119B1 (fr) 1993-02-25 1995-07-13 Metal Process Dispositif d'excitation d'un plasma à la résonance cyclotronique électronique par l'intermédiaire d'un applicateur filaire d'un champ micro-onde et d'un champ magnétique statique.
FR2726729B1 (fr) 1994-11-04 1997-01-31 Metal Process Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes
FR2733300B1 (fr) 1995-04-20 1997-07-04 Sarlam Hublot d'eclairage
DE19821802A1 (de) 1998-05-15 1999-12-02 Andrae Juergen Vorrichtung für die Erzeugung von Ionen- und Elektronenstrahlen mit großem Querschnitt
FR2797372B1 (fr) 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
DE10058326C1 (de) 2000-11-24 2002-06-13 Astrium Gmbh Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen

Also Published As

Publication number Publication date
US7911120B2 (en) 2011-03-22
WO2003049139A1 (fr) 2003-06-12
FR2833452B1 (fr) 2004-03-12
EP1451846A2 (de) 2004-09-01
EP1451846B1 (de) 2005-06-01
CA2468760A1 (en) 2003-06-12
WO2003049139A9 (fr) 2003-10-16
DE60204481T2 (de) 2006-05-11
DE60204481D1 (de) 2005-07-07
JP4059849B2 (ja) 2008-03-12
JP2005512281A (ja) 2005-04-28
US20050062387A1 (en) 2005-03-24
FR2833452A1 (fr) 2003-06-13

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties