ATE297053T1 - Elektronenquelle - Google Patents
ElektronenquelleInfo
- Publication number
- ATE297053T1 ATE297053T1 AT02796900T AT02796900T ATE297053T1 AT E297053 T1 ATE297053 T1 AT E297053T1 AT 02796900 T AT02796900 T AT 02796900T AT 02796900 T AT02796900 T AT 02796900T AT E297053 T1 ATE297053 T1 AT E297053T1
- Authority
- AT
- Austria
- Prior art keywords
- value
- plasma
- enclosure
- mass
- electron source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/077—Electron guns using discharge in gases or vapours as electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
- H01J2237/0041—Neutralising arrangements
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
- Cold Cathode And The Manufacture (AREA)
- Luminescent Compositions (AREA)
- Saccharide Compounds (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0115897A FR2833452B1 (fr) | 2001-12-07 | 2001-12-07 | Source d'electrons |
| PCT/FR2002/004223 WO2003049139A1 (fr) | 2001-12-07 | 2002-12-06 | Source d'electrons |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE297053T1 true ATE297053T1 (de) | 2005-06-15 |
Family
ID=8870266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02796900T ATE297053T1 (de) | 2001-12-07 | 2002-12-06 | Elektronenquelle |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7911120B2 (de) |
| EP (1) | EP1451846B1 (de) |
| JP (1) | JP4059849B2 (de) |
| AT (1) | ATE297053T1 (de) |
| CA (1) | CA2468760A1 (de) |
| DE (1) | DE60204481T2 (de) |
| FR (1) | FR2833452B1 (de) |
| WO (1) | WO2003049139A1 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1923483A1 (de) * | 2006-11-02 | 2008-05-21 | Dow Corning Corporation | Abscheidung von amorphen Siliziumschichten durch Elektronzyclotron-Wellenresonanz |
| WO2010029270A1 (fr) * | 2008-09-15 | 2010-03-18 | Centre National De La Recherche Scientifique (C.N.R.S) | Dispositif de génération d'un faisceau d'ions avec piège cryogénique |
| EP2168691B1 (de) * | 2008-09-26 | 2011-08-17 | Camvac Limited | Strahlungsgehärtete Beschichtungen |
| GB2479154A (en) * | 2010-03-30 | 2011-10-05 | Camvac Ltd | Electron flux coated substrate |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3831052A (en) | 1973-05-25 | 1974-08-20 | Hughes Aircraft Co | Hollow cathode gas discharge device |
| US4684848A (en) * | 1983-09-26 | 1987-08-04 | Kaufman & Robinson, Inc. | Broad-beam electron source |
| US4647818A (en) * | 1984-04-16 | 1987-03-03 | Sfe Technologies | Nonthermionic hollow anode gas discharge electron beam source |
| FR2583250B1 (fr) | 1985-06-07 | 1989-06-30 | France Etat | Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique |
| US4910435A (en) * | 1988-07-20 | 1990-03-20 | American International Technologies, Inc. | Remote ion source plasma electron gun |
| JPH04351838A (ja) * | 1991-05-28 | 1992-12-07 | Hitachi Ltd | イオンビーム装置の中性化器 |
| FR2702119B1 (fr) | 1993-02-25 | 1995-07-13 | Metal Process | Dispositif d'excitation d'un plasma à la résonance cyclotronique électronique par l'intermédiaire d'un applicateur filaire d'un champ micro-onde et d'un champ magnétique statique. |
| FR2726729B1 (fr) | 1994-11-04 | 1997-01-31 | Metal Process | Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes |
| FR2733300B1 (fr) | 1995-04-20 | 1997-07-04 | Sarlam | Hublot d'eclairage |
| DE19821802A1 (de) | 1998-05-15 | 1999-12-02 | Andrae Juergen | Vorrichtung für die Erzeugung von Ionen- und Elektronenstrahlen mit großem Querschnitt |
| FR2797372B1 (fr) | 1999-08-04 | 2002-10-25 | Metal Process | Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma |
| DE10058326C1 (de) | 2000-11-24 | 2002-06-13 | Astrium Gmbh | Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen |
-
2001
- 2001-12-07 FR FR0115897A patent/FR2833452B1/fr not_active Expired - Fee Related
-
2002
- 2002-12-06 CA CA002468760A patent/CA2468760A1/en not_active Abandoned
- 2002-12-06 DE DE60204481T patent/DE60204481T2/de not_active Expired - Lifetime
- 2002-12-06 JP JP2003550245A patent/JP4059849B2/ja not_active Expired - Fee Related
- 2002-12-06 AT AT02796900T patent/ATE297053T1/de not_active IP Right Cessation
- 2002-12-06 WO PCT/FR2002/004223 patent/WO2003049139A1/fr not_active Ceased
- 2002-12-06 US US10/497,894 patent/US7911120B2/en not_active Expired - Fee Related
- 2002-12-06 EP EP02796900A patent/EP1451846B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7911120B2 (en) | 2011-03-22 |
| WO2003049139A1 (fr) | 2003-06-12 |
| FR2833452B1 (fr) | 2004-03-12 |
| EP1451846A2 (de) | 2004-09-01 |
| EP1451846B1 (de) | 2005-06-01 |
| CA2468760A1 (en) | 2003-06-12 |
| WO2003049139A9 (fr) | 2003-10-16 |
| DE60204481T2 (de) | 2006-05-11 |
| DE60204481D1 (de) | 2005-07-07 |
| JP4059849B2 (ja) | 2008-03-12 |
| JP2005512281A (ja) | 2005-04-28 |
| US20050062387A1 (en) | 2005-03-24 |
| FR2833452A1 (fr) | 2003-06-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |