ATE309613T1 - Ein verfahren zum trocknen von siliziumsubstraten - Google Patents
Ein verfahren zum trocknen von siliziumsubstratenInfo
- Publication number
- ATE309613T1 ATE309613T1 AT01130669T AT01130669T ATE309613T1 AT E309613 T1 ATE309613 T1 AT E309613T1 AT 01130669 T AT01130669 T AT 01130669T AT 01130669 T AT01130669 T AT 01130669T AT E309613 T1 ATE309613 T1 AT E309613T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- bath
- liquid
- liquid bath
- silicon substrates
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Detergent Compositions (AREA)
- Inorganic Insulating Materials (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19531031A DE19531031C2 (de) | 1995-08-23 | 1995-08-23 | Verfahren zum Trocknen von Silizium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE309613T1 true ATE309613T1 (de) | 2005-11-15 |
Family
ID=7770207
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT96929234T ATE227885T1 (de) | 1995-08-23 | 1996-08-09 | Verfahren zum trocknen von substraten |
| AT01130669T ATE309613T1 (de) | 1995-08-23 | 1996-08-09 | Ein verfahren zum trocknen von siliziumsubstraten |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT96929234T ATE227885T1 (de) | 1995-08-23 | 1996-08-09 | Verfahren zum trocknen von substraten |
Country Status (24)
| Country | Link |
|---|---|
| EP (2) | EP1199740B1 (de) |
| JP (1) | JP3857314B2 (de) |
| KR (1) | KR19990037642A (de) |
| CN (1) | CN1091542C (de) |
| AT (2) | ATE227885T1 (de) |
| AU (1) | AU697397B2 (de) |
| CA (1) | CA2228168A1 (de) |
| CZ (1) | CZ291335B6 (de) |
| DE (3) | DE19531031C2 (de) |
| DK (2) | DK0846334T3 (de) |
| ES (2) | ES2186800T3 (de) |
| HK (1) | HK1043661B (de) |
| HU (1) | HUP9802482A3 (de) |
| IL (1) | IL123042A (de) |
| MX (1) | MX9801464A (de) |
| NO (1) | NO980734D0 (de) |
| PL (1) | PL183355B1 (de) |
| PT (1) | PT846334E (de) |
| RU (1) | RU2141700C1 (de) |
| SI (1) | SI1199740T1 (de) |
| SK (1) | SK284835B6 (de) |
| TW (1) | TW427952B (de) |
| UA (1) | UA51663C2 (de) |
| WO (1) | WO1997008742A1 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19613620C2 (de) | 1996-04-04 | 1998-04-16 | Steag Micro Tech Gmbh | Verfahren und Vorrichtung zum Trocknen von Substraten |
| DE19800584C2 (de) * | 1998-01-09 | 2002-06-20 | Steag Micro Tech Gmbh | Verfahren und Vorrichtung zum Trocknen von Substraten |
| DE19833257C1 (de) * | 1998-07-23 | 1999-09-30 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung einer Halbleiterscheibe |
| DE19927457C2 (de) * | 1999-06-16 | 2002-06-13 | Wacker Siltronic Halbleitermat | Verwendung eines bekannten Verfahrens als Vorbehandlung zur Bestimmung der Diffusionslängen von Minoritätsträgern in einer Halbleiterscheibe |
| DE10036691A1 (de) * | 2000-07-27 | 2002-02-14 | Wacker Siltronic Halbleitermat | Verfahren zur chemischen Behandlung von Halbleiterscheiben |
| DE10064081C2 (de) * | 2000-12-21 | 2002-06-06 | Wacker Siltronic Halbleitermat | Verfahren zur Herstellung einer Halbleiterscheibe |
| DE10360269A1 (de) * | 2003-12-17 | 2005-07-28 | Friedrich-Schiller-Universität Jena | Verfahren zur schnellen Mischung von kleinvolumigen Flüssigkeiten und Kit zu dessen Anwendung |
| WO2006066115A2 (en) | 2004-12-17 | 2006-06-22 | The Procter & Gamble Company | Process for extracting liquid from a fabric |
| KR100897581B1 (ko) | 2007-11-14 | 2009-05-14 | 주식회사 실트론 | 웨이퍼 건조 방법 |
| RU2486287C2 (ru) * | 2011-04-29 | 2013-06-27 | Антон Викторович Мантузов | Способ очистки поверхности полупроводниковых пластин и регенерации травильных растворов |
| CN114993028B (zh) * | 2022-06-17 | 2023-05-30 | 高景太阳能股份有限公司 | 一种硅片烘干处理方法及系统 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2722783A1 (de) * | 1977-05-20 | 1978-11-30 | Wacker Chemitronic | Verfahren zum reinigen von silicium |
| US4169807A (en) * | 1978-03-20 | 1979-10-02 | Rca Corporation | Novel solvent drying agent |
| DE3317286A1 (de) * | 1983-05-11 | 1984-11-22 | Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen | Verfahren zur reinigung von silicium durch saeureeinwirkung |
| FR2591324B1 (fr) * | 1985-12-10 | 1989-02-17 | Recif Sa | Appareil pour le sechage unitaire des plaquettes de silicium par centrifugation |
| JPS62198127A (ja) * | 1986-02-25 | 1987-09-01 | Sanyo Electric Co Ltd | 半導体ウエハの洗浄方法 |
| US4722752A (en) * | 1986-06-16 | 1988-02-02 | Robert F. Orr | Apparatus and method for rinsing and drying silicon wafers |
| US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
| NL8900480A (nl) * | 1989-02-27 | 1990-09-17 | Philips Nv | Werkwijze en inrichting voor het drogen van substraten na behandeling in een vloeistof. |
| JPH0366126A (ja) * | 1989-08-04 | 1991-03-20 | Sharp Corp | 絶縁膜の製造方法及びその製造装置 |
| JPH0466175A (ja) * | 1990-07-03 | 1992-03-02 | Seiko Epson Corp | 水切り乾燥方法 |
| JPH04346431A (ja) * | 1991-05-24 | 1992-12-02 | Mitsubishi Electric Corp | 半導体シリコンウェハの洗浄装置 |
| WO1995008406A1 (en) * | 1993-09-22 | 1995-03-30 | Legacy Systems, Inc. | Process and apparatus for the treatment of semiconductor wafers in a fluid |
-
1995
- 1995-08-23 DE DE19531031A patent/DE19531031C2/de not_active Expired - Fee Related
-
1996
- 1996-08-09 DK DK96929234T patent/DK0846334T3/da active
- 1996-08-09 AT AT96929234T patent/ATE227885T1/de active
- 1996-08-09 PT PT96929234T patent/PT846334E/pt unknown
- 1996-08-09 CA CA002228168A patent/CA2228168A1/en not_active Abandoned
- 1996-08-09 SI SI9630728T patent/SI1199740T1/sl unknown
- 1996-08-09 JP JP50977197A patent/JP3857314B2/ja not_active Expired - Fee Related
- 1996-08-09 EP EP01130669A patent/EP1199740B1/de not_active Expired - Lifetime
- 1996-08-09 PL PL96325121A patent/PL183355B1/pl not_active IP Right Cessation
- 1996-08-09 ES ES96929234T patent/ES2186800T3/es not_active Expired - Lifetime
- 1996-08-09 KR KR1019980701119A patent/KR19990037642A/ko not_active Ceased
- 1996-08-09 CZ CZ1998517A patent/CZ291335B6/cs not_active IP Right Cessation
- 1996-08-09 RU RU98104458A patent/RU2141700C1/ru not_active IP Right Cessation
- 1996-08-09 CN CN96196222A patent/CN1091542C/zh not_active Expired - Fee Related
- 1996-08-09 AT AT01130669T patent/ATE309613T1/de active
- 1996-08-09 DE DE69624830T patent/DE69624830T2/de not_active Expired - Lifetime
- 1996-08-09 DE DE69635427T patent/DE69635427T2/de not_active Expired - Lifetime
- 1996-08-09 DK DK01130669T patent/DK1199740T3/da active
- 1996-08-09 SK SK212-98A patent/SK284835B6/sk unknown
- 1996-08-09 IL IL12304296A patent/IL123042A/en not_active IP Right Cessation
- 1996-08-09 AU AU68720/96A patent/AU697397B2/en not_active Ceased
- 1996-08-09 HU HU9802482A patent/HUP9802482A3/hu unknown
- 1996-08-09 WO PCT/EP1996/003541 patent/WO1997008742A1/en not_active Ceased
- 1996-08-09 ES ES01130669T patent/ES2250292T3/es not_active Expired - Lifetime
- 1996-08-09 EP EP96929234A patent/EP0846334B1/de not_active Expired - Lifetime
- 1996-08-20 TW TW085110167A patent/TW427952B/zh not_active IP Right Cessation
- 1996-09-08 UA UA98020935A patent/UA51663C2/uk unknown
-
1998
- 1998-02-20 NO NO980734A patent/NO980734D0/no unknown
- 1998-02-23 MX MX9801464A patent/MX9801464A/es not_active IP Right Cessation
- 1998-10-14 HK HK02104685.0A patent/HK1043661B/en not_active IP Right Cessation
Also Published As
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
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