ATE340244T1 - Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen - Google Patents

Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen

Info

Publication number
ATE340244T1
ATE340244T1 AT00984560T AT00984560T ATE340244T1 AT E340244 T1 ATE340244 T1 AT E340244T1 AT 00984560 T AT00984560 T AT 00984560T AT 00984560 T AT00984560 T AT 00984560T AT E340244 T1 ATE340244 T1 AT E340244T1
Authority
AT
Austria
Prior art keywords
cleaning composition
removal
plasma etching
etching residue
corrosive cleaning
Prior art date
Application number
AT00984560T
Other languages
English (en)
Inventor
Kenji Honda
Michelle Elderkin
Vincent Leon
Original Assignee
Fujifilm Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials filed Critical Fujifilm Electronic Materials
Application granted granted Critical
Publication of ATE340244T1 publication Critical patent/ATE340244T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • H10P70/23—Cleaning during device manufacture during, before or after processing of insulating materials
    • H10P70/234—Cleaning during device manufacture during, before or after processing of insulating materials the processing being the formation of vias or contact holes
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Implements For Floors, Carpets, Furniture, Walls, And The Like (AREA)
AT00984560T 1999-11-15 2000-10-20 Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen ATE340244T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/439,469 US6413923B2 (en) 1999-11-15 1999-11-15 Non-corrosive cleaning composition for removing plasma etching residues

Publications (1)

Publication Number Publication Date
ATE340244T1 true ATE340244T1 (de) 2006-10-15

Family

ID=23744827

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00984560T ATE340244T1 (de) 1999-11-15 2000-10-20 Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen

Country Status (8)

Country Link
US (3) US6413923B2 (de)
EP (1) EP1230334B1 (de)
JP (1) JP3871257B2 (de)
KR (1) KR100736061B1 (de)
AT (1) ATE340244T1 (de)
DE (1) DE60030877T2 (de)
TW (1) TWI230733B (de)
WO (1) WO2001036578A1 (de)

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JP2003515254A (ja) 2003-04-22
US20020132745A1 (en) 2002-09-19
EP1230334A4 (de) 2004-08-11
TWI230733B (en) 2005-04-11
US7001874B2 (en) 2006-02-21
DE60030877D1 (de) 2006-11-02
US20010001785A1 (en) 2001-05-24
JP3871257B2 (ja) 2007-01-24
DE60030877T2 (de) 2007-04-26
US6413923B2 (en) 2002-07-02
KR100736061B1 (ko) 2007-07-06
EP1230334B1 (de) 2006-09-20
EP1230334A1 (de) 2002-08-14
US20060094614A1 (en) 2006-05-04
KR20020044593A (ko) 2002-06-15
US7402552B2 (en) 2008-07-22
WO2001036578A1 (en) 2001-05-25

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