ATE365083T1 - Verfahrensregelung für photoresistente beschichtung mit solventdampfsensor - Google Patents

Verfahrensregelung für photoresistente beschichtung mit solventdampfsensor

Info

Publication number
ATE365083T1
ATE365083T1 AT98967092T AT98967092T ATE365083T1 AT E365083 T1 ATE365083 T1 AT E365083T1 AT 98967092 T AT98967092 T AT 98967092T AT 98967092 T AT98967092 T AT 98967092T AT E365083 T1 ATE365083 T1 AT E365083T1
Authority
AT
Austria
Prior art keywords
solvent vapor
carrier gas
coating
photoresistant
gas supply
Prior art date
Application number
AT98967092T
Other languages
English (en)
Inventor
Emir Gurer
Herbert Litvak
Richard Savage
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Application granted granted Critical
Publication of ATE365083T1 publication Critical patent/ATE365083T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
AT98967092T 1997-12-08 1998-12-08 Verfahrensregelung für photoresistente beschichtung mit solventdampfsensor ATE365083T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/987,179 US6027760A (en) 1997-12-08 1997-12-08 Photoresist coating process control with solvent vapor sensor

Publications (1)

Publication Number Publication Date
ATE365083T1 true ATE365083T1 (de) 2007-07-15

Family

ID=25533082

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98967092T ATE365083T1 (de) 1997-12-08 1998-12-08 Verfahrensregelung für photoresistente beschichtung mit solventdampfsensor

Country Status (7)

Country Link
US (1) US6027760A (de)
EP (2) EP1847328A1 (de)
JP (1) JP3747403B2 (de)
KR (1) KR100502442B1 (de)
AT (1) ATE365083T1 (de)
DE (1) DE69837972T2 (de)
WO (1) WO1999029439A1 (de)

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Also Published As

Publication number Publication date
DE69837972D1 (de) 2007-08-02
EP1044074A4 (de) 2006-03-01
US6027760A (en) 2000-02-22
JP2001525251A (ja) 2001-12-11
JP3747403B2 (ja) 2006-02-22
WO1999029439A1 (en) 1999-06-17
KR20010032867A (ko) 2001-04-25
EP1847328A1 (de) 2007-10-24
KR100502442B1 (ko) 2005-07-20
EP1044074B8 (de) 2007-08-08
EP1044074B1 (de) 2007-06-20
EP1044074A1 (de) 2000-10-18
WO1999029439A8 (en) 1999-08-19
DE69837972T2 (de) 2008-02-21

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