|
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(en)
|
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2006-05-26 |
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|
|
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(de)
|
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2011-02-17 |
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|
|
US9482966B2
(en)
|
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2016-11-01 |
Asml Netherlands B.V. |
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|
|
US7372541B2
(en)
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
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|
|
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(en)
|
2002-11-12 |
2006-09-19 |
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|
|
US10503084B2
(en)
|
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2019-12-10 |
Asml Netherlands B.V. |
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|
|
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(zh)
|
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2011-01-12 |
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|
|
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(ko)
|
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2006-06-07 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 장치 및 디바이스 제조방법
|
|
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(en)
|
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|
|
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(en)
|
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Asml Netherlands Bv |
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|
|
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(en)
|
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2006-06-01 |
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|
|
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(en)
|
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|
|
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(de)
|
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2008-10-15 |
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Belichtungsvorrichtung und verfahren zur herstellung der vorrichtung
|
|
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(en)
|
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|
|
AU2003289271A1
(en)
|
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2004-06-30 |
Nikon Corporation |
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|
|
CN101872135B
(zh)
*
|
2002-12-10 |
2013-07-31 |
株式会社尼康 |
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|
|
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(ja)
|
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2009-10-28 |
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|
|
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(en)
|
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|
|
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(de)
|
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|
|
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(de)
|
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2015-04-01 |
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Belichtungsvorrichtung, Belichtungsverfahren und Verfahren zur Herstellung des Geräts
|
|
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(ko)
|
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|
|
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(ja)
|
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|
|
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(en)
|
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|
|
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(en)
|
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|
|
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(ko)
|
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|
|
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(de)
|
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2017-12-27 |
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|
|
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(ko)
|
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|
|
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(ko)
|
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|
|
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(en)
|
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|
|
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(de)
|
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2012-02-15 |
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|
|
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(en)
|
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2008-04-01 |
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|
|
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(zh)
|
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2008-11-26 |
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|
|
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(zh)
|
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2014-01-21 |
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|
|
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(zh)
|
2003-05-23 |
2014-01-01 |
尼康股份有限公司 |
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|
|
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(zh)
|
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2009-09-16 |
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|
|
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(en)
|
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|
|
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(en)
|
2003-06-09 |
2007-05-08 |
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|
|
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(en)
|
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2008-01-08 |
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|
|
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(de)
|
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2011-05-25 |
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|
|
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(ko)
|
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가부시키가이샤 니콘 |
노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
|
|
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(en)
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
|
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(zh)
|
2003-06-19 |
2016-01-01 |
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|
|
EP1498778A1
(de)
|
2003-06-27 |
2005-01-19 |
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|
|
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(de)
|
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2006-09-06 |
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Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
|
US6809794B1
(en)
|
2003-06-27 |
2004-10-26 |
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Immersion photolithography system and method using inverted wafer-projection optics interface
|
|
EP1975721A1
(de)
|
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2008-10-01 |
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|
|
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(de)
|
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2005-01-05 |
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|
|
WO2005006026A2
(en)
|
2003-07-01 |
2005-01-20 |
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Using isotopically specified fluids as optical elements
|
|
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(de)
|
2003-07-08 |
2014-11-26 |
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|
|
ATE513309T1
(de)
|
2003-07-09 |
2011-07-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
|
WO2005006418A1
(ja)
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
WO2005006416A1
(ja)
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
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|
|
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(en)
|
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2005-02-28 |
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|
|
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(de)
|
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2005-01-26 |
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|
|
EP1650787A4
(de)
|
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2007-09-19 |
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Untersuchungsverfahren und untersuchungseinrichtung für ein optisches projektionssystem und herstellungsverfahren für ein optisches projektionssystem
|
|
US7326522B2
(en)
|
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2008-02-05 |
Asml Netherlands B.V. |
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|
|
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(de)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
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|
|
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(zh)
|
2003-07-28 |
2014-01-29 |
株式会社尼康 |
曝光装置、器件制造方法、及曝光装置的控制方法
|
|
US7175968B2
(en)
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
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|
|
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(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
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|
|
US8149381B2
(en)
|
2003-08-26 |
2012-04-03 |
Nikon Corporation |
Optical element and exposure apparatus
|
|
EP2278402B1
(de)
|
2003-08-26 |
2013-03-06 |
Nikon Corporation |
Belichtungsvorrichtung
|
|
US6954256B2
(en)
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
|
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(en)
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
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|
|
EP2261740B1
(de)
|
2003-08-29 |
2014-07-09 |
ASML Netherlands BV |
Lithographischer Apparat
|
|
TWI263859B
(en)
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
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(zh)
|
2003-08-29 |
2008-07-30 |
株式会社尼康 |
曝光装置和器件加工方法
|
|
KR101523180B1
(ko)
|
2003-09-03 |
2015-05-26 |
가부시키가이샤 니콘 |
액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
|
|
WO2005029559A1
(ja)
|
2003-09-19 |
2005-03-31 |
Nikon Corporation |
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|
|
KR101664642B1
(ko)
|
2003-09-29 |
2016-10-11 |
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|
|
US7158211B2
(en)
|
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2007-01-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
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(de)
|
2003-09-29 |
2005-03-30 |
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|
|
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(de)
|
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2006-08-03 |
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|
|
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(ja)
|
2003-10-08 |
2005-05-26 |
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基板搬送装置、露光装置、並びにデバイス製造方法
|
|
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(de)
|
2003-10-08 |
2008-10-15 |
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Substrat-transport-vorrichtung und -verfahren, belichtungs-vorrichtung und -verfahren und bauelementherstellungsverfahren
|
|
WO2005036621A1
(ja)
|
2003-10-08 |
2005-04-21 |
Zao Nikon Co., Ltd. |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
|
|
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(zh)
|
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2017-09-11 |
尼康股份有限公司 |
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|
|
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(de)
|
2003-10-15 |
2005-04-20 |
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|
|
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(de)
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
|
|
US7411653B2
(en)
|
2003-10-28 |
2008-08-12 |
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|
|
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(de)
|
2003-10-28 |
2008-08-06 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
|
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7528929B2
(en)
|
2003-11-14 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7545481B2
(en)
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
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|
|
EP2717295B1
(de)
|
2003-12-03 |
2018-07-18 |
Nikon Corporation |
Belichtungsvorrichtung, Belichtungsverfahren, und Verfahren zur Herstellung einer Vorrichtung
|
|
JP2007516613A
(ja)
*
|
2003-12-15 |
2007-06-21 |
カール・ツアイス・エスエムテイ・アーゲー |
少なくとも1つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ
|
|
DE602004030481D1
(de)
|
2003-12-15 |
2011-01-20 |
Nippon Kogaku Kk |
Bühnensystem, belichtungsvorrichtung und belichtungsverfahren
|
|
US7460206B2
(en)
|
2003-12-19 |
2008-12-02 |
Carl Zeiss Smt Ag |
Projection objective for immersion lithography
|
|
US7394521B2
(en)
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7589818B2
(en)
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
|
CN1938646B
(zh)
|
2004-01-20 |
2010-12-15 |
卡尔蔡司Smt股份公司 |
曝光装置和用于投影透镜的测量装置
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
EP1713114B1
(de)
|
2004-02-03 |
2018-09-19 |
Nikon Corporation |
Belichtungsvorrichtung und verfahren zur herstellung einer vorrichtung
|
|
US7050146B2
(en)
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2005081067A1
(en)
*
|
2004-02-13 |
2005-09-01 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
|
CN100592210C
(zh)
|
2004-02-13 |
2010-02-24 |
卡尔蔡司Smt股份公司 |
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|
|
KR101851511B1
(ko)
|
2004-03-25 |
2018-04-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
US7227619B2
(en)
|
2004-04-01 |
2007-06-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7295283B2
(en)
|
2004-04-02 |
2007-11-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1753016B1
(de)
|
2004-04-19 |
2012-06-20 |
Nikon Corporation |
Belichtungsvorrichtung und bauelemente-herstellungsverfahren
|
|
US7379159B2
(en)
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20060244938A1
(en)
*
|
2004-05-04 |
2006-11-02 |
Karl-Heinz Schuster |
Microlitographic projection exposure apparatus and immersion liquid therefore
|
|
EP1747499A2
(de)
|
2004-05-04 |
2007-01-31 |
Nikon Corporation |
Vorrichtung und verfahren zur bereitstellung eines fluids für die immersionslithographie
|
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7486381B2
(en)
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1774405B1
(de)
|
2004-06-04 |
2014-08-06 |
Carl Zeiss SMT GmbH |
System zur messung der bildqualität eines optischen bildgebungssystems
|
|
WO2005122218A1
(ja)
|
2004-06-09 |
2005-12-22 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
KR20070026603A
(ko)
|
2004-06-10 |
2007-03-08 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
|
US8717533B2
(en)
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US8508713B2
(en)
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
KR20180072867A
(ko)
|
2004-06-10 |
2018-06-29 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101433491B1
(ko)
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7161663B2
(en)
|
2004-07-22 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
US7304715B2
(en)
|
2004-08-13 |
2007-12-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR20070048164A
(ko)
|
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|
|
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|
|
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|
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|
|
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|
|
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|
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|
|
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|
|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
|
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|
|
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|
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|
|
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|
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|
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|
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|
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|
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|
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|
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|
|
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|
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|
|
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|
|
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|
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|
|
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|
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|
|
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|
|
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|
|
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|
|
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|
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|
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|
|
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|
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|
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|
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|
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|
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|
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
|
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|
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|
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|
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|
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|
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|
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|
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|
|
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|
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|
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|
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
|
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|
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|
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|
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|
|
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|
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|
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|
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|
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|
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|
|
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|
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