ATE368298T1 - Verfahren zur behandlung substraten durch erzeugung und kontrole eines kryogenen aerosols - Google Patents

Verfahren zur behandlung substraten durch erzeugung und kontrole eines kryogenen aerosols

Info

Publication number
ATE368298T1
ATE368298T1 AT98926579T AT98926579T ATE368298T1 AT E368298 T1 ATE368298 T1 AT E368298T1 AT 98926579 T AT98926579 T AT 98926579T AT 98926579 T AT98926579 T AT 98926579T AT E368298 T1 ATE368298 T1 AT E368298T1
Authority
AT
Austria
Prior art keywords
substrate
generating
controlling
cryogenic aerosol
aerosol
Prior art date
Application number
AT98926579T
Other languages
English (en)
Inventor
John Patrin
John Heitzinger
Original Assignee
Fsi Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fsi Int Inc filed Critical Fsi Int Inc
Application granted granted Critical
Publication of ATE368298T1 publication Critical patent/ATE368298T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D2400/00—General features of, or devices for refrigerators, cold rooms, ice-boxes, or for cooling or freezing apparatus not covered by any other subclass
    • F25D2400/22—Cleaning means for refrigerating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
    • F25D3/00—Devices using other cold materials; Devices using cold-storage bodies
    • F25D3/10—Devices using other cold materials; Devices using cold-storage bodies using liquefied gases, e.g. liquid air
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT98926579T 1997-06-11 1998-06-11 Verfahren zur behandlung substraten durch erzeugung und kontrole eines kryogenen aerosols ATE368298T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/872,958 US5961732A (en) 1997-06-11 1997-06-11 Treating substrates by producing and controlling a cryogenic aerosol

Publications (1)

Publication Number Publication Date
ATE368298T1 true ATE368298T1 (de) 2007-08-15

Family

ID=25360692

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98926579T ATE368298T1 (de) 1997-06-11 1998-06-11 Verfahren zur behandlung substraten durch erzeugung und kontrole eines kryogenen aerosols

Country Status (7)

Country Link
US (1) US5961732A (de)
EP (1) EP0990264B1 (de)
JP (2) JP2002504016A (de)
KR (1) KR20010013667A (de)
AT (1) ATE368298T1 (de)
DE (1) DE69838135D1 (de)
WO (1) WO1998057365A1 (de)

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JP6690915B2 (ja) 2014-10-06 2020-04-28 ティーイーエル マニュファクチュアリング アンド エンジニアリング オブ アメリカ，インコーポレイテッド 極低温流体混合物で基板を処理するシステムおよび方法
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JP6508707B2 (ja) * 2015-01-27 2019-05-08 有限会社クールテクノス 低温液化ガスの噴射状態の調整方法および低温液化ガス噴射装置
TWI766897B (zh) 2016-11-09 2022-06-11 美商東京威力科創Ｆｓｉ股份有限公司 用於處理一微電子基板的設備及其方法
TWI765936B (zh) 2016-11-29 2022-06-01 美商東京威力科創Ｆｓｉ股份有限公司 用以對處理腔室中之微電子基板進行處理的平移與旋轉夾頭
CN110050336B (zh) 2016-12-07 2023-05-23 东京毅力科创Fsi公司 用于制造半导体装置的晶片边缘提升销设计
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Also Published As

Publication number Publication date
EP0990264B1 (de) 2007-07-25
JP4217987B2 (ja) 2009-02-04
DE69838135D1 (de) 2007-09-06
EP0990264A1 (de) 2000-04-05
JP2002504016A (ja) 2002-02-05
KR20010013667A (ko) 2001-02-26
US5961732A (en) 1999-10-05
JP2006310885A (ja) 2006-11-09
WO1998057365A1 (en) 1998-12-17

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