ATE383404T1 - Härtbare zusammensetzung, härtendes produkt, herstellungsverfahren dafür und mit dem härtenden produkt versiegelte lichtemittierende diode - Google Patents
Härtbare zusammensetzung, härtendes produkt, herstellungsverfahren dafür und mit dem härtenden produkt versiegelte lichtemittierende diodeInfo
- Publication number
- ATE383404T1 ATE383404T1 AT03725638T AT03725638T ATE383404T1 AT E383404 T1 ATE383404 T1 AT E383404T1 AT 03725638 T AT03725638 T AT 03725638T AT 03725638 T AT03725638 T AT 03725638T AT E383404 T1 ATE383404 T1 AT E383404T1
- Authority
- AT
- Austria
- Prior art keywords
- curing product
- curable composition
- curing
- emitting diode
- light emitting
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/42—Introducing metal atoms or metal-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/54—Nitrogen-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/852—Encapsulations
- H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Led Device Packages (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Epoxy Resins (AREA)
- Sealing Material Composition (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002125947 | 2002-04-26 | ||
| JP2002133412 | 2002-05-09 | ||
| JP2002135022 | 2002-05-10 | ||
| JP2002225189 | 2002-08-01 | ||
| JP2003026649 | 2003-02-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE383404T1 true ATE383404T1 (de) | 2008-01-15 |
Family
ID=29273849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03725638T ATE383404T1 (de) | 2002-04-26 | 2003-04-23 | Härtbare zusammensetzung, härtendes produkt, herstellungsverfahren dafür und mit dem härtenden produkt versiegelte lichtemittierende diode |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7371462B2 (de) |
| EP (1) | EP1505121B1 (de) |
| KR (1) | KR100969175B1 (de) |
| CN (1) | CN100338141C (de) |
| AT (1) | ATE383404T1 (de) |
| CA (1) | CA2483510A1 (de) |
| DE (1) | DE60318570T2 (de) |
| TW (1) | TW200307726A (de) |
| WO (1) | WO2003091338A1 (de) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100338142C (zh) * | 2000-12-27 | 2007-09-19 | 钟渊化学工业株式会社 | 固化剂、可固化组合物、光学材料用组合物、光学材料、它们的生产方法、和使用该材料制得的液晶显示器和发光二极管 |
| TW200502372A (en) * | 2003-02-25 | 2005-01-16 | Kaneka Corp | Curing composition and method for preparing same, light-shielding paste, light-shielding resin and method for producing same, package for light-emitting diode, and semiconductor device |
| JP4009581B2 (ja) * | 2003-11-18 | 2007-11-14 | オリンパス株式会社 | カプセル型医療システム |
| DE102005009066A1 (de) * | 2005-02-28 | 2006-09-07 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optischen und eines strahlungsemittierenden Bauelementes und optisches sowie strahlungsemittierendes Bauelement |
| DE102005036520A1 (de) * | 2005-04-26 | 2006-11-09 | Osram Opto Semiconductors Gmbh | Optisches Bauteil, optoelektronisches Bauelement mit dem Bauteil und dessen Herstellung |
| JP2007091960A (ja) * | 2005-09-30 | 2007-04-12 | Nitto Denko Corp | 光半導体素子封止用樹脂組成物およびそれを用いて得られる光半導体装置 |
| US8465175B2 (en) | 2005-11-29 | 2013-06-18 | GE Lighting Solutions, LLC | LED lighting assemblies with thermal overmolding |
| US8263725B2 (en) * | 2005-12-26 | 2012-09-11 | Kaneka Corporation | Curable composition |
| CN100448905C (zh) * | 2006-03-17 | 2009-01-07 | 中国科学院广州化学研究所 | 含有8-羟基喹啉金属配合物的高聚物分子杂化发光材料及其制备方法 |
| US20070269586A1 (en) * | 2006-05-17 | 2007-11-22 | 3M Innovative Properties Company | Method of making light emitting device with silicon-containing composition |
| WO2007135707A1 (ja) | 2006-05-18 | 2007-11-29 | Nichia Corporation | 樹脂成形体及び表面実装型発光装置並びにそれらの製造方法 |
| US8084765B2 (en) * | 2007-05-07 | 2011-12-27 | Xerox Corporation | Electronic device having a dielectric layer |
| US9024455B2 (en) * | 2010-05-26 | 2015-05-05 | Hitachi Chemical Company, Ltd. | Semiconductor encapsulation adhesive composition, semiconductor encapsulation film-like adhesive, method for producing semiconductor device and semiconductor device |
| JP5519290B2 (ja) * | 2007-11-09 | 2014-06-11 | 株式会社カネカ | 環状ポリオルガノシロキサンの製造方法、硬化剤、硬化性組成物およびその硬化物 |
| KR101800015B1 (ko) | 2007-12-10 | 2017-11-21 | 카네카 코포레이션 | 알칼리 현상성을 갖는 경화성 조성물 및 그것을 사용한 절연성 박막 및 박막 트랜지스터 |
| CN101538367B (zh) | 2008-01-28 | 2013-09-04 | 信越化学工业株式会社 | 二缩水甘油基异氰尿酸基改性有机聚硅氧烷以及含有该有机聚硅氧烷的组成物 |
| GB0805495D0 (en) * | 2008-03-26 | 2008-04-30 | Sun Chemical Bv | An ink jet-printable composition and a masking process |
| JP5471180B2 (ja) * | 2008-09-11 | 2014-04-16 | 信越化学工業株式会社 | シリコーン積層基板、その製造方法、シリコーン積層基板製造用シリコーン樹脂組成物及びled装置 |
| CN104497272B (zh) * | 2008-10-02 | 2017-06-23 | 株式会社钟化 | 光固化性组合物以及固化物 |
| EP2196503B1 (de) * | 2008-12-12 | 2015-02-18 | Nitto Denko Corporation | Wärmehärtende Silikonharzzusammensetzung, Silikonharz, Silikonharzfolie und Verwendung dafür |
| TWI579995B (zh) * | 2009-08-19 | 2017-04-21 | 精材科技股份有限公司 | 晶片封裝體及其製造方法 |
| JP2011057755A (ja) * | 2009-09-07 | 2011-03-24 | Shin-Etsu Chemical Co Ltd | シリコーン組成物及びその硬化物 |
| JP5340191B2 (ja) * | 2010-02-02 | 2013-11-13 | 日東電工株式会社 | 光半導体装置 |
| JP5380325B2 (ja) * | 2010-02-18 | 2014-01-08 | 日東電工株式会社 | 光半導体素子封止用熱硬化性樹脂組成物およびその硬化体、ならびにそれを用いて得られる光半導体装置 |
| EP2545103B1 (de) | 2010-03-09 | 2016-09-14 | University Of Virginia Patent Foundation | Viskoelastische silikonkautschukzusammensetzungen |
| WO2011118315A1 (ja) * | 2010-03-23 | 2011-09-29 | 東海ゴム工業株式会社 | 導電性架橋体、およびその製造方法、並びにそれを用いたトランスデューサ、フレキシブル配線板、電磁波シールド |
| US9178120B2 (en) * | 2010-04-02 | 2015-11-03 | Kaneka Corporation | Curable resin composition, curable resin composition tablet, molded body, semiconductor package, semiconductor component and light emitting diode |
| KR101763975B1 (ko) * | 2010-05-07 | 2017-08-01 | 스미토모 베이클리트 컴퍼니 리미티드 | 회로 기판용 에폭시 수지 조성물, 프리프레그, 적층판, 수지 시트, 프린트 배선판용 적층기재, 프린트 배선판, 및 반도체 장치 |
| CN102453327A (zh) * | 2010-10-27 | 2012-05-16 | 3M新设资产公司 | 具有高折射率的聚硅氧树脂组合物 |
| JP2012191062A (ja) * | 2011-03-11 | 2012-10-04 | Toshiba Corp | 半導体装置 |
| EP2584015B1 (de) | 2011-03-16 | 2016-11-02 | Dexerials Corporation | Lichtreflektierendes, anisotropisch leitfähiges haftmittel und lichtemittierende vorrichtung |
| US9550864B2 (en) | 2011-08-10 | 2017-01-24 | University Of Virginia Patent Foundation | Viscoelastic silicon rubber compositions |
| US9484123B2 (en) | 2011-09-16 | 2016-11-01 | Prc-Desoto International, Inc. | Conductive sealant compositions |
| JP5912600B2 (ja) * | 2011-09-16 | 2016-04-27 | 東レ・ダウコーニング株式会社 | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| JP2013159671A (ja) * | 2012-02-02 | 2013-08-19 | Dow Corning Toray Co Ltd | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| JP5695269B2 (ja) * | 2012-03-28 | 2015-04-01 | 株式会社ダイセル | 硬化性エポキシ樹脂組成物 |
| JP5958107B2 (ja) * | 2012-06-15 | 2016-07-27 | デクセリアルズ株式会社 | 光反射性異方性導電接着剤及び発光装置 |
| CN102942895B (zh) * | 2012-11-15 | 2016-03-02 | 烟台德邦科技有限公司 | 一种导热电子灌封胶及其制备方法 |
| JPWO2015046028A1 (ja) * | 2013-09-27 | 2017-03-09 | Rimtec株式会社 | ノルボルネン系架橋重合体およびその製造方法 |
| JP6384046B2 (ja) * | 2013-12-06 | 2018-09-05 | デクセリアルズ株式会社 | 光反射性異方性導電接着剤及び発光装置 |
| CN106414609A (zh) * | 2014-01-17 | 2017-02-15 | 汉高股份有限及两合公司 | 用于光学半导体装置的可固化组合物 |
| CN111527131B (zh) * | 2017-12-30 | 2022-09-27 | 美国圣戈班性能塑料公司 | 杂链聚合物组合物 |
| CN109810669B (zh) * | 2018-12-28 | 2021-07-16 | 广州市高士实业有限公司 | 一种聚硅树脂及其制备方法和应用 |
| JP7752303B2 (ja) | 2019-10-30 | 2025-10-10 | 株式会社スリーボンド | 樹脂組成物 |
| CN112979961B (zh) * | 2019-12-17 | 2022-11-04 | 中蓝晨光化工研究设计院有限公司 | 一种大分子类硅橡胶增粘剂的制备方法 |
| KR20230047432A (ko) * | 2020-08-06 | 2023-04-07 | 다우 도레이 캄파니 리미티드 | 경화성 실리콘 조성물 및 그의 경화물 |
| CN112266571A (zh) * | 2020-10-26 | 2021-01-26 | 东莞市鑫聚光电科技股份有限公司 | 一种pdlc调光膜 |
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| CH529769A (fr) | 1971-04-16 | 1972-10-31 | Rephamac Ag | Procédé de préparation d'acides désoxyribonucléiques à poids moléculaire élevé |
| JPS5756492B2 (de) * | 1973-05-02 | 1982-11-30 | ||
| JPS59155483A (ja) | 1983-02-25 | 1984-09-04 | Toshiba Silicone Co Ltd | 表面硬化性シリコ−ンシ−リング材組成物 |
| JPH0623256B2 (ja) * | 1989-03-28 | 1994-03-30 | 信越化学工業株式会社 | ゴム組成物用シリコーン変性加硫助剤及びその製造方法 |
| US4943601A (en) * | 1989-04-03 | 1990-07-24 | General Electric Company | Coating with improved adhesion |
| JPH07119396B2 (ja) * | 1990-02-27 | 1995-12-20 | 信越化学工業株式会社 | 接着性オルガノポリシロキサン組成物及びその硬化物 |
| JP3268801B2 (ja) | 1991-11-22 | 2002-03-25 | ジーイー東芝シリコーン株式会社 | シリコーンゴム組成物およびシリコーンゴム加工布 |
| JP3354973B2 (ja) | 1992-10-06 | 2002-12-09 | 鐘淵化学工業株式会社 | 硬化性組成物 |
| JP2875758B2 (ja) | 1994-12-28 | 1999-03-31 | 東芝シリコーン株式会社 | 粘着シート |
| JPH0912892A (ja) * | 1995-07-04 | 1997-01-14 | Toray Dow Corning Silicone Co Ltd | 現場成形ガスケット用シリコーンゴム組成物 |
| JPH09291214A (ja) * | 1996-04-25 | 1997-11-11 | Nippon Paint Co Ltd | 硬化性樹脂組成物及びその硬化物 |
| JP3571144B2 (ja) * | 1996-05-29 | 2004-09-29 | 鐘淵化学工業株式会社 | 硬化性組成物 |
| JP2000124475A (ja) * | 1998-10-14 | 2000-04-28 | Kanegafuchi Chem Ind Co Ltd | 光半導体封止材用硬化性組成物及び光半導体製品の製造方法 |
| JP4993806B2 (ja) * | 2000-04-21 | 2012-08-08 | 株式会社カネカ | 光学材料用組成物、光学用材料、その製造方法およびそれを用いた液晶表示装置 |
| CN1192061C (zh) | 2000-04-21 | 2005-03-09 | 钟渊化学工业株式会社 | 固化性组合物、光学材料用组合物、光学材料、液晶显示装置、透明导电性膜及其制造方法 |
| JP4782279B2 (ja) | 2000-12-26 | 2011-09-28 | 株式会社カネカ | 封止剤、半導体等の封止方法、半導体装置の製造方法、および半導体装置 |
| CN100338142C (zh) | 2000-12-27 | 2007-09-19 | 钟渊化学工业株式会社 | 固化剂、可固化组合物、光学材料用组合物、光学材料、它们的生产方法、和使用该材料制得的液晶显示器和发光二极管 |
| JP2002235005A (ja) | 2001-02-09 | 2002-08-23 | Kanegafuchi Chem Ind Co Ltd | 光学用材料用組成物、光学用材料およびその製造方法 |
| JP4275889B2 (ja) * | 2001-02-09 | 2009-06-10 | 株式会社カネカ | 発光ダイオード及びその製造方法 |
| JP4066229B2 (ja) * | 2001-02-14 | 2008-03-26 | 株式会社カネカ | 硬化剤、硬化性組成物、光学材料用組成物、光学材料、その製造方法、並びに、それを用いた液晶表示装置及びled |
| JP4037125B2 (ja) * | 2001-02-23 | 2008-01-23 | 株式会社カネカ | 発光ダイオード及びその製造方法 |
| JP3910080B2 (ja) * | 2001-02-23 | 2007-04-25 | 株式会社カネカ | 発光ダイオード |
| JP2003113310A (ja) * | 2001-10-05 | 2003-04-18 | Kanegafuchi Chem Ind Co Ltd | 光学材料用組成物、電子材料用組成物、光学材料、電子材料、発光ダイオード及びその製造方法 |
| JP2003128921A (ja) | 2001-10-17 | 2003-05-08 | Kanegafuchi Chem Ind Co Ltd | 熱硬化性樹脂組成物及び熱硬化性樹脂フィルム、それを用いてなる金属箔積層体 |
-
2003
- 2003-04-23 CN CNB03809388XA patent/CN100338141C/zh not_active Expired - Lifetime
- 2003-04-23 EP EP20030725638 patent/EP1505121B1/de not_active Expired - Lifetime
- 2003-04-23 US US10/512,135 patent/US7371462B2/en not_active Expired - Lifetime
- 2003-04-23 AT AT03725638T patent/ATE383404T1/de not_active IP Right Cessation
- 2003-04-23 WO PCT/JP2003/005142 patent/WO2003091338A1/ja not_active Ceased
- 2003-04-23 CA CA 2483510 patent/CA2483510A1/en not_active Abandoned
- 2003-04-23 KR KR1020047017264A patent/KR100969175B1/ko not_active Expired - Lifetime
- 2003-04-23 DE DE2003618570 patent/DE60318570T2/de not_active Expired - Lifetime
- 2003-04-25 TW TW92109718A patent/TW200307726A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2483510A1 (en) | 2003-11-06 |
| CN100338141C (zh) | 2007-09-19 |
| US7371462B2 (en) | 2008-05-13 |
| TW200307726A (en) | 2003-12-16 |
| TWI336345B (de) | 2011-01-21 |
| EP1505121A4 (de) | 2006-04-12 |
| WO2003091338A1 (fr) | 2003-11-06 |
| CN1649964A (zh) | 2005-08-03 |
| KR20050007343A (ko) | 2005-01-17 |
| EP1505121A1 (de) | 2005-02-09 |
| DE60318570T2 (de) | 2009-01-08 |
| KR100969175B1 (ko) | 2010-07-14 |
| EP1505121B1 (de) | 2008-01-09 |
| DE60318570D1 (de) | 2008-02-21 |
| US20050209400A1 (en) | 2005-09-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |