ATE391341T1 - Verfahren und vorrichtung zur bestrahlung mit ultraviolettlicht - Google Patents

Verfahren und vorrichtung zur bestrahlung mit ultraviolettlicht

Info

Publication number
ATE391341T1
ATE391341T1 AT04003567T AT04003567T ATE391341T1 AT E391341 T1 ATE391341 T1 AT E391341T1 AT 04003567 T AT04003567 T AT 04003567T AT 04003567 T AT04003567 T AT 04003567T AT E391341 T1 ATE391341 T1 AT E391341T1
Authority
AT
Austria
Prior art keywords
ultraviolet light
wafer
ultraviolet
irradiation
work piece
Prior art date
Application number
AT04003567T
Other languages
English (en)
Inventor
Yuji Okawa
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Application granted granted Critical
Publication of ATE391341T1 publication Critical patent/ATE391341T1/de

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G19/00—Table service
    • A47G19/12—Vessels or pots for table use
    • A47G19/18—Containers for delivering jam, mustard, or the like
    • A47G19/186—Containers for delivering jam, mustard, or the like combined with a spreading implement
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G2400/00—Details not otherwise provided for in A47G19/00-A47G23/16
    • A47G2400/02—Hygiene

Landscapes

  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AT04003567T 2003-03-12 2004-02-18 Verfahren und vorrichtung zur bestrahlung mit ultraviolettlicht ATE391341T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003066561A JP4488686B2 (ja) 2003-03-12 2003-03-12 紫外線照射方法およびそれを用いた装置

Publications (1)

Publication Number Publication Date
ATE391341T1 true ATE391341T1 (de) 2008-04-15

Family

ID=32767936

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04003567T ATE391341T1 (de) 2003-03-12 2004-02-18 Verfahren und vorrichtung zur bestrahlung mit ultraviolettlicht

Country Status (8)

Country Link
US (1) US7091499B2 (de)
EP (1) EP1458012B1 (de)
JP (1) JP4488686B2 (de)
KR (1) KR101011890B1 (de)
CN (1) CN100361273C (de)
AT (1) ATE391341T1 (de)
DE (1) DE602004012789T2 (de)
TW (1) TWI312173B (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4641423B2 (ja) * 2004-02-18 2011-03-02 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
KR100601509B1 (ko) 2004-09-22 2006-07-19 삼성에스디아이 주식회사 배터리 팩의 케이스
JP2006281655A (ja) * 2005-04-01 2006-10-19 Ichikoh Ind Ltd 紫外線照射装置
JP4798754B2 (ja) 2005-05-24 2011-10-19 リンテック株式会社 エネルギー線照射装置とその方法
JP2007214357A (ja) * 2006-02-09 2007-08-23 Nitto Denko Corp ワーク貼付け支持方法およびこれを用いたワーク貼付け支持装置
KR100876155B1 (ko) * 2006-11-28 2008-12-26 삼성전자주식회사 웨이퍼 보호테이프 커팅장치, 백 래핑설비 및 이를 사용한웨이퍼 보호테이프 커팅방법
JP5324130B2 (ja) 2008-05-22 2013-10-23 リンテック株式会社 光照射装置
JP4796096B2 (ja) * 2008-06-12 2011-10-19 リンテック株式会社 光照射装置及び光照射方法
CN103170461B (zh) * 2009-08-07 2015-04-08 晶元光电股份有限公司 芯片分类方法
JP5583374B2 (ja) * 2009-09-07 2014-09-03 株式会社島津製作所 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法
US8710458B2 (en) * 2010-10-19 2014-04-29 Taiwan Semiconductor Manufacturing Company, Ltd. UV exposure method for reducing residue in de-taping process
JP5585379B2 (ja) 2010-10-21 2014-09-10 富士電機株式会社 半導体装置の製造方法およびその製造装置
KR102516339B1 (ko) 2018-04-06 2023-03-31 삼성전자주식회사 광 조사기용 덮개 구조물과 이를 구비하는 광 조사장치 및 이를 이용한 다이 접착 방법
JP7584259B2 (ja) * 2020-09-07 2024-11-15 株式会社ディスコ 紫外線照射装置
JP2023182043A (ja) * 2022-06-14 2023-12-26 リンテック株式会社 電磁波照射装置および電磁波照射方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5921038A (ja) 1982-07-27 1984-02-02 Nec Home Electronics Ltd ペレツト剥離方法
JPS61226933A (ja) 1985-03-30 1986-10-08 Toshiba Corp マウント装置
JPH03180049A (ja) 1989-12-08 1991-08-06 Sumitomo Electric Ind Ltd 半導体装置のピックアップ方法
US5298365A (en) * 1990-03-20 1994-03-29 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
JPH06204335A (ja) * 1993-01-06 1994-07-22 Nitto Denko Corp 紫外線照射装置
US5435876A (en) * 1993-03-29 1995-07-25 Texas Instruments Incorporated Grid array masking tape process
JPH08107088A (ja) * 1994-10-04 1996-04-23 Fujitsu Ltd 半導体装置の製造方法
US5590787A (en) * 1995-01-04 1997-01-07 Micron Technology, Inc. UV light sensitive die-pac for securing semiconductor dies during transport
GB9509487D0 (en) * 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
JP3518786B2 (ja) 1995-12-02 2004-04-12 リンテック株式会社 ダイシングテープ用光照射装置および光照射方法
JP3464596B2 (ja) * 1996-09-13 2003-11-10 富士通株式会社 半導体装置の製造方法および製造装置
US6202292B1 (en) * 1998-08-26 2001-03-20 Micron Technology, Inc. Apparatus for removing carrier film from a semiconductor die
JP3504543B2 (ja) 1999-03-03 2004-03-08 株式会社日立製作所 半導体素子の分離方法およびその装置並びに半導体素子の搭載方法

Also Published As

Publication number Publication date
JP4488686B2 (ja) 2010-06-23
US20040180515A1 (en) 2004-09-16
EP1458012A3 (de) 2006-05-10
KR101011890B1 (ko) 2011-02-01
EP1458012A2 (de) 2004-09-15
US7091499B2 (en) 2006-08-15
JP2004281430A (ja) 2004-10-07
CN1531016A (zh) 2004-09-22
DE602004012789D1 (de) 2008-05-15
CN100361273C (zh) 2008-01-09
KR20040081012A (ko) 2004-09-20
TWI312173B (en) 2009-07-11
DE602004012789T2 (de) 2008-07-24
EP1458012B1 (de) 2008-04-02
TW200425305A (en) 2004-11-16

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