ATE418790T1 - Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten - Google Patents

Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten

Info

Publication number
ATE418790T1
ATE418790T1 AT04741830T AT04741830T ATE418790T1 AT E418790 T1 ATE418790 T1 AT E418790T1 AT 04741830 T AT04741830 T AT 04741830T AT 04741830 T AT04741830 T AT 04741830T AT E418790 T1 ATE418790 T1 AT E418790T1
Authority
AT
Austria
Prior art keywords
plate
wet treatment
substrates
disc
wafer
Prior art date
Application number
AT04741830T
Other languages
English (en)
Inventor
Rainer Obweger
Alexander Pfeuffer
Martin Koeffler
Alexander Lippert
Original Assignee
Sez Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sez Ag filed Critical Sez Ag
Application granted granted Critical
Publication of ATE418790T1 publication Critical patent/ATE418790T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
AT04741830T 2003-06-24 2004-06-17 Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten ATE418790T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT9702003 2003-06-24
EP04741830A EP1644960B1 (de) 2003-06-24 2004-06-17 Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten

Publications (1)

Publication Number Publication Date
ATE418790T1 true ATE418790T1 (de) 2009-01-15

Family

ID=33520101

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04741830T ATE418790T1 (de) 2003-06-24 2004-06-17 Einrichtung und verfahren zur nassbehandlung von scheibenartigen substraten

Country Status (10)

Country Link
US (2) US8261757B2 (de)
EP (1) EP1644960B1 (de)
JP (1) JP4674207B2 (de)
KR (2) KR101364137B1 (de)
CN (2) CN100369187C (de)
AT (1) ATE418790T1 (de)
DE (1) DE602004018643D1 (de)
SG (1) SG166038A1 (de)
TW (1) TWI236937B (de)
WO (1) WO2004114372A1 (de)

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DE102006033372B4 (de) * 2006-02-17 2010-04-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ultraschallaktor zur Reinigung von Objekten
US20090235952A1 (en) * 2006-05-05 2009-09-24 Sez Ag Device and method for wet treating plate-like substrates
TWI359456B (en) * 2006-12-15 2012-03-01 Lam Res Ag Device and method for wet treating plate-like arti
TWI421933B (zh) * 2007-05-16 2014-01-01 蘭研究公司 板狀物件之超音波濕式處理的裝置與方法
CN103824757B (zh) * 2007-05-23 2018-11-23 细美事有限公司 基板干燥的装置与方法
KR20120018296A (ko) * 2009-03-31 2012-03-02 에이씨엠 리서치 (상하이) 인코포레이티드 반도체 웨이퍼 세정 방법 및 장치
US10094034B2 (en) 2015-08-28 2018-10-09 Lam Research Corporation Edge flow element for electroplating apparatus
US10233556B2 (en) 2010-07-02 2019-03-19 Lam Research Corporation Dynamic modulation of cross flow manifold during electroplating
US9624592B2 (en) 2010-07-02 2017-04-18 Novellus Systems, Inc. Cross flow manifold for electroplating apparatus
US8795480B2 (en) 2010-07-02 2014-08-05 Novellus Systems, Inc. Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
US9523155B2 (en) 2012-12-12 2016-12-20 Novellus Systems, Inc. Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
US8539969B2 (en) * 2010-07-30 2013-09-24 Sematech, Inc. Gigasonic brush for cleaning surfaces
EP2515323B1 (de) * 2011-04-21 2014-03-19 Imec Verfahren und Vorrichtung zur Reinigung von Halbleitersubstraten
US8551251B2 (en) * 2011-04-28 2013-10-08 Lam Research Ag Ultrasonic treatment method and apparatus
US10269615B2 (en) * 2011-09-09 2019-04-23 Lam Research Ag Apparatus for treating surfaces of wafer-shaped articles
US8974632B2 (en) * 2011-11-30 2015-03-10 Lam Research Ag Device and method for treating wafer-shaped articles
US9548223B2 (en) * 2011-12-23 2017-01-17 Lam Research Ag Apparatus for treating surfaces of wafer-shaped articles
US9449808B2 (en) 2013-05-29 2016-09-20 Novellus Systems, Inc. Apparatus for advanced packaging applications
US9523158B2 (en) * 2014-02-07 2016-12-20 Applied Materials, Inc. Methods and apparatus for forming semiconductor
US10688536B2 (en) * 2014-02-24 2020-06-23 The Boeing Company System and method for surface cleaning
US9714462B2 (en) * 2014-10-08 2017-07-25 Applied Materials, Inc. Vacuum pre-wetting apparatus and methods
US10167552B2 (en) * 2015-02-05 2019-01-01 Lam Research Ag Spin chuck with rotating gas showerhead
JP6710758B2 (ja) 2015-12-04 2020-06-17 アイシーユー・メディカル・インコーポレーテッド 医療用流体を移送するための電子式医療用流体移送装置
US10364505B2 (en) 2016-05-24 2019-07-30 Lam Research Corporation Dynamic modulation of cross flow manifold during elecroplating
US11001934B2 (en) 2017-08-21 2021-05-11 Lam Research Corporation Methods and apparatus for flow isolation and focusing during electroplating
US10781527B2 (en) 2017-09-18 2020-09-22 Lam Research Corporation Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating
JP7165201B2 (ja) * 2018-09-25 2022-11-02 日立Astemo株式会社 認識装置
JP7213648B2 (ja) * 2018-09-27 2023-01-27 東京エレクトロン株式会社 基板処理装置
US11160892B2 (en) 2019-02-13 2021-11-02 Restec Solutions, Llc Ultrasonic standing wave nebulization system
JP7427777B2 (ja) * 2019-11-05 2024-02-05 アルセロールミタル 移動する鋼ストリップの連続洗浄方法および装置
JP7402698B2 (ja) * 2020-01-21 2023-12-21 東京エレクトロン株式会社 基板洗浄装置及び基板洗浄方法
CN112599441A (zh) * 2020-11-30 2021-04-02 硅密芯镀(海宁)半导体技术有限公司 清洗系统、晶圆清洗设备及晶圆浸润水洗方法
CN119733973B (zh) * 2025-01-21 2026-03-10 武汉芯丰精密科技有限公司 晶片加工装置

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JPH07171526A (ja) * 1993-12-22 1995-07-11 Hitachi Ltd 超音波洗浄装置
US5979475A (en) * 1994-04-28 1999-11-09 Hitachi, Ltd. Specimen holding method and fluid treatment method of specimen surface and systems therefor
JP3099054B2 (ja) * 1994-09-09 2000-10-16 東京エレクトロン株式会社 塗布装置及びその方法
JP3326656B2 (ja) 1994-10-31 2002-09-24 ソニー株式会社 回転式半導体基板処理装置及び回転式半導体基板処理方法
US5788453A (en) * 1996-05-30 1998-08-04 Applied Materials, Inc. Piezoelectric wafer gripping system for robot blades
DE19629705A1 (de) * 1996-07-24 1998-01-29 Joachim Dr Scheerer Verfahren und Vorrichtung zur Reinigung von scheibenförmigen Gegenständen, insbesondere Wafern, mit Ultraschall und Wasser als Spülmedium
JPH10154677A (ja) 1996-11-26 1998-06-09 Hitachi Ltd 半導体集積回路装置の製造方法および製造装置
JP3511441B2 (ja) 1996-11-29 2004-03-29 忠弘 大見 洗浄やエッチング、現像、剥離等を含むウエット処理に用いる省液型の液体供給ノズル、ウエット処理装置及びウエット処理方法
JP3309749B2 (ja) 1997-01-07 2002-07-29 凸版印刷株式会社 超音波洗浄装置
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
JP2930583B1 (ja) 1998-07-02 1999-08-03 株式会社カイジョー 半導体ウェハのスピン枚葉処理装置
JP2001009387A (ja) * 1999-06-29 2001-01-16 Dainippon Screen Mfg Co Ltd 基板洗浄装置
US6532977B2 (en) * 2000-03-16 2003-03-18 Bridgestone Corporation Cleaning vessel and silicon carbide sintered body used therefor
FR2808120B1 (fr) * 2000-04-20 2002-07-26 Karl Suss France Procede et dispositif pour le traitement du substrat d'un circuit integre ou d'un produit analogue en cours de fabrication
ATE257277T1 (de) * 2000-10-31 2004-01-15 Sez Ag Vorrichtung zur flüssigkeitsbehandlung von scheibenförmigen gegenständen
CN1241241C (zh) * 2001-09-04 2006-02-08 阿尔卑斯电气株式会社 湿式处理用喷嘴
US7306002B2 (en) * 2003-01-04 2007-12-11 Yong Bae Kim System and method for wet cleaning a semiconductor wafer

Also Published As

Publication number Publication date
EP1644960A1 (de) 2006-04-12
DE602004018643D1 (de) 2009-02-05
JP4674207B2 (ja) 2011-04-20
JP2007527606A (ja) 2007-09-27
TW200505599A (en) 2005-02-16
CN101308766A (zh) 2008-11-19
KR101333288B1 (ko) 2013-11-27
KR20060024811A (ko) 2006-03-17
KR101364137B1 (ko) 2014-02-17
TWI236937B (en) 2005-08-01
KR20130019013A (ko) 2013-02-25
EP1644960B1 (de) 2008-12-24
CN100369187C (zh) 2008-02-13
CN101308766B (zh) 2010-06-09
WO2004114372A1 (en) 2004-12-29
CN1809913A (zh) 2006-07-26
SG166038A1 (en) 2010-11-29
US8261757B2 (en) 2012-09-11
US8435356B2 (en) 2013-05-07
US20120167914A1 (en) 2012-07-05
US20060151014A1 (en) 2006-07-13

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