ATE498707T1 - Verfahren zur stromlosen abscheidung von metallen - Google Patents
Verfahren zur stromlosen abscheidung von metallenInfo
- Publication number
- ATE498707T1 ATE498707T1 AT03013706T AT03013706T ATE498707T1 AT E498707 T1 ATE498707 T1 AT E498707T1 AT 03013706 T AT03013706 T AT 03013706T AT 03013706 T AT03013706 T AT 03013706T AT E498707 T1 ATE498707 T1 AT E498707T1
- Authority
- AT
- Austria
- Prior art keywords
- metals
- electrolyte
- less
- electroless plating
- films
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title abstract 2
- 239000002184 metal Substances 0.000 title abstract 2
- 229910052751 metal Inorganic materials 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 150000002739 metals Chemical group 0.000 title 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 7
- 238000007772 electroless plating Methods 0.000 abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract 1
- 239000013522 chelant Substances 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
- 230000007306 turnover Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Electrochemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10246453A DE10246453A1 (de) | 2002-10-04 | 2002-10-04 | Verfahren zur stromlosen Abscheidung von Nickel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE498707T1 true ATE498707T1 (de) | 2011-03-15 |
Family
ID=32010257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03013706T ATE498707T1 (de) | 2002-10-04 | 2003-06-17 | Verfahren zur stromlosen abscheidung von metallen |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7846503B2 (de) |
| EP (1) | EP1413646B2 (de) |
| JP (1) | JP4091518B2 (de) |
| KR (1) | KR101063851B1 (de) |
| CN (1) | CN100366795C (de) |
| AT (1) | ATE498707T1 (de) |
| DE (2) | DE10246453A1 (de) |
| ES (1) | ES2357943T5 (de) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004002778C5 (de) * | 2004-01-20 | 2017-04-20 | Enthone Inc. | Verfahren zur Regenerierung von Metallisierungsbädern |
| US7410899B2 (en) * | 2005-09-20 | 2008-08-12 | Enthone, Inc. | Defectivity and process control of electroless deposition in microelectronics applications |
| US20080041734A1 (en) * | 2005-09-22 | 2008-02-21 | Bergelson Alan P | Jewelry display apparatus |
| JP4740724B2 (ja) * | 2005-12-01 | 2011-08-03 | コーア株式会社 | 抵抗体の形成方法及び金属被膜固定抵抗器の形成方法 |
| CN100412232C (zh) * | 2006-01-13 | 2008-08-20 | 厦门大学 | 镁合金表面化学镀镍硼合金的方法 |
| EP1816237A1 (de) * | 2006-02-02 | 2007-08-08 | Enthone, Inc. | Verfahren und Vorrichtung zur Beschichtung von Substratoberflächen |
| CN100402699C (zh) * | 2006-03-15 | 2008-07-16 | 厦门大学 | 一种镁合金表面化学镀镍硼合金的方法 |
| US8317909B2 (en) * | 2007-06-05 | 2012-11-27 | Dfhs, Llc | Compositions and processes for deposition of metal ions onto surfaces of conductive substrates |
| US8962070B2 (en) * | 2009-07-03 | 2015-02-24 | Enthone Inc. | Method for the deposition of a metal layer comprising a beta-amino acid |
| EP2270255A1 (de) | 2009-07-03 | 2011-01-05 | Enthone, Inc. | Beta-Aminosäure enthaltend Elektrolyt und Verfahren zur Ablagerung einer Metallschicht |
| JP2012533683A (ja) * | 2009-07-16 | 2012-12-27 | ラム リサーチ コーポレーション | 無電解析出溶液およびプロセス制御 |
| US20110192316A1 (en) * | 2010-02-05 | 2011-08-11 | E-Chem Enterprise Corp. | Electroless plating solution for providing solar cell electrode |
| DE102010062357B4 (de) | 2010-12-02 | 2013-08-14 | Innovent E.V. | Vorrichtung und Verfahren zur Herstellung eines mit zumindest einer Korrosionsschutzschicht beschichteten magnesiumhaltigen Substrats |
| CN102268658A (zh) * | 2011-07-22 | 2011-12-07 | 深圳市精诚达电路有限公司 | 一种化学镀镍液及化学镀镍工艺 |
| CA2879315C (en) * | 2012-07-17 | 2019-09-10 | Coventya, Inc. | Electroless nickel coatings and compositions and methods for forming the coatings |
| ES2766775T3 (es) * | 2013-09-05 | 2020-06-15 | Macdermid Enthone Inc | Composición acuosa de electrolito que tiene una emisión aérea reducida |
| US11685999B2 (en) | 2014-06-02 | 2023-06-27 | Macdermid Acumen, Inc. | Aqueous electroless nickel plating bath and method of using the same |
| US9708693B2 (en) * | 2014-06-03 | 2017-07-18 | Macdermid Acumen, Inc. | High phosphorus electroless nickel |
| US9962522B2 (en) | 2014-10-29 | 2018-05-08 | Professional Plating, Inc. | Braid plating method for torsional stiffness |
| US20170051411A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Electroless Silver Plating Bath and Method of Using the Same |
| ES2712858T3 (es) | 2015-10-13 | 2019-05-16 | Macdermid Enthone Inc | Uso de fosfa-adamantanos solubles en agua y estables en aire como estabilizadores en electrolitos para deposición no electrolítica de metal |
| EP3255175A1 (de) | 2016-06-07 | 2017-12-13 | MacDermid Enthone Inc. | Verwendung von wasserlöslichen lanthanidverbindungen als stabilisator in elektrolyten zur stromlosen metallabscheidung |
| US10966753B2 (en) | 2016-10-14 | 2021-04-06 | Pacesetter, Inc. | Catheter-based system for delivery and retrieval of a leadless pacemaker |
| US10351715B2 (en) * | 2017-03-30 | 2019-07-16 | The United States Of America As Represented By The Secretary Of The Navy | Synergistic metal polycarboxylate corrosion inhibitors |
| US10960217B2 (en) | 2017-03-31 | 2021-03-30 | Pacesetter, Inc. | Catheter-based delivery system for delivering a leadless pacemaker and employing a locking hub |
| DE102017125954A1 (de) * | 2017-11-07 | 2019-05-09 | RIAG Oberflächentechnik AG | Außen stromloses Verfahren zur Erzeugung einer Nickellegierung und entsprechender Elektrolyt |
| CN110318045A (zh) * | 2019-06-20 | 2019-10-11 | 深圳市宏达秋科技有限公司 | 一种高稳定性化学镀镍液及其制备方法 |
| CN110318046B (zh) * | 2019-06-20 | 2025-03-11 | 吉安宏达秋科技有限公司 | 一种高耐蚀性化学镀镍液及其制备方法 |
| CN117187792B (zh) * | 2023-08-10 | 2024-07-09 | 中山博美新材料科技有限公司 | 一种铝合金高磷化学沉镍液及其使用方法与应用 |
| US12553134B2 (en) | 2023-09-29 | 2026-02-17 | Macdermid Enthone Inc. | Bendable nickel plating on flexible substrates |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2694017A (en) * | 1952-09-16 | 1954-11-09 | Gen American Transporation Cor | Process of chemical nickel plating of aluminum and its alloys and baths therefor |
| US3060059A (en) * | 1961-05-19 | 1962-10-23 | Goodyear Aircraft Corp | Electroless nickel-phosphorous alloy plating bath and method |
| GB1243134A (en) | 1968-07-29 | 1971-08-18 | Texas Instruments Inc | Chemical nickel plating bath and process |
| US3597266A (en) * | 1968-09-23 | 1971-08-03 | Enthone | Electroless nickel plating |
| US3597267A (en) * | 1969-02-26 | 1971-08-03 | Allied Res Prod Inc | Bath and process for chemical metal plating |
| US3887732A (en) * | 1970-10-01 | 1975-06-03 | Gen Am Transport | Stress controlled electroless nickel deposits |
| IT985372B (it) * | 1972-06-09 | 1974-11-30 | Imasa Sa | Composizione concentrata per la produzione di soluzioni di nichelatura senza corrente elet trica soluzione di nichelatura e relativo procedimento di impie go |
| US3876434A (en) * | 1972-12-07 | 1975-04-08 | Shipley Co | Replenishment of electroless nickel solutions |
| US4152164A (en) * | 1976-04-26 | 1979-05-01 | Michael Gulla | Electroless nickel plating |
| US4293089A (en) * | 1979-05-08 | 1981-10-06 | The United States Of America As Represented By The United States Department Of Energy | Brazing method |
| JPS5743978A (en) * | 1980-08-27 | 1982-03-12 | Suzuki Motor Co Ltd | Nickel electroless plating method |
| US4483711A (en) * | 1983-06-17 | 1984-11-20 | Omi International Corporation | Aqueous electroless nickel plating bath and process |
| JPS6421082A (en) * | 1987-07-15 | 1989-01-24 | Nippon Chemical Ind | Production of powdery plated material |
| JPH01201484A (ja) * | 1987-10-06 | 1989-08-14 | Hitachi Ltd | 化学ニッケルめっき液及びその使用方法 |
| JPH01123079A (ja) * | 1987-11-06 | 1989-05-16 | Minoru Tsuda | 非晶質Ni−P合金 |
| JPH01195720A (ja) * | 1988-01-04 | 1989-08-07 | Nec Corp | 半導体集積回路 |
| JPH02225776A (ja) * | 1989-02-27 | 1990-09-07 | Fujita Corp | 制振壁及び制振建造物 |
| GB2231063A (en) * | 1989-02-27 | 1990-11-07 | Omi International | Electroless plating composition containing saccharin |
| ES2027496A6 (es) | 1989-10-12 | 1992-06-01 | Enthone | Metodo para precipitar una capa metalica no electrica lisa sobre un substrato de aluminio. |
| JPH0693460A (ja) * | 1991-04-15 | 1994-04-05 | Mitsubishi Gas Chem Co Inc | 薄膜形成基材の製造法 |
| JP2962496B2 (ja) | 1991-08-12 | 1999-10-12 | 三井金属鉱業株式会社 | マグネ基合金のめっき方法 |
| JPH0565661A (ja) * | 1991-09-06 | 1993-03-19 | Kawasaki Kasei Chem Ltd | 無電解ニツケルめつき皮膜の製造法 |
| JPH05156458A (ja) * | 1991-12-06 | 1993-06-22 | Hitachi Chem Co Ltd | 無電解ニッケル−リンめっき液 |
| JP3192003B2 (ja) | 1992-10-02 | 2001-07-23 | 三井金属鉱業株式会社 | マグネ基合金の高耐食性塗装方法 |
| US5258061A (en) * | 1992-11-20 | 1993-11-02 | Monsanto Company | Electroless nickel plating baths |
| JPH08176837A (ja) * | 1994-12-22 | 1996-07-09 | Hitachi Chem Co Ltd | 無電解ニッケルリンめっき液 |
| JPH09137277A (ja) * | 1995-11-10 | 1997-05-27 | Ibiden Co Ltd | 無電解めっき液、無電解めっき方法およびプリント配線板の製造方法 |
| EP0843597A4 (de) * | 1996-06-05 | 1999-02-24 | Univ Toledo | Stromlose beschichtung einer metallschicht auf ein aktiviertes substrat |
| EP0894156A4 (de) * | 1996-11-14 | 2002-06-26 | Atotech Deutschland Gmbh | Entfernung von orthophosphitionen von stromlosen nickelplattierungsbädern |
| US6106927A (en) * | 1998-02-03 | 2000-08-22 | Seagate Technology, Inc. | Ultra-smooth as-deposited electroless nickel coatings |
| JP2001049448A (ja) * | 1999-08-09 | 2001-02-20 | C Uyemura & Co Ltd | 無電解ニッケルめっき方法 |
| FR2798677B1 (fr) * | 1999-09-22 | 2001-12-21 | A Richard Ets | Procede d'epuration/regenaration d'un bain de nickelage chimique |
| JP2001192850A (ja) * | 2000-01-11 | 2001-07-17 | Ebe Katsuo | 摺動部品用表面処理液及び摺動部品の表面処理方法及び摺動部品 |
| JP2001214279A (ja) | 2000-01-28 | 2001-08-07 | Kyocera Corp | 無電解ニッケルめっき浴 |
| JP3479639B2 (ja) * | 2000-12-08 | 2003-12-15 | 日鉱メタルプレーティング株式会社 | 無電解ニッケルめっき液 |
| JP2002212746A (ja) * | 2001-01-11 | 2002-07-31 | Okuno Chem Ind Co Ltd | 未貫通穴を有する被めっき物への無電解ニッケルめっき方法 |
| US6391177B1 (en) * | 2001-02-20 | 2002-05-21 | David Crotty | High temperature continuous electrodialysis of electroless plating solutions |
| JP4171604B2 (ja) * | 2002-03-18 | 2008-10-22 | 株式会社大和化成研究所 | 無電解めっき浴及び該めっき浴を用いて得られた金属被覆物 |
-
2002
- 2002-10-04 DE DE10246453A patent/DE10246453A1/de not_active Ceased
-
2003
- 2003-06-17 DE DE50313472T patent/DE50313472D1/de not_active Expired - Lifetime
- 2003-06-17 ES ES03013706.1T patent/ES2357943T5/es not_active Expired - Lifetime
- 2003-06-17 EP EP03013706.1A patent/EP1413646B2/de not_active Expired - Lifetime
- 2003-06-17 AT AT03013706T patent/ATE498707T1/de active
- 2003-09-28 CN CNB03160241XA patent/CN100366795C/zh not_active Expired - Lifetime
- 2003-10-02 KR KR1020030068770A patent/KR101063851B1/ko not_active Expired - Lifetime
- 2003-10-03 US US10/678,601 patent/US7846503B2/en not_active Expired - Lifetime
- 2003-10-06 JP JP2003346929A patent/JP4091518B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP1413646B2 (de) | 2014-09-24 |
| CN1497062A (zh) | 2004-05-19 |
| EP1413646A3 (de) | 2008-01-16 |
| CN100366795C (zh) | 2008-02-06 |
| US20040144285A1 (en) | 2004-07-29 |
| US7846503B2 (en) | 2010-12-07 |
| JP2004124261A (ja) | 2004-04-22 |
| JP4091518B2 (ja) | 2008-05-28 |
| ES2357943T5 (es) | 2015-11-25 |
| KR20040031629A (ko) | 2004-04-13 |
| EP1413646B1 (de) | 2011-02-16 |
| DE50313472D1 (de) | 2011-03-31 |
| KR101063851B1 (ko) | 2011-09-14 |
| ES2357943T3 (es) | 2011-05-04 |
| DE10246453A1 (de) | 2004-04-15 |
| EP1413646A2 (de) | 2004-04-28 |
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