ATE509355T1 - Verfahren zur herstellung einer nanolücke für variable kapazitive elemente - Google Patents

Verfahren zur herstellung einer nanolücke für variable kapazitive elemente

Info

Publication number
ATE509355T1
ATE509355T1 AT04759726T AT04759726T ATE509355T1 AT E509355 T1 ATE509355 T1 AT E509355T1 AT 04759726 T AT04759726 T AT 04759726T AT 04759726 T AT04759726 T AT 04759726T AT E509355 T1 ATE509355 T1 AT E509355T1
Authority
AT
Austria
Prior art keywords
silicon
bearing compound
compound electrode
sacrificial layer
variable capacitive
Prior art date
Application number
AT04759726T
Other languages
English (en)
Inventor
Aaron Partridge
Markus Lutz
Thomas Kenny
Original Assignee
Bosch Gmbh Robert
Univ Leland Stanford Junior
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bosch Gmbh Robert, Univ Leland Stanford Junior filed Critical Bosch Gmbh Robert
Application granted granted Critical
Publication of ATE509355T1 publication Critical patent/ATE509355T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00055—Grooves
    • B81C1/00063—Trenches
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0271—Resonators; ultrasonic resonators

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Micromachines (AREA)
  • Pressure Sensors (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
AT04759726T 2003-04-17 2004-03-22 Verfahren zur herstellung einer nanolücke für variable kapazitive elemente ATE509355T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/418,617 US7172917B2 (en) 2003-04-17 2003-04-17 Method of making a nanogap for variable capacitive elements, and device having a nanogap
PCT/US2004/008808 WO2004095540A2 (en) 2003-04-17 2004-03-22 Method of making a nanogap for variable capacitive elements and device having a nanogap

Publications (1)

Publication Number Publication Date
ATE509355T1 true ATE509355T1 (de) 2011-05-15

Family

ID=33159151

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04759726T ATE509355T1 (de) 2003-04-17 2004-03-22 Verfahren zur herstellung einer nanolücke für variable kapazitive elemente

Country Status (4)

Country Link
US (1) US7172917B2 (de)
EP (1) EP1618599B1 (de)
AT (1) ATE509355T1 (de)
WO (1) WO2004095540A2 (de)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4014432B2 (ja) * 2002-03-28 2007-11-28 ユーディナデバイス株式会社 インタディジタルキャパシタ及びその容量調整方法
EP1687896B1 (de) * 2003-11-14 2007-06-13 Koninklijke Philips Electronics N.V. Halbleiterbauelement mit enem resonator
KR100679704B1 (ko) * 2005-01-10 2007-02-06 한국과학기술원 분자소자와 바이오 센서를 위한 나노갭 또는 나노 전계효과 트랜지스터 제작방법
FR2881416B1 (fr) * 2005-01-31 2007-06-01 St Microelectronics Crolles 2 Microresonateur
DE102005037876A1 (de) * 2005-08-10 2007-02-22 Siemens Ag Vorrichtung zur Umwandlung mechanischer Energie in elektrische Energie und Verfahren zum Betreiben dieser Vorrichtung
KR100849384B1 (ko) * 2005-10-21 2008-07-31 한국생명공학연구원 나노갭 및 나노갭 센서의 제조방법
US7563633B2 (en) * 2006-08-25 2009-07-21 Robert Bosch Gmbh Microelectromechanical systems encapsulation process
US8165323B2 (en) * 2006-11-28 2012-04-24 Zhou Tiansheng Monolithic capacitive transducer
US7816166B1 (en) * 2007-03-09 2010-10-19 Silicon Labs Sc, Inc. Method to form a MEMS structure having a suspended portion
US7858422B1 (en) 2007-03-09 2010-12-28 Silicon Labs Sc, Inc. MEMS coupler and method to form the same
US8084361B2 (en) * 2007-05-30 2011-12-27 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor fabrication method suitable for MEMS
JP4477051B2 (ja) * 2007-09-12 2010-06-09 株式会社東芝 半導体集積回路及びｍｅｍｓ型可変容量キャパシタの制御方法
US7881594B2 (en) 2007-12-27 2011-02-01 Stmicroeletronics, Inc. Heating system and method for microfluidic and micromechanical applications
US7851875B2 (en) * 2008-01-11 2010-12-14 Infineon Technologies Ag MEMS devices and methods of manufacture thereof
US7749789B2 (en) * 2008-03-18 2010-07-06 Solid-State Research, Inc. CMOS-compatible bulk-micromachining process for single-crystal MEMS/NEMS devices
US8125046B2 (en) 2008-06-04 2012-02-28 Infineon Technologies Ag Micro-electromechanical system devices
US8022491B2 (en) 2008-12-31 2011-09-20 Stmicroelectronics, Inc. High aspect ratio all SiGe capacitively coupled MEMS devices
US8430255B2 (en) * 2009-03-19 2013-04-30 Robert Bosch Gmbh Method of accurately spacing Z-axis electrode
US7875482B2 (en) * 2009-03-19 2011-01-25 Robert Bosch Gmbh Substrate with multiple encapsulated pressures
FR2946636B1 (fr) * 2009-06-15 2012-03-23 Commissariat Energie Atomique Procede de liberation ameliore de la structure suspendue d'un composant nems et/ou mems
DE102012217853B4 (de) 2011-10-04 2016-02-04 Institut für Mikroelektronik- und Mechatronik-Systeme gGmbH Anordnung zum Erzeugen eines definierten Abstands zwischen Elektrodenflächen auf integrierten Bauelementen für chemische und biochemische Sensoren
US9777372B2 (en) 2013-08-07 2017-10-03 Regents Of The University Of Minnesota Methods for manufacturing nano-gap and angstrom-gap articles
US9837935B2 (en) * 2013-10-29 2017-12-05 Honeywell International Inc. All-silicon electrode capacitive transducer on a glass substrate
US9914118B2 (en) 2015-08-12 2018-03-13 International Business Machines Corporation Nanogap structure for micro/nanofluidic systems formed by sacrificial sidewalls
CN113985017A (zh) 2016-01-14 2022-01-28 罗斯韦尔生物技术股份有限公司 分子传感器及相关方法
EP3408219B1 (de) 2016-01-28 2022-08-17 Roswell Biotechnologies, Inc Massiv parallele dna-sequenzierungsvorrichtung
JP7280590B2 (ja) 2016-01-28 2023-05-24 ロズウェル バイオテクノロジーズ，インコーポレイテッド 大スケールの分子電子工学センサアレイを使用する被分析物を測定するための方法および装置
KR20240170584A (ko) 2016-02-09 2024-12-03 로스웰 엠이 아이엔씨. 전자 비표지 dna 및 게놈 시퀀싱
US10597767B2 (en) 2016-02-22 2020-03-24 Roswell Biotechnologies, Inc. Nanoparticle fabrication
US9829456B1 (en) 2016-07-26 2017-11-28 Roswell Biotechnologies, Inc. Method of making a multi-electrode structure usable in molecular sensing devices
KR102622275B1 (ko) 2017-01-10 2024-01-05 로스웰 바이오테크놀로지스 인코포레이티드 Dna 데이터 저장을 위한 방법들 및 시스템들
CA3052140A1 (en) 2017-01-19 2018-07-26 Roswell Biotechnologies, Inc. Solid state sequencing devices comprising two dimensional layer materials
EP3615685B1 (de) 2017-04-25 2025-02-19 Roswell Biotechnologies, Inc Enzymatische schaltungen für molekulare sensoren
US10508296B2 (en) 2017-04-25 2019-12-17 Roswell Biotechnologies, Inc. Enzymatic circuits for molecular sensors
EP4023764A3 (de) 2017-05-09 2022-09-21 Roswell Biotechnologies, Inc. Bindungssondenschaltungen für molekulare sensoren
CN111373049A (zh) 2017-08-30 2020-07-03 罗斯威尔生命技术公司 用于dna数据存储的进行性酶分子电子传感器
CN111373051A (zh) 2017-10-10 2020-07-03 罗斯威尔生命技术公司 用于无扩增dna数据存储的方法、装置和系统
CN113994013A (zh) 2019-04-12 2022-01-28 罗斯威尔生命技术公司 用于分子电子学传感器的多环芳族桥
US12146852B2 (en) 2019-09-06 2024-11-19 Roswell Biotechnologies, Inc. Methods of fabricating nanoscale structures usable in molecular sensors and other devices
DE102022210972A1 (de) * 2022-10-18 2024-04-18 Robert Bosch Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung einer mikromechanischen Schichtstruktur mit hohem Aspektverhältnis und mikromechanische Schichtstruktur
CN117902548A (zh) * 2023-12-21 2024-04-19 浙江欣芯微机电制造有限公司 Mems高深宽比结构的形成方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5093594A (en) * 1990-06-22 1992-03-03 Massachusetts Institute Of Technology Microfabricated harmonic side-drive motors
US5616514A (en) * 1993-06-03 1997-04-01 Robert Bosch Gmbh Method of fabricating a micromechanical sensor
JP3412293B2 (ja) * 1994-11-17 2003-06-03 株式会社デンソー 半導体ヨーレートセンサおよびその製造方法
US5922212A (en) * 1995-06-08 1999-07-13 Nippondenso Co., Ltd Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body
JP3106389B2 (ja) * 1995-08-18 2000-11-06 株式会社村田製作所 可変容量コンデンサ
JPH09318649A (ja) * 1996-05-30 1997-12-12 Texas Instr Japan Ltd 複合センサ
DE19730715C1 (de) * 1996-11-12 1998-11-26 Fraunhofer Ges Forschung Verfahren zum Herstellen eines mikromechanischen Relais
JP2001504995A (ja) * 1996-11-28 2001-04-10 シーメンス アクチエンゲゼルシヤフト マイクロメカニカルセンサの製造方法
US6035714A (en) * 1997-09-08 2000-03-14 The Regents Of The University Of Michigan Microelectromechanical capacitive accelerometer and method of making same
US6034414A (en) * 1997-11-18 2000-03-07 Industrial Technology Research Institute Variable capacitor using resistor generated heat to control dielectric thickness
US6242989B1 (en) * 1998-09-12 2001-06-05 Agere Systems Guardian Corp. Article comprising a multi-port variable capacitor
US6249073B1 (en) * 1999-01-14 2001-06-19 The Regents Of The University Of Michigan Device including a micromechanical resonator having an operating frequency and method of extending same
WO2000042231A2 (en) * 1999-01-15 2000-07-20 The Regents Of The University Of California Polycrystalline silicon germanium films for forming micro-electromechanical systems
US6211098B1 (en) * 1999-02-18 2001-04-03 Taiwan Semiconductor Manufacturing Company Wet oxidation method for forming silicon oxide dielectric layer
DE19933418B4 (de) * 1999-07-16 2005-09-29 Robert Bosch Gmbh Verfahren zur Herstellung von mikromechanischen Bauelementen
US6229684B1 (en) * 1999-12-15 2001-05-08 Jds Uniphase Inc. Variable capacitor and associated fabrication method
US6362018B1 (en) * 2000-02-02 2002-03-26 Motorola, Inc. Method for fabricating MEMS variable capacitor with stabilized electrostatic drive
US6393913B1 (en) * 2000-02-08 2002-05-28 Sandia Corporation Microelectromechanical dual-mass resonator structure
DE10017422A1 (de) 2000-04-07 2001-10-11 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungverfahren
DE10017976A1 (de) 2000-04-11 2001-10-18 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren
US6367252B1 (en) * 2000-07-05 2002-04-09 Jds Uniphase Corporation Microelectromechanical actuators including sinuous beam structures
US6628177B2 (en) * 2000-08-24 2003-09-30 The Regents Of The University Of Michigan Micromechanical resonator device and micromechanical device utilizing same
US20020070816A1 (en) * 2000-08-24 2002-06-13 Wan-Thai Hsu Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby
ITVA20000042A1 (it) * 2000-12-15 2002-06-15 St Microelectronics Srl Sensore di pressione monoliticamente integrato e relativo processo direalizzazione.
US6440816B1 (en) * 2001-01-30 2002-08-27 Agere Systems Guardian Corp. Alignment mark fabrication process to limit accumulation of errors in level to level overlay
US6413793B1 (en) * 2001-05-17 2002-07-02 Xerox Corporation Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers
US6461888B1 (en) * 2001-06-14 2002-10-08 Institute Of Microelectronics Lateral polysilicon beam process
US6808954B2 (en) * 2001-09-07 2004-10-26 Intel Corporation Vacuum-cavity MEMS resonator

Also Published As

Publication number Publication date
US7172917B2 (en) 2007-02-06
WO2004095540A3 (en) 2005-07-28
EP1618599A4 (de) 2009-04-01
US20040209435A1 (en) 2004-10-21
EP1618599A2 (de) 2006-01-25
EP1618599B1 (de) 2011-05-11
WO2004095540A2 (en) 2004-11-04

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