ATE509355T1 - Verfahren zur herstellung einer nanolücke für variable kapazitive elemente - Google Patents
Verfahren zur herstellung einer nanolücke für variable kapazitive elementeInfo
- Publication number
- ATE509355T1 ATE509355T1 AT04759726T AT04759726T ATE509355T1 AT E509355 T1 ATE509355 T1 AT E509355T1 AT 04759726 T AT04759726 T AT 04759726T AT 04759726 T AT04759726 T AT 04759726T AT E509355 T1 ATE509355 T1 AT E509355T1
- Authority
- AT
- Austria
- Prior art keywords
- silicon
- bearing compound
- compound electrode
- sacrificial layer
- variable capacitive
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00055—Grooves
- B81C1/00063—Trenches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0271—Resonators; ultrasonic resonators
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/418,617 US7172917B2 (en) | 2003-04-17 | 2003-04-17 | Method of making a nanogap for variable capacitive elements, and device having a nanogap |
| PCT/US2004/008808 WO2004095540A2 (en) | 2003-04-17 | 2004-03-22 | Method of making a nanogap for variable capacitive elements and device having a nanogap |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE509355T1 true ATE509355T1 (de) | 2011-05-15 |
Family
ID=33159151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04759726T ATE509355T1 (de) | 2003-04-17 | 2004-03-22 | Verfahren zur herstellung einer nanolücke für variable kapazitive elemente |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7172917B2 (de) |
| EP (1) | EP1618599B1 (de) |
| AT (1) | ATE509355T1 (de) |
| WO (1) | WO2004095540A2 (de) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4014432B2 (ja) * | 2002-03-28 | 2007-11-28 | ユーディナデバイス株式会社 | インタディジタルキャパシタ及びその容量調整方法 |
| US7534639B2 (en) * | 2003-11-14 | 2009-05-19 | Nxp B.V. | Semiconductor device with a resonator |
| KR100679704B1 (ko) * | 2005-01-10 | 2007-02-06 | 한국과학기술원 | 분자소자와 바이오 센서를 위한 나노갭 또는 나노 전계효과 트랜지스터 제작방법 |
| FR2881416B1 (fr) * | 2005-01-31 | 2007-06-01 | St Microelectronics Crolles 2 | Microresonateur |
| DE102005037876A1 (de) * | 2005-08-10 | 2007-02-22 | Siemens Ag | Vorrichtung zur Umwandlung mechanischer Energie in elektrische Energie und Verfahren zum Betreiben dieser Vorrichtung |
| KR100849384B1 (ko) * | 2005-10-21 | 2008-07-31 | 한국생명공학연구원 | 나노갭 및 나노갭 센서의 제조방법 |
| US7563633B2 (en) * | 2006-08-25 | 2009-07-21 | Robert Bosch Gmbh | Microelectromechanical systems encapsulation process |
| US8165323B2 (en) * | 2006-11-28 | 2012-04-24 | Zhou Tiansheng | Monolithic capacitive transducer |
| US7816166B1 (en) * | 2007-03-09 | 2010-10-19 | Silicon Labs Sc, Inc. | Method to form a MEMS structure having a suspended portion |
| US7858422B1 (en) | 2007-03-09 | 2010-12-28 | Silicon Labs Sc, Inc. | MEMS coupler and method to form the same |
| US8084361B2 (en) * | 2007-05-30 | 2011-12-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor fabrication method suitable for MEMS |
| JP4477051B2 (ja) * | 2007-09-12 | 2010-06-09 | 株式会社東芝 | 半導体集積回路及びmems型可変容量キャパシタの制御方法 |
| US7881594B2 (en) | 2007-12-27 | 2011-02-01 | Stmicroeletronics, Inc. | Heating system and method for microfluidic and micromechanical applications |
| US7851875B2 (en) * | 2008-01-11 | 2010-12-14 | Infineon Technologies Ag | MEMS devices and methods of manufacture thereof |
| US7749789B2 (en) * | 2008-03-18 | 2010-07-06 | Solid-State Research, Inc. | CMOS-compatible bulk-micromachining process for single-crystal MEMS/NEMS devices |
| US8125046B2 (en) | 2008-06-04 | 2012-02-28 | Infineon Technologies Ag | Micro-electromechanical system devices |
| US8022491B2 (en) * | 2008-12-31 | 2011-09-20 | Stmicroelectronics, Inc. | High aspect ratio all SiGe capacitively coupled MEMS devices |
| US7875482B2 (en) * | 2009-03-19 | 2011-01-25 | Robert Bosch Gmbh | Substrate with multiple encapsulated pressures |
| US8430255B2 (en) * | 2009-03-19 | 2013-04-30 | Robert Bosch Gmbh | Method of accurately spacing Z-axis electrode |
| FR2946636B1 (fr) * | 2009-06-15 | 2012-03-23 | Commissariat Energie Atomique | Procede de liberation ameliore de la structure suspendue d'un composant nems et/ou mems |
| DE102012217853B4 (de) | 2011-10-04 | 2016-02-04 | Institut für Mikroelektronik- und Mechatronik-Systeme gGmbH | Anordnung zum Erzeugen eines definierten Abstands zwischen Elektrodenflächen auf integrierten Bauelementen für chemische und biochemische Sensoren |
| US9777372B2 (en) | 2013-08-07 | 2017-10-03 | Regents Of The University Of Minnesota | Methods for manufacturing nano-gap and angstrom-gap articles |
| US9837935B2 (en) * | 2013-10-29 | 2017-12-05 | Honeywell International Inc. | All-silicon electrode capacitive transducer on a glass substrate |
| US9914118B2 (en) | 2015-08-12 | 2018-03-13 | International Business Machines Corporation | Nanogap structure for micro/nanofluidic systems formed by sacrificial sidewalls |
| CA3050062A1 (en) | 2016-01-14 | 2017-07-20 | Roswell Biotechnologies, Inc. | Molecular sensors and related methods |
| EP3408219B1 (de) | 2016-01-28 | 2022-08-17 | Roswell Biotechnologies, Inc | Massiv parallele dna-sequenzierungsvorrichtung |
| JP7280590B2 (ja) | 2016-01-28 | 2023-05-24 | ロズウェル バイオテクノロジーズ,インコーポレイテッド | 大スケールの分子電子工学センサアレイを使用する被分析物を測定するための方法および装置 |
| US10737263B2 (en) | 2016-02-09 | 2020-08-11 | Roswell Biotechnologies, Inc. | Electronic label-free DNA and genome sequencing |
| US10597767B2 (en) | 2016-02-22 | 2020-03-24 | Roswell Biotechnologies, Inc. | Nanoparticle fabrication |
| US9829456B1 (en) | 2016-07-26 | 2017-11-28 | Roswell Biotechnologies, Inc. | Method of making a multi-electrode structure usable in molecular sensing devices |
| WO2018132457A1 (en) | 2017-01-10 | 2018-07-19 | Roswell Biotechnologies, Inc. | Methods and systems for dna data storage |
| CN110520517A (zh) | 2017-01-19 | 2019-11-29 | 罗斯威尔生命技术公司 | 包括二维层材料的固态测序装置 |
| KR102879682B1 (ko) | 2017-04-25 | 2025-10-30 | 로스웰 엠이 아이엔씨. | 분자 센서들을 위한 효소 회로들 |
| US10508296B2 (en) | 2017-04-25 | 2019-12-17 | Roswell Biotechnologies, Inc. | Enzymatic circuits for molecular sensors |
| CA3057155A1 (en) | 2017-05-09 | 2018-11-15 | Roswell Biotechnologies, Inc. | Binding probe circuits for molecular sensors |
| EP3676389A4 (de) | 2017-08-30 | 2021-06-02 | Roswell Biotechnologies, Inc | Prozessive enzymatische molekulare elektronische sensoren zur speicherung von dna-daten |
| EP3694990A4 (de) | 2017-10-10 | 2022-06-15 | Roswell Biotechnologies, Inc. | Verfahren, vorrichtung und systeme zur amplikationsfreien dna-datenspeicherung |
| CN113994013A (zh) | 2019-04-12 | 2022-01-28 | 罗斯威尔生命技术公司 | 用于分子电子学传感器的多环芳族桥 |
| WO2021045900A1 (en) | 2019-09-06 | 2021-03-11 | Roswell Biotechnologies, Inc. | Methods of fabricating nanoscale structures usable in molecular sensors and other devices |
| DE102022210972A1 (de) * | 2022-10-18 | 2024-04-18 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung einer mikromechanischen Schichtstruktur mit hohem Aspektverhältnis und mikromechanische Schichtstruktur |
| CN117902548A (zh) * | 2023-12-21 | 2024-04-19 | 浙江欣芯微机电制造有限公司 | Mems高深宽比结构的形成方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5093594A (en) * | 1990-06-22 | 1992-03-03 | Massachusetts Institute Of Technology | Microfabricated harmonic side-drive motors |
| US5616514A (en) | 1993-06-03 | 1997-04-01 | Robert Bosch Gmbh | Method of fabricating a micromechanical sensor |
| JP3412293B2 (ja) | 1994-11-17 | 2003-06-03 | 株式会社デンソー | 半導体ヨーレートセンサおよびその製造方法 |
| US5922212A (en) | 1995-06-08 | 1999-07-13 | Nippondenso Co., Ltd | Semiconductor sensor having suspended thin-film structure and method for fabricating thin-film structure body |
| JP3106389B2 (ja) | 1995-08-18 | 2000-11-06 | 株式会社村田製作所 | 可変容量コンデンサ |
| JPH09318649A (ja) | 1996-05-30 | 1997-12-12 | Texas Instr Japan Ltd | 複合センサ |
| DE19730715C1 (de) | 1996-11-12 | 1998-11-26 | Fraunhofer Ges Forschung | Verfahren zum Herstellen eines mikromechanischen Relais |
| CN1245559A (zh) * | 1996-11-28 | 2000-02-23 | 西门子公司 | 用于制作微力学传感器的方法 |
| US6035714A (en) | 1997-09-08 | 2000-03-14 | The Regents Of The University Of Michigan | Microelectromechanical capacitive accelerometer and method of making same |
| US6034414A (en) | 1997-11-18 | 2000-03-07 | Industrial Technology Research Institute | Variable capacitor using resistor generated heat to control dielectric thickness |
| US6242989B1 (en) | 1998-09-12 | 2001-06-05 | Agere Systems Guardian Corp. | Article comprising a multi-port variable capacitor |
| US6249073B1 (en) | 1999-01-14 | 2001-06-19 | The Regents Of The University Of Michigan | Device including a micromechanical resonator having an operating frequency and method of extending same |
| WO2000042231A2 (en) | 1999-01-15 | 2000-07-20 | The Regents Of The University Of California | Polycrystalline silicon germanium films for forming micro-electromechanical systems |
| US6211098B1 (en) * | 1999-02-18 | 2001-04-03 | Taiwan Semiconductor Manufacturing Company | Wet oxidation method for forming silicon oxide dielectric layer |
| DE19933418B4 (de) * | 1999-07-16 | 2005-09-29 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanischen Bauelementen |
| US6229684B1 (en) | 1999-12-15 | 2001-05-08 | Jds Uniphase Inc. | Variable capacitor and associated fabrication method |
| US6362018B1 (en) | 2000-02-02 | 2002-03-26 | Motorola, Inc. | Method for fabricating MEMS variable capacitor with stabilized electrostatic drive |
| US6393913B1 (en) * | 2000-02-08 | 2002-05-28 | Sandia Corporation | Microelectromechanical dual-mass resonator structure |
| DE10017422A1 (de) | 2000-04-07 | 2001-10-11 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungverfahren |
| DE10017976A1 (de) | 2000-04-11 | 2001-10-18 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
| US6367252B1 (en) | 2000-07-05 | 2002-04-09 | Jds Uniphase Corporation | Microelectromechanical actuators including sinuous beam structures |
| US20020070816A1 (en) | 2000-08-24 | 2002-06-13 | Wan-Thai Hsu | Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby |
| US6628177B2 (en) | 2000-08-24 | 2003-09-30 | The Regents Of The University Of Michigan | Micromechanical resonator device and micromechanical device utilizing same |
| ITVA20000042A1 (it) | 2000-12-15 | 2002-06-15 | St Microelectronics Srl | Sensore di pressione monoliticamente integrato e relativo processo direalizzazione. |
| US6440816B1 (en) * | 2001-01-30 | 2002-08-27 | Agere Systems Guardian Corp. | Alignment mark fabrication process to limit accumulation of errors in level to level overlay |
| US6413793B1 (en) | 2001-05-17 | 2002-07-02 | Xerox Corporation | Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers |
| US6461888B1 (en) * | 2001-06-14 | 2002-10-08 | Institute Of Microelectronics | Lateral polysilicon beam process |
| US6808954B2 (en) * | 2001-09-07 | 2004-10-26 | Intel Corporation | Vacuum-cavity MEMS resonator |
-
2003
- 2003-04-17 US US10/418,617 patent/US7172917B2/en not_active Expired - Lifetime
-
2004
- 2004-03-22 AT AT04759726T patent/ATE509355T1/de not_active IP Right Cessation
- 2004-03-22 EP EP04759726A patent/EP1618599B1/de not_active Expired - Lifetime
- 2004-03-22 WO PCT/US2004/008808 patent/WO2004095540A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004095540A2 (en) | 2004-11-04 |
| EP1618599B1 (de) | 2011-05-11 |
| WO2004095540A3 (en) | 2005-07-28 |
| EP1618599A4 (de) | 2009-04-01 |
| US7172917B2 (en) | 2007-02-06 |
| US20040209435A1 (en) | 2004-10-21 |
| EP1618599A2 (de) | 2006-01-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |