ATE84326T1 - Verfahren zur reinigung und ablagerung von verbindungen der grupen iii b und v b zur bildung epitaktischer schichten. - Google Patents

Verfahren zur reinigung und ablagerung von verbindungen der grupen iii b und v b zur bildung epitaktischer schichten.

Info

Publication number
ATE84326T1
ATE84326T1 AT88905077T AT88905077T ATE84326T1 AT E84326 T1 ATE84326 T1 AT E84326T1 AT 88905077 T AT88905077 T AT 88905077T AT 88905077 T AT88905077 T AT 88905077T AT E84326 T1 ATE84326 T1 AT E84326T1
Authority
AT
Austria
Prior art keywords
purified
compounds
conveying
thermally decomposable
components
Prior art date
Application number
AT88905077T
Other languages
English (en)
Inventor
Thomas M Potts
Original Assignee
Eagle Picher Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eagle Picher Ind Inc filed Critical Eagle Picher Ind Inc
Application granted granted Critical
Publication of ATE84326T1 publication Critical patent/ATE84326T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/06—Hydrogen phosphides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/10—Halides or oxyhalides of phosphorus
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/06—Boron halogen compounds
    • C01B35/061—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/34—Purification; Stabilisation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/06—Halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/06—Aluminium compounds
    • C07F5/061—Aluminium compounds with C-aluminium linkage
    • C07F5/062—Al linked exclusively to C
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C07F9/72—Aliphatic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/94—Bismuth compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/26—Conditioning of the fluid carrier; Flow patterns
    • G01N30/38—Flow patterns
    • G01N30/46—Flow patterns using more than one column
    • G01N30/461—Flow patterns using more than one column with serial coupling of separation columns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)
AT88905077T 1987-05-12 1988-05-10 Verfahren zur reinigung und ablagerung von verbindungen der grupen iii b und v b zur bildung epitaktischer schichten. ATE84326T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/049,590 US4772296A (en) 1987-05-12 1987-05-12 Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films
EP88905077A EP0353256B1 (de) 1987-05-12 1988-05-10 Verfahren zur reinigung und ablagerung von verbindungen der grupen iii b und v b zur bildung epitaktischer schichten
PCT/US1988/001522 WO1988008891A1 (en) 1987-05-12 1988-05-10 METHOD OF PURIFYING AND DEPOSITING GROUP IIIa AND GROUP Va COMPOUNDS TO PRODUCE EPITAXIAL FILMS

Publications (1)

Publication Number Publication Date
ATE84326T1 true ATE84326T1 (de) 1993-01-15

Family

ID=21960633

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88905077T ATE84326T1 (de) 1987-05-12 1988-05-10 Verfahren zur reinigung und ablagerung von verbindungen der grupen iii b und v b zur bildung epitaktischer schichten.

Country Status (9)

Country Link
US (1) US4772296A (de)
EP (1) EP0353256B1 (de)
JP (1) JPH02504384A (de)
KR (1) KR890700544A (de)
AT (1) ATE84326T1 (de)
CA (1) CA1318261C (de)
DE (1) DE3877358T2 (de)
HK (1) HK79196A (de)
WO (1) WO1988008891A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3843313A1 (de) * 1988-12-22 1990-06-28 Wacker Chemitronic Verfahren zur entfernung von gasfoermigen kontaminierenden, insbesondere dotierstoffverbindungen aus halogensilanverbindungen enthaltenden traegergasen
US4936855A (en) * 1989-04-24 1990-06-26 Intermedics, Orthopedics, Inc. Stepped-lock ring system for implantable joint prostheses
US4936877A (en) * 1989-07-18 1990-06-26 Advanced Technology Materials, Inc. Dopant delivery system for semiconductor manufacture
US4941893B1 (en) * 1989-09-19 1996-07-30 Advanced Silicon Materials Inc Gas separation by semi-permeable membranes
US5290342A (en) * 1990-12-05 1994-03-01 Ethyl Corporation Silane compositions and process
US5069690A (en) * 1991-02-21 1991-12-03 Air Products And Chemicals, Inc. Process for kinetic gas-solid chromatographic separations
DE69202014T2 (de) * 1991-07-17 1995-08-31 Japan Pionics Verfahren zur Reinigung von gasförmigen organometallischen Verbindungen.
US5840953A (en) * 1995-11-16 1998-11-24 Eagle-Picher Industries, Inc. Purified tetraethoxysilane and method of purifying
DE59804004D1 (de) * 1997-11-04 2002-06-06 Pneumatik Berlin Gmbh Verfahren und vorrichtung zur rückgewinnung von gasen
JP2002035528A (ja) * 2000-07-26 2002-02-05 Japan Atom Energy Res Inst ガス分離装置
US6776025B2 (en) * 2001-10-29 2004-08-17 Daniel Industries, Inc. Carrier gas pre-heat system for gas chromatograph
JP4538622B2 (ja) * 2003-07-29 2010-09-08 オルガノ株式会社 ガス分離装置
US8152909B2 (en) * 2009-04-01 2012-04-10 Bruker Chemical Analysis B.V. Gas chromatography check valve and system
US10727046B2 (en) * 2018-07-06 2020-07-28 Lam Research Corporation Surface modified depth controlled deposition for plasma based deposition
CN112850731A (zh) * 2021-02-01 2021-05-28 山东合益气体股份有限公司 一种含有三氟化硼的废水中三氟化硼的回收方法及其回收装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3041141A (en) * 1955-09-06 1962-06-26 Baker Chem Co J T Process of purifying silane
US3019087A (en) * 1958-09-29 1962-01-30 Merck & Co Inc Purification of silane
JPS5315477B2 (de) * 1972-09-30 1978-05-25
US4070444A (en) * 1976-07-21 1978-01-24 Motorola Inc. Low cost, high volume silicon purification process
US4159966A (en) * 1977-12-27 1979-07-03 The Dow Chemical Company Chromatographic column packing
JPS58110413A (ja) * 1981-08-24 1983-07-01 イ−グル−ピツチヤ−・インダストリ−ズ・インコ−ポレ−テツド シランの分解による元素状ケイ素の改良された製造方法およびその装置
US4537759A (en) * 1981-08-24 1985-08-27 Eagle-Picher Industries, Inc. Production of elemental silicon from impure silane feed
JPS5930711A (ja) * 1982-08-12 1984-02-18 Showa Denko Kk モノシランの精製法
US4532120A (en) * 1983-12-28 1985-07-30 Ethyl Corporation Silane purification process
JPS6278116A (ja) * 1985-09-28 1987-04-10 Showa Denko Kk アルシンの精製方法

Also Published As

Publication number Publication date
JPH02504384A (ja) 1990-12-13
KR890700544A (ko) 1989-04-25
DE3877358D1 (de) 1993-02-18
CA1318261C (en) 1993-05-25
EP0353256B1 (de) 1993-01-07
DE3877358T2 (de) 1993-08-12
HK79196A (en) 1996-05-10
EP0353256A1 (de) 1990-02-07
WO1988008891A1 (en) 1988-11-17
US4772296A (en) 1988-09-20

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