BRPI0503893A - método e sistema para corrosão por fluoreto de xenÈnio com eficiência aperfeiçoada - Google Patents

método e sistema para corrosão por fluoreto de xenÈnio com eficiência aperfeiçoada

Info

Publication number
BRPI0503893A
BRPI0503893A BRPI0503893-6A BRPI0503893A BRPI0503893A BR PI0503893 A BRPI0503893 A BR PI0503893A BR PI0503893 A BRPI0503893 A BR PI0503893A BR PI0503893 A BRPI0503893 A BR PI0503893A
Authority
BR
Brazil
Prior art keywords
solid
stripper
substrate
corrosion
solid state
Prior art date
Application number
BRPI0503893-6A
Other languages
English (en)
Inventor
Phililp D Floyd
William J Cummings
Original Assignee
Idc Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idc Llc filed Critical Idc Llc
Publication of BRPI0503893A publication Critical patent/BRPI0503893A/pt

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B81C1/00531—Dry etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/26—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials
    • H10P50/264—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by chemical means
    • H10P50/266—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by chemical means by vapour etching only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0135—Controlling etch progression
    • B81C2201/0142—Processes for controlling etch progression not provided for in B81C2201/0136 - B81C2201/014
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/05—Temporary protection of devices or parts of the devices during manufacturing
    • B81C2201/056—Releasing structures at the end of the manufacturing process
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

"MéTODO E SISTEMA PARA CORROSãO POR FLUORETO DE XENÈNIO COM EFICIêNCIA APERFEIçOADA". São providos nesta invenção um equipamento e um método útil para fabricação de dispositivos MEMS. Um aspecto do equipamento descrito provê um substrato compreendendo um material que pode ser corroído exposto a um decapante em estado sólido, em que o substrato e o decapante em estado sólido são dispostos em uma câmara de corrosão. Em algumas modalidades, o decapante em estado sólido é movido para proximidade contígua do substrato. Em outras modalidades, uma partição configurável entre o substrato e o decapante em estado sólido está aberta. O decapante em estado sólido forma um decapante em fase gasosa adequado para corroer o material que pode ser corroído. Em algumas modalidades preferidas, o decapante em estado sólido é difluoreto de xenónio sólido. O equipamento e o método são vantajosamente usados na realização de uma corrosão de liberação na fabricação de moduladores ópticos.
BRPI0503893-6A 2004-09-27 2005-09-27 método e sistema para corrosão por fluoreto de xenÈnio com eficiência aperfeiçoada BRPI0503893A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61342304P 2004-09-27 2004-09-27
US11/083,030 US20060065622A1 (en) 2004-09-27 2005-03-17 Method and system for xenon fluoride etching with enhanced efficiency

Publications (1)

Publication Number Publication Date
BRPI0503893A true BRPI0503893A (pt) 2006-05-09

Family

ID=35197939

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0503893-6A BRPI0503893A (pt) 2004-09-27 2005-09-27 método e sistema para corrosão por fluoreto de xenÈnio com eficiência aperfeiçoada

Country Status (12)

Country Link
US (2) US20060065622A1 (pt)
EP (1) EP1641026A2 (pt)
JP (1) JP2006100795A (pt)
KR (1) KR20060092876A (pt)
AU (1) AU2005203346A1 (pt)
BR (1) BRPI0503893A (pt)
CA (1) CA2515622A1 (pt)
IL (1) IL169798A0 (pt)
MX (1) MXPA05010234A (pt)
RU (1) RU2005129948A (pt)
SG (1) SG121056A1 (pt)
TW (1) TW200626482A (pt)

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US20090218312A1 (en) 2009-09-03
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AU2005203346A1 (en) 2006-04-13
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IL169798A0 (en) 2007-07-04
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US20060065622A1 (en) 2006-03-30
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