CA1286798C - Methode de fabrication d'un dispositif, y compris la deposition d'un materiau a teneur de metal, et dispositif ainsi produit - Google Patents
Methode de fabrication d'un dispositif, y compris la deposition d'un materiau a teneur de metal, et dispositif ainsi produitInfo
- Publication number
- CA1286798C CA1286798C CA000539354A CA539354A CA1286798C CA 1286798 C CA1286798 C CA 1286798C CA 000539354 A CA000539354 A CA 000539354A CA 539354 A CA539354 A CA 539354A CA 1286798 C CA1286798 C CA 1286798C
- Authority
- CA
- Canada
- Prior art keywords
- metal
- drain
- source
- substrate
- reactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
- H10P14/42—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a gas or vapour
- H10P14/43—Chemical deposition, e.g. chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
- H10P14/42—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a gas or vapour
Landscapes
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87447586A | 1986-06-16 | 1986-06-16 | |
| US874,475 | 1986-06-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1286798C true CA1286798C (fr) | 1991-07-23 |
Family
ID=25363874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000539354A Expired - Fee Related CA1286798C (fr) | 1986-06-16 | 1987-06-10 | Methode de fabrication d'un dispositif, y compris la deposition d'un materiau a teneur de metal, et dispositif ainsi produit |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0268654A1 (fr) |
| JP (1) | JPH0680682B2 (fr) |
| KR (1) | KR920010125B1 (fr) |
| CA (1) | CA1286798C (fr) |
| ES (1) | ES2006502A6 (fr) |
| WO (1) | WO1987007763A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5814545A (en) * | 1995-10-02 | 1998-09-29 | Motorola, Inc. | Semiconductor device having a phosphorus doped PECVD film and a method of manufacture |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6050920A (ja) * | 1983-08-30 | 1985-03-22 | Toshiba Corp | 半導体装置の製造方法 |
| EP0178200A1 (fr) * | 1984-09-10 | 1986-04-16 | FAIRCHILD CAMERA & INSTRUMENT CORPORATION | Procédé de régulation du dépôt chimique en phase vapeur |
| EP0194950B1 (fr) * | 1985-03-15 | 1992-05-27 | Fairchild Semiconductor Corporation | Système d'interconnexion à haute température pour un circuit intégré |
-
1987
- 1987-05-27 EP EP87903799A patent/EP0268654A1/fr not_active Ceased
- 1987-05-27 JP JP62503471A patent/JPH0680682B2/ja not_active Expired - Lifetime
- 1987-05-27 WO PCT/US1987/001230 patent/WO1987007763A1/fr not_active Ceased
- 1987-05-27 KR KR1019880700174A patent/KR920010125B1/ko not_active Expired
- 1987-06-10 CA CA000539354A patent/CA1286798C/fr not_active Expired - Fee Related
- 1987-06-12 ES ES8701744A patent/ES2006502A6/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0680682B2 (ja) | 1994-10-12 |
| EP0268654A1 (fr) | 1988-06-01 |
| ES2006502A6 (es) | 1989-05-01 |
| KR880701458A (ko) | 1988-07-27 |
| JPS63503581A (ja) | 1988-12-22 |
| KR920010125B1 (ko) | 1992-11-16 |
| WO1987007763A1 (fr) | 1987-12-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |