CA2066070A1 - Methode de fabrication de supports a lecture optique non re-enregistrables - Google Patents

Methode de fabrication de supports a lecture optique non re-enregistrables

Info

Publication number: CA2066070A1
Authority: CA; Canada
Prior art keywords: layer; dry film; photomask; master; photosensitive dry
Prior art date: 1991-04-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

CA 2066070

Other languages

English (en)

Inventor

Felix P. Shvartsman

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

EIDP Inc

Original Assignee

Individual

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-04-18

Filing date

1992-04-15

Publication date

1992-10-19

1992-04-15 Application filed by Individual filed Critical Individual

1992-10-19 Publication of CA2066070A1 publication Critical patent/CA2066070A1/fr

Status Abandoned legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 38
230000003287 optical effect Effects 0.000 claims abstract description 43
230000005855 radiation Effects 0.000 claims abstract description 18
239000000758 substrate Substances 0.000 claims description 52
239000000853 adhesive Substances 0.000 claims description 21
230000001070 adhesive effect Effects 0.000 claims description 21
230000001681 protective effect Effects 0.000 claims description 11
230000008859 change Effects 0.000 claims description 10
230000000694 effects Effects 0.000 claims description 7
238000010030 laminating Methods 0.000 claims description 7
229920000642 polymer Polymers 0.000 abstract description 19
239000010410 layer Substances 0.000 description 123
239000000178 monomer Substances 0.000 description 22
239000000463 material Substances 0.000 description 18
239000007788 liquid Substances 0.000 description 13
239000011230 binding agent Substances 0.000 description 11
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238000003475 lamination Methods 0.000 description 8
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239000004417 polycarbonate Substances 0.000 description 5
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VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
YGUMVDWOQQJBGA-VAWYXSNFSA-N 5-[(4-anilino-6-morpholin-4-yl-1,3,5-triazin-2-yl)amino]-2-[(e)-2-[4-[(4-anilino-6-morpholin-4-yl-1,3,5-triazin-2-yl)amino]-2-sulfophenyl]ethenyl]benzenesulfonic acid Chemical compound C=1C=C(\C=C\C=2C(=CC(NC=3N=C(N=C(NC=4C=CC=CC=4)N=3)N3CCOCC3)=CC=2)S(O)(=O)=O)C(S(=O)(=O)O)=CC=1NC(N=C(N=1)N2CCOCC2)=NC=1NC1=CC=CC=C1 YGUMVDWOQQJBGA-VAWYXSNFSA-N 0.000 description 4
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
239000011521 glass Substances 0.000 description 4
239000000523 sample Substances 0.000 description 4
239000007787 solid Substances 0.000 description 4
239000002904 solvent Substances 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
239000004698 Polyethylene Substances 0.000 description 3
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YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
238000001723 curing Methods 0.000 description 3
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238000000465 moulding Methods 0.000 description 3
239000004033 plastic Substances 0.000 description 3
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239000010453 quartz Substances 0.000 description 3
238000004528 spin coating Methods 0.000 description 3
NSMXQKNUPPXBRG-SECBINFHSA-N (R)-lisofylline Chemical compound O=C1N(CCCC[C@H](O)C)C(=O)N(C)C2=C1N(C)C=N2 NSMXQKNUPPXBRG-SECBINFHSA-N 0.000 description 2
JIKLHPABSSKSFV-UHFFFAOYSA-N 2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound Clc1ccccc1-c1nc(c(-c2ccccc2)n1C1(N=C(C(=N1)c1ccccc1)c1ccccc1)c1ccccc1Cl)-c1ccccc1.Clc1ccccc1-c1nc(c(-c2ccccc2)n1C1(N=C(C(=N1)c1ccccc1)c1ccccc1)c1ccccc1Cl)-c1ccccc1 JIKLHPABSSKSFV-UHFFFAOYSA-N 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
238000013459 approach Methods 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
150000001768 cations Chemical class 0.000 description 2
229910052804 chromium Inorganic materials 0.000 description 2
239000011651 chromium Substances 0.000 description 2
238000002508 contact lithography Methods 0.000 description 2
238000004132 cross linking Methods 0.000 description 2
230000007423 decrease Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
239000012530 fluid Substances 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
238000003825 pressing Methods 0.000 description 2
238000007639 printing Methods 0.000 description 2
230000010076 replication Effects 0.000 description 2
238000011160 research Methods 0.000 description 2
229910052709 silver Inorganic materials 0.000 description 2
239000011800 void material Substances 0.000 description 2
CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
JLZIIHMTTRXXIN-UHFFFAOYSA-N 2-(2-hydroxy-4-methoxybenzoyl)benzoic acid Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O JLZIIHMTTRXXIN-UHFFFAOYSA-N 0.000 description 1
BLKPFVWYBFDTPX-UHFFFAOYSA-N 2-(6,6-dimethyl-4-bicyclo[3.1.1]hept-3-enyl)acetaldehyde Chemical compound C1C2C(C)(C)C1CC=C2CC=O BLKPFVWYBFDTPX-UHFFFAOYSA-N 0.000 description 1
FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
101150111329 ACE-1 gene Proteins 0.000 description 1
XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
101100459301 Mus musculus Myl4 gene Proteins 0.000 description 1
235000002840 Opuntia megacantha Nutrition 0.000 description 1
240000008607 Opuntia megacantha Species 0.000 description 1
235000006538 Opuntia tuna Nutrition 0.000 description 1
241001163743 Perlodes Species 0.000 description 1
239000004642 Polyimide Substances 0.000 description 1
241000428533 Rhis Species 0.000 description 1
ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
239000011358 absorbing material Substances 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000001252 acrylic acid derivatives Chemical class 0.000 description 1
239000000443 aerosol Substances 0.000 description 1
229940037003 alum Drugs 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
239000012300 argon atmosphere Substances 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
239000007844 bleaching agent Substances 0.000 description 1
238000009835 boiling Methods 0.000 description 1
239000000969 carrier Substances 0.000 description 1
238000005266 casting Methods 0.000 description 1
230000001427 coherent effect Effects 0.000 description 1
238000000748 compression moulding Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
229960000956 coumarin Drugs 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
238000013500 data storage Methods 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
238000011161 development Methods 0.000 description 1
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
238000004049 embossing Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000009472 formulation Methods 0.000 description 1
230000004927 fusion Effects 0.000 description 1
125000000623 heterocyclic group Chemical group 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
229910010272 inorganic material Inorganic materials 0.000 description 1
239000011147 inorganic material Substances 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
230000000873 masking effect Effects 0.000 description 1
238000005259 measurement Methods 0.000 description 1
150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
235000014571 nuts Nutrition 0.000 description 1
230000000149 penetrating effect Effects 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
229920000058 polyacrylate Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
229920000139 polyethylene terephthalate Polymers 0.000 description 1
229920001721 polyimide Polymers 0.000 description 1
229920005596 polymer binder Polymers 0.000 description 1
239000002491 polymer binding agent Substances 0.000 description 1
239000013047 polymeric layer Substances 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
239000004926 polymethyl methacrylate Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
NQLVQOSNDJXLKG-UHFFFAOYSA-N prosulfocarb Chemical compound CCCN(CCC)C(=O)SCC1=CC=CC=C1 NQLVQOSNDJXLKG-UHFFFAOYSA-N 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
238000004080 punching Methods 0.000 description 1
238000003847 radiation curing Methods 0.000 description 1
238000002310 reflectometry Methods 0.000 description 1
239000011347 resin Substances 0.000 description 1
229920005989 resin Polymers 0.000 description 1
230000004044 response Effects 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
239000004332 silver Substances 0.000 description 1
238000009987 spinning Methods 0.000 description 1
238000003892 spreading Methods 0.000 description 1
230000007480 spreading Effects 0.000 description 1
238000012360 testing method Methods 0.000 description 1
239000012815 thermoplastic material Substances 0.000 description 1
238000009966 trimming Methods 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1

Classifications

- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Manufacturing Optical Record Carriers (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

CA 2066070 1991-04-18 1992-04-15 Methode de fabrication de supports a lecture optique non re-enregistrables Abandoned CA2066070A1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US68705991A	1991-04-18	1991-04-18
US07/687,059		1991-04-18

Publications (1)

Publication Number	Publication Date
CA2066070A1 true CA2066070A1 (fr)	1992-10-19

Family

ID=24758868

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA 2066070 Abandoned CA2066070A1 (fr)	1991-04-18	1992-04-15	Methode de fabrication de supports a lecture optique non re-enregistrables

Country Status (3)

Country	Link
EP (1)	EP0509472A3 (fr)
JP (1)	JPH05114171A (fr)
CA (1)	CA2066070A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR2724255B1 (fr) *	1994-09-01	1997-04-11	Digipress Sa	Disque optique et procede de fabrication de disques optiques
JPH10208319A (ja) *	1997-01-28	1998-08-07	Kitano Eng Kk	ディスク基板の貼り合わせ方法
US6200402B1 (en) *	1998-01-27	2001-03-13	Kitano Engineering Co., Ltd.	Method of and apparatus for laminating disc-shaped substrates
US6066218A (en) *	1998-04-23	2000-05-23	3M Innovative Properties Company	Method and apparatus for assembling an optical recording medium
IL147084A0 (en) *	1999-06-16	2002-08-14	Steag Hamatech Ag	Device and method for coating an optically readable data carrier
DE102005051471A1 (de) *	2005-10-21	2007-05-16	Bizerba Gmbh & Co Kg	Vorrichtung zur Bereitstellung von aktivierten Indikatoren zur Warenkennzeichnung, Warenkennzeichnung und Verfahren zur Bereitstellung von Indikatoren zur Warenkennzeichnung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60227253A (ja) *	1984-04-26	1985-11-12	Hitachi Chem Co Ltd	高密度記録体の製造法
CA1315023C (fr) *	1987-09-30	1993-03-23	Kenji Ohta	Film de protection translucide
US4942112A (en) *	1988-01-15	1990-07-17	E. I. Du Pont De Nemours And Company	Photopolymerizable compositions and elements for refractive index imaging
CA2020180C (fr) *	1989-06-30	2000-01-04	Stephen A. Zager	Methode de fabrication de supports d'information a cuvettes a lecture optique

1992
- 1992-04-15 CA CA 2066070 patent/CA2066070A1/fr not_active Abandoned
- 1992-04-15 EP EP19920106488 patent/EP0509472A3/en not_active Withdrawn
- 1992-04-17 JP JP9833992A patent/JPH05114171A/ja active Pending

Also Published As

Publication number	Publication date
JPH05114171A (ja)	1993-05-07
EP0509472A3 (en)	1992-12-16
EP0509472A2 (fr)	1992-10-21

Legal Events

Date	Code	Title	Description
1994-10-17	FZDE	Dead

Publication	Publication Date	Title
KR930006352B1 (ko)	1993-07-14	엠보싱된 정보를 함유하는 광학적으로 판독 가능한 매체의 제조방법
US5188863A (en)	1993-02-23	Direct effect master/stamper for optical recording
US5635114A (en)	1997-06-03	Method of making thin film optical storage media
US5669995A (en)	1997-09-23	Method for writing and reading data on a multi-layer recordable interferometric optical disc and method for fabricating such
US5708652A (en)	1998-01-13	Multi-layer recording medium and method for producing same
JPH08203125A (ja)	1996-08-09	貼り合わせ型光ディスク及びその製造方法
KR100697136B1 (ko)	2007-03-20	디스크형 다층 정보 기록 매체 및 그 제조 방법
JPH11273147A (ja)	1999-10-08	光ディスク
CA2034542A1 (fr)	1991-07-19	Methode de fabrication de supports a lecture optique contenant de l'information enregistree en relief
KR930006351B1 (ko)	1993-07-14	광학 기록에 사용되는 직접 작용식 마스터/스탬퍼
JP4078678B2 (ja)	2008-04-23	光ディスクの製造方法
EP0509472A2 (fr)	1992-10-21	Procédé de fabrication de milieux optique ne servant qu' à la lecture
JPH10222870A (ja)	1998-08-21	光記録媒体
JPH09147417A (ja)	1997-06-06	光学記録媒体およびその製造方法
JPH1074342A (ja)	1998-03-17	光学記録媒体の製造方法
JPS58144879A (ja)	1983-08-29	ホログラムの複製方法
EP0517122A2 (fr)	1992-12-09	Procédé de fabrication d'hologrammes de phase en volume à efficacité élevée
JP3476179B2 (ja)	2003-12-10	カード形ホログラム記録媒体及びその製造方法ならびにその再生装置
JP3460402B2 (ja)	2003-10-27	多層光学記録媒体とその製造方法
JPWO2003030159A1 (ja)	2005-01-20	光学記録媒体およびその製造方法
JPH10154351A (ja)	1998-06-09	光学記録媒体とその製造方法
JPH0615991A (ja)	1994-01-25	偽造防止ホログラム付光カード基体の製造方法およびその基体を用いる光情報記録媒体の製造方法
JP2733942B2 (ja)	1998-03-30	光ディスク
JP2004126039A (ja)	2004-04-22	光情報記録媒体
JPH0973663A (ja)	1997-03-18	多層光ディスク