EP1360346A2 - Saures bad zur galvanischen abscheidung von einer zink-manganlegierung - Google Patents
Saures bad zur galvanischen abscheidung von einer zink-manganlegierungInfo
- Publication number
- EP1360346A2 EP1360346A2 EP02702457A EP02702457A EP1360346A2 EP 1360346 A2 EP1360346 A2 EP 1360346A2 EP 02702457 A EP02702457 A EP 02702457A EP 02702457 A EP02702457 A EP 02702457A EP 1360346 A2 EP1360346 A2 EP 1360346A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- manganese
- bath
- zinc
- agent
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002253 acid Substances 0.000 title abstract description 8
- 229910000914 Mn alloy Inorganic materials 0.000 title abstract description 5
- 238000004070 electrodeposition Methods 0.000 title description 3
- WJZHMLNIAZSFDO-UHFFFAOYSA-N manganese zinc Chemical compound [Mn].[Zn] WJZHMLNIAZSFDO-UHFFFAOYSA-N 0.000 title description 3
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 36
- 150000002500 ions Chemical class 0.000 claims abstract description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims abstract description 7
- 239000007864 aqueous solution Substances 0.000 claims abstract description 7
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 7
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 6
- 230000008021 deposition Effects 0.000 claims abstract description 4
- 239000011572 manganese Substances 0.000 claims description 48
- 239000011701 zinc Substances 0.000 claims description 45
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 34
- 239000004327 boric acid Substances 0.000 claims description 19
- 239000001103 potassium chloride Substances 0.000 claims description 17
- 235000011164 potassium chloride Nutrition 0.000 claims description 17
- -1 naphthoxy Chemical group 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 14
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 12
- 239000006172 buffering agent Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 239000012747 synergistic agent Substances 0.000 claims description 6
- 238000005282 brightening Methods 0.000 claims description 5
- 125000005037 alkyl phenyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000001624 naphthyl group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 2
- 125000005248 alkyl aryloxy group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- 125000005619 boric acid group Chemical group 0.000 claims 1
- 239000000872 buffer Substances 0.000 abstract description 5
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 41
- 229910052725 zinc Inorganic materials 0.000 description 39
- 229910052748 manganese Inorganic materials 0.000 description 38
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 37
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 30
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 18
- 239000011592 zinc chloride Substances 0.000 description 15
- 235000005074 zinc chloride Nutrition 0.000 description 15
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 14
- BXRRQHBNBXJZBQ-UHFFFAOYSA-L dichloromanganese;hydrate Chemical compound O.Cl[Mn]Cl BXRRQHBNBXJZBQ-UHFFFAOYSA-L 0.000 description 14
- 238000001556 precipitation Methods 0.000 description 10
- 230000001580 bacterial effect Effects 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- 235000002639 sodium chloride Nutrition 0.000 description 9
- 229910021645 metal ion Inorganic materials 0.000 description 8
- 230000035755 proliferation Effects 0.000 description 8
- 235000019270 ammonium chloride Nutrition 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 229910001437 manganese ion Inorganic materials 0.000 description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- IPJKJLXEVHOKSE-UHFFFAOYSA-L manganese dihydroxide Chemical class [OH-].[OH-].[Mn+2] IPJKJLXEVHOKSE-UHFFFAOYSA-L 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000001509 sodium citrate Substances 0.000 description 3
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 3
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 2
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Substances OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 2
- 238000010668 complexation reaction Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000011565 manganese chloride Substances 0.000 description 2
- 235000002867 manganese chloride Nutrition 0.000 description 2
- 229940099607 manganese chloride Drugs 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 150000004786 2-naphthols Chemical class 0.000 description 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- 241000233866 Fungi Species 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 239000008351 acetate buffer Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229940001468 citrate Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- RUQIYMSRQQCKIK-UHFFFAOYSA-M sodium;2,3-di(propan-2-yl)naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(C(C)C)C(C(C)C)=CC2=C1 RUQIYMSRQQCKIK-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 239000011686 zinc sulphate Substances 0.000 description 1
- 235000009529 zinc sulphate Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
Definitions
- the present invention relates to an electrolysis bath consisting of an acidic aqueous solution for depositing an alloy of zinc and manganese in particular on steel.
- Zinc-manganese deposits have shown their superiority compared to other alloyed zinc by their superior corrosion resistance in a natural atmosphere.
- Surface analyzes after exposure to natural corrosion have highlighted the presence of a ⁇ -Mn 2 ⁇ 3 manganese oxide which would act as a passivation layer. This type of oxide would block oxygen reduction and therefore decrease corrosion of the coating.
- the known zinc-manganese electrolytic deposition processes are composed of an acidic aqueous solution either based on sodium citrate or based on ammonium chloride.
- the replacement of ammonium chloride by an alkali metal salt based on chloride, such as sodium chloride or potassium chloride also does not make it possible to obtain deposits with sufficient concentrations of manganese in the deposit.
- the use of complexing agents such as tartaric acid or gluconic acid makes it possible to obtain deposits having high manganese concentrations in the deposit.
- This type of bath has the disadvantage of working at a pH between 6.3 and 6.9, which requires adding sodium hydroxide to the bath.
- the zinc and manganese ions are not stable, that is to say that they are in the form of precipitates of zinc and manganese hydroxides. Therefore to avoid the formation of these species it is necessary to complex the zinc ions and the manganese ions with complexing agents such as citric or tartaric acid.
- complexing agents such as citric or tartaric acid.
- the local increase in pH occurring during the reduction of zinc and manganese may lead to the formation of zinc and manganese hydroxides. This phenomenon is accentuated if one works at a very low acid pH, that is to say of the order of 6.3 to 6.9.
- the present invention relates to a stable electrolysis bath, consisting of an acidic aqueous solution, making it possible to obtain a deposit of zinc and manganese having a good manganese content and a good yield, without having to carry out a particular treatment of the waters. of rejection.
- This acid bath therefore does not require the presence of complexing agents and allows to use smaller amounts of boric acid than those used in GB 2 351 503
- the subject of the invention is a bath consisting of an acidic aqueous solution free of ammonium ion, fluoroborate ion and citrate ion and comprising per liter
- Mn 2+ ions from 20 to 100 g of Mn 2+ ions, characterized in that it comprises a buffering agent maintaining the pH at a value between 4.0 and 6.0 and, preferably, between 4.5 and 6 and a another agent, distinct from the buffering agent, making it possible to approximate the deposition potentials of zinc and manganese.
- the invention also relates to a method of electroplating an alloy of zinc and manganese using the bath according to the invention.
- an acidic aqueous solution is used, free from ammonium ion, fluoroborate ion and citrate ion, containing:
- the zinc ion may be present in the form of a soluble salt such as zinc sulphate or zinc chloride.
- the manganese ion may be present in the form of a soluble salt such as manganese sulphate or manganese acetate or manganese chloride.
- a conductive salt in particular of an alkali metal such as sodium chloride, potassium chloride, sodium sulfate or potassium sulfate. Its concentration in the electrolytic bath is preferably from 100 to 250 g / L.
- a buffering agent to control the pH was obtained by citrate, tartrate or gluconate ions and ammonium ions.
- This buffering agent can be boric acid and its concentration is of the order of 5 to 40 g / L.
- Other buffers can be used such as hydrogenophthalate, dihydrogenophosphate and acetate buffers.
- a sufficient quantity of hydronium ions is sought in order to have a pH of between 4.8 and 5.5.
- At least one potential approximation agent or addition agent in order to shift the electrochemical potential of zinc towards that of manganese and thus allow the codeposition of zinc and manganese. This role was played by ammonium ions and citrate ions in the other baths.
- the potentials of the two redox systems can be brought together by complexing the metal ions. Complexation modifies the electrochemical potential of each of the couples and makes it possible to approximate the polarization curves.
- Ri aryloxy group, in particular phenoxy or naphthoxy, aryloxyalkoxy group, in particular phenoxyalkoxy or naphthoxyalkoxy, where the alkoxy part of the aryloxyalkoxy radical has from 1 to 6 carbon atoms, alkylaryl group, in particular alkylphenyl or alkylnaphthyl where the alkyl part of the alkylaryl radical has 1 to 12 carbon atoms, alkylaryloxy group, in particular alkylphenoxy or alkylnaphthoxy, or alkylaryloxyalkoxy group, in particular alkylphenoxyalkoxy or alkylnaphthoxyalkoxy.
- linear or branched alkyl groups preferably having from 1 to 6 carbon atoms.
- R1 is aryloxyalkoxy, especially phenoxyalkoxy or naphthoxyalkoxy. Ori-les preferably uses it at a concentration between 0.5 and 10 g / L
- synergistic agents are the compounds having the following general formula:
- R -H, or a linear or branched alkyl group having up to 6 carbon atoms
- a brightening agent is added to the electrolysis bath to obtain a bright deposit and to improve the codeposition of the alloyed metal, manganese.
- These brighteners are compounds which have the general formula:
- R 5 ⁇ -H, - CH 3 , aryl group, in particular phenyl, alkylphenyl or alkenylphenyl such as: -C 6 H 5 , CH 3 -C 6 H -, CH 3 -CH 2 -C 6 H 4 -, -CH ⁇ CH- C 6 H5, or naphthyl group.
- aryl group in particular phenyl, alkylphenyl or alkenylphenyl such as: -C 6 H 5 , CH 3 -C 6 H -, CH 3 -CH 2 -C 6 H 4 -, -CH ⁇ CH- C 6 H5, or naphthyl group.
- R 6 ⁇ -H or alkyl such as -CH 3 , -CH2-CH3, -CH2-CH2-CH3 (linear or branched alkyl and alkenyl groups preferably having from 1 to 6 carbon atoms).
- citrate or ammonium ions previously played two different roles.
- the role of buffering agent and the role of agent for bringing potentials to different compounds we are free from a constraint for the choice of agent for bringing together potentials and we can now use a complexing agent as such less annoying in rejections than those to which one was forced to resort.
- Example 1.1 The deposit is made at 1.5 A / dm 2 for 30 minutes. The deposit is then analyzed by Fluorescence X or by dissolution of the deposit in dilute hydrochloric acid and assay by Atomic Absorption Spectrometry to verify the presence of manganese in the deposit. Comparative example 1 Example 1.1
- ammonium ion strongly complexes metal ions such as Ni 2+ and Cu 2+ ions (ions which may be present in a surface treatment chain) and are therefore not precipitated as metallic hydroxide during the neutralization process. /precipitation.
- baths containing ammonium ions are undesirable.
- the release of the ammonium ion itself constitutes an environmental nuisance.
- Example ⁇ (according to the invention)
- This compound is marketed by the company SABO under the name of Sabosol NFE-8. We varied its concentration in the bath from 0.5g / L to 10g / L.
- the deposit contains manganese, that is to say that we have made a deposit of zinc and manganese.
- the amount of manganese in the deposit increases with the concentration of addition agent, the bath is stable for several months, that is to say that there is no bacterial proliferation in the bath, nor precipitation crystalline.
- This compound is marketed by the company RASCHIG GMBH Ludwigshafen Germany under the name of Ralufon NAPE 14-90. We varied its concentration in the bath from 0.5g / L to 10g / L. In all cases :
- the deposit contains manganese, that is to say that we have made a deposit of zinc and manganese.
- the amount of manganese in the deposit increases with the concentration of addition agent,
- the bath is stable for several months, that is to say that there is no bacterial proliferation in the bath, nor any crystalline precipitation.
- This compound is marketed by BASF under the name of Lugalvan BNO 24.
- the deposit contains manganese, that is to say that we have made a deposit of zinc and manganese.
- the amount of manganese in the deposit increases with the concentration of addition agent, the bath is stable for several months, that is to say that there is no bacterial proliferation in the bath, nor precipitation crystalline.
- Zinc chloride 60 g / L Manganese chloride monohydrate 60 g / L Potassium chloride 240 g / L
- This compound is marketed by the company CYTEC INDUSTRIES INC. under the name of Aerosol OS (West Paterson New Jersey E.U.A.).
- This compound is marketed by the company RASCHIG under the name of Ralufon N 9.
- the deposit contains manganese, that is to say that we have made a deposit of zinc and manganese,
- the bath is stable for several months, that is to say that there is no bacterial proliferation in the bath, nor any crystalline precipitation.
- the deposit contains manganese, that is to say that we have made a deposit of zinc and manganese.
- the deposit contains even more manganese than in Example 2 and 3, or the bath only contained the agent for bringing potentials together.
- the use of synergists alone did not make it possible to co-deposit zinc and manganese (examples 8 and 9).
- the use of synergistic agents in a bath containing the addition agents makes it possible to obtain deposits having even more manganese - the bath is stable for several months, that is to say that one does not observe no bacterial growth in the bath, no crystal precipitation.
- the concentration in the bath is 8 g / L
- the deposit contains manganese, that is to say that we have carried out a deposit of zinc and manganese, the manganese being present in a greater content than if we only use the addition agent. This synergistic effect is unexpected.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0101555 | 2001-02-06 | ||
| FR0101555A FR2820439B1 (fr) | 2001-02-06 | 2001-02-06 | Bain acide pour l'electrodeposition d'un alliage zinc-manganese |
| PCT/FR2002/000459 WO2002063071A2 (fr) | 2001-02-06 | 2002-02-06 | Bain acide pour l'electrodeposition d'un alliage zinc-manganese |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1360346A2 true EP1360346A2 (de) | 2003-11-12 |
Family
ID=8859654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP02702457A Withdrawn EP1360346A2 (de) | 2001-02-06 | 2002-02-06 | Saures bad zur galvanischen abscheidung von einer zink-manganlegierung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7070689B2 (de) |
| EP (1) | EP1360346A2 (de) |
| JP (1) | JP4159879B2 (de) |
| FR (1) | FR2820439B1 (de) |
| WO (1) | WO2002063071A2 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9840788B2 (en) * | 2014-05-30 | 2017-12-12 | Applied Materials, Inc. | Method for electrochemically depositing metal on a reactive metal film |
| US9828687B2 (en) * | 2014-05-30 | 2017-11-28 | Applied Materials, Inc. | Method for electrochemically depositing metal on a reactive metal film |
| US11066752B2 (en) | 2018-02-28 | 2021-07-20 | The Boeing Company | Compositionally modulated zinc-manganese multilayered coatings |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794590A (en) * | 1980-12-04 | 1982-06-12 | Toshikatsu Watabe | High corrosion resistant zinc plating method |
| US4898652A (en) * | 1986-03-03 | 1990-02-06 | Omi International Corporation | Polyoxalkylated polyhydroxy compounds as additives in zinc alloy electrolytes |
| JPH0826474B2 (ja) * | 1989-08-31 | 1996-03-13 | 日本鋼管株式会社 | 生産性に優れた亜鉛―マンガン合金の電気めつき方法 |
| JPH0565674A (ja) * | 1991-09-09 | 1993-03-19 | Nkk Corp | 亜鉛−マンガン合金層を有するアルミニウム板およびアルミニウム合金板 |
| FR2762331B1 (fr) * | 1997-04-22 | 1999-09-24 | Peugeot | Composition pour le depot electrolytique d'un alliage de zinc-manganese, procede de depot d'une telle composition et revetement ainsi obtenu |
| GB9910681D0 (en) * | 1999-05-07 | 1999-07-07 | Enthone Omi Benelux Bv | Alloy plating |
| US6387229B1 (en) * | 1999-05-07 | 2002-05-14 | Enthone, Inc. | Alloy plating |
-
2001
- 2001-02-06 FR FR0101555A patent/FR2820439B1/fr not_active Expired - Fee Related
-
2002
- 2002-02-06 US US10/467,264 patent/US7070689B2/en not_active Expired - Fee Related
- 2002-02-06 WO PCT/FR2002/000459 patent/WO2002063071A2/fr not_active Ceased
- 2002-02-06 JP JP2002562801A patent/JP4159879B2/ja not_active Expired - Fee Related
- 2002-02-06 EP EP02702457A patent/EP1360346A2/de not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO02063071A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4159879B2 (ja) | 2008-10-01 |
| US7070689B2 (en) | 2006-07-04 |
| FR2820439B1 (fr) | 2004-04-09 |
| WO2002063071A3 (fr) | 2003-03-13 |
| JP2004524441A (ja) | 2004-08-12 |
| US20040050712A1 (en) | 2004-03-18 |
| FR2820439A1 (fr) | 2002-08-09 |
| WO2002063071A2 (fr) | 2002-08-15 |
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