ES2574158T3 - Baño galvánico alcalino con una membrana de filtración - Google Patents

Baño galvánico alcalino con una membrana de filtración Download PDF

Info

Publication number
ES2574158T3
ES2574158T3 ES09152660.8T ES09152660T ES2574158T3 ES 2574158 T3 ES2574158 T3 ES 2574158T3 ES 09152660 T ES09152660 T ES 09152660T ES 2574158 T3 ES2574158 T3 ES 2574158T3
Authority
ES
Spain
Prior art keywords
bath
zinc
filtration membrane
cathode
membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES09152660.8T
Other languages
English (en)
Spanish (es)
Inventor
Karlheinz Arzt
Jens-Eric Geissler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2574158(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Application granted granted Critical
Publication of ES2574158T3 publication Critical patent/ES2574158T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
ES09152660.8T 2005-04-26 2005-04-26 Baño galvánico alcalino con una membrana de filtración Expired - Lifetime ES2574158T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05009127A EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran
EP09152660.8A EP2050841B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Publications (1)

Publication Number Publication Date
ES2574158T3 true ES2574158T3 (es) 2016-06-15

Family

ID=35530823

Family Applications (2)

Application Number Title Priority Date Filing Date
ES09152660.8T Expired - Lifetime ES2574158T3 (es) 2005-04-26 2005-04-26 Baño galvánico alcalino con una membrana de filtración
ES05009127T Expired - Lifetime ES2324169T3 (es) 2005-04-26 2005-04-26 Baño galvanico alcalino con una membrana de filtracion.

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES05009127T Expired - Lifetime ES2324169T3 (es) 2005-04-26 2005-04-26 Baño galvanico alcalino con una membrana de filtracion.

Country Status (11)

Country Link
US (1) US8293092B2 (de)
EP (2) EP2050841B1 (de)
JP (1) JP4955657B2 (de)
KR (1) KR101301275B1 (de)
CN (3) CN104911651A (de)
AT (1) ATE429528T1 (de)
BR (1) BRPI0610765B1 (de)
CA (1) CA2600273C (de)
DE (1) DE502005007138D1 (de)
ES (2) ES2574158T3 (de)
WO (1) WO2006114305A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8084684B2 (en) * 2006-10-09 2011-12-27 Solexel, Inc. Three-dimensional thin-film solar cells
ITTO20070704A1 (it) * 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US8177944B2 (en) 2007-12-04 2012-05-15 Ebara Corporation Plating apparatus and plating method
DE102008056776A1 (de) 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
ES2404844T3 (es) 2010-05-07 2013-05-29 Dr.Ing. Max Schlötter Gmbh & Co. Kg Regeneración de electrolitos de cinc-níquel alcalinos mediante la eliminación de iones cianuro
IT1405319B1 (it) * 2010-12-27 2014-01-03 Fontana R D S R L Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) * 2012-10-12 2014-07-18 주식회사 익스톨 금속 도금장치
EP2784189A1 (de) 2013-03-28 2014-10-01 Coventya SAS Elektroplattierungsbad für Zink-Eisen-Legierungen, Verfahren zur Ablagerung von Zink-Eisen-Legierung auf einer Vorrichtung sowie solche Vorrichtung
WO2016147709A1 (ja) 2015-03-13 2016-09-22 奥野製薬工業株式会社 治具用電解剥離剤
WO2016075964A1 (ja) 2015-07-22 2016-05-19 ディップソール株式会社 亜鉛合金めっき方法
RU2610183C1 (ru) * 2015-07-22 2017-02-08 Дипсол Кемикалз Ко., Лтд. Способ гальваностегии цинковым сплавом
WO2017205473A1 (en) * 2016-05-24 2017-11-30 Coventya, Inc. Ternary zinc-nickel-iron alloys and alkaline electrolytes for plating such alloys
WO2018018161A1 (en) * 2016-07-29 2018-02-01 Simon Fraser University Methods of electrochemical deposition
EP3358045A1 (de) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
ES2969188T3 (es) 2017-06-14 2024-05-16 Dr Ing Max Schloetter Gmbh & Co Kg Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos
EP3461933B1 (de) * 2017-09-28 2019-09-04 ATOTECH Deutschland GmbH Verfahren zur elektrolytischen abscheidung einer schicht aus zink-nickel-legierung auf mindestens einem zu behandelnden substrat
US11165091B2 (en) 2018-01-23 2021-11-02 City University Of Hong Kong Battery system and a method of forming a battery
CA3127517A1 (en) * 2019-01-24 2020-07-30 Atotech Deutschland Gmbh Membrane anode system for electrolytic zinc-nickel alloy deposition
CN110462107A (zh) 2019-02-15 2019-11-15 迪普索股份公司 锌或锌合金电镀方法和系统
RU2712582C1 (ru) * 2019-07-16 2020-01-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (de) * 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB381931A (en) * 1931-07-11 1932-10-11 Mond Nickel Co Ltd Improvements relating to electro-plating and the electrodeposition of metals
US3945900A (en) 1972-05-02 1976-03-23 Dorr-Oliver Incorporated Electro ultrafiltration process and apparatus
IE39814B1 (en) * 1973-08-03 1979-01-03 Parel Sa Electrochemical process and apparatus
US4250002A (en) * 1979-09-19 1981-02-10 Hooker Chemicals & Plastics Corp. Polymeric microporous separators for use in electrolytic processes and devices
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
JPS6353285A (ja) 1986-08-22 1988-03-07 Nippon Hyomen Kagaku Kk 亜鉛−ニツケル合金めつき液
JPH01116094A (ja) * 1987-10-28 1989-05-09 Eagle Ind Co Ltd 隔膜鍍金法
JPH02141596A (ja) * 1988-11-21 1990-05-30 Yuken Kogyo Kk ジンケート型亜鉛合金メッキ浴
JPH0444375A (ja) * 1990-06-12 1992-02-14 Zexel Corp レーザ共振器のアライメント装置
US5443727A (en) 1990-10-30 1995-08-22 Minnesota Mining And Manufacturing Company Articles having a polymeric shell and method for preparing same
US5082538A (en) 1991-01-09 1992-01-21 Eltech Systems Corporation Process for replenishing metals in aqueous electrolyte solutions
CN2175238Y (zh) * 1993-09-29 1994-08-24 北京科技大学 锌-镍合金电镀用阳极
US5417840A (en) 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US5631102A (en) * 1996-02-12 1997-05-20 Wilson Greatbatch Ltd. Separator insert for electrochemical cells
JPH11200099A (ja) 1998-01-08 1999-07-27 Toyo Kohan Co Ltd 不溶性陽極を用いるめっき方法およびめっき装置
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE19840019C1 (de) 1998-09-02 2000-03-16 Atotech Deutschland Gmbh Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren
JP2000087299A (ja) * 1998-09-08 2000-03-28 Ebara Corp 基板メッキ装置
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
JP4060012B2 (ja) * 1999-07-19 2008-03-12 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき装置
ES2250166T5 (es) 2000-06-15 2016-05-20 Coventya Inc Electrochapado de zinc-níquel
FR2839729B1 (fr) * 2002-05-16 2005-02-11 Univ Toulouse Procede de protection d'un substrat en acier ou alliage d'aluminium contre la corrosion permettant de lui conferer des proprietes tribologiques, et substrat obtenu
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
AU2003252677A1 (en) 2002-07-25 2004-02-16 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
BR0318331A (pt) 2003-06-03 2006-07-11 Taskem Inc aparelho para aplicar um eletrodepósito de zinco ou de liga de zinco a uma peça de trabalho
JP4120497B2 (ja) * 2003-06-27 2008-07-16 Ｊｆｅスチール株式会社 電気亜鉛系めっき鋼板
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

Also Published As

Publication number Publication date
CA2600273A1 (en) 2006-11-02
KR20070122454A (ko) 2007-12-31
EP1717353B1 (de) 2009-04-22
US20090107845A1 (en) 2009-04-30
CN104911651A (zh) 2015-09-16
DE502005007138D1 (de) 2009-06-04
CN104911676B (zh) 2017-11-17
JP2008539329A (ja) 2008-11-13
CN104911676A (zh) 2015-09-16
BRPI0610765B1 (pt) 2017-04-04
US8293092B2 (en) 2012-10-23
EP2050841B1 (de) 2016-05-11
CN101146934A (zh) 2008-03-19
ES2324169T3 (es) 2009-07-31
JP4955657B2 (ja) 2012-06-20
CA2600273C (en) 2014-08-12
EP2050841A1 (de) 2009-04-22
BRPI0610765A2 (pt) 2010-07-20
WO2006114305A1 (en) 2006-11-02
EP1717353A1 (de) 2006-11-02
ATE429528T1 (de) 2009-05-15
KR101301275B1 (ko) 2013-08-29

Similar Documents

Publication Publication Date Title
ES2324169T3 (es) Baño galvanico alcalino con una membrana de filtracion.
TWI227284B (en) Plating bath and method for depositing a metal layer on a substrate
TWI252870B (en) Plating bath and method for depositing a metal layer on a substrate
Jung et al. Electrochemical plating of Cu-Sn alloy in non-cyanide solution to substitute for Ni undercoating layer
TW201026904A (en) Method for replenishing tin and its alloying metals in electrolyte solutions
Nady et al. Ni–Cu nano-crystalline alloys for efficient electrochemical hydrogen production in acid water
TW201109478A (en) Electrolytic plating equipment and electrolytic plating method
JPWO2011102276A1 (ja) 高純度スルホン酸銅水溶液及びその製造方法
Bograchev et al. Electrodeposition of metals into nano/micropores of templates: a type of electrochemistry under confinement
TW201114953A (en) Electrolyte composition
JPH0375400A (ja) 非シアン化浴を用いる銅メッキ方法
ES2256268T3 (es) Recubrimiento en niquel o aleacion de niquel con acabado satinado.
ES2940623T3 (es) Método para depositar electrolíticamente una capa de cromo o aleación de cromo sobre al menos un sustrato
US20060272951A1 (en) Electroplating process and composition
ES2244603T3 (es) Sal compleja de paladio y su utilizacion para ajustar la concentracion en paladio de un baño electrolitico destinado para el deposito de paladio o de una de sus aleaciones.
WO2012133225A1 (ja) 電気銅めっき用添加剤及び電気銅めっき浴
US20080277285A1 (en) Bipolar electroless processing methods
ES2290783T3 (es) Instalacion para depositos de zinc.
JP5312842B2 (ja) 電解合金めっき液及びそれを用いるめっき方法
ES2969188T3 (es) Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos
Xu et al. Preparation and Electrocatalytic Activity of Nanocrystalline Ni–Mo–Co Alloy Electrode for Hydrogen Evolution
JP4991472B2 (ja) 電気めっき方法
ES2270353T3 (es) Metodo para deposicion electrolitica de cobre en soluccion clorhidrica.
US20080226953A1 (en) Cell for gas generation
JPS60135593A (ja) Ｎｉ―Ｗ合金連続めつき方法およびその装置