HK76585A - Positive-working radiation-sensitive composition - Google Patents

Positive-working radiation-sensitive composition

Info

Publication number
HK76585A
HK76585A HK765/85A HK76585A HK76585A HK 76585 A HK76585 A HK 76585A HK 765/85 A HK765/85 A HK 765/85A HK 76585 A HK76585 A HK 76585A HK 76585 A HK76585 A HK 76585A
Authority
HK
Hong Kong
Prior art keywords
sensitive
layer
resin
acid
light
Prior art date
Application number
HK765/85A
Other languages
German (de)
English (en)
Inventor
Hans Dr. Ruckert
Gerhard Dr. Buhr
Hartmut Dr. Steppan
Original Assignee
Hoechst Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Aktiengesellschaft filed Critical Hoechst Aktiengesellschaft
Publication of HK76585A publication Critical patent/HK76585A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)

Claims (5)

1. Mélange sensible au rayonnement, travaillant positivement, constitué de
'a) un composé ayant au moins une liaison C―O―C pouvant être scindée par des acides,
b) un composé formant un acide fort par irradiation,
c) un liant insoluble dans l'eau, soluble dans les solutions aqueuses-alcalines et
d) au moins une résine ayant un autre comportement de solubilité que le liant c), caractérisé en ce que la résine ayant un autre comportement de solubilité est
d1) une résine de polyuréthane préparée à partir d'un isocyanate organique et d'un polymère contenant des groupes hydroxy,
d2) un éther polyvinylalkylique,
d3) un polymère d'acrylate d'alkyle ou
d4) un dérivé hydrogéné ou partiellement hydrogéné de la colophane.
2. Mélange sensible au rayonnement suivant la revendication 1, caractérisé en ce qu'il contient le constituant d) dans une quantité de 1 à 50 % en poids par rapport aux constituants non volatils du mélange.
3. Mélange sensible au rayonnement suivant la revendication 1, caractérisé en ce que le composé (a) scindable par les acides est un dérivé d'acide orthocarboxylique, un acétal, un éther énolique ou un N-acyliminocarbonate.
4. Mélange sensible au rayonnement suivant la revendication 1, caractérisé en ce que le liant c) est une novolaque.
5. Procédé de préparation d'images en relief, dans lequel on stratifie une matière sensible à la lumière constituée d'une feuille de support temporaire et d'une couche thermoplastique sensible à la lumière, sous pression et en chauffant, sur une matière de support, on expose la couche sensible à lumière selon une image, et après avoir détaché la feuille de support temporaire, on élimine par lavage les régions exposées de la couche avec une solution aqueuse-alcaline de révélateur, caractérisé en ce que la couche thermoplastique sensible à la lumière se compose d'un mélange sensible à la lumière suivant la revendication 1.
HK765/85A 1980-06-21 1985-10-10 Positive-working radiation-sensitive composition HK76585A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803023201 DE3023201A1 (de) 1980-06-21 1980-06-21 Positiv arbeitendes strahlungsempfindliches gemisch

Publications (1)

Publication Number Publication Date
HK76585A true HK76585A (en) 1985-10-18

Family

ID=6105078

Family Applications (1)

Application Number Title Priority Date Filing Date
HK765/85A HK76585A (en) 1980-06-21 1985-10-10 Positive-working radiation-sensitive composition

Country Status (10)

Country Link
US (1) US4506003A (fr)
EP (1) EP0042562B1 (fr)
JP (1) JPS5737349A (fr)
KR (1) KR840001602B1 (fr)
AT (1) ATE13729T1 (fr)
CA (1) CA1235831A (fr)
DE (2) DE3023201A1 (fr)
HK (1) HK76585A (fr)
MY (1) MY8600248A (fr)
ZA (1) ZA814176B (fr)

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DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US4544466A (en) * 1983-12-06 1985-10-01 Phillips Petroleum Company Process of making U.V. cured polyurethanes using diazonium salt promoters
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
EP0164083B1 (fr) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Solution de revêtement photosensible positive
DE3421160A1 (de) * 1984-06-07 1985-12-12 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
US4571373A (en) * 1984-06-11 1986-02-18 Minnesota Mining And Manufacturing Company Exposure latitude improvement in printing positive-acting color pre-press proofs
JPH0650392B2 (ja) * 1985-07-12 1994-06-29 富士写真フイルム株式会社 感光性平版印刷版の製造方法
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
DE3662341D1 (en) * 1985-10-07 1989-04-20 Interatom Casting head for a liquid metal metering apparatus, and method for using it
DE3537441A1 (de) * 1985-10-22 1987-04-23 Hoechst Ag Loesemittel zum entfernen von photoresists
DE3541534A1 (de) * 1985-11-25 1987-05-27 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
DE3750275T3 (de) * 1986-06-13 1998-10-01 Microsi Inc Lackzusammensetzung und -anwendung.
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
MY103006A (en) * 1987-03-30 1993-03-31 Microsi Inc Photoresist compositions
DE3716848A1 (de) * 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
DE3737734A1 (de) * 1987-11-06 1989-05-18 Hoechst Ag Strahlungsempfindliches gemisch
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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US5164278A (en) * 1990-03-01 1992-11-17 International Business Machines Corporation Speed enhancers for acid sensitized resists
JPH0480758A (ja) * 1990-07-23 1992-03-13 Fuji Photo Film Co Ltd 感光性組成物
DE4125723A1 (de) * 1991-08-02 1993-02-04 Hoechst Ag Verfahren zur herstellung eines mehrfarbenbilds und lichtempfindliches material zur durchfuehrung dieses verfahrens
DE69226920T2 (de) * 1991-10-07 1999-01-28 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Lichtempfindliche Zusammensetzung
DE4243253A1 (de) * 1992-12-19 1994-06-23 Hoechst Ag Lichtempfindliches Material und Verfahren zur Herstellung von Farbprüffolien
DE4432294A1 (de) * 1994-09-12 1996-03-14 Telefunken Microelectron Verfahren zur Reduzierung der Oberflächenrekombinationsgeschwindigkeit in Silizium
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
DE10105278A1 (de) * 2001-02-02 2002-08-08 Basf Ag Klebstoffe, enthaltend Polyvinylalkylether
KR100636068B1 (ko) * 2001-06-15 2006-10-19 신에쓰 가가꾸 고교 가부시끼가이샤 레지스트 재료 및 패턴 형성 방법
CN100535749C (zh) 2002-10-23 2009-09-02 Az电子材料（日本）株式会社 化学增强正性光敏树脂组合物
JP4440600B2 (ja) * 2003-10-31 2010-03-24 Ａｚエレクトロニックマテリアルズ株式会社 厚膜および超厚膜対応化学増幅型感光性樹脂組成物
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
JP2007029152A (ja) * 2005-07-22 2007-02-08 Takano Co Ltd 張り材の取付構造
US8846195B2 (en) * 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
DE102009019745A1 (de) * 2009-05-02 2010-11-11 Karlsruher Institut für Technologie Verfahren zur Strukturierung einer Schicht aus Silikon und Verwendung einer hierfür entwickelten Mischung
WO2011066450A2 (fr) * 2009-11-24 2011-06-03 Molecular Imprints, Inc. Couches d'adhésion en lithographie par nano-impression

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DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
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DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse

Also Published As

Publication number Publication date
KR840001602B1 (ko) 1984-10-11
DE3023201A1 (de) 1982-01-07
CA1235831A (fr) 1988-04-26
EP0042562B1 (fr) 1985-06-05
ATE13729T1 (de) 1985-06-15
US4506003A (en) 1985-03-19
EP0042562A3 (en) 1982-11-17
ZA814176B (en) 1982-07-28
MY8600248A (en) 1986-12-31
EP0042562A2 (fr) 1981-12-30
DE3170823D1 (en) 1985-07-11
JPS5737349A (en) 1982-03-01
JPH0143940B2 (fr) 1989-09-25

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