IT8321641A1 - Complesso circuitale ad alta frequenza e dispositivo semiconduttore per l'impiego in tale complesso - Google Patents

Complesso circuitale ad alta frequenza e dispositivo semiconduttore per l'impiego in tale complesso

Info

Publication number
IT8321641A1
IT8321641A1 IT1983A21641A IT2164183A IT8321641A1 IT 8321641 A1 IT8321641 A1 IT 8321641A1 IT 1983A21641 A IT1983A21641 A IT 1983A21641A IT 2164183 A IT2164183 A IT 2164183A IT 8321641 A1 IT8321641 A1 IT 8321641A1
Authority
IT
Italy
Prior art keywords
assembly
semiconductor device
high frequency
frequency circuit
circuit assembly
Prior art date
Application number
IT1983A21641A
Other languages
English (en)
Other versions
IT1170151B (it
IT8321641A0 (it
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of IT8321641A0 publication Critical patent/IT8321641A0/it
Publication of IT8321641A1 publication Critical patent/IT8321641A1/it
Application granted granted Critical
Publication of IT1170151B publication Critical patent/IT1170151B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00Electrical arrangements for controlling or matching impedance
    • H10W44/20Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69Insulating materials thereof
    • H10W70/698Semiconductor materials that are electrically insulating, e.g. undoped silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00Electrical arrangements for controlling or matching impedance
    • H10W44/20Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H10W44/226Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for HF amplifiers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/682Shapes or dispositions thereof comprising holes having chips therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/685Shapes or dispositions thereof comprising multiple insulating layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5445Dispositions of bond wires being orthogonal to a side surface of the chip, e.g. parallel arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/752Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between stacked chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
IT2164183A 1982-06-18 1983-06-15 Complesso circuitale ad alta frequenza e dispositivo semiconduttore per l'impiego in tale complesso IT1170151B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8202470A NL8202470A (nl) 1982-06-18 1982-06-18 Hoogfrequentschakelinrichting en halfgeleiderinrichting voor toepassing in een dergelijke inrichting.

Publications (3)

Publication Number Publication Date
IT8321641A0 IT8321641A0 (it) 1983-06-15
IT8321641A1 true IT8321641A1 (it) 1984-12-15
IT1170151B IT1170151B (it) 1987-06-03

Family

ID=19839906

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2164183A IT1170151B (it) 1982-06-18 1983-06-15 Complesso circuitale ad alta frequenza e dispositivo semiconduttore per l'impiego in tale complesso

Country Status (9)

Country Link
US (1) US4739389A (it)
JP (1) JPS594064A (it)
AU (1) AU557136B2 (it)
CA (1) CA1213079A (it)
DE (1) DE3320275A1 (it)
FR (1) FR2529013B1 (it)
GB (1) GB2123209B (it)
IT (1) IT1170151B (it)
NL (1) NL8202470A (it)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3382183D1 (de) * 1982-12-23 1991-04-04 Sumitomo Electric Industries Monolithische integrierte mikrowellenschaltung und verfahren zum auswaehlen derselben.
US4577213A (en) * 1984-03-05 1986-03-18 Honeywell Inc. Internally matched Schottky barrier beam lead diode
US4675717A (en) * 1984-10-09 1987-06-23 American Telephone And Telegraph Company, At&T Bell Laboratories Water-scale-integrated assembly
JPS61292383A (ja) * 1985-06-20 1986-12-23 Sony Corp 集積回路装置
CH668667A5 (de) * 1985-11-15 1989-01-13 Bbc Brown Boveri & Cie Leistungshalbleitermodul.
US5060048A (en) * 1986-10-22 1991-10-22 Siemens Aktiengesellschaft & Semikron GmbH Semiconductor component having at least one power mosfet
FR2608318B1 (fr) * 1986-12-16 1989-06-16 Thomson Semiconducteurs Dispositif semi-conducteur a faible bruit en hyperfrequence, monte dans un boitier
JPS6414949A (en) * 1987-07-08 1989-01-19 Nec Corp Semiconductor device and manufacture of the same
US4901136A (en) * 1987-07-14 1990-02-13 General Electric Company Multi-chip interconnection package
JPH02184054A (ja) * 1989-01-11 1990-07-18 Toshiba Corp ハイブリッド型樹脂封止半導体装置
US4967258A (en) * 1989-03-02 1990-10-30 Ball Corporation Structure for use in self-biasing and source bypassing a packaged, field-effect transistor and method for making same
EP0393220B1 (en) * 1989-04-20 1994-07-13 International Business Machines Corporation Integrated circuit package
JPH0777261B2 (ja) * 1989-07-10 1995-08-16 三菱電機株式会社 固体撮像装置及びその組立方法
US5244833A (en) * 1989-07-26 1993-09-14 International Business Machines Corporation Method for manufacturing an integrated circuit chip bump electrode using a polymer layer and a photoresist layer
DE68927931T2 (de) * 1989-07-26 1997-09-18 Ibm Verfahren zur Herstellung einer Packungsstruktur für einen integrierten Schaltungschip
JPH0724270B2 (ja) * 1989-12-14 1995-03-15 株式会社東芝 半導体装置及びその製造方法
EP0460554A1 (en) * 1990-05-30 1991-12-11 Sanyo Electric Co., Ltd. Hybrid integrated circuit device
US5049978A (en) * 1990-09-10 1991-09-17 General Electric Company Conductively enclosed hybrid integrated circuit assembly using a silicon substrate
US5153408A (en) * 1990-10-31 1992-10-06 International Business Machines Corporation Method and structure for repairing electrical lines
DE4108154A1 (de) * 1991-03-14 1992-09-17 Telefunken Electronic Gmbh Elektronische baugruppe und verfahren zur herstellung von elektronischen baugruppen
EP0506122A3 (en) * 1991-03-29 1994-09-14 Matsushita Electric Industrial Co Ltd Power module
US5151769A (en) * 1991-04-04 1992-09-29 General Electric Company Optically patterned RF shield for an integrated circuit chip for analog and/or digital operation at microwave frequencies
JPH0583017A (ja) * 1991-09-24 1993-04-02 Mitsubishi Electric Corp マイクロ波集積回路装置
US5596171A (en) * 1993-05-21 1997-01-21 Harris; James M. Package for a high frequency semiconductor device and methods for fabricating and connecting the same to an external circuit
US5665649A (en) * 1993-05-21 1997-09-09 Gardiner Communications Corporation Process for forming a semiconductor device base array and mounting semiconductor devices thereon
JP2638514B2 (ja) * 1994-11-11 1997-08-06 日本電気株式会社 半導体パッケージ
DE19720300B4 (de) * 1996-06-03 2006-05-04 CiS Institut für Mikrosensorik gGmbH Elektronisches Hybrid-Bauelement und Verfahren zu seiner Herstellung
WO1998020553A1 (en) * 1996-11-05 1998-05-14 Philips Electronics N.V. Semiconductor device with a high-frequency bipolar transistor on an insulating substrate
JP3859340B2 (ja) * 1998-01-06 2006-12-20 三菱電機株式会社 半導体装置
EP1487019A1 (en) * 2003-06-12 2004-12-15 Koninklijke Philips Electronics N.V. Electronic device and method of manufacturing thereof
US9214909B2 (en) * 2005-07-29 2015-12-15 Mks Instruments, Inc. High reliability RF generator architecture

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3022472A (en) * 1958-01-22 1962-02-20 Bell Telephone Labor Inc Variable equalizer employing semiconductive element
LU38614A1 (it) * 1959-05-06
DE1591501A1 (de) * 1967-06-06 1970-02-26 Siemens Ag Integrierter Halbleiterschaltkreis
US3577037A (en) * 1968-07-05 1971-05-04 Ibm Diffused electrical connector apparatus and method of making same
JPS4947713B1 (it) * 1970-04-27 1974-12-17
JPS50147292A (it) * 1974-05-15 1975-11-26
US4023198A (en) * 1974-08-16 1977-05-10 Motorola, Inc. High frequency, high power semiconductor package
US3996603A (en) * 1974-10-18 1976-12-07 Motorola, Inc. RF power semiconductor package and method of manufacture
US4122479A (en) * 1975-01-31 1978-10-24 Hitachi, Ltd. Optoelectronic device having control circuit for light emitting element and circuit for light receiving element integrated in a semiconductor body
JPS5293285A (en) * 1976-02-02 1977-08-05 Hitachi Ltd Structure for semiconductor device
US4092664A (en) * 1976-02-17 1978-05-30 Hughes Aircraft Company Carrier for mounting a semiconductor chip
JPS5337383A (en) * 1976-09-20 1978-04-06 Hitachi Ltd Semiconductor integrated circuit
JPS5411666A (en) * 1977-06-28 1979-01-27 Nec Corp Microwave high output transistor
US4190854A (en) * 1978-02-15 1980-02-26 National Semiconductor Corporation Trim structure for integrated capacitors
JPS5591165A (en) * 1978-12-28 1980-07-10 Fujitsu Ltd Microwave ic
EP0015709B1 (en) * 1979-03-10 1984-05-23 Fujitsu Limited Constructional arrangement for semiconductor devices
JPS57166068A (en) * 1981-04-07 1982-10-13 Toshiba Corp Semiconductor device
EP0062725B1 (de) * 1981-04-14 1984-09-12 Deutsche ITT Industries GmbH Verfahren zum Herstellen eines integrierten Planartransistors
US4463322A (en) * 1981-08-14 1984-07-31 Texas Instruments Incorporated Self-biasing for FET-driven microwave VCOs

Also Published As

Publication number Publication date
CA1213079A (en) 1986-10-21
FR2529013B1 (fr) 1987-04-17
JPS594064A (ja) 1984-01-10
AU557136B2 (en) 1986-12-04
GB8316270D0 (en) 1983-07-20
GB2123209B (en) 1986-01-02
DE3320275A1 (de) 1983-12-22
US4739389A (en) 1988-04-19
FR2529013A1 (fr) 1983-12-23
GB2123209A (en) 1984-01-25
AU1583783A (en) 1983-12-22
NL8202470A (nl) 1984-01-16
IT1170151B (it) 1987-06-03
IT8321641A0 (it) 1983-06-15

Similar Documents

Publication Publication Date Title
IT8321641A1 (it) Complesso circuitale ad alta frequenza e dispositivo semiconduttore per l'impiego in tale complesso
KR100201183B1 (en) Semiconductor integatrated circuit device and fabrication method of the same
KR840003534A (ko) 반도체 장치와 그 제조 방법
KR860004457A (ko) 반도체 집적회로장치 및 그의 제조방법과 제조장치
EP0189914A3 (en) Semiconductor integrated circuit device and method of manufacturing the same
DE69026164D1 (de) Halbleitende integrierte Schaltung
DE69118952D1 (de) Halbleitervorrichtung mit integrierter Halbleiterschaltung und Betriebsverfahren dafür
KR900008928A (ko) 반도체 집적회로
GB2084796B (en) Mounting and cooling arrangements for semiconductor devices
KR890004421A (ko) 반도체집적회로장치
KR850007157A (ko) 반도체 집적 회로장치
IT8349562A0 (it) Apparecchio e procedimento di cardatura
DE69317945D1 (de) Hochfrequenz-Halbleiterbauelement
MY8700647A (en) Semiconductor integrated circuit devices and method of manufacturing the same
ES540478A0 (es) Perfeccionamientos en dispositivos de circuitos integrados
KR860005450A (ko) 반도체 집적 회로장치 및 그의 제조방법
DE69031671D1 (de) Integrierte Halbleiterschaltung
IT8547677A1 (it) Dispositivo e semiconduttore in particolare circuito darlington bipolare -mos integrato
IT1167554B (it) Dispositivo e semiconduttore planare
KR860006136A (ko) 반도체 집적 회로 장치
IT1193605B (it) Procedimento e dispositivo di presa mediante aspirazione
DE69026226D1 (de) Integrierte Halbleiterschaltung
IT1194531B (it) Circuito per la elaborazione e la utilizzazione di segnali
KR860007757A (ko) 반도체 집적회로장치
KR900019203A (ko) 반도체 장치와 반도체 장치를 사용한 전자장치