JP1704964S - プラズマ処理装置用サセプタリング - Google Patents

プラズマ処理装置用サセプタリング

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Publication number
JP1704964S
JP1704964S JP2021008306F JP2021008306F JP1704964S JP 1704964 S JP1704964 S JP 1704964S JP 2021008306 F JP2021008306 F JP 2021008306F JP 2021008306 F JP2021008306 F JP 2021008306F JP 1704964 S JP1704964 S JP 1704964S
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JP
Japan
Prior art keywords
article
processing equipment
plasma processing
suceptoring
outer peripheral
Prior art date
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Active
Application number
JP2021008306F
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English (en)
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Publication date
Application filed filed Critical
Priority to JP2021008306F priority Critical patent/JP1704964S/ja
Priority to TW110305596F priority patent/TWD235887S/zh
Priority to US29/789,775 priority patent/USD1005245S1/en
Application granted granted Critical
Publication of JP1704964S publication Critical patent/JP1704964S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本物品は、半導体製造で使われるプラズマ処理装置に用いられるサセプタリングであり、静電チャックおよびＲＦ給電リングをプラズマから保護するためのものである。本物品は、Ｂ－Ｂ部分拡大図において略横長長方形状で表れる大きな溝を備えており、また、長い外周縁部を備えることで、使用状態及び各部の名称を示す参考図に一例を示すように、使用状態において本物品の外周縁部が内側の構成物を囲う形状としている。
JP2021008306F 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング Active JP1704964S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021008306F JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング
TW110305596F TWD235887S (zh) 2021-04-19 2021-10-18 電漿處理裝置用保護環
US29/789,775 USD1005245S1 (en) 2021-04-19 2021-10-18 Electrode cover for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021008306F JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング

Publications (1)

Publication Number Publication Date
JP1704964S true JP1704964S (ja) 2022-01-14

Family

ID=80217244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021008306F Active JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング

Country Status (3)

Country Link
US (1) USD1005245S1 (ja)
JP (1) JP1704964S (ja)
TW (1) TWD235887S (ja)

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US11387134B2 (en) 2018-01-19 2022-07-12 Applied Materials, Inc. Process kit for a substrate support
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1121576S1 (en) * 2022-07-14 2026-04-07 Applied Materials Inc. Purge ring for a substrate processing chamber
US12553133B2 (en) 2022-08-04 2026-02-17 Applied Materials Inc. Substrate handling system, method, and apparatus
USD1064005S1 (en) 2022-08-04 2025-02-25 Applied Materials, Inc. Grounding ring of a process kit for semiconductor substrate processing
USD1069863S1 (en) * 2022-08-04 2025-04-08 Applied Materials, Inc. Deposition ring of a process kit for semiconductor substrate processing
JP1746404S (ja) * 2023-01-11 2023-06-15 サセプタカバーベース
USD1083043S1 (en) * 2023-03-28 2025-07-08 Mitsubishi Cable Industries, Ltd. Composite seal member for semiconductor production apparatus
JP1782485S (ja) * 2023-09-29 2024-10-17 プラズマ処理装置用サセプタリング
JP1782543S (ja) * 2023-09-29 2024-10-17 プラズマ処理装置用サセプタリング
JP1766095S (ja) * 2023-12-01 2024-03-19 サセプタ
USD1110288S1 (en) * 2024-03-20 2026-01-27 Kokusai Electric Corporation Heat insulation pedestal of a semiconductor manufacturing apparatus

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA127551A (en) * 1909-12-18 1910-08-16 Leon Braquier Confection explosive shell
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
US10003873B2 (en) * 2011-09-06 2018-06-19 Kohler Co. Speaker and shower
JP1546801S (ja) * 2015-06-12 2016-03-28
TWD178425S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的電極板
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
JP1584906S (ja) * 2017-01-31 2017-08-28
JP1598996S (ja) * 2017-08-31 2018-03-05
JP1598998S (ja) * 2017-08-31 2018-03-05
JP1598997S (ja) * 2017-08-31 2018-03-05
USD874617S1 (en) * 2018-02-12 2020-02-04 Chudun Chen Shower drain strainer
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
JP1624795S (ja) * 2018-07-24 2019-02-18
JP1624794S (ja) * 2018-07-24 2019-02-18
JP1624793S (ja) * 2018-07-24 2019-02-18
JP1640255S (ja) * 2018-10-25 2019-09-02
USD934994S1 (en) * 2019-05-09 2021-11-02 Fratelli Fantini S.P.A. Shower head
JP1659287S (ja) 2019-10-18 2020-05-11
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JP1733645S (ja) * 2022-04-25 2023-01-04 半導体処理装置用シャワーヘッド
JP1729106S (ja) * 2022-04-25 2022-11-04 半導体処理装置用シャワーヘッド

Also Published As

Publication number Publication date
USD1005245S1 (en) 2023-11-21
TWD235887S (zh) 2025-01-11

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