JPH01119057U - - Google Patents

Info

Publication number
JPH01119057U
JPH01119057U JP1155388U JP1155388U JPH01119057U JP H01119057 U JPH01119057 U JP H01119057U JP 1155388 U JP1155388 U JP 1155388U JP 1155388 U JP1155388 U JP 1155388U JP H01119057 U JPH01119057 U JP H01119057U
Authority
JP
Japan
Prior art keywords
substrate
support
forming apparatus
reaction chamber
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1155388U
Other languages
English (en)
Other versions
JPH0623567Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988011553U priority Critical patent/JPH0623567Y2/ja
Publication of JPH01119057U publication Critical patent/JPH01119057U/ja
Application granted granted Critical
Publication of JPH0623567Y2 publication Critical patent/JPH0623567Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)

Description

【図面の簡単な説明】
添付図面は本考案成膜装置の概略図である。 １……反応室、２……グロー放電用電極板、３
……基板支持体、６……回転駆動部、７……ヒー
タ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 反応室の内部に円筒状基板が配置され且つ該基
    板の内部に基板を所要温度に加熱するためのヒー
    タが配置され、該基板が回転しながら基板周面に
    成膜形成される成膜装置において、前記基板が基
    板支持体の上に載置され且つ該基板支持体を回転
    させる回転駆動部が反応室外側に設置されて基板
    を所定の速度で回転させ、更にヒータ用電力導入
    部が該基板支持体を貫通するように形成されてい
    ることを特徴とする成膜装置。
JP1988011553U 1988-01-30 1988-01-30 成膜装置 Expired - Lifetime JPH0623567Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988011553U JPH0623567Y2 (ja) 1988-01-30 1988-01-30 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988011553U JPH0623567Y2 (ja) 1988-01-30 1988-01-30 成膜装置

Publications (2)

Publication Number Publication Date
JPH01119057U true JPH01119057U (ja) 1989-08-11
JPH0623567Y2 JPH0623567Y2 (ja) 1994-06-22

Family

ID=31220208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988011553U Expired - Lifetime JPH0623567Y2 (ja) 1988-01-30 1988-01-30 成膜装置

Country Status (1)

Country Link
JP (1) JPH0623567Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007238394A (ja) * 2006-03-09 2007-09-20 Dainippon Printing Co Ltd 金属酸化物膜の製造方法、および、金属酸化物膜の製造装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938375A (ja) * 1982-08-26 1984-03-02 Canon Inc プラズマｃｖｄ装置
JPS6063370A (ja) * 1983-09-16 1985-04-11 Hitachi Koki Co Ltd アモルファス水素化シリコン膜製造装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938375A (ja) * 1982-08-26 1984-03-02 Canon Inc プラズマｃｖｄ装置
JPS6063370A (ja) * 1983-09-16 1985-04-11 Hitachi Koki Co Ltd アモルファス水素化シリコン膜製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007238394A (ja) * 2006-03-09 2007-09-20 Dainippon Printing Co Ltd 金属酸化物膜の製造方法、および、金属酸化物膜の製造装置

Also Published As

Publication number Publication date
JPH0623567Y2 (ja) 1994-06-22

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