JPH0158201B2 - - Google Patents

Info

Publication number
JPH0158201B2
JPH0158201B2 JP54011756A JP1175679A JPH0158201B2 JP H0158201 B2 JPH0158201 B2 JP H0158201B2 JP 54011756 A JP54011756 A JP 54011756A JP 1175679 A JP1175679 A JP 1175679A JP H0158201 B2 JPH0158201 B2 JP H0158201B2
Authority
JP
Japan
Prior art keywords
weight
resin
sandblasting
protective film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54011756A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55103554A (en
Inventor
Takezo Sano
Haruo Inoe
Yoshinobu Hachimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP1175679A priority Critical patent/JPS55103554A/ja
Publication of JPS55103554A publication Critical patent/JPS55103554A/ja
Publication of JPH0158201B2 publication Critical patent/JPH0158201B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP1175679A 1979-02-02 1979-02-02 Photosensitive resin composition for sand blast resist Granted JPS55103554A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1175679A JPS55103554A (en) 1979-02-02 1979-02-02 Photosensitive resin composition for sand blast resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1175679A JPS55103554A (en) 1979-02-02 1979-02-02 Photosensitive resin composition for sand blast resist

Publications (2)

Publication Number Publication Date
JPS55103554A JPS55103554A (en) 1980-08-07
JPH0158201B2 true JPH0158201B2 (de) 1989-12-11

Family

ID=11786824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1175679A Granted JPS55103554A (en) 1979-02-02 1979-02-02 Photosensitive resin composition for sand blast resist

Country Status (1)

Country Link
JP (1) JPS55103554A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115845A (ja) * 1988-10-26 1990-04-27 Tokyo Ohka Kogyo Co Ltd サンドブラスト用光重合性組成物及びこれを用いた彫刻方法
TW475098B (en) 1995-10-27 2002-02-01 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition and photosensitive resin laminated film containing the same
TW322680B (de) * 1996-02-29 1997-12-11 Tokyo Ohka Kogyo Co Ltd
JP2000066391A (ja) 1998-08-17 2000-03-03 Tokyo Ohka Kogyo Co Ltd サンドブラスト用感光性組成物及びそれを用いた感光性フィルム
JP2002148802A (ja) 2000-11-07 2002-05-22 Tokyo Ohka Kogyo Co Ltd サンドブラスト用感光性組成物及びそれを用いた感光性フィルム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522831B2 (de) * 1973-08-31 1977-01-24
JPS5226095A (en) * 1975-08-21 1977-02-26 Sumitomo Chem Co Ltd Patterning method
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン （株） スクリ−ン版用感光性組成物及び感光膜

Also Published As

Publication number Publication date
JPS55103554A (en) 1980-08-07

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