JPH0194969A - Sample stand of spin coater - Google Patents
Sample stand of spin coaterInfo
- Publication number
- JPH0194969A JPH0194969A JP62249596A JP24959687A JPH0194969A JP H0194969 A JPH0194969 A JP H0194969A JP 62249596 A JP62249596 A JP 62249596A JP 24959687 A JP24959687 A JP 24959687A JP H0194969 A JPH0194969 A JP H0194969A
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- substrate
- sample stand
- spin coater
- square base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、液晶表示体の基板の製造工程で基板上に均一
な塗膜を行なうために用いるスピンコーターにおいて、
基板を固定し回転を加える機能を有する試料台の形状に
関するものである。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a spin coater used for forming a uniform coating film on a substrate in the manufacturing process of a substrate for a liquid crystal display.
This relates to the shape of a sample stage that has the function of fixing a substrate and applying rotation.
(従来の技術〕
従来のスピンコーターの試料台は、塗膜を行なう基板よ
りも小さく作られることが一般的であった。これは、基
板の試料台への脱着を容易にするためと、塗液が試料台
にかかることをきらったためである。(Prior art) The sample stage of a conventional spin coater was generally made smaller than the substrate to be coated. This was because they did not want the liquid to get on the sample stage.
しかし、前述の従来技術では、多角形基板シ・:特に四
角形基板の内接円内となる領域は膜厚が均一となる塗膜
ができるものの、その外部の領域は回転時に基板端面か
ら発生する乱流により低圧となるため膜厚が厚くなって
有効に利用できないという問題点を有する。However, with the above-mentioned conventional technology, a coating film with a uniform thickness can be produced on a polygonal substrate: especially in the area within the inscribed circle of a rectangular substrate, but in the area outside of the inscribed circle, coating film is formed from the edge surface of the substrate during rotation. The problem is that the turbulent flow creates a low pressure, resulting in a thick film that cannot be used effectively.
そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは多角形基板内接円の外部の領域に
も内接円内と同様に均一な膜厚の塗膜を行なう方法を提
供するところKある。The present invention is intended to solve these problems, and its purpose is to provide a method for coating a polygonal substrate with a uniform film thickness in areas outside the inscribed circle as well as in the inscribed circle. There are K places that offer this.
(問題点を解決するための手段〕
本発明のスピンコーターの試料台は、基板が載置固定さ
れており、回転機能を有するスピンコーターの試料台に
おいて、該試料台が、該試料台の回転中心を中心とする
前記基板の内接円より大きい径を有する円板であり、該
円板と前記基板との固定面が、前記基板固定領域内で且
つ前記基板の板厚に相当する深さの凹部な有することを
特徴とする。(Means for Solving the Problems) The spin coater sample stand of the present invention has a substrate placed and fixed thereon, and has a rotating function. A disk having a diameter larger than an inscribed circle of the substrate centered at the center, and a fixing surface between the disk and the substrate is within the substrate fixing area and at a depth corresponding to the thickness of the substrate. It is characterized by having a concave portion.
本発明の上記の構・成によれば、円板状をなす試料台の
多角形基板固定領域において、ガラス端面からの乱流が
発生しないためこの影響を受けることなく塗膜を行なう
ことができ、あらゆる多角形基板の内接円内と同様な膜
厚を持ち有効に利用できる領域を拡大することができる
。According to the above structure of the present invention, turbulent flow from the end face of the glass does not occur in the area where the polygonal substrate is fixed on the disk-shaped sample stage, so that coating can be performed without being affected by this. , it is possible to expand the area that can be effectively used with a film thickness similar to that within the inscribed circle of any polygonal substrate.
第1図は本発明によるスピンコーターの試料台とそこに
固定された四角形基板を示す平面図である。FIG. 1 is a plan view showing a sample stage of a spin coater according to the present invention and a rectangular substrate fixed thereto.
試料台は、回転中心1を中心とする円板2を四角形基板
固定領域3について四角形基板4の板厚だけさらい加工
を行なったものである。さらに四角形基板固定領域3に
は四角形基板4を固定する目的で真空吸着を行なう吸着
溝5が加工されている。また、四角形基板固定領域5の
ある面の裏面は、試料台に艙動源からの回転を伝えるた
めの回転軸が固定されている。The sample stage is obtained by processing a circular plate 2 centered on the rotation center 1 by cleaning the rectangular substrate fixing area 3 by the thickness of the rectangular substrate 4. Furthermore, suction grooves 5 are machined in the rectangular substrate fixing area 3 to perform vacuum suction for the purpose of fixing the rectangular substrate 4. Further, on the back side of the surface where the rectangular substrate fixing area 5 is located, a rotation axis for transmitting rotation from the sliding source to the sample stage is fixed.
この試料台を用いてスピンコーFを行なった場合試料台
の四角形基板固定領域5のある面は、四角形基板4を置
くことによりもとの平面となるので回転時にガラス端面
から乱流が発生しない。そこで本発明による試料台を用
いて四角形基板4にスピンフートを行なった場合、四角
形基板固定領域5について均一な塗膜を行なうことがで
きた。When spinco F is performed using this sample stage, the surface of the sample stage with the rectangular substrate fixing area 5 becomes the original plane by placing the rectangular substrate 4, so no turbulent flow is generated from the end face of the glass during rotation. Therefore, when spin footing was performed on the rectangular substrate 4 using the sample stage according to the present invention, a uniform coating film could be formed on the rectangular substrate fixing area 5.
これは、試料台の円板2を1枚の基板に見たててこれに
スピンコードな行なうのと同様である。This is similar to treating the disk 2 on the sample stage as a single substrate and performing a spin code on it.
ここで円板2の大きさは均一な塗膜を得ることのできる
有効面積を増やす意味から少なくとも四角形基板の内接
円6より大きいことが必要である、また逆に円板2の大
きさが四角形基板の外接円 。Here, the size of the disk 2 needs to be at least larger than the inscribed circle 6 of the rectangular substrate in order to increase the effective area that can obtain a uniform coating film. Circumcircle of a rectangular board.
7より大きくなることは、その有効面積を拡大する効果
において円板2が四角形基板の外接円7と同様の大きさ
である場合と変わりなく、一方で円板の慣性モーメント
が増し、より強力な駆動力が必要になるため望ましくな
い。7 is the same as when the disk 2 has the same size as the circumscribed circle 7 of a rectangular substrate in the effect of expanding its effective area, but on the other hand, the moment of inertia of the disk increases and it becomes more powerful. This is undesirable because it requires driving force.
有効面積という観点から円板2の大きさは、四角形基板
の外接円7と同機であることが望ましい、しかし、基板
の脱着を考えると、円板2を四角形基板の外接円7より
少し小さくし、四角形基板4の四端を支持できるように
するのが理想的である。From the viewpoint of effective area, it is desirable that the size of the disk 2 is the same as the circumscribed circle 7 of the rectangular board.However, considering the attachment and detachment of the board, the size of the disk 2 should be slightly smaller than the circumscribed circle 7 of the rectangular board. Ideally, the four ends of the rectangular substrate 4 can be supported.
また、本実施例において多角形基板は四角形である場合
の例を示したが、角を落した形状や他の多角形でも同様
の効果が得られることは言うまでもない。Further, in this embodiment, an example was shown in which the polygonal substrate is a square, but it goes without saying that similar effects can be obtained with a shape with rounded corners or other polygons.
以上述べたように本発明によれば、スピンコーターの試
料台を回転中心を中心とする四角形基板の内接円より大
きな円板を前記四角形基板固定領域について前記四角形
基板の厚さだけさらい加工した形状とすることにより、
四角形基板上の均一な塗膜を得ることのできる有効面積
が、四角形基板固定領域まで拡大するという効果を有す
る!As described above, according to the present invention, a disk larger than the inscribed circle of the rectangular substrate centered around the rotation center of the sample stage of the spin coater is processed by sweeping the rectangular substrate fixing area by the thickness of the rectangular substrate. By making the shape,
This has the effect of expanding the effective area on which a uniform coating film can be obtained on the square substrate to the fixed area of the square substrate!
第1図は、本発明によるスピンコーターの試料台に四角
形基板を固定したところを示す平面図。、1・・・・・
・・・・回転中心
2・・・・・・・・・円 板
3・・・・・・・・・四角形基板固定領域4・・・・・
・・・・四角形基板
5・・・・・・・・・吸着溝FIG. 1 is a plan view showing a rectangular substrate fixed to a sample stage of a spin coater according to the present invention. , 1...
...Rotation center 2...Circle Plate 3...Rectangular board fixing area 4...
...Square board 5 ...... Suction groove
Claims (1)
コーターの試料台において、該試料台が、該試料台の回
転中心を中心とする前記基板の内接円より大きい径を有
する円板であり、該円板と前記基板との固定面が、前記
基板固定領域内で且つ前記基板の板厚に相当する深さの
凹部を有することを特徴とするスピンコーターの試料台
。In a sample stand of a spin coater on which a substrate is mounted and fixed and has a rotation function, the sample stand is a disk having a diameter larger than an inscribed circle of the substrate centered on the rotation center of the sample stand. . A sample stage for a spin coater, wherein a fixing surface between the disk and the substrate has a recess within the substrate fixing area and having a depth corresponding to the thickness of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62249596A JPH0194969A (en) | 1987-10-02 | 1987-10-02 | Sample stand of spin coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62249596A JPH0194969A (en) | 1987-10-02 | 1987-10-02 | Sample stand of spin coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0194969A true JPH0194969A (en) | 1989-04-13 |
Family
ID=17195367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62249596A Pending JPH0194969A (en) | 1987-10-02 | 1987-10-02 | Sample stand of spin coater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0194969A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024102847A (en) * | 2023-01-19 | 2024-07-31 | エスケー エンパルス カンパニー リミテッド | Blank mask manufacturing apparatus and method for manufacturing blank mask |
| JP2024102848A (en) * | 2023-01-19 | 2024-07-31 | エスケー エンパルス カンパニー リミテッド | Blank mask manufacturing apparatus and method for manufacturing blank mask |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6295172A (en) * | 1985-10-21 | 1987-05-01 | Hitachi Ltd | Rotary coating device |
-
1987
- 1987-10-02 JP JP62249596A patent/JPH0194969A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6295172A (en) * | 1985-10-21 | 1987-05-01 | Hitachi Ltd | Rotary coating device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024102847A (en) * | 2023-01-19 | 2024-07-31 | エスケー エンパルス カンパニー リミテッド | Blank mask manufacturing apparatus and method for manufacturing blank mask |
| JP2024102848A (en) * | 2023-01-19 | 2024-07-31 | エスケー エンパルス カンパニー リミテッド | Blank mask manufacturing apparatus and method for manufacturing blank mask |
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