JPH0216556U - - Google Patents
Info
- Publication number
- JPH0216556U JPH0216556U JP9412288U JP9412288U JPH0216556U JP H0216556 U JPH0216556 U JP H0216556U JP 9412288 U JP9412288 U JP 9412288U JP 9412288 U JP9412288 U JP 9412288U JP H0216556 U JPH0216556 U JP H0216556U
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- disk
- current
- electrons
- primary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004069 differentiation Effects 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 230000010354 integration Effects 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は、この考案の一実施例に係るイオン処
理装置の中性化制御回路の回路図である。第２図
は、この考案の背景となるイオン処理装置の一例
を示す要部構成図である。第３図は、第２図中の
中性化制御回路の先行例の回路図である。
２……イオンビーム、４……デイスク、６……
ウエハ、１０……ニユートラルカツプ、１４……
フイラメント、１６……フイラメント電源、２４
……デイスク電流計測抵抗、３４……設定回路、
３６……演算回路、３７……積分回路、３８……
制御回路、４０……中性化制御回路、４２……微
分・反転回路。
FIG. 1 is a circuit diagram of a neutralization control circuit of an ion processing apparatus according to an embodiment of this invention. FIG. 2 is a block diagram of essential parts showing an example of an ion processing apparatus which is the background of this invention. FIG. 3 is a circuit diagram of a prior example of the neutralization control circuit in FIG. 2. 2...Ion beam, 4...Disk, 6...
Wafer, 10... Neutral cup, 14...
Filament, 16...Filament power supply, 24
...Disk current measurement resistor, 34...Setting circuit,
36...Arithmetic circuit, 37...Integrator circuit, 38...
Control circuit, 40...neutralization control circuit, 42...differentiation/inversion circuit.
Claims (1)
クに装着されたウエハにイオンビームを照射して
当該ウエハを処理する装置であつて、一次電子を
放出する一次電子放出源と、この一次電子を受け
て二次電子を放出する二次電子放出源とを備え、
この二次電子をイオンビーム照射領域におけるウ
エハに供給するようにしたものにおいて、前記デ
イスクに流れるデイスク電流を計測するデイスク
電流計測回路と、所望のデイスク電流を設定する
設定回路と、デイスク電流計測回路によつて計測
されたデイスク電流と設定回路によつて設定され
たデイスク電流との差を求める演算回路と、この
差を積分する積分回路と、この積分回路に並列に
接続されていて前記差を微分すると共にその前ま
たは後で極性反転させる微分・反転回路と、積分
回路からの出力と微分・反転回路からの出力の和
に応じて前記一次電子放出源を制御してそこから
放出する一次電子の量を制御する制御回路とを備
えることを特徴とするイオン処理装置。 This device processes a wafer mounted on a disk that is rotated and translated in a vacuum chamber by irradiating the wafer with an ion beam, and includes a primary electron emission source that emits primary electrons, and a secondary electron source that receives the primary electrons. A secondary electron emission source that emits secondary electrons,
In an apparatus for supplying these secondary electrons to a wafer in an ion beam irradiation area, there is provided a disk current measuring circuit for measuring a disk current flowing through the disk, a setting circuit for setting a desired disk current, and a disk current measuring circuit. an arithmetic circuit that calculates the difference between the disc current measured by the disc current and the disc current set by the setting circuit; an integrator circuit that integrates this difference; A differentiation/inversion circuit that differentiates and inverts the polarity before or after the differentiation, and primary electrons that control the primary electron emission source according to the sum of the output from the integration circuit and the output from the differentiation/inversion circuit and emit the primary electrons from there. An ion processing device comprising: a control circuit for controlling the amount of
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9412288U JPH0216556U (en) | 1988-07-16 | 1988-07-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9412288U JPH0216556U (en) | 1988-07-16 | 1988-07-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0216556U true JPH0216556U (en) | 1990-02-02 |
Family
ID=31318622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9412288U Pending JPH0216556U (en) | 1988-07-16 | 1988-07-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0216556U (en) |
-
1988
- 1988-07-16 JP JP9412288U patent/JPH0216556U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0216556U (en) | ||
| JPH0214358U (en) | ||
| JPH03104948U (en) | ||
| JPS63109438U (en) | ||
| JP2702987B2 (en) | Ion beam processing equipment | |
| JPH02131258U (en) | ||
| JPH0424255U (en) | ||
| JPH0737232Y2 (en) | Ion beam irradiation device | |
| JPH0310461U (en) | ||
| JP2665958B2 (en) | Control device for ion implanter | |
| JPH0424254U (en) | ||
| JPH01154489U (en) | ||
| JPS63953A (en) | Ion radiating device | |
| JPH04357657A (en) | Ion treatment device | |
| JPH0518839Y2 (en) | ||
| JPH025349A (en) | Device for detecting abnormality in disk current | |
| JPH0424253U (en) | ||
| JPS63109437U (en) | ||
| JPS6335399Y2 (en) | ||
| JPH0384842A (en) | Ion processor | |
| JPS6348930Y2 (en) | ||
| JPH0455752U (en) | ||
| JPS58199677A (en) | Electron beam welding device | |
| JPH0229151U (en) | ||
| JPH0162651U (en) |