JPH02198162A - Lead frame for semiconductor device and manufacture thereof - Google Patents

Lead frame for semiconductor device and manufacture thereof

Info

Publication number
JPH02198162A
JPH02198162A JP1830789A JP1830789A JPH02198162A JP H02198162 A JPH02198162 A JP H02198162A JP 1830789 A JP1830789 A JP 1830789A JP 1830789 A JP1830789 A JP 1830789A JP H02198162 A JPH02198162 A JP H02198162A
Authority
JP
Japan
Prior art keywords
lead frame
protrusion
diameter
semiconductor device
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1830789A
Other languages
Japanese (ja)
Other versions
JPH0695560B2 (en
Inventor
Satoru Kobayashi
悟 小林
Toshikatsu Tsunehiro
経広 敏克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1830789A priority Critical patent/JPH0695560B2/en
Publication of JPH02198162A publication Critical patent/JPH02198162A/en
Publication of JPH0695560B2 publication Critical patent/JPH0695560B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Lead Frames For Integrated Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、半導体装置用リードフレームに関するもので
あり、特に半導体装置の組立作業を容易にするために使
用されるもので、半導体装置組立時にリードフレームの
二枚型さなりを防止するものである。
[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention relates to a lead frame for semiconductor devices, and in particular is used to facilitate the assembly work of semiconductor devices. This is to prevent the lead frame from becoming two-piece when assembling a semiconductor device.

(従来の技術) 従来技術により成形した半導体装置用リードフレームの
凸起部の断面形状を、第3図にリードフレーム1を3枚
積重ねした状態で図示する。
(Prior Art) FIG. 3 shows a cross-sectional shape of a convex portion of a lead frame for a semiconductor device formed by a conventional technique in a state where three lead frames 1 are stacked.

即ち各リードフレームは、組み立て作業時に複数枚積み
重ねられ、その後1枚1枚つかみ上げるために、隣接リ
ードフレーム間に隙間を要するが、この隙間を形成する
ためには、リードフレーム面に凸起2が必要となる。通
常この凸起は、リードフレームの板厚Tに対し所要の高
さHを得るために、打ち出しく半抜き)加工で形成され
る。即ち図示しないプレス金型の直径D1のパンチで、
材厚Tのリードフレーム素材に打ち出しく半抜き)加工
を施し、高さHの凸起2を形成する。このとき凸起形成
用パンチ径D とダイ径D2はほぼ同一径であった。リ
ードフレームを積重ねしたときの隙間Cは、凸起高さH
を平均0.4關とした時、平均0.3mmであった。
In other words, a plurality of lead frames are stacked during assembly, and in order to pick up each lead frame one by one, a gap is required between adjacent lead frames. Is required. Normally, these protrusions are formed by stamping or half punching in order to obtain a required height H relative to the plate thickness T of the lead frame. That is, with a punch having a diameter D1 of a press die (not shown),
A lead frame material with a thickness T is punched out (half punched) to form a protrusion 2 with a height H. At this time, the protrusion-forming punch diameter D and the die diameter D2 were approximately the same diameter. The gap C when lead frames are stacked is the protrusion height H
When the average distance was 0.4 mm, the average distance was 0.3 mm.

(発明が解決しようとする課題) ■)第4図に示す半導体リードフレーム1では、凸起2
が6ケ所配置されているが、リードフレームを板厚方向
に第3図の如く積上げした時、凸起部のコーナーだれ3
の所が、凸起形成用パンチの跡の穴(凹み)4に嵌まり
合い、1枚のリードフレームを吸盤又は爪等でつかみ上
げようとしても、その下側の1枚〜2枚が同時につかみ
上げられてしまい、半導体装置組立機械のワーク供給異
状となる問題点があった。
(Problem to be solved by the invention) ■) In the semiconductor lead frame 1 shown in FIG.
are arranged at six locations, but when the lead frames are stacked in the thickness direction as shown in Figure 3, the corners of the protrusions sag 3.
The lead frame fits into the hole (recess) 4 left by the protrusion forming punch, and even if you try to pick up one lead frame with a suction cup or nail, the lower one or two lead frames will fall at the same time. There was a problem in that the workpiece was picked up, causing an abnormality in the supply of workpieces to the semiconductor device assembly machine.

2) また積重ね枚数が多くなれば多くなる程、リード
フレーム自重が大きくなるため、凸起部が強く嵌まる問
題があった。さらに凸起部が6ケ所共同−量嵌まり込む
事は少なく、吸盤又は爪でつかみ上げるべく、リードフ
レームを水平に積上げしようとしても、嵌まり込み具合
の差により、最下層リードフレームが水平な状態であっ
ても、数十枚積上げした最上層リードフレームは、リー
ドフレームの板厚以上の傾斜が発生しバキューム吸着不
可や爪によるつかみ不可等の問題があった。
2) Furthermore, as the number of stacked lead frames increases, the weight of the lead frame increases, which causes the problem that the protrusions fit tightly together. Furthermore, the six protrusions rarely get stuck together, and even if you try to stack the lead frames horizontally to pick them up with a suction cup or claw, the bottom lead frame will not be horizontal due to the difference in how well they fit together. Even in this state, the top layer lead frames stacked up in tens of sheets have a slope that is greater than the thickness of the lead frame, causing problems such as being unable to be vacuum-sucked or gripped with nails.

3)また嵌まり込み防止のため、凸起径D2を穴径D1
より大きくすると、凸起高さが低くなり、爪がつかむた
めに必要な積重ね隙間Cが規格値0.3mmミニマムを
満足できない欠点があった。
3) Also, to prevent jamming, the convex diameter D2 is the hole diameter D1.
If it is made larger, the height of the protrusions becomes lower, and there is a drawback that the stacking gap C required for the claw to grip cannot satisfy the minimum standard value of 0.3 mm.

本発明は、半導体装置の組立作業時に、リードフレーム
を水平に積上げする時に、リードフレーム1枚1枚が水
平に積上げできると共に、最上層の1枚をつかみ上げす
る時確実に1枚つかみ上げできる様にする事を目的とす
る。
According to the present invention, when stacking lead frames horizontally during semiconductor device assembly work, each lead frame can be stacked horizontally one by one, and when one of the top layers is picked up, it is possible to reliably pick up one lead frame. The purpose is to make it similar.

[発明の構成] (課題を解決するための手段と作用) 本発明は、リードフレームの板厚方向に凸起を有する半
導体装置用リードフレームにおいて、前記リードフレー
ムの凸起成形用穴径が前記凸起の径より小さく、また凸
起の中央付近に凹みを有することを特徴とする半導体装
置用リードフレームである。また本発明は、リードフレ
ームに、その板厚方向に打ち出し凸起を設け、この凸起
の上部中央付近に凹みを設けて前記凸起径を押し広げ、
この凸起径を前記打ち出し凸起成形時に形成される凹み
の径より大とすることを特徴とする半導体装置用リード
フレームの製造方法である。
[Structure of the Invention] (Means and Effects for Solving the Problems) The present invention provides a lead frame for a semiconductor device having a protrusion in the thickness direction of the lead frame, in which the diameter of the hole for forming the protrusion of the lead frame is This is a lead frame for a semiconductor device characterized by having a recess that is smaller in diameter than the protrusion and near the center of the protrusion. Further, the present invention provides a lead frame with a protrusion punched out in the thickness direction thereof, and a recess is provided near the center of the upper part of the protrusion to expand the diameter of the protrusion.
This method of manufacturing a lead frame for a semiconductor device is characterized in that the diameter of the protrusion is made larger than the diameter of the recess formed during the stamping and protrusion molding.

即ち本発明は、リードフレームの嵌まり合いを、凸起部
中央に設けた凹みにより凸起直径を拡大させて、凸起形
成用凹みに嵌まり合う事を防止し、確実に1枚1枚が爪
又は吸盤でつかみ上げ可能にした。また、凸起中央部に
直径拡大用凹みを形成すると同時に、打ち出し加工を用
いたことで、凸起高さを精度良く加圧形成できる事によ
り、リードフレームを多数枚積上げした時、例えば6ケ
所の凸起がバランス良くリードフレームを水平に保持で
きると共に、リードフレーム間の隙間の規格値を精度よ
く確保できる様にした。
That is, the present invention prevents the lead frames from fitting into each other by enlarging the diameter of the protrusion using the recess provided at the center of the protrusion, thereby ensuring that each lead frame is fitted one by one. can be picked up with a claw or suction cup. In addition, by forming a diameter-enlarging recess in the center of the protrusion and at the same time using punching, the height of the protrusion can be press-formed with high precision. The protrusions of the lead frame can be held horizontally in a well-balanced manner, and the standard value of the gap between the lead frames can be maintained with high precision.

(実施例) 以下図面を参照して本発明の一実施例を説明する。第1
図は同実施例のリードフレームの凸起部での積重ね状態
を示す断面図、第2図は同リードフレームの凸起形成用
凹を示す金型部の断面図であるが、この実施例は前記従
来例と対応させた場合の例であるから、対応個所には同
一符号を用いる。ここでの特徴は、リードフレーム1の
凸起成形用凹み4の径d が、凸起2、の径d2とdl
くd2の関係にあり、この関係をもたせるために、凸起
中央付近に凹み11を有することである。
(Example) An example of the present invention will be described below with reference to the drawings. 1st
The figure is a cross-sectional view showing the stacked state of the lead frame at the protrusion part of the same embodiment, and FIG. 2 is a cross-sectional view of the mold part showing the concave part for forming the protrusion of the lead frame. Since this is an example corresponding to the conventional example, the same reference numerals are used for corresponding parts. The feature here is that the diameter d of the recess 4 for forming the protrusion on the lead frame 1 is the same as the diameter d2 of the protrusion 2 and dl.
In order to maintain this relationship, a recess 11 is provided near the center of the protrusion.

次に第2図により、第1図のリードフレームのつくり方
の一例を説明する。ダイ(凸起成形工具の凸側)21上
面にリードフレーム素材1を供給し、ストリッパー(凸
起成形工具の凹側)22でダイ21に強く素材1を押し
つけた状態で、凸起形成パンチ23を上方に押し上げす
る。つぎに上側から凸起拡大用パンチ24を押し下げて
、ストリッパー22の内径d2に密着するまで加圧する
Next, referring to FIG. 2, an example of how to make the lead frame shown in FIG. 1 will be explained. The lead frame material 1 is supplied onto the upper surface of the die (convex side of the protrusion forming tool) 21, and the material 1 is strongly pressed against the die 21 by the stripper (concave side of the protrusion forming tool) 22, and the protrusion forming punch 23 is applied. push upward. Next, the protrusion enlarging punch 24 is pushed down from above and pressurized until it comes into close contact with the inner diameter d2 of the stripper 22.

このd の径は凸起形成パンチ径d1より大きな寸法に
設定する。実施例ではdl−1,2m+w、d2” 1
.5m+*、また、パンチ23の押し上げ量h2は凸起
高さh3を高くするためにあまりに大きくしすぎると、
リードフレーム素材1と凸起2□とが破断してしまうた
め、板厚t−0,6mmの時、パンチ押し上げm h 
2−0 、4 m+sとした。また凸起拡大用パンチ2
4の先端Rと角度θは、リードフレーム素材1が内径d
2に密着しやすい様にR−0,25關、θ−60″、押
し込み深さり、−0,45關とし、充分押し込みして凸
起高さh3の寸法が安定する様にした。その結果凸起高
さ63寸法は0.44±0 、02 mmであり、隙間
Cの規格値0.3mmミニマムを充分確保できた。
The diameter of this d is set to be larger than the convexity forming punch diameter d1. In the example, dl-1, 2m+w, d2" 1
.. 5m+*, and if the push-up amount h2 of the punch 23 is made too large in order to increase the protrusion height h3,
Because the lead frame material 1 and the protrusion 2□ break, when the plate thickness is t-0.6 mm, the punch is pushed up m h
2-0, 4 m+s. Also, punch 2 for enlarging protrusions
4, the tip R and the angle θ are based on the inner diameter d of the lead frame material 1.
2, the R-0,25 angle, θ-60'', and the pushing depth were set to -0,45 inch, so that the height of the protrusion h3 was stabilized by pushing it in enough.As a result. The height of the protrusion 63 was 0.44±0.02 mm, and the minimum standard value of the gap C of 0.3 mm was sufficiently secured.

第1図、第2図のようにすれば、 ■)凸起拡大用ポンチで凸起径を十分押し広げするため
、リードフレームを積重ねた時凸起2、が凹み4に嵌ま
り合う事が防止できた。
If you do it as shown in Figures 1 and 2, ■) The diameter of the protrusion is sufficiently expanded using the protrusion enlarging punch, so that when the lead frames are stacked, the protrusions 2 and 2 will fit into the recesses 4. It could have been prevented.

2)凸起高さ方向の寸法を正確に形成できた事により、
6ケ所の凸起1のバラツキが少なく、リードフレームを
積重ねた時に、吸盤又は爪でつかみやすい水平状態を保
つことができると共に、リードフレーム間すき間Cを規
格値に保持できる。
2) By being able to accurately form the height dimension of the protrusion,
There is little variation in the protrusions 1 at six locations, and when the lead frames are stacked, they can be kept in a horizontal state that is easy to grip with a suction cup or a claw, and the gap C between the lead frames can be maintained at a standard value.

3)半導体装置組立機械の稼動率が、上記1)。3) The operating rate of the semiconductor device assembly machine is the same as 1) above.

2)の効果により5%向上した。Due to the effect of 2), it improved by 5%.

4) また、半導体リードフレームのプレス加工後の洗
浄工程において、リードフレームが凸起により密着する
事が無いため、洗浄液が充分リードフレーム表面に当た
り、良好に洗浄できるという付随効果も有る。
4) In addition, in the cleaning process after pressing the semiconductor lead frame, since the lead frame does not come into close contact with each other due to the protrusions, the cleaning liquid sufficiently hits the lead frame surface, resulting in the additional effect that the lead frame can be cleaned well.

[発明の効果コ 以上説明した如く本発明によれば、半導体装置の組立作
業時に、各リードフレームを水平に積上げることができ
ると共に、最上層の一枚を確実につかみ上げできる等の
利点を有するものである。
[Effects of the Invention] As explained above, according to the present invention, lead frames can be stacked horizontally during assembly of semiconductor devices, and one of the top layers can be reliably picked up. It is something that you have.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の要部の積重ね状態を示す断
面図、第2図は同実施例を得る工程の断面図、第3図は
従来のリードフレームの積重ね状態を示す断面図、第4
図(a)はリードフレームの平面図、同図(b)は同側
面図である。 1・・・リードフレーム、2□・・・凸起、4,11・
・・凹み、21・・・ダイ、22・・・ストリッパー 
23・・・凸起形成用パンチ、24・・・凸起拡大用パ
ンチ。 出願人代理人  弁理士 鈴江武彦 第1図 第3図 (a) (b) 第2図 第4図
FIG. 1 is a cross-sectional view showing a stacked state of essential parts of an embodiment of the present invention, FIG. 2 is a cross-sectional view of the process of obtaining the same embodiment, and FIG. 3 is a cross-sectional view showing a stacked state of conventional lead frames. , 4th
Figure (a) is a plan view of the lead frame, and figure (b) is a side view of the lead frame. 1...Lead frame, 2□...Protrusion, 4,11.
...dent, 21...die, 22...stripper
23... Punch for forming protrusions, 24... Punch for enlarging protrusions. Applicant's agent Patent attorney Takehiko Suzue Figure 1 Figure 3 (a) (b) Figure 2 Figure 4

Claims (2)

【特許請求の範囲】[Claims] (1)リードフレームの板厚方向に凸起を有する半導体
装置用リードフレームにおいて、前記リードフレームの
凸起成形用穴径が前記凸起の径より小さく、また凸起の
中央付近に凹みを有することを特徴とする半導体装置用
リードフレーム。
(1) In a lead frame for a semiconductor device having a protrusion in the thickness direction of the lead frame, the diameter of the hole for forming the protrusion in the lead frame is smaller than the diameter of the protrusion, and the protrusion has a recess near the center thereof. A lead frame for semiconductor devices characterized by the following.
(2)リードフレームに、その板厚方向に打ち出し凸起
を設け、この凸起の上部中央付近に凹みを設けて前記凸
起径を押し広げ、この凸起径を前記打ち出し凸起成形時
に形成される凹みの径より大とすることを特徴とする半
導体装置用リードフレームの製造方法。
(2) Providing a punched convexity in the thickness direction of the lead frame, providing a recess near the center of the upper part of this convexity to push out the diameter of the convexity, and forming this convex diameter during the punching convexity forming process. A method for manufacturing a lead frame for a semiconductor device, characterized in that the diameter of the lead frame is larger than that of a recess.
JP1830789A 1989-01-27 1989-01-27 Lead frame for semiconductor device and manufacturing method thereof Expired - Fee Related JPH0695560B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1830789A JPH0695560B2 (en) 1989-01-27 1989-01-27 Lead frame for semiconductor device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1830789A JPH0695560B2 (en) 1989-01-27 1989-01-27 Lead frame for semiconductor device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH02198162A true JPH02198162A (en) 1990-08-06
JPH0695560B2 JPH0695560B2 (en) 1994-11-24

Family

ID=11967957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1830789A Expired - Fee Related JPH0695560B2 (en) 1989-01-27 1989-01-27 Lead frame for semiconductor device and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0695560B2 (en)

Also Published As

Publication number Publication date
JPH0695560B2 (en) 1994-11-24

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