JPH024055B2 - - Google Patents

Info

Publication number
JPH024055B2
JPH024055B2 JP1058184A JP1058184A JPH024055B2 JP H024055 B2 JPH024055 B2 JP H024055B2 JP 1058184 A JP1058184 A JP 1058184A JP 1058184 A JP1058184 A JP 1058184A JP H024055 B2 JPH024055 B2 JP H024055B2
Authority
JP
Japan
Prior art keywords
magnetic
substrate
light
introduction hole
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1058184A
Other languages
Japanese (ja)
Other versions
JPS59139125A (en
Inventor
Kyotaka Wasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59010581A priority Critical patent/JPS59139125A/en
Publication of JPS59139125A publication Critical patent/JPS59139125A/en
Publication of JPH024055B2 publication Critical patent/JPH024055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/187Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23Gap features
    • G11B5/232Manufacture of gap

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は磁気ギヤツプの形成法に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of forming a magnetic gap.

従来例の構成とその問題点 磁気ヘツドの分野において、その磁気ギヤツプ
を再現性よくかつ生産性よく形成することが強く
望まれており、近年そのスペーサ薄膜をスパツタ
蒸着法で形成することが広く行なわれるようにな
つている。このような方法で薄膜を形成する場
合、その膜厚をモニタする必要がある。
Conventional configurations and their problems In the field of magnetic heads, there is a strong desire to form magnetic gaps with good reproducibility and productivity, and in recent years it has become widely used to form spacer thin films by sputter deposition. It's starting to become easier. When forming a thin film using such a method, it is necessary to monitor the film thickness.

従来蒸着膜の蒸着中の膜厚モニタは例えば水晶
共振子上に蒸着膜を付着させ、蒸着膜の付着によ
る共振周波数の変化から求めたり、あるいは被膜
を付着すべき基板上に光を導き、基板面及びこの
基板に付着した薄膜表面からの反射する上記光の
相互干渉強度から求めたりしていた。
Conventionally, to monitor the thickness of a deposited film during deposition, for example, the deposited film is deposited on a crystal resonator, and the resonant frequency is determined from the change in resonance frequency caused by the deposition of the deposited film. It was determined from the mutual interference intensity of the light reflected from the surface and the surface of the thin film attached to the substrate.

第1図は従来の光相互干渉を用いたスパツタ蒸
着装置と膜厚モニタ装置の要部を示し、1はター
ゲツト電極、2はこのターゲツト電極1を取り囲
む基板ホールダ、6はスパツタ装置基台を示す。
蒸着すべき基板3は基板ホールダ2上に保持す
る。この場合、上記基板ホールダ2に光導入孔4
を設け、この光導入孔4を介して光線5を外部か
ら導入し、基板3の表面に導く。基板3表面から
反射した光は再び上記光導入孔4を通して外部に
導出し、この反射光の強度の時間的変化を蒸着中
に観測すると、例えば第2図のごとき振動特性が
得られ、この振動の周期より蒸着膜の蒸着中の膜
厚が得られる。第2図において、nは蒸着膜にお
ける光の屈折率、λは導入光線の光の波長を示
す。この種の膜厚モニタ装置は、透明な蒸着膜の
膜厚モニタ用として有効であるが、導入孔付近で
は蒸着膜の膜厚分布が大きくなり、均一な膜厚の
被膜を基板上に形成するには導入孔近くには基板
を配置できなく、そのため基板の加工数が減少す
るという欠点があつた。特に磁気ヘツドの磁気ギ
ヤツプをスペーサ薄膜で形成する場合、極めて均
一な膜厚分布が要求され、上記欠点の解決が要望
されている。
Fig. 1 shows the main parts of a conventional sputter deposition apparatus and film thickness monitoring apparatus using mutual optical interference, in which 1 is a target electrode, 2 is a substrate holder surrounding this target electrode 1, and 6 is a sputter apparatus base. .
A substrate 3 to be deposited is held on a substrate holder 2. In this case, the light introduction hole 4 is provided in the substrate holder 2.
A light beam 5 is introduced from the outside through the light introduction hole 4 and guided to the surface of the substrate 3. The light reflected from the surface of the substrate 3 is led out again through the light introduction hole 4, and when the temporal change in the intensity of this reflected light is observed during vapor deposition, vibration characteristics as shown in FIG. 2, for example, are obtained. The thickness of the deposited film during deposition can be obtained from the period of . In FIG. 2, n indicates the refractive index of light in the deposited film, and λ indicates the wavelength of the introduced light beam. This type of film thickness monitoring device is effective for monitoring the thickness of transparent deposited films, but the thickness distribution of the deposited film becomes large near the introduction hole, making it difficult to form a film with a uniform thickness on the substrate. The disadvantage of this method is that the substrate cannot be placed near the introduction hole, which reduces the number of substrates to be processed. In particular, when forming the magnetic gap of a magnetic head using a spacer thin film, an extremely uniform film thickness distribution is required, and a solution to the above-mentioned drawbacks is desired.

発明の目的 本発明は上記従来の欠点を解消するもので、均
一なギヤツプ長を有する磁気ギヤツプを、再現性
よくかつ生産性よく形成することのできる磁気ギ
ヤツプの形成法を提供することを目的とする。
Purpose of the Invention The present invention solves the above-mentioned conventional drawbacks, and an object of the present invention is to provide a method for forming a magnetic gap that can form a magnetic gap having a uniform gap length with good reproducibility and high productivity. do.

発明の構成 上記目的を達成するため、本発明の1対の高透
磁率磁性体の少なくとも一方の表面に低透磁率物
質のガラス薄層を沈着させ、前記1対の高透磁率
磁性体を前記低透磁率物質のガラス薄層を介して
接合して磁気ヘツドの磁気ギヤツプを形成するに
際して、前記ガラス薄層の沈着方法として、少な
くともターゲツト電極と、前記ターゲツト電極を
取り囲み内面に高透磁率の基板が配置される基板
ホールダとを用いるスパツタ蒸着法を用い、かつ
前記基板ホールダに光導入孔を設け、前記光導入
孔に導電性の透明ガラスを挿入して設け、少なく
ともスパツタ蒸着時に光導入孔から導入した光を
前記基板表面に導き、前記基板表面及びこの基板
に付着したガラス薄層表面から反射する前記光の
相互干渉強度から前記ガラス薄層の膜厚をモニタ
するものである。
Structure of the Invention In order to achieve the above object, a thin glass layer of a low permeability material is deposited on at least one surface of a pair of high permeability magnetic materials of the present invention, and the pair of high permeability magnetic materials are When bonding via a thin glass layer of a low magnetic permeability material to form the magnetic gap of the magnetic head, the method of depositing the thin glass layer includes at least a target electrode and a substrate surrounding the target electrode and having a high magnetic permeability on the inner surface. The substrate holder is provided with a light introduction hole, and conductive transparent glass is inserted into the light introduction hole. The introduced light is guided to the surface of the substrate, and the thickness of the thin glass layer is monitored from the mutual interference intensity of the light reflected from the surface of the substrate and the surface of the thin glass layer attached to the substrate.

実施例の説明 以下、本発明の一実施例について、図面に基づ
いて説明する。
DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

即ち本発明は前記第1図に示す装置において、
磁気ヘツドの磁気ギヤツプを形成するに際して、
第3図に示すように基板ホールダ21の光導入孔
22の存在による膜厚分布の発生を、該光導入孔
22に導電性のガラス23を取り付けることによ
り防止し、基板ホールダ21への基板の充填数を
増加させるようにしたものである。この場合導電
性のガラス23として表面が透明導電膜で被膜さ
れた透明ガラス板を用いることができる。又光導
入孔22を通る光線24としてはHe―Neレーザ
光が実用的である。以上のように光導入孔22に
導電性のガラス23を取り付けることにより第4
図に示すような特性を得ることができる。第4図
は直径10cmの円筒型基板ホールダに直径10mmの光
導入孔を設けたときの光導入孔付近の膜厚分布を
示し、(イ)は空間光導入孔を用いた従来例、(ロ)は本
発明にかかる導電性ガラスを光導入孔に挿入して
取り付けた場合を示す。光導入孔付近の膜厚分布
は本発明によつて皆無になることが確認される。
膜厚分布が減少することの理由は主として光導入
孔付近の電界の乱れが導電性ガラスの存在により
減少し、均一なスパツタリング放電が保持される
ためと考えられる。
That is, the present invention provides the apparatus shown in FIG.
When forming the magnetic gap of the magnetic head,
As shown in FIG. 3, the occurrence of film thickness distribution due to the presence of the light introduction hole 22 in the substrate holder 21 is prevented by attaching conductive glass 23 to the light introduction hole 22, and the substrate holder 21 is The number of fillings is increased. In this case, a transparent glass plate whose surface is coated with a transparent conductive film can be used as the conductive glass 23. Further, as the light beam 24 passing through the light introduction hole 22, a He--Ne laser beam is practical. By attaching the conductive glass 23 to the light introduction hole 22 as described above, the fourth
The characteristics shown in the figure can be obtained. Figure 4 shows the film thickness distribution near the light introduction hole when a light introduction hole with a diameter of 10 mm is provided in a cylindrical substrate holder with a diameter of 10 cm. ) shows the case where the conductive glass according to the present invention is inserted and attached to the light introduction hole. It is confirmed that the film thickness distribution near the light introduction hole is completely eliminated by the present invention.
The reason why the film thickness distribution decreases is thought to be mainly because the disturbance of the electric field near the light introduction hole is reduced by the presence of the conductive glass, and a uniform sputtering discharge is maintained.

ところでこのスパツタ蒸着法は磁気ヘツド、例
えばビデオ信号高精度磁気ヘツドの形成に用いる
磁気ギヤツプの加工に有効である。第5図〜第7
図を用いてより具体的に説明する。第5図におい
て1対の例えばフエライト等の高透磁率磁性体3
1,31の少なくとも一方の表面32,32に、
第6図に示すように低透磁率物質のガラス、例え
ば硼硅酸ガラスの薄層33,33を厚さ例えば
0.3μmで上述のように膜厚をモニタしながら付着
する。この場合、膜厚精度は50Å〜100Å以下に
する。これら1対の高透磁率磁性体31,31同
士を上記ガラス薄層33,33を介して接合し、
これらをスライスして第7図に示すような磁気ギ
ヤツプ34を有する磁気コアを形成する。通常こ
れにコイル35を巻き、磁気ヘツドを形成する。
この場合、磁気ギヤツプ34の幅はほぼガラス薄
層33,33の厚みに相当し、サブミクロン範囲
である。又加工精度は50Å〜100Å以下を要求さ
れるから、膜厚分布も3%以下を要求される。従
来の技術はこれらの精度を満足した量産技術とし
ては不充分であるが、上記スパツタ蒸着法ではこ
れが可能になる。
By the way, this sputter deposition method is effective for processing magnetic heads, such as magnetic gaps used in forming high-precision magnetic heads for video signals. Figures 5 to 7
This will be explained in more detail using figures. In FIG. 5, a pair of high magnetic permeability magnetic materials 3, such as ferrite, etc.
On at least one surface 32, 32 of 1, 31,
As shown in FIG.
Deposit at 0.3 μm while monitoring the film thickness as described above. In this case, the film thickness accuracy should be 50 Å to 100 Å or less. These pairs of high magnetic permeability magnetic bodies 31, 31 are joined together via the glass thin layers 33, 33,
These are sliced to form a magnetic core having a magnetic gap 34 as shown in FIG. Usually, a coil 35 is wound around this to form a magnetic head.
In this case, the width of the magnetic gap 34 corresponds approximately to the thickness of the thin glass layers 33, 33, and is in the submicron range. Furthermore, since the processing accuracy is required to be 50 Å to 100 Å or less, the film thickness distribution is also required to be 3% or less. Although conventional techniques are insufficient for mass production that satisfies these precisions, the sputter deposition method described above makes this possible.

発明の効果 以上説明したように本発明によれば、寸法精度
の高いギヤツプを有する磁気ヘツドの磁気ギヤツ
プを再現性よくかつ生産性よく形成することがで
き、その工業的利用価値は極めて大である。
Effects of the Invention As explained above, according to the present invention, the magnetic gap of a magnetic head having a gap with high dimensional accuracy can be formed with good reproducibility and productivity, and its industrial utility value is extremely large. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来例を示す断面図、第2図は従来例
の特性図、第3図は本発明の基本実施例を示す要
部断面図、第4図は本発明の特性図、第5図〜第
7図は本発明の具体実施例における磁気ヘツドの
製造順序を示す説明図である。 21…基本ホールダ、22…光導入孔、23…
導電性ガラス、24…光線、31…高透磁率磁性
体、32…表面、33…ガラス薄層、34…磁気
ギヤツプ。
Fig. 1 is a sectional view showing a conventional example, Fig. 2 is a characteristic diagram of the conventional example, Fig. 3 is a sectional view of essential parts showing a basic embodiment of the present invention, Fig. 4 is a characteristic diagram of the present invention, and Fig. 5 7 to 7 are explanatory diagrams showing the manufacturing order of a magnetic head in a specific embodiment of the present invention. 21... Basic holder, 22... Light introduction hole, 23...
Conductive glass, 24...Light beam, 31...High magnetic permeability magnetic material, 32...Surface, 33... Glass thin layer, 34... Magnetic gap.

Claims (1)

【特許請求の範囲】 1 1対の高透磁率磁性体の少なくとも一方の表
面に低透磁率物質のガラス薄層を沈着させ、前記
1対の高透磁率磁性体を前記低透磁率物質のガラ
ス薄層を介して接合して磁気ヘツドの磁気ギヤツ
プを形成するに際して、前記ガラス薄層の沈着方
法として、少なくともターゲツト電極と、前記タ
ーゲツト電極を取り囲み内面に高透磁率の基板が
配置される基板ホールダとを用いるスパツタ蒸着
法を用い、かつ前記基板ホールダに光導入孔を設
け、前記光導入孔に導電性の透明ガラスを挿入し
て設け、少なくともスパツタ蒸着時に光導入孔か
ら導入した光を前記基板表面に導き、前記基板表
面及びこの基板に付着したガラス薄層表面から反
射する前記光の相互干渉強度から前記ガラス薄層
の膜厚をモニタすることを特徴とする磁気ギヤツ
プの形成法。 2 膜厚モニタに用いる光としてHe―Neレーザ
を用いることを特徴とする特許請求の範囲第1項
記載の磁気ギヤツプの形成法。 3 導電性の透明ガラスとして表面を透明導電膜
で被覆された透明ガラス板を用いることを特徴と
する特許請求の範囲第1項記載の磁気ギヤツプの
形成法。
[Scope of Claims] 1. A thin glass layer of a low magnetic permeability material is deposited on the surface of at least one of a pair of high magnetic permeability magnetic materials, and the pair of high magnetic permeability magnetic materials are coated with the glass of the low magnetic permeability material. When bonding through a thin layer to form a magnetic gap of a magnetic head, the method for depositing the thin glass layer includes at least a target electrode and a substrate holder surrounding the target electrode and having a substrate with high magnetic permeability on the inner surface. A light introduction hole is provided in the substrate holder, a conductive transparent glass is inserted into the light introduction hole, and at least the light introduced from the light introduction hole during the sputter deposition is transferred to the substrate. A method for forming a magnetic gap, characterized in that the thickness of the thin glass layer is monitored from the mutual interference intensity of the light guided to the surface and reflected from the surface of the substrate and the surface of the thin glass layer attached to the substrate. 2. The method for forming a magnetic gap according to claim 1, characterized in that a He--Ne laser is used as the light used to monitor the film thickness. 3. A method for forming a magnetic gap according to claim 1, characterized in that a transparent glass plate whose surface is coated with a transparent conductive film is used as the conductive transparent glass.
JP59010581A 1984-01-23 1984-01-23 Formation of magnetic gap Granted JPS59139125A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59010581A JPS59139125A (en) 1984-01-23 1984-01-23 Formation of magnetic gap

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59010581A JPS59139125A (en) 1984-01-23 1984-01-23 Formation of magnetic gap

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10598980A Division JPS5929112B2 (en) 1980-07-31 1980-07-31 sputter deposition method

Publications (2)

Publication Number Publication Date
JPS59139125A JPS59139125A (en) 1984-08-09
JPH024055B2 true JPH024055B2 (en) 1990-01-25

Family

ID=11754207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59010581A Granted JPS59139125A (en) 1984-01-23 1984-01-23 Formation of magnetic gap

Country Status (1)

Country Link
JP (1) JPS59139125A (en)

Also Published As

Publication number Publication date
JPS59139125A (en) 1984-08-09

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